CN205152331U - Improved chemical copper plating device - Google Patents
Improved chemical copper plating device Download PDFInfo
- Publication number
- CN205152331U CN205152331U CN201520969180.4U CN201520969180U CN205152331U CN 205152331 U CN205152331 U CN 205152331U CN 201520969180 U CN201520969180 U CN 201520969180U CN 205152331 U CN205152331 U CN 205152331U
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- Prior art keywords
- reaction tank
- circulation
- transmission rod
- working chamber
- circulation water
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Abstract
The utility model discloses an improved chemical copper plating device, including the reaction tank, the reaction tank is the rectangle, and the both ends of rectangle constitute by the semi -circle, evenly distributed has circulation water inlet and circulation water drainage tank in the inner chamber of reaction tank, and the water inlet that just circulates is the same with circulation water drainage tank's quantity, inner circulating device is all installed at both ends around the reaction tank. The utility model discloses an inner circulating device makes the solution flow in the reaction tank move, and the low concentration solution replacement that will plate near along with the flow of solution is for plating piece highly concentrated solution at a distance, the effectual reaction rate that has guaranteed.
Description
Technical field
The utility model relates to copper plating device technical field, is specially a kind of Modified Chemical copper plating device.
Background technology
Electroless copper is a kind of technique in circuit board fabrication, usually also makes heavy copper or hole (PTH) be a kind of their catalytic redox reactions.First Treatment with activating agent is used, make the particle of insulating substrate surface adsorption last layer activity usually be that (palladium is a kind of very expensive metal to palladium metal particle, price is high and rising always, practical electrocuprol technique is had now abroad in operation) for reducing costs, first cupric ion is reduced on the palladium metal particle of these activity, and the metallic copper nucleus that these are reduced itself becomes the Catalytic Layer of cupric ion, the reduction reaction of copper is made to continue to carry out on the copper nucleating surface that these are new.When carrying out electroless copper, there will be the phenomenon pockety of strength of solution, cause the concentration near plating piece lower than the concentration of plating piece distant place, to such an extent as to reaction efficiency is not high, for this reason, proposes a kind of Modified Chemical copper plating device.
Utility model content
The purpose of this utility model is to provide a kind of Modified Chemical copper plating device, to solve the problem proposed in above-mentioned background technology.
For achieving the above object, the utility model provides following technical scheme: a kind of Modified Chemical copper plating device, comprise reaction tank, the centre of described reaction tank is rectangle, and two ends are semicircular structure, be evenly distributed with circulation water-in and circulation drainage tray in the inner chamber of described reaction tank, and circulation water-in is identical with the quantity of circulation drainage tray, the rear and front end of described reaction tank is all provided with internal circulation apparatus;
Described internal circulation apparatus comprises working chamber, diaphragm cavity and flowing lumen, and the both sides of working chamber are provided with diaphragm cavity and flowing lumen successively, the internal activity of described working chamber is provided with pressure control assembly, described pressure control assembly comprises transmission rod, middle on described transmission rod is provided with the first gear, the both sides described transmission rod being positioned at the first gear are equipped with chute, and the inwall of working chamber is provided with the projection mated with chute, the two ends of described transmission rod are equipped with sealing block, the outside of described working chamber is provided with electric motor, and electric motor is connected by the engagement of the second gear and the first gear and transmission rod, the inside of described diaphragm cavity is connected with barrier film, the two ends of described flowing lumen are equipped with non-return assembly, the two ends of described flowing lumen are connected with circulation water-in and circulation drainage tray respectively by pipeline.
Preferably, described non-return assembly comprises annular geosynclinal block, fluid stopping ball and limited block, and described annular geosynclinal block, fluid stopping ball and limited block are arranged in flowing lumen successively, and the distance between annular geosynclinal block and limited block is greater than the diameter of fluid stopping ball.
Preferably, described circulation water-in is truncated cone-shaped, and described circulation drainage tray extends to the semicircular inner side wall of reaction tank.
Compared with prior art, the beneficial effects of the utility model are: the utility model makes the solution stream in reaction tank move up by internal circulation apparatus, along with the low concentration solution near plating piece is replaced with plating piece highly concentrated solution at a distance by the flowing of solution, effectively ensure that speed of reaction.
Accompanying drawing explanation
Fig. 1 is the utility model structural representation;
Fig. 2 is the utility model front view;
Fig. 3 is sectional view of the present utility model.
In figure: 1 reaction tank, 11 circulation water-ins, 12 circulation drainage trays, 2 internal circulation apparatus, 21 working chambers, 211 projections, 22 diaphragm cavities, 23 flowing lumens, 24 pressure control assemblies, 241 transmission rods, 242 first gears, 243 chutes, 244 sealing blocks, 25 electric motor, 251 second gears, 26 barrier films, 27 non-return assemblies, 271 annular geosynclinal blocks, 272 fluid stopping balls and 273 limited blocks.
Embodiment
Below in conjunction with the accompanying drawing in the utility model embodiment, be clearly and completely described the technical scheme in the utility model embodiment, obviously, described embodiment is only the utility model part embodiment, instead of whole embodiments.Based on the embodiment in the utility model, those of ordinary skill in the art are not making the every other embodiment obtained under creative work prerequisite, all belong to the scope of the utility model protection.
Refer to Fig. 1-3, the utility model provides a kind of technical scheme: a kind of Modified Chemical copper plating device, comprise reaction tank 1, the centre of described reaction tank 1 is rectangle, and two ends are semicircular structure, be evenly distributed with circulation water-in 11 and circulation drainage tray 12 in the inner chamber of described reaction tank 1, and circulation water-in 11 is identical with the quantity of circulation drainage tray 12, the rear and front end of described reaction tank 1 is all provided with internal circulation apparatus 2;
Described internal circulation apparatus 2 comprises working chamber 21, diaphragm cavity 22 and flowing lumen 23, and the both sides of working chamber 21 are provided with diaphragm cavity 22 and flowing lumen 23 successively, the internal activity of described working chamber 21 is provided with pressure control assembly 24, described pressure control assembly 24 comprises transmission rod 241, middle on described transmission rod 241 is provided with the first gear 242, the both sides described transmission rod 241 being positioned at the first gear 242 are equipped with chute 243, and the inwall of working chamber 21 is provided with the projection 211 mated with chute 243, the two ends of described transmission rod 241 are equipped with sealing block 244, the outside of described working chamber 21 is provided with electric motor 25, and electric motor 25 is connected by the engagement of the second gear 251 and the first gear 242 and transmission rod 241, the inside of described diaphragm cavity 22 is connected with barrier film 26, the two ends of described flowing lumen 23 are equipped with non-return assembly 27, the two ends of described flowing lumen 23 are connected with circulation water-in 11 and circulation drainage tray 12 respectively by pipeline.
Specifically, described non-return assembly 27 comprises annular geosynclinal block 271, fluid stopping ball 272 and limited block 273, described annular geosynclinal block 271, fluid stopping ball 272 and limited block 273 are arranged in flowing lumen 23 successively, and the distance between annular geosynclinal block 271 and limited block 273 is greater than the diameter of fluid stopping ball 272, uniflux under the effect making solution drive barrier film 26 to move at pressure control assembly 24.
In order to improve the homogeneity of water inlet and draining, described circulation water-in 11 is truncated cone-shaped, and described circulation drainage tray 12 extends to the semicircular inner side wall of reaction tank 1.
During use, electric motor 25 drives pressure control assembly 24 to move up and down, thus makes barrier film 26 drive solution to flow, and the quick plating piece of the low concentration solution in reaction tank 1 near plating piece solution is at a distance replaced, effectively ensure that speed of reaction.
Although illustrate and described embodiment of the present utility model, for the ordinary skill in the art, be appreciated that and can carry out multiple change, amendment, replacement and modification to these embodiments when not departing from principle of the present utility model and spirit, scope of the present utility model is by claims and equivalents thereof.
Claims (3)
1. a Modified Chemical copper plating device, it is characterized in that: comprise reaction tank (1), the centre of described reaction tank (1) is rectangle, and two ends are semicircular structure, circulation water-in (11) and circulation drainage tray (12) is evenly distributed with in the inner chamber of described reaction tank (1), and circulation water-in (11) is identical with the quantity of circulation drainage tray (12), the rear and front end of described reaction tank (1) is all provided with internal circulation apparatus (2);
Described internal circulation apparatus (2) comprises working chamber (21), diaphragm cavity (22) and flowing lumen (23), and the both sides of working chamber (21) are provided with diaphragm cavity (22) and flowing lumen (23) successively, the internal activity of described working chamber (21) is provided with pressure control assembly (24), described pressure control assembly (24) comprises transmission rod (241), middle on described transmission rod (241) is provided with the first gear (242), the both sides described transmission rod (241) being positioned at the first gear (242) are equipped with chute (243), and the inwall of working chamber (21) is provided with the projection (211) mated with chute (243), the two ends of described transmission rod (241) are equipped with sealing block (244), the outside of described working chamber (21) is provided with electric motor (25), and electric motor (25) is connected by the engagement of the second gear (251) and the first gear (242) and transmission rod (241), the inside of described diaphragm cavity (22) is connected with barrier film (26), the two ends of described flowing lumen (23) are equipped with non-return assembly (27), the two ends of described flowing lumen (23) are connected with circulation water-in (11) and circulation drainage tray (12) respectively by pipeline.
2. a kind of Modified Chemical copper plating device according to claim 1, it is characterized in that: described non-return assembly (27) comprises annular geosynclinal block (271), fluid stopping ball (272) and limited block (273), described annular geosynclinal block (271), fluid stopping ball (272) and limited block (273) are arranged in flowing lumen (23) successively, and the distance between annular geosynclinal block (271) and limited block (273) is greater than the diameter of fluid stopping ball (272).
3. a kind of Modified Chemical copper plating device according to claim 1, is characterized in that: described circulation water-in (11) is truncated cone-shaped, and described circulation drainage tray (12) extends to the semicircular inner side wall of reaction tank (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520969180.4U CN205152331U (en) | 2015-11-27 | 2015-11-27 | Improved chemical copper plating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520969180.4U CN205152331U (en) | 2015-11-27 | 2015-11-27 | Improved chemical copper plating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205152331U true CN205152331U (en) | 2016-04-13 |
Family
ID=55688046
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520969180.4U Expired - Fee Related CN205152331U (en) | 2015-11-27 | 2015-11-27 | Improved chemical copper plating device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205152331U (en) |
-
2015
- 2015-11-27 CN CN201520969180.4U patent/CN205152331U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160413 Termination date: 20161127 |
|
| DD01 | Delivery of document by public notice | ||
| DD01 | Delivery of document by public notice |
Addressee: Zheng Jianye Document name: Notification of Termination of Patent Right |