CN204129434U - Photoresist feeding mechanism and system - Google Patents
Photoresist feeding mechanism and system Download PDFInfo
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- CN204129434U CN204129434U CN201420487628.4U CN201420487628U CN204129434U CN 204129434 U CN204129434 U CN 204129434U CN 201420487628 U CN201420487628 U CN 201420487628U CN 204129434 U CN204129434 U CN 204129434U
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Abstract
The utility model discloses a kind of photoresist feeding mechanism and system, by installing an air strainer additional at the gas exhaust piping of photoresist consumption detecting bucket, make when consuming detecting bucket and detecting that in photoresist memory storage, photoresist is finished and reports sky, open gas exhaust piping pressure release, outside air can not directly contact with the consumption photoresist detected in bucket, the dirts such as the dust in air, particle are avoided to enter photoresist, adverse effect is brought to subsequent technique, product, improve the security of technique, reliability, ensure that the quality of product.
Description
Technical field
The utility model relates to technical field of manufacturing semiconductors, particularly relates to a kind of new photoresist feeding mechanism and system.
Background technology
In semiconductor fabrication process, photoetching process to be considered in IC manufacturing crucial step always, needs to be used multiple times in whole technological process, and its stability and reliability have important impact to the quality of product, yield and cost.
Photoetching process is a complicated process, its essence to be carried out on the wafer of etching and ion implantation after circuit structure is copied in a graphical form: first utilize photoresist coating system on wafer, form one deck photosensitive material---photoresist thin layer, again directional light is radiated at through mask plate and photoresist thin layer makes it expose and goes bad, finally utilize developer solution to carry out development and complete Graphic transitions.Wherein, if deviation has appearred in the photoresist thickness of thin layer formed, directly can have influence on the carrying out of related process below, as photoresist thickness exceeds the estimates thickness, exposure may have been caused, develop insufficient, can not get normal litho pattern; And photoresist thickness is less than anticipated thickness, except the figure deformation caused except exposure imaging is abnormal, photoresist also may be caused the protection failure of wafer, and wafer is being scrapped after etching technics.So in the coating process of photoresist, realize the good control of photoresist thickness very crucial.
Generally for the quality ensureing photoetching process, all having a set of photoresist feeding mechanism for supplying photoresist.Photoresist feeding mechanism being generally included storage container for storing photoresist, for photoresist being extracted the pump to nozzle from bottom storage container, being all connected by transmission pipeline between pump and storage container and between pump and nozzle.Wherein the photoresist also comprised in pump pump extracts from storage container filters deimpurity filtrator.Be in the Chinese patent of 02158677.2, to find more information about photoresist feeding mechanism in the such as patent No..
Application number be 03153892.4 China apply for a patent disclose a kind of photoresist coating detecting system, this system utilizes multiple relay to match with solenoid valve, detection coating system each component switches state, realize the monitoring to photoresist coating process.But, just monitored the on off state of each assembly in the method, prevented from causing because of mechanical fault photoresist to be coated with unsuccessfully.But, find in practice, cause the coating weight of photoresist to depart from except the mechanical switch state of each assembly, also has other several reason: as air bubble problem, although can through removal of bubbles system in the coating process of photoresist, but because removal of bubbles number of times is few, make still bubble may be there is in the photoresist of final ejection, and when containing bubble in photoresist thin layer, jet-coating photoresit not only can be made uneven, decrease in yield, also can cause the actual coating weight of photoresist to tail off, the lower thickness of the photoresist thin layer of formation.Therefore, change photoresist filtrator or on new photoresist time, need to do the action that bubble removes, the bubble that filtrator, Electric-motor driven pumps and photoresist transport in pipeline will be stayed and discharge, avoid bubble to transport pipeline by photoresist and arrive crystal column surface, form defect.
Fig. 1 is the existing photoresist coating system schematic diagram with photoresist removal of bubbles system.As shown in Figure 1, photoresist coating system comprises: photoresist storage system 102, for storing photoresist; Photoresist removal of bubbles system 104, for getting rid of the bubble in photoresist; First photoresist transports pipeline 100, for being communicated with photoresist storage system 102 and removal of bubbles system 104, photoresist is outputted to removal of bubbles system 104 from photoresist storage system 102; Photoresist return suction system 106, in order to control the correct volume of distribution of photoresist, makes photoresist spray smooth-going, prevents bubble from entering in photoresist and preventing photoresist on wafer during spin coating, residual Other substrate materials instillation; 4th photoresist transports pipeline 118, for being communicated with photoresist removal of bubbles system 104 and photoresist return suction system 106, photoresist is outputted to photoresist return suction system 106 from photoresist removal of bubbles system 104; Photoresist ejection system 108, is coated on wafer by photoresist ejection; 5th photoresist transports pipeline 120, sprays system 108 for being communicated with photoresist return suction system 106 with photoresist, and photoresist is outputted to photoresist ejection system 108 from photoresist return suction system 106.
Wherein, also comprise in photoresist removal of bubbles system 104: consume detecting bucket (L/E tank, or claim liquid report empty buffer bucket) 110, transport pipeline 100 by the first photoresist the described consumption detecting photoresist input end of bucket 110 is connected with the photoresist output terminal of photoresist storage system 102, temporary a small amount of photoresist, stops bubble to enter rear end; Consume the full state sensor (L/E Upper Sensor) 105 of detecting bucket, being positioned at the first photoresist transports on pipeline 100, whether be finished by responding to the photoresist whether having photoresist to detect in photoresist storage system 102 in the first photoresist transport pipeline 100, as being finished, adding new photoresist in photoresist storage system 102, as not being finished, carrying out follow-up eliminating bubble or photoresist application step; 3rd gas exhaust piping 101, detects bucket 110 exhausr port with consumption and is connected, for getting rid of the bubble consumed in detecting bucket 110 in photoresist; 3rd vent valve 109, is installed on the 3rd gas exhaust piping 101, and make the consumption bubble detected in bucket 110 in photoresist from the 3rd gas exhaust piping 101, enter factory's business liquid waste treatment system during unlatching, bubble during closedown in photoresist does not discharge the 3rd gas exhaust piping 101; Bubble gathering barrel (Trap tank) 112, transports pipeline 103 by the second photoresist and is communicated with by the photoresist output terminal that bucket 110 is detected in the photoresist input end of bubble gathering barrel 112 and consumption; Photoelectric sensor 107, being installed on the second photoresist transports on pipeline 103, whether be finished for detecting the photoresist consumed in detecting bucket 110, as being finished, the photoresist in photoresist storage system 102 being transported to detect to consume and detecting in bucket 110, as not being finished, carrying out follow-up eliminating bubble or photoresist application step; Downtake pipe road 115, is connected with bubble gathering barrel 112 exhausr port, for getting rid of the bubble in bubble gathering barrel 112 in photoresist; First row air valve 111, is positioned on downtake pipe road 115, and make the bubble in bubble gathering barrel 112 in photoresist from downtake pipe road 115, enter factory's business liquid waste treatment system during unlatching, bubble during closedown in photoresist is not discharged from downtake pipe road 115; Electric-motor driven pumps (RDS Pump) 114, transport pipeline 117 by the 3rd photoresist the photoresist input end of Electric-motor driven pumps 114 is communicated with the photoresist output terminal of bubble gathering barrel 112, for the photoresist resorption in photoresist storage system 102 is ejected to photoresist return suction system 106; Filtrator 116, is connected with Electric-motor driven pumps 114, band bubble photoresist in Electric-motor driven pumps 114 is inputed to filtrator 116, is filtered out by bubble, and the defeated Electric-motor driven pumps 114 of getting back to of photoresist; Second exhaust pipe road 119, is connected with Electric-motor driven pumps 114 exhausr port, for getting rid of the bubble in Electric-motor driven pumps 114 in photoresist; Bubble detecting inductor (L/E Sensor) 113, being positioned at the 4th photoresist transports on pipeline 118, whether detecting has the bubble of omission to export from Electric-motor driven pumps 114, and wherein the 4th photoresist transport pipeline 118 is connected with the Electric-motor driven pumps 114 photoresist output terminal in removal of bubbles system 104.
But, when the photoresist report of above-mentioned photoresist feeding mechanism is empty, namely consume the full state sensor 105 of detecting bucket and detect that the photoresist in photoresist storage system 102 is finished, feeding mechanism can close photoresist bottle end solenoid valve automatically, open and consume detecting bucket pressure release end solenoid valve, i.e. the 3rd vent valve 109, ensures do not have negative pressure to produce in photoresist pipeline in subsequent handling, thus changes photoresist bottle or add new photoresist in photoresist bottle.Now, pressure release end directly communicates with air, and photoresist is directly contacted with air, and as shown in Figure 2, the dirts such as the dust in air, particle can enter photoresist, bring impact to subsequent technique, and makes product produce defect, affects product quality.
Utility model content
In order to realize utility model object of the present utility model, the utility model provides a kind of photoresist feeding mechanism and system, communicate with air with consuming detecting bucket pressure release end when solving photoresist report sky in prior art, and make dirt in air enter photoresist, affect the technical matters of subsequent technique and product.
The photoresist feeding mechanism that the utility model provides, it comprises: for storing the photoresist memory storage of photoresist, for photoresist in photoresist memory storage being extracted the pump to nozzle, for detecting consumption detecting bucket (LE tank) of photoresist amount in photoresist memory storage, this photoresist memory storage, consume detecting bucket to be communicated with successively by pipeline with pump, wherein, this consumption detecting bucket has downtake pipe road and is located at the first row air valve on downtake pipe road, this downtake pipe road is also provided with the first air strainer, just communicate with air through this first air strainer with the photoresist making this consumption detect in bucket.
Further, this first air strainer is located between first row air valve and downtake pipe road end.
Further, this photoresist feeding mechanism also comprise to consume between detecting bucket and pump and with the bubble gathering barrel of both pipeline connections, this bubble gathering barrel has second exhaust pipe road and is located at the second row air valve on second exhaust pipe road, this second exhaust pipe road is provided with the second air strainer, just communicates with air through this second air strainer to make the photoresist in this bubble gathering barrel.
Further, this second air strainer is located between second row air valve and second exhaust pipe road end.
Further, what this first air strainer and/or the second air strainer contained in nonwoven layer, electrostatic filter layer, photocatalyst filter layer, activated carbon filter layer, plasma filtering layer is one or more.
Further, this pump is single-stage pump (CRD pump).
The utility model also provides a kind of photoresist supply system, it comprises multiple photoresist feeding mechanism, this photoresist feeding mechanism comprises the photoresist memory storage for storing photoresist, for photoresist in photoresist memory storage being extracted the pump to nozzle, for detecting the consumption detecting bucket of photoresist amount in photoresist memory storage, this photoresist memory storage, consume detecting bucket to be communicated with successively by pipeline with pump, wherein, this consumption detecting bucket has gas exhaust piping and is located at the vent valve on gas exhaust piping, gas exhaust piping in the plurality of photoresist feeding mechanism is communicated to a linker respectively, in this linker or end be provided with the 3rd air strainer, just communicate with air through the 3rd air strainer with the photoresist making this consumption detect in bucket.
Photoresist feeding mechanism of the present utility model and system, by installing an air strainer additional at the gas exhaust piping of photoresist consumption detecting bucket (LE tank), make when consuming detecting bucket and detecting that in photoresist memory storage, photoresist is finished and reports sky, open gas exhaust piping pressure release, outside air can not directly contact with the consumption photoresist detected in bucket, the dirts such as the dust in air, particle are avoided to enter photoresist, adverse effect is brought to subsequent technique, product, improve the security of technique, reliability, ensure that the quality of product.
Accompanying drawing explanation
For the purpose of this utility model, feature and advantage clearlyer can be understood, below with reference to accompanying drawing, preferred embodiment of the present utility model is described in detail, wherein:
Fig. 1 is the existing photoresist coating system schematic diagram with photoresist removal of bubbles system;
Fig. 2 is that the consumption detecting bucket of existing photoresist feeding mechanism opens pressure release end and the schematic diagram communicated with air;
Fig. 3 is the structural representation of the utility model photoresist feeding mechanism;
Fig. 4 is the structural representation of the utility model photoresist supply system.
Embodiment
first embodiment
Refer to Fig. 3, the photoresist feeding mechanism of the present embodiment comprises: for store photoresist photoresist memory storage 21, for by photoresist memory storage 21 photoresist extract to nozzle 25 pump 24, be used for detecting photoresist amount in photoresist memory storage 21 consumption detecting bucket 22.Photoresist memory storage 21, consumption detecting bucket 22 are communicated with by pipeline successively with pump 24.Wherein, consume detecting bucket 22 to there is downtake pipe road 221 and be located at the first row air valve 222 on downtake pipe road 221, downtake pipe road 221 is also provided with the first air strainer 223, just communicates with air through the first air strainer 223 with the photoresist making consumption detect in bucket 22.
The present embodiment is by installing an air strainer 223 additional at the gas exhaust piping 221 of photoresist consumption detecting bucket 22, make when consuming detecting bucket 22 and detecting that in photoresist memory storage 21, photoresist is finished and reports sky, open gas exhaust piping 221 pressure release, outside air can not directly contact with the consumption photoresist detected in bucket 22, the dirts such as the dust in air, particle are avoided to enter photoresist, adverse effect is brought to subsequent technique, product, improve the security of technique, reliability, ensure that the quality of product.
In the present embodiment, in order to get rid of the bubble in photoresist further, improve processing quality, photoresist feeding mechanism also comprise to consume between detecting bucket 22 and pump 24 and with the bubble gathering barrel 23 of both pipeline connections, bubble gathering barrel 23 has second exhaust pipe road 231 and is located at the second row air valve 232 on second exhaust pipe road 231, second exhaust pipe road 231 is provided with the second air strainer 233, just communicates with air through the second air strainer 233 to make the photoresist in bubble gathering barrel 23.
In practical application, the first air strainer is preferably located between first row air valve and downtake pipe road end, and the second air strainer is preferably located between second row air valve and second exhaust pipe road end, as shown in Figure 3.
It is one or more that two air strainers of the present embodiment contain in nonwoven layer, electrostatic filter layer, photocatalyst filter layer, activated carbon filter layer, plasma filtering layer, to adjust according to different condition and demand.
The present embodiment is preferably applicable to single-stage pump (CRD pump) photoresist feeding mechanism, is particularly useful for TEL Lithius Pro type and more than Pro type.
second embodiment
Refer to Fig. 4, the photoresist supply system of the present embodiment comprises the photoresist feeding mechanism of multiple first embodiment, each photoresist feeding mechanism has to consume respectively detects bucket, each consumption detecting bucket is respectively equipped with gas exhaust piping, multiple gas exhaust piping 221 is communicated to a linker 26 respectively, the connection of linker 26 end is provided with the 3rd air strainer 27, just communicates with air through the 3rd air strainer 27 with the photoresist making consumption detect in bucket.
Multiple photoresist feeding mechanisms in the present embodiment adopt the setting of a linker and air strainer, can greatly reduce cost.
Claims (7)
1. a photoresist feeding mechanism, it comprises: for storing the photoresist memory storage of photoresist, for photoresist in photoresist memory storage being extracted the pump to nozzle, for detecting the consumption detecting bucket of photoresist amount in photoresist memory storage, this photoresist memory storage, consume detecting bucket to be communicated with successively by pipeline with pump, it is characterized in that: this consumption detecting bucket has downtake pipe road and is located at the first row air valve on downtake pipe road, this downtake pipe road is also provided with the first air strainer, just communicate with air through this first air strainer with the photoresist making this consumption detect in bucket.
2. photoresist feeding mechanism according to claim 1, is characterized in that: this first air strainer is located between first row air valve and downtake pipe road end.
3. photoresist feeding mechanism according to claim 1, it is characterized in that: this photoresist feeding mechanism also comprise to consume between detecting bucket and pump and with the bubble gathering barrel of both pipeline connections, this bubble gathering barrel has second exhaust pipe road and is located at the second row air valve on second exhaust pipe road, this second exhaust pipe road is provided with the second air strainer, just communicates with air through this second air strainer to make the photoresist in this bubble gathering barrel.
4. photoresist feeding mechanism according to claim 3, is characterized in that: this second air strainer is located between second row air valve and second exhaust pipe road end.
5. photoresist feeding mechanism according to claim 4, is characterized in that: it is one or more that this first air strainer and/or the second air strainer contain in nonwoven layer, electrostatic filter layer, photocatalyst filter layer, activated carbon filter layer, plasma filtering layer.
6. photoresist feeding mechanism according to claim 1, is characterized in that: this pump is single-stage pump.
7. a photoresist supply system, it comprises multiple photoresist feeding mechanism as described in any one of claim 1 to 6, this photoresist feeding mechanism comprises the photoresist memory storage for storing photoresist, for photoresist in photoresist memory storage being extracted the pump to nozzle, for detecting the consumption detecting bucket of photoresist amount in photoresist memory storage, this photoresist memory storage, consume detecting bucket to be communicated with successively by pipeline with pump, it is characterized in that: this consumption detecting bucket has gas exhaust piping and is located at the vent valve on gas exhaust piping, gas exhaust piping in the plurality of photoresist feeding mechanism is communicated to a linker respectively, in this linker or end be provided with the 3rd air strainer, just communicate with air through the 3rd air strainer with the photoresist making this consumption detect in bucket.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420487628.4U CN204129434U (en) | 2014-08-27 | 2014-08-27 | Photoresist feeding mechanism and system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420487628.4U CN204129434U (en) | 2014-08-27 | 2014-08-27 | Photoresist feeding mechanism and system |
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| CN204129434U true CN204129434U (en) | 2015-01-28 |
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| CN201420487628.4U Active CN204129434U (en) | 2014-08-27 | 2014-08-27 | Photoresist feeding mechanism and system |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107121897A (en) * | 2017-05-25 | 2017-09-01 | 上海华力微电子有限公司 | A kind of photoresist circuit design |
| CN107490937A (en) * | 2017-09-07 | 2017-12-19 | 信利（惠州）智能显示有限公司 | A kind of On-line Measuring Method of resist coating system and its gumminess |
-
2014
- 2014-08-27 CN CN201420487628.4U patent/CN204129434U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107121897A (en) * | 2017-05-25 | 2017-09-01 | 上海华力微电子有限公司 | A kind of photoresist circuit design |
| CN107490937A (en) * | 2017-09-07 | 2017-12-19 | 信利（惠州）智能显示有限公司 | A kind of On-line Measuring Method of resist coating system and its gumminess |
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