CN204558439U - A kind of vacuum cup taking off film for Taiko wafer - Google Patents

A kind of vacuum cup taking off film for Taiko wafer Download PDF

Info

Publication number
CN204558439U
CN204558439U CN201520239467.1U CN201520239467U CN204558439U CN 204558439 U CN204558439 U CN 204558439U CN 201520239467 U CN201520239467 U CN 201520239467U CN 204558439 U CN204558439 U CN 204558439U
Authority
CN
China
Prior art keywords
main body
suction cup
cup main
wafer
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201520239467.1U
Other languages
Chinese (zh)
Inventor
王成
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Dong Xu Electronic Science And Technology Co Ltd
Original Assignee
Shanghai Dong Xu Electronic Science And Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Dong Xu Electronic Science And Technology Co Ltd filed Critical Shanghai Dong Xu Electronic Science And Technology Co Ltd
Priority to CN201520239467.1U priority Critical patent/CN204558439U/en
Application granted granted Critical
Publication of CN204558439U publication Critical patent/CN204558439U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

The utility model describes a kind of vacuum cup taking off film for Taiko wafer, and comprise suction cup main body and be positioned at the sucker pipeline external tapping outside suction cup main body, the upper surface of this suction cup main body is provided with several micropores; Meanwhile, the inside of suction cup main body is provided with sucker pipeline, this sucker pipeline, micropore and sucker pipeline external tapping are communicated with mutually; In addition, the bottom of suction cup main body is provided with fixing sucking disk pedestal; Wherein, the edge of suction cup main body is provided with ledge structure, and sucker pipeline external tapping is provided with several fixing sucking disk screws.Owing to have employed above-mentioned technology, namely the utility model is provided with ledge structure by the edge in suction cup main body, and utilize the 3mm trough of this ledge structure and Taiko crystal round fringes to match, thus the leakage vacuum problem that occurs when can effectively avoid using Tiako wafer, and then reduce the risk of breaking when wafer takes off film, and finally reach the object improving product yield.

Description

A kind of vacuum cup taking off film for Taiko wafer
Technical field
The utility model relates to field of semiconductor package, particularly relates to a kind of vacuum cup taking off film for Taiko wafer.
Background technology
Nowadays, in field of semiconductor package, the thickness after people require wafer thinning is more and more thinner, and wafer size is larger, and the warpage of thinning rear wafer is also more serious, causes the subsequent job (as operations such as back face metalizations) that cannot meet power device.
For above-mentioned warpage issues, the Tiako grinding wafer equipment of Disco commercial firm provides a kind of solution preferably, when namely grinding being carried out to wafer, retain the marginal portion (about about 3mm) of wafer periphery, make the warpage that effectively can be reduced wafer by this technique, reduce the risk of thin wafer carrying.
But, after wafer is thinning, also need the diaphragm removing wafer frontside; Now, wafer firmly holds with wafer size vacuum cup of the same size by general employing, more artificial or take off film arm and peeled off by wafer frontside diaphragm.Due to edge part about the 3mm remaining periphery of Tiako wafer, there is step at the back side, so when adopting existing vacuum cup, the situation of leaking vacuum easily occurs, thus causes product to break, thus cause the raising of production cost.
Utility model content
In order to solve above-mentioned mismatch problem, the utility model provides a kind of vacuum cup taking off film for Taiko wafer, can well mate the marginal texture of Tiako wafer, thus avoids the generation of the Lou situation such as vacuum.
Above-mentioned a kind of vacuum cup taking off film for Taiko wafer, comprise suction cup main body and be positioned at the sucker pipeline external tapping outside suction cup main body, the upper surface of described suction cup main body is provided with several micropores, the inside of described suction cup main body is provided with sucker pipeline, and described sucker pipeline, micropore and sucker pipeline external tapping are communicated with mutually; The bottom of described suction cup main body is provided with fixing sucking disk pedestal;
Wherein, the edge of described suction cup main body is provided with ledge structure, and described sucker pipeline external tapping is provided with several fixing sucking disk screws.
In the said equipment, the width of described ledge structure is 3mm.
In the said equipment, the height of described ledge structure is 4 ~ 5mm.
In the said equipment, the quantity of described fixing sucking disk screw is 8.
Advantage of the present utility model and beneficial effect are: the utility model provides a kind of vacuum cup taking off film for Taiko wafer, ledge structure is provided with by the edge in suction cup main body, and utilize the 3mm trough of this ledge structure and Taiko crystal round fringes to match, thus the leakage vacuum problem that occurs when can effectively avoid using Tiako wafer, and then reduce the risk of breaking when wafer takes off film, and finally reach the object improving product yield.
Accompanying drawing explanation
In order to be illustrated more clearly in the utility model embodiment or technical scheme of the prior art, be briefly described to the accompanying drawing used required in embodiment or description of the prior art below, apparently, accompanying drawing in the following describes is only embodiments more of the present utility model, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 is the end view of vacuum cup in the utility model;
Fig. 2 is the vertical view of vacuum cup in the utility model.
Embodiment
Below in conjunction with drawings and Examples, embodiment of the present utility model is further described.Following examples only for clearly the technical solution of the utility model being described, and can not limit protection range of the present utility model with this.
As depicted in figs. 1 and 2, the utility model describes a kind of vacuum cup taking off film for Taiko wafer, the sucker pipeline external tapping 5 comprising suction cup main body 1 and be positioned at outside it.
Wherein, the upper surface of suction cup main body 1 is provided with several micropores (not marking in the drawings), the inside of suction cup main body 1 is provided with sucker pipeline (not marking in the drawings) simultaneously, this sucker pipeline, micropore and sucker pipeline external tapping 5 are communicated with mutually, thus can the grinding part of Taiko wafer and edge step part mutually be held simultaneously.
In addition, be also provided with fixing sucking disk pedestal 4 in the bottom of suction cup main body 1, this fixing sucking disk pedestal 4 primary responsibility fixing sucking disk main body 1, thus ensure that the stable of technique carries out.
Unlike the prior art, the risk of breaking when Taiko wafer takes off film, the edge of the suction cup main body 1 in the utility model is provided with ledge structure 2, the width of this ledge structure 2 have employed the 3mm consistent with the trough, edge of Taiko wafer, be highly then 4 ~ 5mm, thus reach the object improving product yield.
Further, above-mentioned sucker pipeline external tapping 5 is provided with several fixing sucking disk screws 3; Meanwhile, in order to reach better fixed effect, in the utility model, the quantity of fixing sucking disk screw 3 is 8, and these 8 fixing sucking disk screws 3 are uniformly distributed in the surface of sucker pipeline external tapping 5, thus further increase firm performance.
The foregoing is only preferred embodiment of the present utility model; not in order to limit the utility model; all within spirit of the present utility model and principle, any amendment done, equivalent replacement, improvement etc., all should be included within protection range of the present utility model.

Claims (4)

1. take off the vacuum cup of film for Taiko wafer for one kind, comprise suction cup main body and be positioned at the sucker pipeline external tapping outside suction cup main body, the upper surface of described suction cup main body is provided with several micropores, the inside of described suction cup main body is provided with sucker pipeline, and described sucker pipeline, micropore and sucker pipeline external tapping are communicated with mutually; The bottom of described suction cup main body is provided with fixing sucking disk pedestal; It is characterized in that, the edge of described suction cup main body is provided with ledge structure, and described sucker pipeline external tapping is provided with several fixing sucking disk screws.
2. a kind of vacuum cup taking off film for Taiko wafer as claimed in claim 1, it is characterized in that, the width of described ledge structure is 3mm.
3. a kind of vacuum cup taking off film for Taiko wafer as claimed in claim 2, it is characterized in that, the height of described ledge structure is 4 ~ 5mm.
4. a kind of vacuum cup taking off film for Taiko wafer as claimed in claim 1, it is characterized in that, the quantity of described fixing sucking disk screw is 8.
CN201520239467.1U 2015-04-20 2015-04-20 A kind of vacuum cup taking off film for Taiko wafer Active CN204558439U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201520239467.1U CN204558439U (en) 2015-04-20 2015-04-20 A kind of vacuum cup taking off film for Taiko wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201520239467.1U CN204558439U (en) 2015-04-20 2015-04-20 A kind of vacuum cup taking off film for Taiko wafer

Publications (1)

Publication Number Publication Date
CN204558439U true CN204558439U (en) 2015-08-12

Family

ID=53833521

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201520239467.1U Active CN204558439U (en) 2015-04-20 2015-04-20 A kind of vacuum cup taking off film for Taiko wafer

Country Status (1)

Country Link
CN (1) CN204558439U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109887876A (en) * 2017-12-06 2019-06-14 上海微电子装备(集团)股份有限公司 Vacuum chuck, substrate adsorption method, laser anneal device and method
CN111312649A (en) * 2020-02-25 2020-06-19 中芯集成电路制造(绍兴)有限公司 Vacuum carrying platform, semiconductor machine table and film sticking device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109887876A (en) * 2017-12-06 2019-06-14 上海微电子装备(集团)股份有限公司 Vacuum chuck, substrate adsorption method, laser anneal device and method
CN109887876B (en) * 2017-12-06 2020-02-21 上海微电子装备(集团)股份有限公司 Vacuum chuck, substrate adsorption method, laser annealing device and method
CN111312649A (en) * 2020-02-25 2020-06-19 中芯集成电路制造(绍兴)有限公司 Vacuum carrying platform, semiconductor machine table and film sticking device

Similar Documents

Publication Publication Date Title
CN204558439U (en) A kind of vacuum cup taking off film for Taiko wafer
CN204417589U (en) PECVD plated film lap guard plating step frame
JP2017523010A (en) New object suspension system
CN110416149A (en) A kind of thinned wafer bracing means
CN207250473U (en) A kind of absorption type wafer carrier
CN103682802B (en) The many bayonet mounts of antidetonation
CN203732530U (en) Soil alkaline hydrolysis nitrogen diffusion dish
CN204962222U (en) Hanging device and electronic equipment
CN203826359U (en) A flexible device peeling mechanism
CN204771218U (en) Automatic welding machine graduation platform
CN104455993A (en) Bracket for mobile phone and tablet computer
CN210337229U (en) Improve equipment of cell-phone lens printing benefit
CN204069156U (en) A kind of assembly structure of television stand
CN205115588U (en) Electricity thick liquid plasma shields tool
CN204617795U (en) The cup not easily outwelled
CN205061875U (en) CT bulb glass sealing -in fixing device
CN204289490U (en) A kind of graphite nail platform
CN104124408A (en) Sealed battery box
CN204136540U (en) A kind of anti-corner flies the pcb board special-purpose plaster film device of expecting
CN204230218U (en) A kind of horizontal LPCVD quartz boat
CN203595985U (en) Hard disk assembly die
CN203910775U (en) Novel vacuum chuck
CN213249913U (en) False tooth cleaning device
CN204375787U (en) Paster type light emitting type
CN208324460U (en) A kind of release film

Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant