CN204325494U - A kind of LPCVD deposition boiler tube - Google Patents
A kind of LPCVD deposition boiler tube Download PDFInfo
- Publication number
- CN204325494U CN204325494U CN201420764903.2U CN201420764903U CN204325494U CN 204325494 U CN204325494 U CN 204325494U CN 201420764903 U CN201420764903 U CN 201420764903U CN 204325494 U CN204325494 U CN 204325494U
- Authority
- CN
- China
- Prior art keywords
- boiler tube
- inner casing
- lpcvd deposition
- deposition boiler
- tube according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
The utility model discloses a kind of LPCVD deposition boiler tube, comprises body and is located at the slide mount in body, and described body one end has inlet mouth, the other end has air outlet, also be provided with inner casing in described body, described slide mount is positioned at described inner casing, and described inner casing is evenly distributed with through hole.The utility model can make entering in slide glass boat of the gas uniform in LPCVD reaction chamber, makes deposited film thickness consistent.
Description
Technical field
The utility model belongs to LPCVD depositing device technical field, particularly a kind of LPCVD deposition boiler tube.
Background technology
In recent years, along with the fast development of semiconductor industry and microelectronics, the reduction of semiconductor technology characteristic dimension, the uniformity requirement of film and the error requirements of thickness are improved constantly, LPCVD technology is not only for the preparation of silicon epitaxy layer, also being widely used in the deposition of various amorphous passive film and polycrystal film, is a kind of important film deposition technique.From LPCVD deposition principle, participate in the gas of reaction, due to the effect of pressure difference, flow to the other end from boiler tube one end, some will be attracted in wafer surface, and by the effect of temperature, deposition reaction will occur.Traditional LPCVD slide glass boat is only made up of the pole of two troughs of belt, and therefore, wafer is all outside exposed, and the direction that deposited film thickness is discharged from the direction that reactant gases enters to reactant gases to thin distribution, is difficult to the consistence ensureing deposited film thickness by thick.
Utility model content
Technical problem to be solved in the utility model is to provide a kind of LPCVD deposition boiler tube, can make entering in slide glass boat of the gas uniform in LPCVD reaction chamber, makes deposited film thickness consistent, to overcome the deficiency that prior art exists.
For solving the problems of the technologies described above, the utility model adopts following technical scheme:
A kind of LPCVD deposition boiler tube, comprise body and be located at the slide mount in body, described body one end has inlet mouth, the other end has air outlet, it is characterized in that: be also provided with inner casing in described body, described slide mount is positioned at described inner casing, and described inner casing is evenly distributed with through hole.
In the utility model embodiment, described inner casing is cylindrical inner case, and the body of described cylindrical inner case and the end cap at two ends are all evenly distributed with through hole.
Described through hole is circular hole, the preferred 5mm in aperture.
The bottom of described body also has feet.Described feet is a pair long strip type feet.
Described slide mount is made up of a pair cylinder, described a pair cylinder is distributed with symmetrical groove.
Described recess width is 1mm, and described flute pitch is 5mm.
The material of described inner casing is quartz or silicon carbide.
In order to ensure the splicing of the end cap of body and two ends, the internal diameter of end cap is identical with the external diameter of body.Easily the end cap at two ends and body can be combined like this, and the end cap at two ends is general, facilitates operation.
LPCVD deposition boiler tube of the present utility model is used in LPCVD depositing operation, the circular hole that in body, deposition gases can distribute from the end cap at inner casing two ends and body enters slide glass boat equably, and wafer on slide mount can be made to deposit, and diaphragm is middle with between sheet, in a slice and deposit thickness is around consistent.Slide glass boat of the present utility model is very easy to use in semiconductor bulk wafer deposition is produced, and ensure that the consistence of deposited film.
Accompanying drawing explanation
Below in conjunction with the drawings and specific embodiments, the utility model is described in detail:
Fig. 1 is structural representation of the present utility model;
Fig. 2 is the perspective view of slide glass boat;
In figure: 100-inner casing, 101-body, 102-end cap, 103-circular hole, 200-slide mount, 201-cylinder, 202-groove, 300-feet.
Embodiment
As shown in Figure 1, LPCVD deposition boiler tube of the present utility model, the slide glass boat 20 comprising body 10 and be located in body 10.Wherein, body 10 one end has inlet mouth 11, and the other end has air outlet 12.Electrical heating wire 30 is also provided with for heating body 10 in the outside of body 10.
As shown in Figure 2, slide glass boat 20 comprises inner casing 100 and slide mount 200.Wherein, inner casing 100 is cylindrical inner case, and material is quartz or silicon carbide, is assembled by the end cap 102 at body 101 and two ends.The end cap 102 at body 101 and two ends is all evenly distributed with circular hole 103, and the aperture of circular hole 103 is 5mm.
In order to ensure the splicing of the end cap 102 of body 101 and two ends, the internal diameter of end cap 102 is identical with the external diameter of body 101.Easily the end cap 102 at two ends can be combined with body 101 like this, and the end cap at two ends is general, facilitates operation.
Slide mount 200 is placed in inner casing 100, when opening end cap, can remove slide mount 200 from inner casing 200.
Slide mount 200 is made up of a pair cylinder 201, this pair cylinder 201 is distributed with symmetrical groove 202.Recess width is 1mm, and flute pitch is 5mm.
In addition, in the bottom of body 101, also there is feet 300.This feet 300 is a pair long strip type feet.
It is exactly more than LPCVD deposition boiler tube of the present utility model, this LPCVD deposition boiler tube is used in LPCVD depositing operation, the circular hole that in body, deposition gases can distribute from the end cap at inner casing two ends and body enters slide glass boat equably, and wafer on slide mount can be made to deposit, and diaphragm is middle with between sheet, in a slice and deposit thickness is around consistent.Slide glass boat of the present utility model is very easy to use in semiconductor bulk wafer deposition is produced, and ensure that the consistence of deposited film.
The above; it is only preferred embodiment of the present utility model; not any pro forma restriction is done to the utility model; have in any art and usually know the knowledgeable; if in the protection domain not departing from the claim that the utility model proposes; the Equivalent embodiments that local done by the technology contents utilizing the utility model to disclose is changed or modified, and do not depart from technical characteristic content of the present utility model, all still belong in the scope of the utility model technical characteristic.
Claims (9)
1. a LPCVD deposition boiler tube, comprises body and is located at the slide mount in body, and described body one end has inlet mouth, the other end has air outlet, it is characterized in that: be also provided with inner casing in described body, described slide mount is positioned at described inner casing, and described inner casing is evenly distributed with through hole.
2. LPCVD deposition boiler tube according to claim 1, is characterized in that: described inner casing is cylindrical inner case, and the body of described cylindrical inner case and the end cap at two ends are all evenly distributed with through hole.
3. LPCVD deposition boiler tube according to claim 1, is characterized in that: described through hole is circular hole, and aperture is 5mm.
4. LPCVD deposition boiler tube according to claim 2, is characterized in that: the bottom of described body also has feet.
5. LPCVD deposition boiler tube according to claim 4, is characterized in that: described feet is a pair long strip type feet.
6. LPCVD deposition boiler tube according to claim 1, is characterized in that: described slide mount is made up of a pair cylinder, described a pair cylinder is distributed with symmetrical groove.
7. LPCVD deposition boiler tube according to claim 6, is characterized in that: described recess width is 1mm, and described flute pitch is 5mm.
8. LPCVD deposition boiler tube according to claim 2, is characterized in that: the internal diameter of described end cap is identical with the external diameter of described body.
9. LPCVD deposition boiler tube according to claim 1, is characterized in that: the material of described inner casing is quartz or silicon carbide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420764903.2U CN204325494U (en) | 2014-12-05 | 2014-12-05 | A kind of LPCVD deposition boiler tube |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420764903.2U CN204325494U (en) | 2014-12-05 | 2014-12-05 | A kind of LPCVD deposition boiler tube |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204325494U true CN204325494U (en) | 2015-05-13 |
Family
ID=53161871
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420764903.2U Active CN204325494U (en) | 2014-12-05 | 2014-12-05 | A kind of LPCVD deposition boiler tube |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204325494U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106367732A (en) * | 2016-09-22 | 2017-02-01 | 四川大学 | Device for medium-temperature organometallic chemical vapor deposition of TiO2-Al2O3 composite coating and coating method |
| CN111424262A (en) * | 2020-03-27 | 2020-07-17 | 中央民族大学 | Device and method for preparing parylene film |
| CN115074702A (en) * | 2022-06-02 | 2022-09-20 | 上海微世半导体有限公司 | Method for introducing chemical gas into LPCVD furnace |
-
2014
- 2014-12-05 CN CN201420764903.2U patent/CN204325494U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106367732A (en) * | 2016-09-22 | 2017-02-01 | 四川大学 | Device for medium-temperature organometallic chemical vapor deposition of TiO2-Al2O3 composite coating and coating method |
| CN106367732B (en) * | 2016-09-22 | 2018-11-06 | 四川大学 | A kind of medium temperature metal organic chemical vapor deposition TiO2-Al2O3Composite coating device and painting method |
| CN111424262A (en) * | 2020-03-27 | 2020-07-17 | 中央民族大学 | Device and method for preparing parylene film |
| CN115074702A (en) * | 2022-06-02 | 2022-09-20 | 上海微世半导体有限公司 | Method for introducing chemical gas into LPCVD furnace |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN204325494U (en) | A kind of LPCVD deposition boiler tube | |
| CN204325493U (en) | A kind of LPCVD deposition apparatus | |
| JP2011530806A5 (en) | ||
| JP2010529682A5 (en) | ||
| CN204080101U (en) | To bleed ring and depositing device | |
| CN204325496U (en) | A kind of slide glass boat improving LPCVD deposited film conformality | |
| CN203307432U (en) | Special gas pipeline device and PECVD (plasma enhanced chemical vapor deposition) equipment | |
| CN113088928A (en) | Inner cylinder wall blowing device | |
| CN207452250U (en) | A kind of aerodynamics reaction unit | |
| CN204320588U (en) | A kind of slot coated head for the ultra-thin coating of low viscosity fluid | |
| CN109518166B (en) | Gas uniform flow system suitable for ultra-large scale atomic layer deposition | |
| CN202322999U (en) | Mixed air distribution pipe | |
| US10571343B2 (en) | Rapid response sensor housing | |
| CN103904158A (en) | Method for improving uniformity of film coating of pipe type PECVD system | |
| CN203187742U (en) | Gas release device for film coating process | |
| CN202766615U (en) | Double-channel homogenizing low-pressure chemical vapor deposition system | |
| CN104975293A (en) | Silicon substrate and preparation method thereof | |
| CN202337730U (en) | Reactor for glass coating | |
| CN211170882U (en) | Inner cylinder wall blowing device | |
| CN103396005B (en) | A kind of gas uniform divider for sheet glass plated film | |
| CN103397308A (en) | Spray head used for MOCVD equipment | |
| CN104419909A (en) | Film-coated furnace tube | |
| CN203639548U (en) | Flat-plate type PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment and gas path device thereof | |
| CN203187778U (en) | Air inlet plug-in component for low-pressure peripheral equipment | |
| CN203707092U (en) | Quartz plug-in member applied to quartz air inlet opening of low pressure epitaxial chamber |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |