CN107490937A - A kind of On-line Measuring Method of resist coating system and its gumminess - Google Patents
A kind of On-line Measuring Method of resist coating system and its gumminess Download PDFInfo
- Publication number
- CN107490937A CN107490937A CN201710801888.2A CN201710801888A CN107490937A CN 107490937 A CN107490937 A CN 107490937A CN 201710801888 A CN201710801888 A CN 201710801888A CN 107490937 A CN107490937 A CN 107490937A
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- China
- Prior art keywords
- pointswitch
- photoresist
- glue
- control valve
- control system
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N11/00—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties
- G01N11/02—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties by measuring flow of the material
Abstract
The present invention relates to semiconductor fabrication process technical field, more particularly to a kind of resist coating system and its On-line Measuring Method of gumminess.Resist coating system includes glue-coating pot, exhaust tank, filter and the gluing head being linked in sequence by sebific duct, three-pointswitch control valve is provided with sebific duct between described glue-coating pot and exhaust tank, described three-pointswitch control valve both ends connect glue-coating pot and exhaust tank respectively by sebific duct, and the three-terminal link of three-pointswitch control valve has online viscosity test instrument.Three-pointswitch control valve turns on the photoresist between glue-coating pot and exhaust tank, opens the switch for leading to photoresist viscosity test instrument, on-line measurement gumminess.Resist coating system is additionally provided with flowmeter, and described flowmeter electrically connects with three-pointswitch control valve.The On-line Measuring Method of the gumminess of the resist coating system is particularly suitable for use in the production of industrial mass semiconductor technology, and its On-line Measuring Method is simple, and feasibility is good.
Description
Technical field
The present invention relates to semiconductor fabrication process technical field, more particularly to a kind of resist coating system and its gumminess
On-line Measuring Method.
Background technology
With flourishing for IC-components, semiconductor fabrication process and production scale are also increasing;Wherein, apply
Photoresist is one of very important technique process in semiconductor process, because being needed after photoetching is required during production
Uniform line width is obtained, the increase of especially present substrate size, the requirement to lithographic results can be stricter, so to photoetching
The coating processes requirement of glue also can be more and more stricter;Particularly to the requirement of photoresist self character, wherein viscosity is photoresist
One of characteristic, it is the important parameter for weighing photoresist flow behavior, and photoetching gumminess is to photoresist film layer thickness and uniformly
Property influence it is very big, it increases with the reduction of the solvent in photoresist;High viscosity can produce thicker photoresist film layer;
Small viscosity, then the mobility of glue be also more readily obtained uniform photoresist thickness just than very fast.At present, semiconductor fabrication
During the measurement of photoetching gumminess be all off-line measurement, i.e., pour out or take out out of its container before using this photoresist
Measure, such way often pollutes this photoresist, causes to coat film layer exception, and then influences the photoetching effect of product
Fruit, cause the bad of product;And during production, usually photoetching gumminess is not measured in producing line
, thus production product can be given to bring certain yield risk.
The content of the invention
For the problems of above-mentioned photoetching gumminess off-line measurement, the present invention has carried a kind of resist coating system and its glue
The On-line Measuring Method of viscosity.
In order to solve the above technical problems, technical scheme provided by the invention is:A kind of resist coating system, including by sebific duct
Glue-coating pot, exhaust tank, filter and the gluing head being linked in sequence, set on the sebific duct between described glue-coating pot and exhaust tank
It is equipped with three-pointswitch control valve, described three-pointswitch control valve both ends connect glue-coating pot and exhaust tank respectively by sebific duct, and three
There is online viscosity test instrument to the three-terminal link of switching control pilot.The On-line Measuring Method of gumminess is:Three-pointswitch controls
Valve turns on the photoresist between glue-coating pot and exhaust tank, opens the switch for leading to photoresist viscosity test instrument, on-line measurement gluing
Degree.
Further:In above-mentioned resist coating system, it also includes control system, described online viscosity test instrument and control
System connection processed.Waste liquid tank, described control system control glue-coating pot, exhaust are also connected with by sebific duct on described filter
Tank, waste liquid tank, filter and gluing head.The On-line Measuring Method of gumminess is:Described control system according to subscription parameters,
The photoresist between three-pointswitch control valve conducting glue-coating pot and exhaust tank is controlled, opening leads to opening for photoresist viscosity test instrument
Close, on-line measurement gumminess.
Further:In above-mentioned resist coating system, connected between described filter and gluing head by sebific duct
There is flowmeter, described flowmeter electrically connects with three-pointswitch control valve.Described flowmeter is connected with control system.
The On-line Measuring Method of gumminess is:
A, described control system is according to subscription parameters, the light between control three-pointswitch control valve conducting glue-coating pot and exhaust tank
Photoresist, open the switch for leading to photoresist viscosity test instrument, on-line measurement gumminess;
B, when control system read step A data are shown as " normal ", the switch for leading to photoresist viscosity test instrument is closed;And
Feed back to flowmeter;
C, control system reads the data on flows of glue in flowmeter at any time;
D, when control system read step C data are shown as "No", adjusting parameter or photoresist is changed.
Compared with prior art, one three is increased between the sebific duct of glue-coating pot and exhaust tank of the present invention in coating system
To switching control pilot, wherein leading to photoresist viscosity test instrument all the way, so during production, in the regular hour
Interior this road sebific duct of opening is passed through a certain amount of photoresist into viscosity test instrument device and measured;In addition, in gluing cutter head annex
One controllable flowmeter is installed, on the one hand this flowmeter ensures photoresist in the range of qualified viscosity to gluing cutter head
Glue amount is certain;Another side, the change of its flow can feed back to photoresist viscosity test instrument, the glue amount monitored according to flowmeter
Scope decides whether to test photoresist viscosity, and then judges the photoetching gumminess size that whether changes and change, so exists
The decision of line can is improved the photoresist still more renewed to gluing parameter, ensure that the spreading knife in process of producing product
The glue amount of head is certain, it is ensured that the uniformity and uniformity of the photoresist thickness of coating, and then ensure that the lithographic results of product.
Such a way is particularly suitable for use in the production of industrial mass semiconductor technology, and method is simple, and feasibility is high.
Brief description of the drawings:
Fig. 1 is the structure principle chart of embodiment one;
Fig. 2 is the structure principle chart of embodiment two;
Fig. 3 is the structure principle chart of embodiment three;
Wherein 1 glue-coating pot, 2 exhaust tanks, 3 filters, 4 gluing heads, 5 three-pointswitch control valves, 6 viscosity test instruments, 7 waste liquid tanks,
8 flowmeters.
Embodiment:
The present invention is illustrated in greater detail in following embodiments.
Embodiment one
A kind of resist coating system, including glue-coating pot 1, exhaust tank 2, filter 3 and the gluing head 4 being linked in sequence by sebific duct,
Three-pointswitch control valve 5, the control of described three-pointswitch are provided with sebific duct between described glue-coating pot 1 and exhaust tank 2
Valve both ends connect glue-coating pot 1 and exhaust tank 2 by sebific duct respectively, and the three-terminal link of three-pointswitch control valve 5 has online viscosity
Tester 6.The On-line Measuring Method of gumminess is:Three-pointswitch control valve 5 turns on the photoetching between glue-coating pot 1 and exhaust tank 2
Glue, open the switch for leading to photoresist viscosity test instrument 6, on-line measurement gumminess.
Embodiment two
On the basis of embodiment one, in addition to control system, described online viscosity test instrument 6 are connected with control system.
Waste liquid tank 7, described control system control glue-coating pot 1, exhaust tank 2, waste liquid are also connected with by sebific duct on described filter 3
Tank 7, filter 3 and gluing head 4.The On-line Measuring Method of gumminess is:Described control system is according to subscription parameters, control
Three-pointswitch control valve turns on the photoresist between glue-coating pot and exhaust tank, opens the switch for leading to photoresist viscosity test instrument,
On-line measurement gumminess.
Embodiment three
On the basis of embodiment two, flowmeter 8, institute are connected with by sebific duct between described filter 3 and gluing head 4
The flowmeter 8 stated electrically connects with three-pointswitch control valve 5.Described flowmeter 8 is connected with control system.The online survey of gumminess
Amount method is:A, described control system is according to subscription parameters, control three-pointswitch control valve conducting glue-coating pot and exhaust tank it
Between photoresist, open and lead to the switch of photoresist viscosity test instrument, on-line measurement gumminess;
B, when control system read step A data are shown as " normal ", the switch for leading to photoresist viscosity test instrument is closed;And
Feed back to flowmeter;
C, control system reads the data on flows of photoresist in flowmeter at any time;
D, when control system read step C data are shown as "No", adjusting parameter or photoresist is changed.
Embodiments of the present invention are explained in detail above in conjunction with accompanying drawing, but the present invention is not limited to above-mentioned implementation
Mode, can also be on the premise of present inventive concept not be departed from those of ordinary skill in the art's possessed knowledge
Make a variety of changes.
Claims (10)
1. a kind of resist coating system, including the glue-coating pot being linked in sequence by sebific duct(1), exhaust tank(2), filter(3)And
Gluing head(4), it is characterised in that:In described glue-coating pot(1)And exhaust tank(2)Between sebific duct on be provided with three-pointswitch control
Valve processed(5), described three-pointswitch control valve both ends connect glue-coating pot respectively by sebific duct(1)And exhaust tank(2), three-pointswitch
The three-terminal link of control valve has online viscosity test instrument(6).
2. resist coating system according to claim 1, it is characterised in that:Also include control system, described is online glutinous
Spend tester(6)It is connected with control system.
3. resist coating system according to claim 2, it is characterised in that:Described filter(3)On also pass through sebific duct
It is connected with waste liquid tank(7), the control system control glue-coating pot(1), exhaust tank(2), waste liquid tank(7), filter(3)And apply
Rubber head(4).
4. resist coating system according to claim 2, it is characterised in that:Described filter(3)And gluing head(4)
Between flowmeter is connected with by sebific duct(8), described flowmeter(8)With three-pointswitch control valve(5)Electrical connection.
5. resist coating system according to claim 4, it is characterised in that:Described flowmeter(8)Connect with control system
Connect.
A kind of 6. gumminess On-line Measuring Method of the resist coating system described in claim 1, it is characterised in that:Three-pointswitch
Control valve turns on the photoresist between glue-coating pot and exhaust tank, opens the switch for leading to photoresist viscosity test instrument, on-line measurement
Gumminess.
7. On-line Measuring Method according to claim 6, it is characterised in that:Also include control system, described is online glutinous
Spend tester(6)It is connected with control system;
Described control system control glue-coating pot(1), exhaust tank(2), waste liquid tank(7), filter(3)And gluing head(4);
Described filter(3)And gluing head(4)Between be provided with flowmeter(8), described flowmeter(8)With three-pointswitch control
Valve processed(5)Electrical connection.
8. On-line Measuring Method according to claim 7, it is characterised in that:Described control system according to subscription parameters,
The photoresist between three-pointswitch control valve conducting glue-coating pot and exhaust tank is controlled, opening leads to opening for photoresist viscosity test instrument
Close, on-line measurement gumminess.
9. On-line Measuring Method according to claim 6, it is characterised in that:Described filter(3)And gluing head(4)
Between sebific duct be provided with flowmeter(8), described flowmeter(8)With three-pointswitch control valve(5)Electrical connection;Described flow
Meter(8)It is connected with control system.
10. On-line Measuring Method according to claim 9, its step are:
A, described control system is according to subscription parameters, the light between control three-pointswitch control valve conducting glue-coating pot and exhaust tank
Photoresist, open the switch for leading to photoresist viscosity test instrument, on-line measurement gumminess;
B, when control system read step A data are shown as " normal ", the switch for leading to photoresist viscosity test instrument is closed;And
Feed back to flowmeter;
C, control system reads the data on flows of photoresist in flowmeter at any time;
D, when control system read step C data are shown as "No", adjusting parameter or photoresist is changed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201710801888.2A CN107490937B (en) | 2017-09-07 | 2017-09-07 | Photoresist coating system and online measurement method of glue viscosity thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710801888.2A CN107490937B (en) | 2017-09-07 | 2017-09-07 | Photoresist coating system and online measurement method of glue viscosity thereof |
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Publication Number | Publication Date |
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CN107490937A true CN107490937A (en) | 2017-12-19 |
CN107490937B CN107490937B (en) | 2020-11-10 |
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Citations (6)
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CN1928720A (en) * | 2005-09-06 | 2007-03-14 | 东京应化工业株式会社 | Photoresist liquid feeding device and modified set using same |
CN101930222A (en) * | 2010-08-20 | 2010-12-29 | 陈炎 | On-line glue viscosity control system |
CN202450385U (en) * | 2011-12-30 | 2012-09-26 | 厦门文仪电脑材料有限公司 | System for controlling viscosity of glue solutions of thermosensitive printing paper automatically |
CN204129434U (en) * | 2014-08-27 | 2015-01-28 | 上海华力微电子有限公司 | Photoresist feeding mechanism and system |
WO2015064657A1 (en) * | 2013-10-30 | 2015-05-07 | 東京エレクトロン株式会社 | Flow adjustment mechanism, diluted drug solution supply mechanism, liquid treatment device, and operation method thereof |
CN105675444A (en) * | 2014-11-21 | 2016-06-15 | 中石化胜利石油工程有限公司钻井工艺研究院 | Three-tube hybrid-type plastic fluid funnel viscosity on-line measuring device and method |
-
2017
- 2017-09-07 CN CN201710801888.2A patent/CN107490937B/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1928720A (en) * | 2005-09-06 | 2007-03-14 | 东京应化工业株式会社 | Photoresist liquid feeding device and modified set using same |
CN101930222A (en) * | 2010-08-20 | 2010-12-29 | 陈炎 | On-line glue viscosity control system |
CN202450385U (en) * | 2011-12-30 | 2012-09-26 | 厦门文仪电脑材料有限公司 | System for controlling viscosity of glue solutions of thermosensitive printing paper automatically |
WO2015064657A1 (en) * | 2013-10-30 | 2015-05-07 | 東京エレクトロン株式会社 | Flow adjustment mechanism, diluted drug solution supply mechanism, liquid treatment device, and operation method thereof |
CN204129434U (en) * | 2014-08-27 | 2015-01-28 | 上海华力微电子有限公司 | Photoresist feeding mechanism and system |
CN105675444A (en) * | 2014-11-21 | 2016-06-15 | 中石化胜利石油工程有限公司钻井工艺研究院 | Three-tube hybrid-type plastic fluid funnel viscosity on-line measuring device and method |
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