CN204214788U - For detecting the substrate imperfection pick-up unit of base material - Google Patents
For detecting the substrate imperfection pick-up unit of base material Download PDFInfo
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- CN204214788U CN204214788U CN201420653472.2U CN201420653472U CN204214788U CN 204214788 U CN204214788 U CN 204214788U CN 201420653472 U CN201420653472 U CN 201420653472U CN 204214788 U CN204214788 U CN 204214788U
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Abstract
The utility model relates to the substrate surface image that obtains by linear image acquisition unit to judge the substrate imperfection pick-up unit for detecting base material of the whether defective existence of substrate surface, and it comprises a light source module, a detection module and a control module.Light source module is radiated at the detection light source on the base material being positioned at a surveyed area for generation of one, and light source module has one first light-emitting area and one second light-emitting area, has a dark space scope between the first light-emitting area and the second light-emitting area.Detection module and light source module correspond to each other and arrange, and detection module comprises one for capturing the linear image acquisition unit of the image information of the base material being positioned at surveyed area, and linear image acquisition unit has the intercepting scope that is equal to or greater than dark space scope.Control module is electrically connected at detection module, with receive detection module the image information that captures, image information by the computing of control module, to obtain the flaw information that one is positioned at the defect areas on base material.
Description
Technical field
The utility model relates to a kind of defect detecting device, particularly relates to a kind of by judging whether existing defects reaches the substrate imperfection pick-up unit improving base material detection speed and accuracy to substrate surface.
Background technology
Product now mostly reduces production cost to produce in a large number, and the while of mass-produced, how pick-up unit can be detected as effectively as one of important problem, and before production, the material made needed for product mostly needs first after testing, eliminate tool defective material whereby, and then improve the acceptance rate of product and reduce production cost.
Many products produce with substrate or base material manufacture, therefore, the acceptance rate that substrate or base material detect for producing has very important impact, wherein, the detection of substrate or base material often needs to confirm the positive and negative two surfaces whether defectiveness of substrate or base material, such as: depression, protruding, damaged, scratch, foreign matter absorption or the unequal problem of matrix density.
Therefore, in order to provide substrate or the base material of better quality, usually can by manually carrying out visual detection; by substrate or base material are arranged in a conveying device; and observe with human eye, detect these substrates or whether base material has flaw, and record these defect areas.But, carry out the mode detected above by human eye, easily because eyes produce tired or erroneous judgement under observation for a long time, start to produce substrate or substrate imperfection distinguishes the situation that rate declines, and also can be inconsistent for the defect dipoles standard of single product.In addition, also owing to being detected by human eye, therefore substrate or base material speed on a conveyor can not be too fast.Furthermore, if the thickness of substrate or base material is thinner, more hour, the discrimination power of human eye may identification for defect.
Therefore, how to provide one can will improve substrate or substrate surface defect identification rate, simultaneously to overcome above-mentioned defect, become one of this field important topic urgently to be resolved hurrily.
Utility model content
In view of above problem, the utility model provides a kind of and is projected in the intercepting scope of linear image acquisition unit by the defect areas on base material by detection light source deviation, judge the whether defective existence of substrate surface, to reach the substrate imperfection pick-up unit improving base material detection speed and accuracy.
To achieve the above object, one of them embodiment of the present utility model is to provide a kind of substrate imperfection pick-up unit for detecting base material, and it comprises a light source module, a detection module and a control module.Described light source module is radiated at for generation of one the detection light source be positioned on the described base material of a surveyed area, described light source module has one first light-emitting area and one second light-emitting area, and has a dark space scope between described first light-emitting area and described second light-emitting area.Described detection module and described light source module correspond to each other and arrange, described detection module comprises one for capturing the linear image acquisition unit of the image information of the described base material being positioned at described surveyed area, and wherein said linear image acquisition unit has the intercepting scope that is equal to or greater than described dark space scope.Described control module is electrically connected at described detection module, with receive described detection module the described image information that captures, wherein said image information by the computing of described control module, to obtain the flaw information that one is positioned at the defect areas on described base material.Wherein, described first light-emitting area and described both second light-emitting areas one of them by described defect areas, be incident upon in the described intercepting scope of described linear image acquisition unit with deviation.
Further, described light source module comprises one first luminescence unit, one second luminescence unit and a positioning seat, described positioning seat is arranged at the side of described first luminescence unit and described both second luminescence units, wherein said first luminescence unit and described second luminescence unit have described first light-emitting area and described second light-emitting area respectively, a preset distance is spaced, by rotating described positioning seat to define described dark space scope between described first luminescence unit and described second luminescence unit.
Further, described light source module is provided with a lightproof unit, to produce described dark space scope.
Further, by adjusting the distance between described linear image acquisition unit to described base material, to adjust the size of the described intercepting scope of described linear image acquisition unit.
Further, by adjusting the distance between described light source module to described base material, the size of described dark space scope is projected in the described intercepting scope adjusting described linear image acquisition unit.
Further, described light source is linear light sorurce.
Further, described light source module is arranged at a first side of described base material, and described detection module is arranged at a second side of described base material.
Further, the described intercepting scope of described linear image acquisition unit is directly projected in the described dark space scope of described light source module through described base material.
Further, described light source module and described detection module are all arranged at a first side of described base material, described light source module by the described defect areas on described base material, to reflect described detection light source in described linear image acquisition unit.
Further, the described intercepting scope of described linear image acquisition unit be projected in the described dark space scope of described light source module be projected in the scope of described substrate surface.
The beneficial effects of the utility model can be, the substrate imperfection pick-up unit for detecting base material that embodiment of the present utility model provides, the substrate surface image that can be obtained by linear image acquisition unit, judges the whether defective existence of substrate surface.In other words, by the defect areas on base material, detection light source deviation is projected in the intercepting scope of linear image acquisition unit, judges the whether defective existence of base material.
In order to characteristic sum technology contents of the present utility model further can be understood, please refer to following about detailed description of the present utility model and accompanying drawing, but accompanying drawing is only for providing reference and explanation, is not used for being limited the utility model.
Accompanying drawing explanation
Figure 1A is one of them front-view schematic diagram of the first embodiment of the present utility model.
Figure 1B is the enlarged diagram of the base material of the first embodiment of the present utility model.
Fig. 1 C is the schematic diagram in one of them optical axis path of the first embodiment of the present utility model.
Fig. 1 D is the schematic diagram in the another one optical axis path of the first embodiment of the present utility model.
Fig. 2 is the another one front-view schematic diagram of the first embodiment of the present utility model.
Fig. 3 A is the schematic perspective view of the light source module of the first embodiment of the present utility model.
Fig. 3 B is the schematic diagram of wherein a kind of using state of the light source module of the first embodiment of the present utility model.
Fig. 3 C is the schematic diagram of another using state of the light source module of the first embodiment of the present utility model.
Fig. 4 A is the front-view schematic diagram of the second embodiment of the present utility model.
Fig. 4 B is the schematic diagram in one of them optical axis path of the second embodiment of the present utility model.
Fig. 4 C is the schematic diagram in the another one optical axis path of the second embodiment of the present utility model.
Embodiment
Below by way of the embodiment that " for detecting the substrate imperfection pick-up unit of base material " disclosed in the utility model is described by specific instantiation, those skilled in the art can understand other advantages of the present utility model and effect easily by the content disclosed in this instructions.The utility model is also implemented by other different embodiments or is applied, and the every details in this instructions also based on different viewpoints and application, not deviating under spirit of the present utility model, can carry out various amendment and change.In addition, accompanying drawing of the present utility model is only simplicity of illustration, not draws according to physical size, and also namely unreacted goes out the physical size of dependency structure, is first described.Following embodiment further describes correlation technique content of the present utility model, but and is not used to limit technical scope of the present utility model.
[the first embodiment]
First, please refer to shown in Figure 1A and Figure 1B, Figure 1A is one of them front-view schematic diagram of the first embodiment of the present utility model, and Figure 1B is the enlarged diagram of the first embodiment base material of the present utility model.Because base material S can produce breakage unavoidably or make impurity absorption inside base material S in manufacture or transport process, first embodiment of the present utility model provides a kind of substrate imperfection pick-up unit Q for detecting base material S, and it comprises light source module 1, detection module 2 and a control module 3.Whereby, base material S, by the detection of detection module 2, judges whether base material S surface or inside have defect areas F.For example, with the first embodiment of the present utility model, base material S to be detected can be the film with light transmission, such as, have the film of transmittance more than 85%, and right the utility model is not as restriction.
Specifically, base material S carries and supporting substrate S by a conveyor module 4 be arranged on substrate imperfection pick-up unit Q, and conveyor module 4 can comprise multiple roller 41, and base material S is delivered on a predetermined detection region Z by the drive by roller 41.For example, one of them in multiple roller 41, as driving wheel, by the setting of driving wheel, can drive the base material S to be detected be positioned on conveyor module 4 by the driving of a motor (not shown).Whereby base material S to be detected is transported to the surveyed area Z that is used for detecting base material S.
Light source module 1 can be used for generation one and is radiated at the detection light source P be positioned on the base material S of surveyed area Z, and light source module 1 has one first light-emitting area 11 and one second light-emitting area 12, and has a dark space scope N between the first light-emitting area 11 and the second light-emitting area 12.For example, with embodiment of the present utility model, wherein a kind of embodiment of the dark space scope N between the first light-emitting area 11 and the second light-emitting area 12, by being provided with a lightproof unit 13 on light source module 1, block the continuity light source that original light source module 1 produces, and form aforementioned dark space scope N.Whereby, adjust the size of dark space scope N at the size on light source module 1 surface by adjustment lightproof unit 13.Furthermore, light source module 1 can comprise at least one light emitting diode, the detection light source P irradiating high brightness on surveyed area Z and high evenness to provide one, preferably, the detection light source P that light source module 1 produces can be a linear light sorurce, make detection light source P have directive property ground to penetrate vertically upward, right the utility model is not as restriction.For example, the light source module 1 also other light sources structure that forms of optional free halogen lamp or fluorescent tube.In addition, also by adjusting the light source position, arrangement mode etc. of light source module 1, and then better light source dispersion effect is obtained.
Then, detection module 2 can be arranged with light source module 1 with corresponding to each other, and with the first embodiment of the present utility model, light source module 1 can be arranged at outside a first side S1 of base material S, and detection module 2 can be arranged at outside a second side S2 of base material S.Detection module 2 can comprise one for capturing the linear image acquisition unit 21 of the image information of the base material S being positioned at surveyed area Z, wherein, linear image acquisition unit 21 has the intercepting scope T that is equal to or greater than dark space scope N, wherein, the intercepting scope T of linear image acquisition unit 21 directly can be projected on the dark space scope N of light source module 1 through base material S.For example, linear image acquisition unit 21 can comprise complementary metal oxide semiconductor (CMOS) (Complementary Metal-Oxide-Semiconductor, CMOS) chip or a charge-coupled image sensor (Charge-coupled Device, CCD) chip.Whereby, the linear image acquisition unit 21 of one dimension can form scan line on base material S.Specifically, sweep trace changes the width of sweep trace by the distance changed between the focal length of linear image acquisition unit 21, linear image acquisition unit 21 to base material S.
Then, control module 3 can be electrically connected on detection module 2, with receive detection module 2 the image information that arrives of acquisition, with embodiment of the present utility model, control module 3 can be a computing machine, wherein, image information, by the computing of control module 3, is positioned at a flaw information of the defect areas F on base material S.Whereby, one of them of both the first light-emitting area 11 and the second light-emitting area 12, by defect areas F, is carried out deviation and is incident upon in the described intercepting scope T of linear image acquisition unit 21.It is worth mentioning that, if when base material S to be detected has a predetermined length, the meter code unit (not shown) of control module 3 is electrically connected on to record the length information of base material S to be detected by one, and this length information is sent in control module 3, whereby, control module 3 can judge the flaw information of every a collection of base material S to be detected according to this length information and image information, what defect what section, what position that can record base material S have simultaneously, and these flaw information are recorded in control module 3, so that follow-up use.
In other words, please also refer to shown in Fig. 1 C-Fig. 1 D, Fig. 1 C is the schematic diagram in one of them optical axis path of the first embodiment of the present utility model, and Fig. 1 D is the schematic diagram in the another one optical axis path of the first embodiment of the present utility model.As shown in Figure 1 C, when the detection light source P that light source module 1 sends penetrate one not there is the base material S of defect areas F time, primary optic axis C1, the second optical axis C2 and the 3rd optical axis C3 can be divided into, whereby, when the base material S penetrated does not have defect, primary optic axis C1 to enter in the middle of base material S and form one second optical axis C2 in base material S, after penetrating base material S, the second optical axis C2 can form the 3rd optical axis C3 and penetrate base material S, wherein, due to base material S not having defect areas F, therefore the incident angle of primary optic axis C1 and the angle of the 3rd optical axis C3 can be identical.Whereby, utilize dark field detection (Dark Field Inspection) principle, when not there is defect areas F on base material S to be detected, be positioned at the light source that the light source module 1 below base material S produces, can, because the intercepting scope T of linear image acquisition unit 21 is equal to or slightly greater than dark space scope N, light source can not be entered in linear image acquisition unit 21 in direct projection.Accordingly, for linear image acquisition unit 21, the image information that captures be entirely black or only there is a faint light.With embodiment of the present utility model, by control module 3 by this full image information that is black or faint light be converted into a grey decision-making (0 to 255), using as judge reference value.Preferably, it is good for can sensing faint light with linear image acquisition unit 21, and the reference value of its grey decision-making is predeterminable is 128.
Then, as shown in figure ip, when the detection light source P that light source module 1 sends penetrate one there is the base material S of defect areas F time, primary optic axis C1 ' can be divided into, second optical axis C2 ' and the 3rd optical axis C3 ', whereby, when the base material S penetrated has defect, primary optic axis C1 ' to enter in the middle of base material S and form one second optical axis C2 ' in base material S, after penetrating base material S, the second optical axis C2 ' can form the 3rd optical axis C3 ', and the 3rd optical axis C3 ' can produce deviation due to the defect areas F on base material S, the light source that 3rd optical axis C3 ' of deviation is sent can enter in linear image acquisition unit 21.In other words, when the detection light source P that light source module 1 produces is irradiated to the defect areas F on base material S, owing to defect areas F having irregular surface, therefore deviation will be produced through the detection light source P on defect areas F, the optical axis path of detection light source P will be forced to produce change, cause part to be rolled over by the detection light source P of the first light-emitting area 11 and the second light-emitting area 12 right avertence of turning left and entered in linear image acquisition unit 21, therefore linear image acquisition unit 21 bright spot on the image information that captures may be exactly defect areas F.Whereby, if when brightness transition being become grey decision-making, when entering to the light in linear image acquisition unit 21 and being more, the numerical value of grey decision-making will be higher, and when defect areas F is when being adsorbed with an impurity in base material S, this impurity can block the detection light source P of the first light-emitting area 11 and the second light-emitting area 12, and detected grey decision-making will be reduced to certain numerical value.Therefore, the height of grey decision-making can be utilized to judge the defect areas F on base material S, with the defect on identification base material S.Meanwhile, the defect level of base material S is also judged by the height of grey decision-making.
Furthermore, please refer to shown in Figure 1A and Fig. 2, Fig. 2 is the another one front-view schematic diagram of the first embodiment of the present utility model.Because have different quality requirementss for base material S in various situation, the criterion for flaw is also not quite similar.For example, the dark space scope N size that intercepting scope T by adjustment linear image acquisition unit 21 is projected in light source module 1 distinguishes sensitivity to what adjust defect areas F, judge the defect level of base material S whereby, for example, by the distance (D1 between adjustment linear image acquisition unit 21 to base material S, D2), the intercepting scope T adjusting linear image acquisition unit 21 is projected in the dark space scope N size of light source module 1, in other words, the position of the linear image acquisition unit 21 of adjustable, the intercepting scope T increasing linear image acquisition unit 21 is projected in the size of the dark space scope N on light source module 1.In addition, also by the distance (D3, D4) between adjustment light source module 1 to base material, the intercepting scope T adjusting linear image acquisition unit 21 is projected in the size of the dark space scope N on light source module 1.In other words, linear image acquisition unit 21 and light source module 1 can be separately positioned on a pedestal (not shown), adjust linear image acquisition unit 21 and light source module 1 relative position each other.In addition, also can directly by the aperture size of adjustment linear image acquisition unit 21, the intercepting scope T carrying out adjustment linear image acquisition unit 21 is projected in the size of the dark space scope N on light source module 1.
Then, please refer to shown in Fig. 3 A-Fig. 3 C, Fig. 3 A is the schematic perspective view of the light source module of the first embodiment of the present utility model, Fig. 3 B is the schematic diagram of wherein a kind of using state of the light source module of the first embodiment of the present utility model, and Fig. 3 C is the schematic diagram of another using state of the light source module of the first embodiment of the present utility model.In the embodiment of another light source module 1 ', light source module 1 ' can comprise one first luminescence unit 14, one second luminescence unit 15 and a positioning seat 16, positioning seat 16 can be arranged at the first luminescence unit 14 and the side both the second luminescence unit 15, positioning seat 16 has a pivotal axis 161, first luminescence unit 14 and the second luminescence unit 15 have the first light-emitting area 11 and the second light-emitting area 12 respectively, a preset distance is spaced between first luminescence unit 14 and the second luminescence unit 15, for example, first luminescence unit 14 and the second luminescence unit 15 can be light emitting diodes with directive property, detection light source P is penetrated vertically upward, but, the utility model is not as restriction.Whereby, by rotational positioning seat 16, positioning seat 16 is pivoted on pivotal axis 161, and the size of dark space scope N can be defined.Specifically, as shown in Fig. 3 B and Fig. 3 C, for linear image acquisition unit 21, the dark space scope N of light source module 1 can equal the drop shadow spread R1 that the first luminescence unit 14 and the second luminescence unit 15 are formed.When after rotational positioning seat 16, for linear image acquisition unit 21, the dark space scope N of light source module 1 ' can equal the drop shadow spread R2 that the first luminescence unit 14 and the second luminescence unit 15 are formed, by relatively can understanding of Fig. 3 B and Fig. 3 C, when after rotational positioning seat 16, drop shadow spread R2 can be less than drop shadow spread R1, adjust the size of the dark space scope N of light source module 1 whereby.
The substrate imperfection pick-up unit Q for detecting base material S that first embodiment of the present utility model provides, detection light source P deviation can be projected in the intercepting scope T of linear image acquisition unit 21 by the defect areas F on base material S, judge the whether defective existence of base material S.Simultaneously, by rotating the positioning seat 16 being arranged on the first luminescence unit 14 and the second luminescence unit 15 side, adjust the drop shadow spread (R1 that the first luminescence unit 14 and the second luminescence unit 15 are formed, R2), so the intercepting scope T of adjustment linear image acquisition unit 21 be projected in the size of the dark space scope N on light source module 1.
[the second embodiment]
First, please refer to shown in Fig. 4 A-Fig. 4 C, Fig. 4 A is the front-view schematic diagram of the second embodiment of the present utility model, Fig. 4 B is the schematic diagram in one of them optical axis path of the second embodiment of the present utility model, and Fig. 4 C is the schematic diagram in the another one optical axis path of the second embodiment of the present utility model.The difference of the second embodiment and the first embodiment is: by changing the position relationship between light source module 1 and detection module 2, the substrate imperfection pick-up unit Q ' for detecting base material S ' that second embodiment of the present utility model is provided, can be used to detect the base material S ' without light transmission, or the base material S ' that light transmission is lower.
With the second embodiment of the present utility model, for detecting the substrate imperfection pick-up unit Q ' of base material S ', comprise light source module 1, detection module 2 and a control module 3.As aforementioned, light source module 1 can be used for generation one and is radiated at the detection light source P be positioned on the base material S ' of surveyed area Z, light source module 1 has one first light-emitting area 11 and one second light-emitting area 12, and has a dark space scope N between the first light-emitting area 11 and the second light-emitting area 12.Detection module 2 can comprise one for capturing the linear image acquisition unit 21 of the image information of the base material S ' being positioned at surveyed area Z, and wherein, linear image acquisition unit 21 has the intercepting scope T that is equal to or greater than dark space scope N.Control module 3 can be electrically connected on detection module 2, with receive detection module 2 the image information that arrives of acquisition, image information, by the computing of control module 3, can obtain the flaw information that one is positioned at the defect areas F on base material S '.Whereby, one of them of both the first light-emitting area 11 and the second light-emitting area 12, by defect areas F, is carried out deviation and is incident upon in the intercepting scope T of linear image acquisition unit 21.Specifically, with the second embodiment of the present utility model, light source module 1 and detection module 2 are all arranged at a first side S1 ' of base material S ' outward, and detection light source P, by the defect areas F on base material S ', reflexes in linear image acquisition unit 21 by light source module 1.Wherein, the intercepting scope T of linear image acquisition unit 21 can directly be projected in the dark space scope N of light source module 1 be projected on base material S ' surface scope on.
Specifically, as shown in Figure 4 B, when the detection light source P that light source module 1 sends penetrate one not there is the base material S ' of defect areas F time, an an incident light axis E1 and reflection optical axis E2 can be divided into, whereby, when the base material S ' penetrated does not have defect, incident light axis E1 can reflect into via the reflection of base material S ' the reflection optical axis E2 that does not enter linear image acquisition unit 21.In other words, when base material S not having defect areas F, detection light source P can't directly reflex in linear image acquisition unit 21.Therefore, for linear image acquisition unit 21, the image information that captures be entirely black or only there is a faint light.With embodiment of the present utility model, by control module 3 by this full image information that is black or faint light be converted into a grey decision-making (0 to 255), be used as judge reference value.
Then, as shown in Figure 4 C, when the detection light source P that light source module 1 sends be radiated at one there is the base material S ' of defect areas F time, an an incident light axis E1 ' and reflection optical axis E2 ' can be divided into, whereby, when the base material S ' penetrated has defect, incident light axis E1 ' can by defect areas F institute deviation, and forming a reflection optical axis E2 ', the light source that the reflection optical axis E2 ' of deviation is sent can enter into linear image acquisition unit 21.In other words, when the detection light source P that light source module 1 produces is irradiated to the defect areas F on base material S ', owing to defect areas F having irregular surface, therefore deviation will be produced through the detection light source P on defect areas F, the optical axis path of detection light source P will be forced to produce change, cause part reflected by the detection light source P deviation of the first light-emitting area 11 and the second light-emitting area 12 and enter in linear image acquisition unit 21.Whereby, if when brightness transition being become grey decision-making, when entering the light in linear image acquisition unit 21 and being more, the numerical value of grey decision-making will be higher.Therefore, the height of grey decision-making can be utilized to judge the defect areas F on base material S ', with the defect on identification base material S '.Meanwhile, the defect level of base material S ' is also judged by the height of grey decision-making.Furthermore, the light source module 1 that the second embodiment provides, detection module 2 are identical with foregoing first embodiment with the structure of control module 3, do not repeat them here.
The substrate imperfection pick-up unit Q ' for detecting base material S ' that second embodiment of the present utility model provides, detection light source P deviation can be reflexed in the intercepting scope T of linear image acquisition unit 21 by the defect areas F on base material S ', judge the whether defective existence of base material S ' that light transmission is lower.
[possible effect of embodiment]
In sum, embodiment of the present utility model provide for detecting base material (S, S ') substrate imperfection pick-up unit (Q, Q '), base material (the S that can obtain by linear image acquisition unit 21, S ') surface image, judge the whether defective existence in surface of base material (S, S ').In other words, by the defect areas F on base material (S, S '), detection light source P deviation is projected in the intercepting scope T of linear image acquisition unit 21, judges base material (S, S ') whether defective existence.
The foregoing is only preferably feasible embodiment of the present utility model; not thereby the scope of the claims of the present utility model is limited; therefore every equivalence techniques change done according to instructions of the present utility model and accompanying drawing content, is all included in protection domain of the present utility model.
[symbol description]
Substrate imperfection pick-up unit Q, Q '
Base material S, S '
First side S1, S1 '
Second side S2, S2 '
Light source module 1,1 '
First light-emitting area 11
Second light-emitting area 12
Lightproof unit 13
First luminescence unit 14
Second luminescence unit 15
Positioning seat 16
Pivotal axis 161
Detection module 2
Linear image acquisition unit 21
Control module 3
Conveyor module 4
Roller 41
Detection light source P
Intercepting scope T
Dark space scope N
Drop shadow spread R1, R2
Surveyed area Z
Defect areas F
Primary optic axis C1, C1 '
Second optical axis C2, C2 '
3rd optical axis C3, C3 '
Incident light axis E1, E1 '
Reflection optical axis E2, E2 '
Distance D1, D2, D3, D4.
Claims (10)
1., for detecting a substrate imperfection pick-up unit for base material, it is characterized in that, it comprises:
One light source module, described light source module is radiated at for generation of one the detection light source be positioned on the described base material of a surveyed area, described light source module has one first light-emitting area and one second light-emitting area, and has a dark space scope between described first light-emitting area and described second light-emitting area;
One detection module, described detection module and described light source module correspond to each other and arrange, described detection module comprises one for capturing the linear image acquisition unit of the image information of the described base material being positioned at described surveyed area, and wherein said linear image acquisition unit has the intercepting scope that is equal to or greater than described dark space scope; And
One control module, described control module is electrically connected at described detection module, with receive described detection module the described image information that captures, wherein said image information by the computing of described control module, to obtain the flaw information that one is positioned at the defect areas on described base material;
Wherein, described first light-emitting area and described both second light-emitting areas one of them by described defect areas, be incident upon in the described intercepting scope of described linear image acquisition unit with deviation.
2. the substrate imperfection pick-up unit for detecting base material according to claim 1, it is characterized in that, described light source module comprises one first luminescence unit, one second luminescence unit and a positioning seat, described positioning seat is arranged at the side of described first luminescence unit and described both second luminescence units, wherein said first luminescence unit and described second luminescence unit have described first light-emitting area and described second light-emitting area respectively, a preset distance is spaced between described first luminescence unit and described second luminescence unit, by rotating described positioning seat to define described dark space scope.
3. the substrate imperfection pick-up unit for detecting base material according to claim 1, is characterized in that, described light source module is provided with a lightproof unit, to produce described dark space scope.
4. the substrate imperfection pick-up unit for detecting base material according to claim 1, it is characterized in that, by adjusting the distance between described linear image acquisition unit to described base material, to adjust the size of the described intercepting scope of described linear image acquisition unit.
5. the substrate imperfection pick-up unit for detecting base material according to claim 1, it is characterized in that, by adjusting the distance between described light source module to described base material, be projected in the size of described dark space scope with the described intercepting scope adjusting described linear image acquisition unit.
6. the substrate imperfection pick-up unit for detecting base material according to claim 1, is characterized in that, described light source is linear light sorurce.
7. the substrate imperfection pick-up unit for detecting base material according to claim 1, is characterized in that, described light source module is arranged at a first side of described base material, and described detection module is arranged at a second side of described base material.
8. the substrate imperfection pick-up unit for detecting base material according to claim 7, is characterized in that, the described intercepting scope of described linear image acquisition unit is directly projected in the described dark space scope of described light source module through described base material.
9. the substrate imperfection pick-up unit for detecting base material according to claim 1, it is characterized in that, described light source module and described detection module are all arranged at a first side of described base material, described light source module by the described defect areas on described base material, to reflect described detection light source in described linear image acquisition unit.
10. the substrate imperfection pick-up unit for detecting base material according to claim 9, it is characterized in that, the described intercepting scope of described linear image acquisition unit be projected in the described dark space scope of described light source module be projected in the scope of described substrate surface.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105548194A (en) * | 2015-12-03 | 2016-05-04 | 苏州威盛视信息科技有限公司 | Surface detection method and device |
| CN113820323A (en) * | 2020-06-19 | 2021-12-21 | 财团法人纺织产业综合研究所 | Fabric detection system and fabric detection method |
-
2014
- 2014-11-04 CN CN201420653472.2U patent/CN204214788U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105548194A (en) * | 2015-12-03 | 2016-05-04 | 苏州威盛视信息科技有限公司 | Surface detection method and device |
| CN113820323A (en) * | 2020-06-19 | 2021-12-21 | 财团法人纺织产业综合研究所 | Fabric detection system and fabric detection method |
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