CN204529949U - 掩模板 - Google Patents
掩模板 Download PDFInfo
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- CN204529949U CN204529949U CN201520172858.6U CN201520172858U CN204529949U CN 204529949 U CN204529949 U CN 204529949U CN 201520172858 U CN201520172858 U CN 201520172858U CN 204529949 U CN204529949 U CN 204529949U
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- support bar
- mask plate
- metal films
- pattern metal
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- 239000002184 metal Substances 0.000 claims abstract description 43
- 229910052751 metal Inorganic materials 0.000 claims abstract description 43
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 230000009471 action Effects 0.000 abstract description 4
- 230000005484 gravity Effects 0.000 abstract description 4
- 238000005516 engineering process Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 230000008859 change Effects 0.000 description 5
- 239000000758 substrate Substances 0.000 description 4
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 229910001111 Fine metal Inorganic materials 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000004020 luminiscence type Methods 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 230000000739 chaotic effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
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- Electron Beam Exposure (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201520172858.6U CN204529949U (zh) | 2015-03-25 | 2015-03-25 | 掩模板 |
Applications Claiming Priority (1)
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CN201520172858.6U CN204529949U (zh) | 2015-03-25 | 2015-03-25 | 掩模板 |
Publications (1)
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CN204529949U true CN204529949U (zh) | 2015-08-05 |
Family
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CN201520172858.6U Active CN204529949U (zh) | 2015-03-25 | 2015-03-25 | 掩模板 |
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CN (1) | CN204529949U (zh) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105839051A (zh) * | 2016-05-09 | 2016-08-10 | 京东方科技集团股份有限公司 | 掩模板及其制作方法、oled显示基板和显示装置 |
CN105839052A (zh) * | 2016-06-17 | 2016-08-10 | 京东方科技集团股份有限公司 | 掩膜板以及掩膜板的组装方法 |
CN106884140A (zh) * | 2017-04-28 | 2017-06-23 | 京东方科技集团股份有限公司 | 一种掩膜组件及其组装方法 |
CN107275522A (zh) * | 2017-05-25 | 2017-10-20 | 上海天马有机发光显示技术有限公司 | 一种掩膜板及阵列基板的制作方法 |
CN107435130A (zh) * | 2017-09-28 | 2017-12-05 | 上海天马微电子有限公司 | 掩膜装置、蒸镀设备及蒸镀方法 |
CN108004504A (zh) * | 2018-01-02 | 2018-05-08 | 京东方科技集团股份有限公司 | 一种掩膜板 |
CN108531862A (zh) * | 2017-03-03 | 2018-09-14 | 上海和辉光电有限公司 | 一种金属掩膜板及其制备方法 |
-
2015
- 2015-03-25 CN CN201520172858.6U patent/CN204529949U/zh active Active
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105839051A (zh) * | 2016-05-09 | 2016-08-10 | 京东方科技集团股份有限公司 | 掩模板及其制作方法、oled显示基板和显示装置 |
CN105839052A (zh) * | 2016-06-17 | 2016-08-10 | 京东方科技集团股份有限公司 | 掩膜板以及掩膜板的组装方法 |
WO2017215286A1 (zh) * | 2016-06-17 | 2017-12-21 | 京东方科技集团股份有限公司 | 掩膜板以及掩膜板的组装方法 |
US10982314B2 (en) | 2016-06-17 | 2021-04-20 | Boe Technology Group Co., Ltd. | Mask plate assembly capable of preventing wrinkle and assembly method thereof |
CN108531862B (zh) * | 2017-03-03 | 2020-12-08 | 上海和辉光电股份有限公司 | 一种金属掩膜板及其制备方法 |
CN108531862A (zh) * | 2017-03-03 | 2018-09-14 | 上海和辉光电有限公司 | 一种金属掩膜板及其制备方法 |
CN106884140A (zh) * | 2017-04-28 | 2017-06-23 | 京东方科技集团股份有限公司 | 一种掩膜组件及其组装方法 |
CN106884140B (zh) * | 2017-04-28 | 2019-04-30 | 京东方科技集团股份有限公司 | 一种掩膜组件及其组装方法 |
CN107275522A (zh) * | 2017-05-25 | 2017-10-20 | 上海天马有机发光显示技术有限公司 | 一种掩膜板及阵列基板的制作方法 |
CN107435130A (zh) * | 2017-09-28 | 2017-12-05 | 上海天马微电子有限公司 | 掩膜装置、蒸镀设备及蒸镀方法 |
CN108004504A (zh) * | 2018-01-02 | 2018-05-08 | 京东方科技集团股份有限公司 | 一种掩膜板 |
CN108004504B (zh) * | 2018-01-02 | 2019-06-14 | 京东方科技集团股份有限公司 | 一种掩膜板 |
US11203808B2 (en) | 2018-01-02 | 2021-12-21 | Boe Technology Group Co., Ltd. | Mask plate |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
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TR01 | Transfer of patent right |
Effective date of registration: 20211229 Address after: No.8, liufangyuanheng Road, Donghu New Technology Development Zone, Wuhan City, Hubei Province, 430074 Patentee after: WUHAN TIANMA MICROELECTRONICS Co.,Ltd. Patentee after: Wuhan Tianma Microelectronics Co.,Ltd. Shanghai Branch Patentee after: Tianma Micro-Electronics Co.,Ltd. Address before: Room 509, building 1, No. 6111, Longdong Avenue, Pudong New Area, Shanghai 201203 Patentee before: SHANGHAI TIANMA AM-OLED Co.,Ltd. Patentee before: Tianma Micro-Electronics Co.,Ltd. |