CN103018950B - Color film substrate and manufacturing method and display device thereof - Google Patents
Color film substrate and manufacturing method and display device thereof Download PDFInfo
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- CN103018950B CN103018950B CN201210530719.7A CN201210530719A CN103018950B CN 103018950 B CN103018950 B CN 103018950B CN 201210530719 A CN201210530719 A CN 201210530719A CN 103018950 B CN103018950 B CN 103018950B
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Abstract
The invention provides a color film substrate and a manufacturing method and a display device thereof, relates to the technical field of display and solves the problems of the prior art that the cost is high when a halftone or gray tone mask plate is used for arranging a spacer film layer and the size of an auxiliary spacer is limited when an ordinary mask plate is used. The color film substrate comprises a transparent substrate, a black matrix film layer and a color film layer which are arranged on the transparent substrate, and a spacer film layer arranged above the block matrix film layer, wherein the spacer film layer comprises a first spacer and a second spacer; and the color film layer is positioned under the spacer film layer, covers the whole or partial area where the first spacer is arranged, and does not cover the area where the second spacer is arranged. The invention is suitable for the manufacturing field of a liquid crystal display device.
Description
Technical field
The present invention relates to display technique field, particularly relate to a kind of color membrane substrates and manufacture method, display device.
Background technology
Current liquid crystal indicator comprises the color membrane substrates and array base palte that are shaped to box, and needs between two substrates, to arrange chock insulator matter to support two substrates, is formed for the space of filling liquid crystal.
As shown in Figure 1, 2, in prior art, color membrane substrates comprises: transparency carrier 1, black matrix rete 2, colored film layer 3, protective film 4 and chock insulator matter rete 5.For improving display quality, chock insulator matter rete 5 generally comprises two kinds of chock insulator matters: main chock insulator matter 6 and auxiliary chock insulator matter 7; Wherein, main chock insulator matter 6 plays main support effect, and 7 the secondary supporting roles of auxiliary chock insulator matter.Under normal circumstances, the height of main chock insulator matter 6 is greater than the height of auxiliary chock insulator matter 7.
In order to make above-mentioned two kinds of highly different chock insulator matters, there are two kinds of methods at present.One is, in the process forming chock insulator matter rete 5, uses shadow tone or gray tone mask board to explosure, and light intensity required during by controlling to form the exposure of different chock insulator matter, realizes difference in height design after development; Two are, use common mask board to explosure, and two kinds of different chock insulator matters are designed to different sizes (size in bottom transverse cross section and height) with regard to needing by this, and the size of auxiliary chock insulator matter is less, needs strictly to control.
But, due to shadow tone or gray tone mask plate costly, therefore adopt the former method can make with high costs; According to the method for the latter, due to chock insulator matter height only when small-sized just with change in size, thus auxiliary chock insulator matter 7 must design to obtain the very little difference in height that could realize between two kinds of chock insulator matters, therefore to realize predetermined difference in height, the size of auxiliary chock insulator matter 7 is very restricted.
Summary of the invention
Embodiments of the invention provide a kind of color membrane substrates and manufacture method, display device, with high costs in order to what solve that shadow tone or gray tone mask plate bring, and common mask plate is to the restricted problem of auxiliary chock insulator matter size.
For solving the problem, embodiments of the invention adopt following technical scheme:
Embodiments provide a kind of color membrane substrates, comprising: transparency carrier, be arranged on the black matrix rete on described transparency carrier and colored film layer, and be arranged on the chock insulator matter rete above described black matrix rete; Wherein, described chock insulator matter rete comprises: the first chock insulator matter and the second chock insulator matter; Described colored film layer is positioned at the below of described chock insulator matter rete, covers all or part of of described first chock insulator matter region, and does not cover described second chock insulator matter region.
Optionally, described colored film layer comprises the pattern of pixels of multiple array arrangement; The extension of one of them pattern of pixels adjacent with arbitrary described first chock insulator matter covers all or part of of this first chock insulator matter region, or respectively the extending of two pattern of pixels adjacent with arbitrary described first chock insulator matter covers all or part of of this first chock insulator matter region.
Optionally, when adjacent two pattern of pixels of described and arbitrary described first chock insulator matter extend respectively cover this first chock insulator matter region whole, two pattern of pixels adjacent with described first chock insulator matter contact.
Optionally, described in the solid colour of two pattern of pixels that contacts, and to be structure as a whole.
Optionally, described black matrix rete comprises: the black matrix lines that many transverse and longitudinals are intersected; Wherein, described first chock insulator matter and described second chock insulator matter is provided with above the black matrix lines of at least two first directions.
Optionally, described first chock insulator matter above the black matrix lines of same first direction and described second chock insulator matter interval are arranged.
Optionally, chock insulator matter number set above the black matrix lines of described at least two first directions is equal, and in the second direction vertical with described first direction, chock insulator matter set above the black matrix lines of arbitrary first direction aligns one by one with chock insulator matter set above the black matrix lines of other first directions.
Optionally, in this second direction, described first chock insulator matter and described second chock insulator matter interval are arranged.
Optionally, described color membrane substrates, also comprises: protective film, and described protective film covers described colored film layer and described black matrix rete, and described chock insulator matter rete is positioned at above described protective film.
Optionally, described color membrane substrates, also comprises: shielding protection rete, and described shielding protection rete is positioned at the described transparency carrier side contrary with described black matrix rete and colored film layer.
Optionally, the difference in height of the bottom of described first chock insulator matter and the bottom of described second chock insulator matter is 0.5-1.0 μm.
Optionally, the difference in height on the top of described first chock insulator matter and the top of described second chock insulator matter is 0.3-0.8 μm.
Embodiments provide a kind of display device, comprise that the embodiment of the present invention provides any one described in color membrane substrates.
Embodiments provide a kind of manufacture method of color membrane substrates, comprise: the step that black matrix rete is set on the transparent substrate, the step of colored film layer is set on the transparent substrate, and on the transparency carrier being provided with described black matrix rete and described colored film layer, the step of chock insulator matter rete is set above described black matrix rete; Wherein, described chock insulator matter rete comprises: the first chock insulator matter and the second chock insulator matter; The described step arranging colored film layer on the transparent substrate comprises: arrange colored film layer in the region that described black matrix rete opening surrounds and described first all or part of of chock insulator matter region to be placed, and described colored film layer does not cover described second chock insulator matter region.
Optionally, before above described black matrix rete, the step of chock insulator matter rete is set, also comprise: the step that protective film is set on the transparency carrier being provided with described black matrix rete and described colored film layer.
Optionally, described manufacture method also comprises: the step arranging shielding protection rete in the side that transparency carrier is contrary with described black matrix rete and colored film layer.
A kind of color membrane substrates that the embodiment of the present invention provides and manufacture method thereof, display device, the colored film layer of described color membrane substrates covers all or part of of described first chock insulator matter region, and do not cover described second chock insulator matter region, bottom and the second chock insulator matter bottom height of formation of such first chock insulator matter are poor, thus height of formation is poor between the first chock insulator matter and the second chock insulator matter, common mask plate can be used when forming described chock insulator matter rete, and the size of the second chock insulator matter can measure-alike and unrestricted with the first chock insulator matter, avoid use shadow tone or gray tone mask plate cost high, use common mask plate to the restricted problem of the second chock insulator matter size.
Accompanying drawing explanation
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, be briefly described to the accompanying drawing used required in embodiment or description of the prior art below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 is the plan structure schematic diagram of color membrane substrates in prior art;
Fig. 2 is that the A-A ' of color membrane substrates in prior art is to cut-open view;
The plan structure schematic diagram of a kind of color membrane substrates that Fig. 3 provides for the embodiment of the present invention;
The A-A ' of a kind of color membrane substrates that Fig. 4 provides for the embodiment of the present invention is to cut-open view;
The manufacture method of a kind of color membrane substrates that Fig. 5 provides for the embodiment of the present invention.
Reference numeral:
1-transparency carrier; The black matrix rete of 2-; 3-colored film layer; 4-protective film; 5-chock insulator matter rete; The main chock insulator matter of 6-; The auxiliary chock insulator matter of 7-; 8-shielding protection rete; 51-first chock insulator matter; 52-second chock insulator matter.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, be clearly and completely described the technical scheme in the embodiment of the present invention, obviously, described embodiment is only the present invention's part embodiment, instead of whole embodiments.
Embodiments provide a kind of color membrane substrates, as shown in Figure 3, Figure 4, comprising: transparency carrier 1, be arranged on the black matrix rete 2 on described transparency carrier 1 and colored film layer 3, and be arranged on the chock insulator matter rete 5 above described black matrix rete 2; Wherein, described chock insulator matter rete 5 comprises: the first chock insulator matter 51 and the second chock insulator matter 52; Described colored film layer 3 is positioned at the below of described chock insulator matter rete 5, covers all or part of of described first chock insulator matter 51 region, and does not cover described second chock insulator matter 52 region.
It should be noted that, in the embodiment of the present invention " on ", D score is as the criterion with sequencing when manufacturing color membrane substrates, such as, refers to relatively at the rete of rear formation at upper rete, under rete refer to the rete relatively formerly formed.Wherein, the first chock insulator matter supports as the first order, plays main support effect, is equivalent to main chock insulator matter of the prior art; Second chock insulator matter supports as the second level, plays secondary supporting role, is equivalent to auxiliary chock insulator matter of the prior art.When liquid crystal indicator is subject to the effect generation miniature deformation of external force, first chock insulator matter supports as the first order, prevent the distortion of display device, second chock insulator matter will support as the second level, deformation is there is further to prevent liquid crystal indicator, like this, largely can reduce the generation of water ripple phenomenon, the use sense improving user is subject to.
Described colored film layer is positioned at the below of described chock insulator matter rete, cover described first chock insulator matter region, and do not cover described second chock insulator matter region, be provided with colored film layer relative between the bottom of the second chock insulator matter and transparency carrier surface between the bottom of such first chock insulator matter and transparency carrier surface more, then the bottom of the first chock insulator matter and the distance on described transparency carrier surface are greater than the bottom of the second chock insulator matter and the distance on described transparency carrier surface, namely the bottom of described first chock insulator matter and the bottom height of formation of described second chock insulator matter poor, thus make the first chock insulator matter and the second chock insulator matter height of formation poor.
Wherein, described colored film layer covers described first chock insulator matter region, can be that described colored film layer covers the whole of the region at described first chock insulator matter place, be arranged on above described colored film layer completely to make described first chock insulator matter; Or can be the part that described colored film layer covers described first chock insulator matter region, be arranged on above described colored film layer to make described first chock insulator matter, now, can there is partial collapse along with the out-of-flatness of bottom in the first chock insulator matter top, can be that the centre at top subsides also can be that the avris at top subsides.But no matter described colored film layer is the whole or part covering described first chock insulator matter region, the bottom of the first chock insulator matter and the distance on described transparency carrier surface are all greater than the bottom of the second chock insulator matter and the distance on described transparency carrier surface, then between the first chock insulator matter and the second chock insulator matter, height of formation is poor.
Difference in height is there is between first chock insulator matter and the second chock insulator matter, when liquid crystal indicator is subject to the effect generation miniature deformation of external force, second chock insulator matter will support as the second level, deformation is there is further to prevent liquid crystal indicator, can reduce the generation of water ripple phenomenon to a great extent, the use sense improving user is subject to.
Embodiments provide a kind of color membrane substrates, because described colored film layer is positioned at the below of described chock insulator matter rete, cover all or part of of described first chock insulator matter region, and do not cover described second chock insulator matter region, like this due to the impact of colored film layer thickness, the distance on the bottom of the first chock insulator matter and transparency carrier surface is made to be greater than the bottom of the second chock insulator matter and the distance on transparency carrier surface, thus height of formation is poor between described first chock insulator matter and described second chock insulator matter, common mask plate can be used when forming described chock insulator matter rete, and the size of the second chock insulator matter can measure-alike and unrestricted with the first chock insulator matter.Avoid use shadow tone or gray tone mask plate cost high, use common mask plate to the restricted problem of the second chock insulator matter size.
Optionally, as shown in Figure 4, described color membrane substrates, also comprises: protective film 4, and described protective film 4 covers described colored film layer 3 and described black matrix rete 2, and described chock insulator matter rete 5 is positioned at above described protective film 4.
Wherein, described protective film 4 is clear protective film layer.Described protective film 4 covers described colored film layer 3 and described black matrix rete 2; but owing to being also coated with colored film layer 3 in the first chock insulator matter 51 region; there is difference in height first chock insulator matter 51 bottom and the second chock insulator matter 52 bottom relative to substrate 1 surface; and the first chock insulator matter 51 bottom and the second chock insulator matter 52 bottom can not be reduced to zero relative to the difference in height between transparency carrier 1 surface by protective film 4; like this, on color membrane substrates, the difference in height d1 of the bottom of described first chock insulator matter 51 bottom and described second chock insulator matter 52 is 0.5-1.0 μm.
Again owing to forming the material of the first chock insulator matter 51 and the second chock insulator matter 52 for liquid, due to the impact of its mobility, by the oneself height making the oneself height of the second chock insulator matter a little more than the first chock insulator matter, the difference in height between described first chock insulator matter 51 and described second chock insulator matter 52 is made to reduce like this, now the difference in height d2 on the top of described first chock insulator matter 51 and the top of described second chock insulator matter 52 is 0.3-0.8 μm, meets the difference in height of normal first chock insulator matter and the second chock insulator matter.
Optionally, as shown in Figure 4, described color membrane substrates also comprises: shielding protection rete 8, and described shielding protection rete 8 is positioned at described transparency carrier 1 side contrary with described black matrix rete 2 and colored film layer 3.
Wherein, described shielding protection rete is Transparent shielding diaphragm, and its material can be ITO (Indium tin oxide, tin indium oxide).Described shielding protection rete mainly plays electrostatic screening, and protection display panel is not by the impact of external electrical field.For TN (Twisted Nematic; twisted-nematic) type liquid crystal indicator, due to its color membrane substrates being provided with public electrode rete, it has the effect of electrostatic screening; therefore, color membrane substrates can comprise shielding protection rete and also can not comprise shielding protection rete.For ADS (or claim AD-SDS; ADvanced Super Dimension Switch, senior super dimension field switch technology) type liquid crystal indicator, because its public electrode is arranged on array base palte; therefore preferred, its color membrane substrates surface also comprises shielding protection rete.
Wherein, the electric field that the electric field that ADS is mainly produced by gap electrode edge in same plane and gap electrode layer and plate electrode interlayer produce forms multi-dimensional electric field, make in liquid crystal cell that between gap electrode, directly over electrode, all aligned liquid-crystal molecules can both produce rotation, thus improve liquid crystal work efficiency and increase light transmission efficiency.Senior super dimension field switch technology can improve the picture quality of TFT-LCD product, have high resolving power, high permeability, low-power consumption, wide viewing angle, high aperture, low aberration, without advantages such as water of compaction ripples (push Mura).
Optionally, as shown in Figure 3, described colored film layer 3 comprises the pattern of pixels of multiple array arrangement; The extension of one of them pattern of pixels adjacent with arbitrary described first chock insulator matter 51 covers all or part of of this first chock insulator matter 51 region, or respectively the extending of two pattern of pixels adjacent with arbitrary described first chock insulator matter 51 covers all or part of of this first chock insulator matter 51 region.
Because described first chock insulator matter is between adjacent two pattern of pixels, therefore, being arranged on all or part of colored film layer in described first chock insulator matter region can be the extension of any one in two pattern of pixels adjacent with described first chock insulator matter.Certainly, also can be the extension respectively of two pattern of pixels adjacent with described first chock insulator matter, and these two pattern of pixels extend to contact and also can not contact, if do not contact, described colored film layer covers the part in the region of described first chock insulator matter, now can there is partial collapse along with the out-of-flatness of bottom in the first chock insulator matter top, can be that the centre at top subsides also can be that the avris at top subsides; If contact, described colored film layer covers the whole of the region of described first chock insulator matter, and now the top of the first chock insulator matter is smooth.
Preferably, when adjacent two pattern of pixels of described and arbitrary described first chock insulator matter extend respectively cover this first chock insulator matter region whole, two pattern of pixels adjacent with described first chock insulator matter contact.Like this, because two pattern of pixels contact, cover the whole of described first chock insulator matter region, the first chock insulator matter of upper flat can be formed.
As shown in Figure 3, further preferably, be positioned at the solid colour of two pattern of pixels contacted below described first chock insulator matter, and be structure as a whole.
As shown in Figure 3, the pattern of pixels array arrangement of described colored film layer, example, along on first direction 101 as shown in Figure 3, the color of pattern of pixels is one group with red, green, blue, repeats to arrange, and the pattern of pixels of filling with different pattern in figure represents the pattern of pixels of different colours; And along in second direction 102, the color of neighbor pattern is identical.Like this, two pattern of pixels that described first chock insulator matter is adjacent extend and contact and the solid colour of these two pattern of pixels, for the pattern of pixels arrangement mode shown in Fig. 3, to the solid colour of two pattern of pixels, now, two kinds of chock insulator matters 51,52 can only be arranged along first direction 101.Integrative-structure refers between two pattern of pixels completely very close to each other, the entirety of these two pattern of pixels can be regarded as a pattern as shown in the figure.
Optionally, as shown in Figure 3, described black matrix rete 2 comprises: the black matrix lines that many transverse and longitudinals are intersected; Wherein, described first chock insulator matter and described second chock insulator matter is provided with above the black matrix lines of at least two first directions.
Be provided with described first chock insulator matter and described second chock insulator matter above at least two on first direction 101 black matrix lines simultaneously, like this when liquid crystal indicator is subject to the effect generation miniature deformation of external force, due on first direction 101 and second direction 102, first chock insulator matter and the second chock insulator matter are all set, liquid crystal indicator generation deformation can be prevented in the two directions, reduce the generation of water ripple phenomenon to a great extent, the use sense improving user is subject to.
Certainly, also can be that described first chock insulator matter and described second chock insulator matter are set above the black matrix lines of each first direction.Or above the black matrix lines of first direction, arrange described first chock insulator matter and described second chock insulator matter along second direction interval, and the black matrix lines interval being in a second direction provided with described first chock insulator matter and described second chock insulator matter is identical.
Preferably, described first chock insulator matter above the black matrix lines of same first direction and described second chock insulator matter interval are arranged.
Like this, in a first direction, because the first chock insulator matter and the second chock insulator matter interval are arranged, when liquid crystal indicator is subject to the effect generation miniature deformation of external force, first chock insulator matter and the supporting role of the second chock insulator matter to display device more even, more effectively can prevent liquid crystal indicator generation deformation, reduce the generation of water ripple phenomenon to a great extent, the use sense improving user is subject to.
Again in order to control the quantity of the first chock insulator matter and the second chock insulator matter, avoid the light leak that black matrix rete causes owing to too much arranging the first chock insulator matter or the second chock insulator matter, preferred further, as shown in Figure 3, in the black matrix lines of the pattern of pixels of the corresponding same color of described first direction, interval arranges described first chock insulator matter and described second chock insulator matter.
Preferably, chock insulator matter number set above the black matrix lines of described at least two first directions is equal, and in the second direction vertical with described first direction, chock insulator matter set above the black matrix lines of arbitrary first direction aligns one by one with chock insulator matter set above the black matrix lines of other first directions.
As shown in Figure 3, the first chock insulator matter 51 and the second chock insulator matter 52 align along second direction 102.Certainly, the first chock insulator matter and the alignment of the second chock insulator matter can be align one by one in the first chock insulator matter and the optional position of the second chock insulator matter within the scope of described neighbor pattern width.Preferably, also can be that the first chock insulator matter and the second chock insulator matter align along the center of described pattern of pixels.
As shown in Figure 3, preferably, in described second direction 102, described first chock insulator matter 51 and described second chock insulator matter 52 interval are arranged.
Like this, when liquid crystal indicator is subject to the effect generation miniature deformation of external force, in a second direction, first chock insulator matter and the supporting role of the second chock insulator matter to liquid crystal indicator more even, effectively can prevent liquid crystal indicator generation deformation, reduce the generation of water ripple phenomenon to a great extent, the use sense that improve user is subject to.
Embodiments provide a kind of manufacture method of color membrane substrates, comprise: the step (S101) that black matrix rete is set on the transparent substrate, the step (S102) of colored film layer is set on the transparent substrate, and on the transparency carrier being provided with described black matrix rete and described colored film layer, the step (S103) of chock insulator matter rete is set above described black matrix rete; Wherein, described chock insulator matter rete comprises: the first chock insulator matter and the second chock insulator matter; The described step (S102) arranging colored film layer on the transparent substrate comprising: arrange colored film layer in the region that described black matrix rete opening surrounds and described first all or part of of chock insulator matter region to be placed, and described colored film layer does not cover described second chock insulator matter region.
Example, as shown in Figure 5, the manufacture method of color membrane substrates can comprise the following steps successively:
S101, black matrix rete is set on the transparent substrate.
Wherein, described black matrix rete comprises: many black matrix lines of intersecting, as shown in Figure 3.
S102, colored film layer is set on the transparent substrate.
Described colored film layer covers all or part of of described first chock insulator matter region, and does not cover described second chock insulator matter region, as shown in Figure 3.
S103, chock insulator matter rete is set above described black matrix rete.
Common mask plate can be used, complete the setting of chock insulator matter rete, wherein, described chock insulator matter rete comprises: the first chock insulator matter and the second chock insulator matter, the size of described first chock insulator matter can be identical with the size of described second chock insulator matter, and described first chock insulator matter is arranged on the position black matrix lines being coated with colored film layer.
Wherein, the manufacture method of color membrane substrates is also not only confined to above-mentioned method, and the order of such as above-mentioned steps S101 and step S102 can be exchanged.
Embodiments provide a kind of manufacture method of color membrane substrates, the region that described method surrounds at described black matrix rete opening, and described first all or part of of chock insulator matter region to be placed arranges colored film layer, and described colored film layer does not cover described second chock insulator matter region, like this, the bottom of the first chock insulator matter and the bottom height of formation of the second chock insulator matter poor, thus height of formation is poor between the first chock insulator matter and the second chock insulator matter, common mask plate can be used when forming described chock insulator matter rete, and the size of the second chock insulator matter can measure-alike and unrestricted with the first chock insulator matter.Avoid use shadow tone or gray tone mask plate cost high, use common mask plate to the restricted problem of the second chock insulator matter size.
Optionally, before the step (S103) of chock insulator matter rete is set above described black matrix rete, also comprise: on the transparency carrier being provided with described black matrix rete and described colored film layer, protective film (S104) is set.
Wherein, described protective film is clear protective film layer; its protective film formed is between described chock insulator matter rete and described black matrix rete; and the first chock insulator matter bottom and the second chock insulator matter bottom can not be reduced to zero relative to the difference in height between transparency carrier surface by protective film; like this, on color membrane substrates, the difference in height d1 of the bottom of described first chock insulator matter 51 bottom and described second chock insulator matter 52 is 0.5-1.0 μm.
Optionally, described manufacture method also comprises: the step (S105) arranging shielding protection rete in the side that transparency carrier is contrary with described black matrix rete and colored film layer.
Wherein, described shielding protection rete is Transparent shielding diaphragm, and its material can be ITO.Described shielding protection rete mainly plays electrostatic screening, and protection display panel is not by the impact of external electrical field.For TN type liquid crystal indicator, due to its color membrane substrates being provided with public electrode rete, it has the effect of electrostatic screening, and therefore, the manufacture method of color membrane substrates can also comprise step S105, also can not comprise step S105; For ADS type liquid crystal indicator, because its public electrode is arranged on array base palte, therefore preferably, the manufacture method of color membrane substrates also comprises step S105.
And be arranged on the transparency carrier side contrary with described black matrix rete and colored film layer due to described shielding protection rete, mutually do not interfere with above-mentioned steps S101-step S104, therefore step S105 can carry out separately.And preferred, before carrying out step S101, carry out step S105.
Embodiments provide a kind of display device, comprise that the embodiment of the present invention provides any one described in color membrane substrates.Wherein, described display device can be any product or parts with Presentation Function such as liquid crystal display, LCD TV, digital camera, mobile phone, panel computer.
The above; be only the specific embodiment of the present invention, but protection scope of the present invention is not limited thereto, is anyly familiar with those skilled in the art in the technical scope that the present invention discloses; the change that can expect easily or replacement, all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of described claim.
Claims (15)
1. a color membrane substrates, comprising: transparency carrier, is arranged on the black matrix rete on described transparency carrier and colored film layer, and is arranged on the chock insulator matter rete above described black matrix rete; Wherein, described chock insulator matter rete comprises: the first chock insulator matter and the second chock insulator matter; It is characterized in that, described colored film layer is positioned at the below of described chock insulator matter rete, covers all or part of of described first chock insulator matter region, and does not cover described second chock insulator matter region;
Described black matrix rete comprises: the black matrix lines that many transverse and longitudinals are intersected; Wherein, be provided with described first chock insulator matter and described second chock insulator matter above the black matrix lines of at least two first directions, described first direction is horizontal direction.
2. color membrane substrates according to claim 1, is characterized in that, described colored film layer comprises the pattern of pixels of multiple array arrangement;
The extension of one of them pattern of pixels adjacent with arbitrary described first chock insulator matter covers all or part of of this first chock insulator matter region, or respectively the extending of two pattern of pixels adjacent with arbitrary described first chock insulator matter covers all or part of of this first chock insulator matter region.
3. color membrane substrates according to claim 2, it is characterized in that, when adjacent two pattern of pixels of described and arbitrary described first chock insulator matter extend respectively cover this first chock insulator matter region whole, two pattern of pixels adjacent with described first chock insulator matter contact.
4. color membrane substrates according to claim 3, is characterized in that, described in the solid colour of two pattern of pixels that contacts, and to be structure as a whole.
5. color membrane substrates according to claim 1, is characterized in that, described first chock insulator matter above the black matrix lines of same first direction and described second chock insulator matter interval are arranged.
6. color membrane substrates according to claim 1, it is characterized in that, chock insulator matter number set above the black matrix lines of described at least two first directions is equal, and in the second direction vertical with described first direction, chock insulator matter set above the black matrix lines of arbitrary first direction aligns one by one with chock insulator matter set above the black matrix lines of other first directions.
7. color membrane substrates according to claim 6, is characterized in that, in this second direction, described first chock insulator matter and described second chock insulator matter interval are arranged.
8. color membrane substrates according to claim 1, is characterized in that, also comprises: protective film, and described protective film covers described colored film layer and described black matrix rete, and described chock insulator matter rete is positioned at above described protective film.
9. color membrane substrates according to claim 1, is characterized in that, also comprises: shielding protection rete, and described shielding protection rete is positioned at the described transparency carrier side contrary with described black matrix rete and colored film layer.
10. the color membrane substrates according to any one of claim 1-4, is characterized in that, the difference in height of the bottom of described first chock insulator matter and the bottom of described second chock insulator matter is 0.5-1.0 μm.
11. color membrane substrates according to any one of claim 1-4, it is characterized in that, the difference in height on the top of described first chock insulator matter and the top of described second chock insulator matter is 0.3-0.8 μm.
12. 1 kinds of display device, is characterized in that, comprise the color membrane substrates described in any one of claim 1-11.
The manufacture method of 13. 1 kinds of color membrane substrates, comprise: the step that black matrix rete is set on the transparent substrate, the step of colored film layer is set on the transparent substrate, and on the transparency carrier being provided with described black matrix rete and described colored film layer, the step of chock insulator matter rete is set above described black matrix rete; Wherein, described chock insulator matter rete comprises: the first chock insulator matter and the second chock insulator matter; It is characterized in that, the described step arranging colored film layer on the transparent substrate comprises:
Colored film layer is set in the region that described black matrix rete opening surrounds and described first all or part of of chock insulator matter region to be placed, and described colored film layer does not cover described second chock insulator matter region;
Described black matrix rete comprises: the black matrix lines that many transverse and longitudinals are intersected; Wherein, be provided with described first chock insulator matter and described second chock insulator matter above the black matrix lines of at least two first directions, described first direction is horizontal direction.
14. manufacture methods according to claim 13; it is characterized in that; before above described black matrix rete, the step of chock insulator matter rete is set, also comprise: the step that protective film is set on the transparency carrier being provided with described black matrix rete and described colored film layer.
15. manufacture methods according to claim 13, is characterized in that, also comprise: the step arranging shielding protection rete in the side that transparency carrier is contrary with described black matrix rete and colored film layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210530719.7A CN103018950B (en) | 2012-12-10 | 2012-12-10 | Color film substrate and manufacturing method and display device thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210530719.7A CN103018950B (en) | 2012-12-10 | 2012-12-10 | Color film substrate and manufacturing method and display device thereof |
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| CN201510007503.6A Division CN104460105A (en) | 2012-12-10 | 2012-12-10 | Color membrane substrate, manufacturing method for color membrane substrate and display device |
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| US11841573B2 (en) | 2018-09-12 | 2023-12-12 | AU Optronics (Kunshan) Co., Ltd. | Mask plate group and display panel |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103676293B (en) * | 2013-12-02 | 2017-05-31 | 京东方科技集团股份有限公司 | A kind of color membrane substrates and preparation method thereof, display device |
| CN104749812A (en) * | 2013-12-31 | 2015-07-01 | 上海仪电显示材料有限公司 | Color filter substrate, manufacturing method of color filter substrate and liquid crystal display device comprising color filter substrate |
| TWI519878B (en) * | 2014-12-25 | 2016-02-01 | 友達光電股份有限公司 | Display panel and method of making the same |
| CN204667020U (en) * | 2015-05-26 | 2015-09-23 | 京东方科技集团股份有限公司 | A kind of display device |
| CN105204238B (en) * | 2015-10-26 | 2019-02-26 | 厦门天马微电子有限公司 | A kind of color membrane substrates and display panel, display device |
| CN105489124B (en) * | 2016-01-05 | 2019-06-07 | 京东方科技集团股份有限公司 | Display panel and preparation method thereof and display device |
| CN114690473A (en) * | 2020-12-31 | 2022-07-01 | 上海仪电显示材料有限公司 | Color filter substrate, liquid crystal box and manufacturing method thereof |
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| GB2424509A (en) * | 2003-11-27 | 2006-09-27 | Lg Philips Lcd Co Ltd | Color filter array substrate and fabricating method thereof |
| KR20070036867A (en) * | 2005-09-30 | 2007-04-04 | 엘지.필립스 엘시디 주식회사 | Liquid crystal display device and method of fabricating the same |
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| KR101064189B1 (en) * | 2004-08-03 | 2011-09-14 | 삼성전자주식회사 | Color filter substrate, display panel and method of manufacturing the same |
| KR20110133836A (en) * | 2010-06-07 | 2011-12-14 | 삼성모바일디스플레이주식회사 | Color filter display panel and plat panel display including the same |
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| GB2424509A (en) * | 2003-11-27 | 2006-09-27 | Lg Philips Lcd Co Ltd | Color filter array substrate and fabricating method thereof |
| KR20070036867A (en) * | 2005-09-30 | 2007-04-04 | 엘지.필립스 엘시디 주식회사 | Liquid crystal display device and method of fabricating the same |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US11841573B2 (en) | 2018-09-12 | 2023-12-12 | AU Optronics (Kunshan) Co., Ltd. | Mask plate group and display panel |
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