CN205009030U - 化学机械抛光装置用承载头及其隔膜 - Google Patents

化学机械抛光装置用承载头及其隔膜 Download PDF

Info

Publication number
CN205009030U
CN205009030U CN201520591847.1U CN201520591847U CN205009030U CN 205009030 U CN205009030 U CN 205009030U CN 201520591847 U CN201520591847 U CN 201520591847U CN 205009030 U CN205009030 U CN 205009030U
Authority
CN
China
Prior art keywords
mentioned
barrier film
horizontal extension
mechanical polishing
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201520591847.1U
Other languages
English (en)
Chinese (zh)
Inventor
孙准皓
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Case Polytron Technologies Inc
Original Assignee
KC Tech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KC Tech Co Ltd filed Critical KC Tech Co Ltd
Application granted granted Critical
Publication of CN205009030U publication Critical patent/CN205009030U/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
CN201520591847.1U 2014-10-24 2015-08-03 化学机械抛光装置用承载头及其隔膜 Active CN205009030U (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020140144661A KR101587780B1 (ko) 2014-10-24 2014-10-24 화학 기계적 연마 장치용 캐리어 헤드의 멤브레인
KR10-2014-0144661 2014-10-24

Publications (1)

Publication Number Publication Date
CN205009030U true CN205009030U (zh) 2016-02-03

Family

ID=55207657

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201520591847.1U Active CN205009030U (zh) 2014-10-24 2015-08-03 化学机械抛光装置用承载头及其隔膜

Country Status (2)

Country Link
KR (1) KR101587780B1 (ko)
CN (1) CN205009030U (ko)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111168562A (zh) * 2018-11-09 2020-05-19 凯斯科技股份有限公司 研磨装置用承载头及其隔膜
WO2020253869A1 (zh) * 2019-06-21 2020-12-24 清华大学 用于化学机械抛光头的气膜、化学机械抛光头及抛光设备
CN112847127A (zh) * 2021-02-03 2021-05-28 华海清科股份有限公司 一种用于化学机械抛光的柔性膜、承载头及抛光设备

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118254325B (zh) * 2024-04-23 2024-09-27 宁波松迦智能装备有限公司 一种膜片挤压成型设备及其工艺

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100586018B1 (ko) * 2004-02-09 2006-06-01 삼성전자주식회사 연마 헤드용 플렉서블 멤브레인 및 이를 포함하는 연마 장치
KR101223010B1 (ko) * 2012-06-29 2013-01-17 주식회사 케이씨텍 화학 기계적 연마 장치의 캐리어 헤드용 멤브레인
KR101410358B1 (ko) * 2013-02-25 2014-06-20 삼성전자주식회사 화학적 기계적 연마장치용 멤브레인 및 화학적 기계적 연마장치용 연마헤드
KR101293485B1 (ko) * 2013-07-08 2013-08-06 주식회사 케이씨텍 화학 기계적 연마 장치용 캐리어 헤드용 리테이너 링

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111168562A (zh) * 2018-11-09 2020-05-19 凯斯科技股份有限公司 研磨装置用承载头及其隔膜
WO2020253869A1 (zh) * 2019-06-21 2020-12-24 清华大学 用于化学机械抛光头的气膜、化学机械抛光头及抛光设备
CN112847127A (zh) * 2021-02-03 2021-05-28 华海清科股份有限公司 一种用于化学机械抛光的柔性膜、承载头及抛光设备

Also Published As

Publication number Publication date
KR101587780B1 (ko) 2016-01-25

Similar Documents

Publication Publication Date Title
CN205009030U (zh) 化学机械抛光装置用承载头及其隔膜
CN204954603U (zh) 化学机械抛光装置的承载头的隔膜
CN205148039U (zh) 化学机械抛光装置用承载头的隔膜及承载头
EP3315467B1 (en) Substrate vacuum forming mold and method
US9969049B2 (en) Polishing layer of polishing pad and method of forming the same and polishing method
TW200715396A (en) Manufacturing method for a semiconductor device
KR102247838B1 (ko) 수지 시트의 분단 방법 및 분단 장치
JP7276434B2 (ja) 基板貼り合わせ装置および基板貼り合わせ方法
CN204954604U (zh) 化学机械抛光装置用承载头的隔膜及承载头
JP2016201519A (ja) デバイスパッケージの製造方法
JP6566703B2 (ja) デバイスチップの製造方法
JP6433204B2 (ja) 静電支持プレート及び静電支持プレートの製造方法
JP5003015B2 (ja) 基板の研削方法
CN103522165B (zh) 研磨垫成型模具的制造方法、研磨垫成型模具及研磨垫
KR20120124700A (ko) 기판 흡착용 패드 및 이의 제조방법
CN204954605U (zh) 化学机械抛光装置用承载头的隔膜及承载头
KR102098993B1 (ko) 웨이퍼 에지 연마용 드럼 패드의 드레싱 장치
CN207656469U (zh) 化学机械式研磨装置用承载头的隔膜及具备其的承载头
US8580691B2 (en) Method of forming non-planar membranes using CMP
CN205201297U (zh) 用于化学机械研磨装置的研磨头
CN204913592U (zh) 化学机械抛光装置用承载头的隔膜以及化学机械抛光装置用承载头
KR102110489B1 (ko) 화학 기계적 연마 장치의 캐리어 헤드의 멤브레인
KR20130004776U (ko) 패드 콘디셔너 활모양 절삭날의 가공면 및 그의 제조용 금형의 구조
JP3174489U (ja) パッドコンディショナー弧状切刃の仕上げ面及びその製造用金型の構造
KR100614831B1 (ko) 폴리싱 패드 및 그 제조방법

Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
TR01 Transfer of patent right

Effective date of registration: 20180508

Address after: Korea city Daoan

Patentee after: Case Polytron Technologies Inc

Address before: Jing Jidao

Patentee before: K. C. Tech Co., Ltd.

TR01 Transfer of patent right