CN103769351A - Photoresist recovering system - Google Patents
Photoresist recovering system Download PDFInfo
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- CN103769351A CN103769351A CN201410024900.XA CN201410024900A CN103769351A CN 103769351 A CN103769351 A CN 103769351A CN 201410024900 A CN201410024900 A CN 201410024900A CN 103769351 A CN103769351 A CN 103769351A
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Abstract
The invention discloses a photoresist recovering system which is used for solving the problems that the used photoresist exhausted from a photoresist coating machine is wasted. The system comprises a receiving device which is connected with the photoresist coating device, and a conveying device connected with a first buffer device and a second buffer device, respectively, and is used for conveying the photoresist in the first buffer device into the second buffer device, wherein the top of the second buffer device is connected with a dry and clean air source via a pipeline which is provided with a second control valve; the bottom of the second buffer device is connected with a pipeline which is provided with a fourth control valve; the second buffer device is used for containing the used photoresist conveyed by the conveying device and conveying the used photoresist to a photoresist barrel via the pipeline provided with the fourth control valve under the air pressure provided by the dry and clean air source. The used photoresist exhausted from the photoresist coating machine enters the photoresist barrel via the devices, in this way, the photoresist can be recycled, and consequently, the production cost is reduced.
Description
Technical field
The present invention relates to display device technology field, relate in particular to a kind of photoresist recovery system.
Background technology
In the photoetching process of making color membrane substrates and array base palte, thereby be mainly to utilize photoresist to add that diluent is diluted to photoresist after finite concentration, with rotary coating mode (Spin coat) or slot coated mode (Slit coat), the photoresist after dilution is evenly coated on substrate again.And for photoresist can be coated on substrate equably, rotary coating mode can first be coated with a large amount of photoresists conventionally on this substrate, then rotary plate can evenly be coated on whole substrate photoresist, but in this kind of coating method, the utilization rate of photoresist is lower, most photoresist all, in the process of rotary coating, is discharged in waste liquid tank; And in slot coated mode, that the substrate being coated with on workbench is taken away, placing new substrate is coated with again, and in order to guarantee the even of coating, in the time putting in place at next substrate of wait, keep the continuity of nozzle plastic emitting, stand-by period inner nozzle is also always in plastic emitting, and the plastic emitting of this time period is also discharged in waste liquid tank.As can be seen here, the waste of photoresist is more serious, and a large amount of photoresist of discharging can be to environment, and especially, for large-scale production line, photoresist, by a large amount of wastes, has increased production cost.
Summary of the invention
The object of this invention is to provide a kind of photoresist recovery system, for solving the problem of a large amount of wastes when at present color membrane substrates and array base palte production technology are coated with photoresist, thereby reduce production costs.
The object of the invention is to be achieved through the following technical solutions:
The embodiment of the present invention provides a kind of photoresist recovery system, comprising:
Receiving system, described receiving system is connected with photoresist apparatus for coating, the used photoresist of discharging for receiving described photoresist apparatus for coating;
The first buffer unit, the top of described the first buffer unit is connected with the bottom of described receiving system; The described used photoresist receiving for holding described receiving system;
Conveying device, is connected with the bottom of described the first buffer unit by the pipeline that is provided with the first control valve, and is connected with the second buffer unit; Described conveying device is for being delivered to the described used photoresist of described the first buffer unit in described the second buffer unit;
The top of described the second buffer unit is connected with dry clean source of the gas by the pipeline that is provided with the second control valve; The bottom of described the second buffer unit is connected with the pipeline of the 4th control valve; The described used photoresist that described the second buffer unit is carried for holding described conveying device, and under the air pressure providing at dry clean source of the gas, by the described pipeline that is provided with the 4th control valve, described used photoresist is delivered to glue bucket.
In the embodiment of the present invention, by buffer unit and conveying device, make the photoresist reclaiming there is more sufficient buffer time and can there is enough power and enter glue bucket, thereby realize the recovery of used photoresist, reduce the waste of photoresist, reduce production costs.
Preferably, the top of described the second buffer unit is also connected with waste liquid barrel by the pipeline that is provided with the 3rd control valve, the break-make of the 3rd control valve described in described control device control, the described pipeline that is provided with the 3rd control valve under the state of described the 3rd control valve conducting to waste liquid barrel Exhaust Gas to reduce the pressure in described the second buffer unit, or for discharging to waste liquid barrel the liquid that cleans described the second buffer unit under the state in described the 3rd control valve conducting.In the embodiment of the present invention, described in be provided with the 3rd control valve pipeline under the state of described the 3rd control valve conducting to waste liquid barrel Exhaust Gas to reduce the pressure in described the second buffer unit, therefore can not affect the conveying action of described conveying device; Cleaning when this system, by conveying device transport cleaning liquid, described in be provided with the 3rd control valve pipeline under the state of described the 3rd control valve conducting, discharge to waste liquid barrel the liquid that cleans described the second buffer unit.
Preferably, described system also comprises control device and the first monitoring device and the second monitoring device that are connected with described control device respectively;
Described the first monitoring device is connected with described the first control valve, for monitoring the liquid level of described the first buffer unit photoresist, and sends the first liquid level signal to control device;
Described the second monitoring device is connected with described the second control valve, described the 3rd control valve, described the 4th control valve, for monitoring the liquid level of described the second buffer unit photoresist, and sends the second liquid level signal to control device;
Described control device be connected with described the first control valve, described the second control valve, described the 3rd control valve, described the 4th control valve and described conveying device connect, for according to receive described the first liquid level signal control described in the first control valve break-make and control described conveying device unlatching and stop; Also for according to the break-make of the second control valve, described the 3rd control valve described in described the second liquid level signal control receiving or described the 4th control valve, and control stopping of described conveying device.
In the embodiment of the present invention, by described control device, described the first monitoring device and described the second monitoring device, the monitoring of the liquid level to used photoresist described in buffer unit, and each control valve conveying device is controlled, realize unartificial described used photoresist and collect.
Preferably, also comprise the first filter, described the first filter is arranged at the bottom of described receiving system, the described used photoresist of discharging for filtering described receiving system.Described the first filter is screen pack, and described screen pack is provided with the filtering holes that some diameters are less than 1 millimeter.By described the first filter, the described used photoresist of collecting is tentatively filtered, to reduce the particle in the described used photoresist of collecting in follow-up collection flow process.
Preferably, also comprise the second filter, described the second filter is arranged at the bottom of described the second buffer unit, the described used photoresist of discharging for filtering described the second buffer unit.By described the second filter, the described used photoresist of collecting is further filtered, so that the described used photoresist of collecting meets standard.
Preferably, described the second filter is screen pack, and described screen pack is provided with the filtering holes that some diameters are less than 3 microns.
Preferably, also comprise the second filter, described in described the second filter is arranged at, be provided with between the pipeline and described glue bucket of the 4th control valve.Described the second filter is filter, in described filter, screen pack is set, and described screen pack is provided with the filtering holes that some diameters are less than 3 microns; The described used photoresist that described filter is discharged for being provided with the pipeline of the 4th control valve described in filtering.By described the second filter, the described used photoresist of collecting is further filtered, so that the described used photoresist of collecting meets standard.
Preferably, described the first monitoring device and described the second monitoring device are sensor, and described sensor comprises any one or the combination in ultrasonic sensor, pressure sensor, infrared sensor, laser sensor and mechanical floats.
Embodiment of the present invention beneficial effect is as follows: by buffer unit and conveying device, make the photoresist reclaiming have more sufficient buffer time and can have enough power and enter glue bucket; The cooperation of multiple control valves, can make photoresist filter and enter glue bucket by rational speed; The filter providing can filter the photoresist reclaiming, and makes it to meet instructions for use; By the cooperation of each part mentioned above device, thereby realize the recovery of used photoresist, reduce the waste of photoresist, reduce production costs.
Accompanying drawing explanation
The structure chart of the photoresist recovery system that Fig. 1 provides for the embodiment of the present invention;
The structure chart of the photoresist recovery system that comprises the first monitoring device and the second monitoring device that Fig. 2 provides for the embodiment of the present invention;
The structure chart of the photoresist recovery system that comprises the first monitoring device, the second monitoring device and control device that Fig. 3 provides for the embodiment of the present invention.
Accompanying drawing explanation:
The specific embodiment
Below in conjunction with Figure of description, the implementation procedure of the embodiment of the present invention is elaborated.It should be noted that same or similar label from start to finish represents same or similar element or has the element of identical or similar functions.Be exemplary below by the embodiment being described with reference to the drawings, only for explaining the present invention, and can not be interpreted as limitation of the present invention.
Referring to Fig. 1, the embodiment of the present invention provides a kind of photoresist recovery system, comprising:
Receiving system 1, receiving system 1 is connected with photoresist apparatus for coating, the used photoresist of discharging for receiving photoresist apparatus for coating.Because photoresist apparatus for coating is divided into rotary coating mode and slot coated mode, receiving system 1 need to carry out accommodation according to the equipment of above-mentioned two kinds of coating methods, for example, for the automatic double surface gluer of rotary coating mode, conventionally there is substrate rotating disc, receiving system 1 can be designed to be able to receive binder removal in a big way and adapt to the storage tank of substrate rotating disc; Again for example, for slot coated mode, receiving system 1 can be designed to littlely, and the corresponding fanging noz(zle) in the position of receiving system 1 is in pre-coating position, or receiving system 1 is designed to larger, can fanging noz(zle) at glue spraying and the frictioning of pre-coating position and coating position.It should be noted that, the present embodiment, just for receiving system 1 is described, the invention is not restricted to this.Those skilled in the art can, according to thought of the present invention, carry out modification to receiving system 1, still in protection scope of the present invention.
The top of the first buffer unit 2, the first buffer units 2 is connected with the bottom of receiving system 1; For holding the used photoresist that receiving system 1 receives.The first filter 10 is set in the bottom of receiving system 1.Certainly this first filter 10 also can be arranged between receiving system 1 and the first buffer unit 2, in receiving system 1 bottom, the first filter 10 to be set similar.The used photoresist receiving with the receiving apparatus 1 that achieves a butt joint by the first filter 10 carries out preliminary filtration, reduces larger photoresist particle; The first filter 10 is preliminary filtration, and therefore the diameter of its filtering holes can be larger, and for example, the diameter of the filtering holes of the first filter 10 is less than 1 millimeter.The first filter 10 can or can be installed on the filter of receiving system 1 bottom or other meet the filter of production requirement for screen pack.
Conveying device 3, is connected with the bottom of the first buffer unit 2 by the pipeline that is provided with the first control valve 6, and is connected with the second buffer unit 4; Conveying device is for being delivered to the used photoresist of the first buffer unit 2 in the second buffer unit 4.Conveying device 3 can be delivery pump, and delivery pump can provide power that the photoresist in the first buffer unit 2 is pumped into the second buffer unit 4.
The top of the second buffer unit 4 is connected with dry clean source of the gas by the pipeline that is provided with the second control valve 7; The bottom of the second buffer unit 4 is connected with glue bucket 5 by the pipeline that is provided with the 4th control valve 9; The used photoresist that the second buffer unit 4 is carried for holding conveying device 3, and under the air pressure providing at dry clean source of the gas, make used photoresist flow into glue bucket 5.In order to obtain better filter effect, in the second buffer unit 4 bottoms, the second filter 11 is set, or the second filter 11 is set being provided with between the pipeline of the 4th control valve 9 and glue bucket 5, for further filtering photoresist particle, thereby make the photoresist that carries out glue bucket 5 meet the requirement reusing, compare the filtering holes that the first filter 10, the second filters 11 need to arrange small diameter, the diameter of for example filtering holes is less than 3 microns.The second filter 11 can be the screen pack that is installed on the bottom of the second buffer unit 4, and this screen pack is for filtering the used photoresist that the second buffer unit 4 is discharged; Or the second filter 11 can be for being installed on the filter between pipeline and the glue bucket 5 that is provided with the 3rd control valve 8, filter is for filtering the described used photoresist of the pipeline discharge that is provided with the 4th control valve 9; The second filter 11 can also meet for other filter of production requirement.The second control valve 7, under conducting state, can increase the air pressure in the second buffer unit 4 according to dry clean source of the gas, the photoresist in the second buffer unit 4 can be filtered stably, and flow into glue bucket 5.This dry clean source of the gas provides the gas of clean dehumidifying, to guarantee not affect the quality of photoresist.
Above-mentioned the first buffer unit 2, conveying device 3 and the second buffer unit 4 of the present embodiment makes the recovery of used photoresist have a buffering, thereby guarantees the smooth realization of whole removal process.
Conveying device 3 is delivered to the used photoresist in the first buffer unit 2 process of the second buffer unit 4, along with the increase of photoresist, can cause the air pressure in the second buffer unit 4 to increase, the increase of air pressure will affect the work of conveying device 3, therefore be necessary the air pressure in the second buffer unit 4 under this situation to regulate, therefore can make the top of the second buffer unit 4 be connected with waste liquid barrel by the pipeline that is provided with the 3rd control valve 8, the 3rd control valve 8 break-make under the control of control device, for under the state of conducting to waste liquid barrel Exhaust Gas to reduce the pressure in the second buffer unit.Meanwhile, in the time cleaning the photoresist recovery system that this enforcement provides, can make the 3rd control valve 8 conductings, to discharge and clean the liquid of the second buffer unit 4 to waste liquid barrel.Certainly, if do not consider the situation of cleaning, can, by vacant the pipeline that is provided with the 3rd control valve 8, not connect waste liquid barrel, only need to discharge the gas in the second buffer unit 4, reduce air pressure in the second buffer unit 4.It should be noted that, in the time that the 3rd control valve 8 is opened, the second control valve 7 must be closed, and corresponding, when the second control valve 7 is opened, the 3rd control valve 8 must be closed.
Embodiment of the present invention beneficial effect is as follows: by buffer unit and conveying device, make the photoresist reclaiming have more sufficient buffer time and can have enough power and enter glue bucket; The cooperation of multiple control valves, can make photoresist filter and enter glue bucket by rational speed; The filter providing can filter the photoresist reclaiming, and makes it to meet instructions for use; By the cooperation of each part mentioned above device, thereby realize the recovery of used photoresist, reduce the waste of photoresist, reduce production costs.
Each control valve and conveying device can Artificial Control above, in order to reduce artificial participation, reduce costs and to increase work efficiency, the photoresist recovery system that the embodiment of the present invention provides also comprises control device 14 and the first monitoring device 12 being attached thereto and the second monitoring device 13.Certainly control device 14 can be integrated in to the first monitoring device 12 and the second monitoring device 13 according to hardware capability.
Referring to Fig. 2, show the photoresist recovery system that comprises the first monitoring device 12 and the second monitoring device 13, be integrated in the scheme of the first monitoring device 12 and the second monitoring device 13 by control device 14.Wherein, the first monitoring device 12 is connected with the first control valve and conveying device, for monitoring the liquid level of the first buffer unit 2 photoresists, and triggers the break-make of the first control valve 6 and the unlatching of conveying device 3 and stops according to the liquid level in the first buffer unit 2;
The second monitoring device 13 is connected with the second control valve 7, the 3rd control valve 8, the 4th control valve 9 and conveying device 3, for monitoring the liquid level of the second buffer unit 4 photoresists, and trigger the second control valve 7, the 3rd control valve 8 or the break-make of the 4th control valve 9 and stopping of conveying device 3 according to the liquid level in the second buffer unit 4.
Referring to Fig. 3, show the photoresist recovery system that comprises control device 14 and the first monitoring device 12 being connected with control device 14 respectively and the second monitoring device 13.Wherein, the first monitoring device 12 is connected with the first control valve 6, for monitoring the liquid level of the first buffer unit 2 photoresists, and sends the first liquid level signal to control device 14;
The second monitoring device 13 and the second control valve 7, the 3rd control valve 8, the 4th control valve 9, for monitoring the liquid level of the second buffer unit 4 photoresists, and send the second liquid level signal to control device 14;
The first monitoring device 12 and the second monitoring device 13 can be for realizing the present invention program's sensor, for example ultrasonic sensor, pressure sensor, infrared sensor, laser sensor and mechanical floats sensor, can apply any one in the sensor also can Combination application.The quantity of the setting of sensor and position can be determined according to the actual requirements.For example, each sensor can be arranged at the first buffer unit 2 and the second buffer unit 4 connecting pipes on, the liquid level in this pipeline is synchronizeed with the liquid level in the first buffer unit 2 and the second buffer unit 4; Again for example, can be arranged at the inside of the first buffer unit 2 and the second buffer unit 4.
The number of the sensor that same monitoring device comprises can for one or two and more than.Describe as an example of the first monitoring device 12 example:
For example, the first monitoring device 12 comprises 2 sensors, and a high position and the low level of corresponding the first monitoring device 12 are controlled the first control valve 6 and opened, and start conveyer 3 in the time of a high position respectively, close the first control valve 6, and stop conveyer 3 in the time of low level; Or send to control device 14 signal that liquid level is high in the time of a high position, make control device 4 control the first control valve 6 and start, and start conveyer 3, in the time of low level, send to control device 14 signal that liquid level is low, make control device 14 close the first control valve 6, and stop conveyer 3.
Again for example, the first monitoring device 12 comprises 3 sensors, a high position, meta and the low level of corresponding the first monitoring device 12 respectively, in the time of a high position, controlling the first control valve 6 opens, and start conveyer 3 to the second buffer unit 4 conveying photoresist fast, in the time of meta, control conveyer 3 and carry photoresists to the second buffer unit 4 low speed, in the time of low level, control the first control valve 6 and close and stop conveying device 3; Or to control device 14 transmitted signals, control the first control valve 6 and conveying device 3 by control device 14.
It should be noted that, the first monitoring device 12 and the second monitoring device 13 can comprise one or more sensors, and above-described embodiment, just in order to illustrate, the invention is not restricted to this.
In addition, according to the situation of practical application, need to consider the control logic of each control valve and conveying device 3, for example liquid level of the first buffer unit 2 and the second buffer unit 4 be high, just, low height and low control situation; Again for example on the basis of above-mentioned situation, the second control valve is under on off operating mode and the control situation of the 3rd control valve under different on off operating modes; The for example control situation when cleaning only again.Relevant technical staff in the field can be according to photoresist recovery system of the present invention, and the control logic of design under different situations, to meet control requirement in this case, differs one for example at this.
The embodiment of the present invention is by buffer unit and conveying device, and the photoresist that makes to reclaim has more sufficient buffer time and can have enough power and enters glue bucket; The cooperation of multiple control valves, can make photoresist filter and enter glue bucket by rational speed; The filter providing can filter the photoresist reclaiming, and makes it to meet instructions for use; By the cooperation of each part mentioned above device, thereby realize the recovery of used photoresist, reduce the waste of photoresist, reduce production costs; Further adopt sensing device to monitor the liquid level in each buffer unit, and control corresponding control valve and conveying device, increase work efficiency to reduce cost of labor.
Obviously, those skilled in the art can carry out various changes and modification and not depart from the spirit and scope of the present invention the present invention.Like this, if within of the present invention these are revised and modification belongs to the scope of the claims in the present invention and equivalent technologies thereof, the present invention is also intended to comprise these changes and modification interior.
Claims (10)
1. a photoresist recovery system, is characterized in that, comprising:
Receiving system, described receiving system is connected with photoresist apparatus for coating, the used photoresist of discharging for receiving described photoresist apparatus for coating;
The first buffer unit, the top of described the first buffer unit is connected with the bottom of described receiving system; The described used photoresist receiving for holding described receiving system;
Conveying device, is connected with the bottom of described the first buffer unit by the pipeline that is provided with the first control valve, and is connected with the second buffer unit; Described conveying device is for being delivered to the described used photoresist of described the first buffer unit in described the second buffer unit;
The top of described the second buffer unit is connected with dry clean source of the gas by the pipeline that is provided with the second control valve; The bottom of described the second buffer unit is connected with the pipeline of the 4th control valve; The described used photoresist that described the second buffer unit is carried for holding described conveying device, and under the air pressure providing at dry clean source of the gas, by the described pipeline that is provided with the 4th control valve, described used photoresist is delivered to glue bucket.
2. the system as claimed in claim 1, it is characterized in that, the top of described the second buffer unit is also connected with waste liquid barrel by the pipeline that is provided with the 3rd control valve, the described pipeline that is provided with the 3rd control valve under the state of described the 3rd control valve conducting to waste liquid barrel Exhaust Gas to reduce the pressure in described the second buffer unit, or for discharging to waste liquid barrel the liquid that cleans described the second buffer unit under the state in described the 3rd control valve conducting.
3. system as claimed in claim 2, is characterized in that, described system also comprises control device and the first monitoring device and the second monitoring device that are connected with described control device respectively;
Described the first monitoring device is connected with described the first control valve, for monitoring the liquid level of described the first buffer unit photoresist, and sends the first liquid level signal to control device;
Described the second monitoring device is connected with described the second control valve, described the 3rd control valve, described the 4th control valve, for monitoring the liquid level of described the second buffer unit photoresist, and sends the second liquid level signal to control device;
Described control device be connected with described the first control valve, described the second control valve, described the 3rd control valve, described the 4th control valve and described conveying device connect, for according to receive described the first liquid level signal control described in the first control valve break-make and control described conveying device unlatching and stop; Also for according to the break-make of the second control valve, described the 3rd control valve described in described the second liquid level signal control receiving or described the 4th control valve, and control stopping of described conveying device.
4. the system as described in claims 1 to 3 any one, is characterized in that, also comprises the first filter, and described the first filter is arranged at the bottom of described receiving system, the described used photoresist of discharging for filtering described receiving system.
5. system as claimed in claim 4, is characterized in that, described the first filter is screen pack, and described screen pack is provided with the filtering holes that some diameters are less than 1 millimeter.
6. the system as described in claims 1 to 3 any one, is characterized in that, also comprises the second filter, and described the second filter is arranged at the bottom of described the second buffer unit, the described used photoresist of discharging for filtering described the second buffer unit.
7. system as claimed in claim 6, is characterized in that, described the second filter is screen pack, and described screen pack is provided with the filtering holes that some diameters are less than 3 microns.
8. the system as described in claims 1 to 3 any one, is characterized in that, also comprises the second filter, is provided with between the pipeline and described glue bucket of the 4th control valve described in described the second filter is arranged at.
9. system as claimed in claim 8, is characterized in that, described the second filter is filter, in described filter, screen pack is set, and described screen pack is provided with the filtering holes that some diameters are less than 3 microns; The described used photoresist that described filter is discharged for being provided with the pipeline of the 4th control valve described in filtering.
10. system as claimed in claim 3, it is characterized in that, described the first monitoring device and described the second monitoring device are sensor, and described sensor comprises any one or the combination in ultrasonic sensor, pressure sensor, infrared sensor, laser sensor and mechanical floats.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410024900.XA CN103769351B (en) | 2014-01-20 | 2014-01-20 | A kind of photoresist recovery system |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410024900.XA CN103769351B (en) | 2014-01-20 | 2014-01-20 | A kind of photoresist recovery system |
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| CN103769351A true CN103769351A (en) | 2014-05-07 |
| CN103769351B CN103769351B (en) | 2016-08-17 |
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| CN201410024900.XA Expired - Fee Related CN103769351B (en) | 2014-01-20 | 2014-01-20 | A kind of photoresist recovery system |
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| CN104209241A (en) * | 2014-08-26 | 2014-12-17 | 中天光伏材料有限公司 | Precise coating glue recycling device |
| CN104281007A (en) * | 2014-08-06 | 2015-01-14 | 深圳市华星光电技术有限公司 | Photoresist feeder and coater |
| CN110281592A (en) * | 2018-03-19 | 2019-09-27 | 北京美好纸制品有限责任公司 | Corrugated paper board production line |
| CN111213906A (en) * | 2020-01-15 | 2020-06-02 | 贵州中烟工业有限责任公司 | Automatic recycling system and recycling method for cigarette lap adhesive overflowing |
| US10741427B2 (en) | 2016-11-22 | 2020-08-11 | Boe Technology Group Co., Ltd. | Coating apparatus for reducing waste of coating liquid, method for recycling coating liquid by utilization of the same, and method for cleaning the same |
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| Publication number | Publication date |
|---|---|
| CN103769351B (en) | 2016-08-17 |
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