CN107490937A - A kind of On-line Measuring Method of resist coating system and its gumminess - Google Patents

A kind of On-line Measuring Method of resist coating system and its gumminess Download PDF

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Publication number
CN107490937A
CN107490937A CN201710801888.2A CN201710801888A CN107490937A CN 107490937 A CN107490937 A CN 107490937A CN 201710801888 A CN201710801888 A CN 201710801888A CN 107490937 A CN107490937 A CN 107490937A
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China
Prior art keywords
pointswitch
photoresist
glue
control valve
control system
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CN201710801888.2A
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Chinese (zh)
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CN107490937B (en
Inventor
陈世喜
朱景河
王学雷
黄伟东
李建华
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Truly Huizhou Smart Display Ltd
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Truly Huizhou Smart Display Ltd
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Priority to CN201710801888.2A priority Critical patent/CN107490937B/en
Publication of CN107490937A publication Critical patent/CN107490937A/en
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N11/00Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties
    • G01N11/02Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties by measuring flow of the material

Abstract

The present invention relates to semiconductor fabrication process technical field, more particularly to a kind of resist coating system and its On-line Measuring Method of gumminess.Resist coating system includes glue-coating pot, exhaust tank, filter and the gluing head being linked in sequence by sebific duct, three-pointswitch control valve is provided with sebific duct between described glue-coating pot and exhaust tank, described three-pointswitch control valve both ends connect glue-coating pot and exhaust tank respectively by sebific duct, and the three-terminal link of three-pointswitch control valve has online viscosity test instrument.Three-pointswitch control valve turns on the photoresist between glue-coating pot and exhaust tank, opens the switch for leading to photoresist viscosity test instrument, on-line measurement gumminess.Resist coating system is additionally provided with flowmeter, and described flowmeter electrically connects with three-pointswitch control valve.The On-line Measuring Method of the gumminess of the resist coating system is particularly suitable for use in the production of industrial mass semiconductor technology, and its On-line Measuring Method is simple, and feasibility is good.

Description

A kind of On-line Measuring Method of resist coating system and its gumminess
Technical field
The present invention relates to semiconductor fabrication process technical field, more particularly to a kind of resist coating system and its gumminess On-line Measuring Method.
Background technology
With flourishing for IC-components, semiconductor fabrication process and production scale are also increasing;Wherein, apply Photoresist is one of very important technique process in semiconductor process, because being needed after photoetching is required during production Uniform line width is obtained, the increase of especially present substrate size, the requirement to lithographic results can be stricter, so to photoetching The coating processes requirement of glue also can be more and more stricter;Particularly to the requirement of photoresist self character, wherein viscosity is photoresist One of characteristic, it is the important parameter for weighing photoresist flow behavior, and photoetching gumminess is to photoresist film layer thickness and uniformly Property influence it is very big, it increases with the reduction of the solvent in photoresist;High viscosity can produce thicker photoresist film layer; Small viscosity, then the mobility of glue be also more readily obtained uniform photoresist thickness just than very fast.At present, semiconductor fabrication During the measurement of photoetching gumminess be all off-line measurement, i.e., pour out or take out out of its container before using this photoresist Measure, such way often pollutes this photoresist, causes to coat film layer exception, and then influences the photoetching effect of product Fruit, cause the bad of product;And during production, usually photoetching gumminess is not measured in producing line , thus production product can be given to bring certain yield risk.
The content of the invention
For the problems of above-mentioned photoetching gumminess off-line measurement, the present invention has carried a kind of resist coating system and its glue The On-line Measuring Method of viscosity.
In order to solve the above technical problems, technical scheme provided by the invention is:A kind of resist coating system, including by sebific duct Glue-coating pot, exhaust tank, filter and the gluing head being linked in sequence, set on the sebific duct between described glue-coating pot and exhaust tank It is equipped with three-pointswitch control valve, described three-pointswitch control valve both ends connect glue-coating pot and exhaust tank respectively by sebific duct, and three There is online viscosity test instrument to the three-terminal link of switching control pilot.The On-line Measuring Method of gumminess is:Three-pointswitch controls Valve turns on the photoresist between glue-coating pot and exhaust tank, opens the switch for leading to photoresist viscosity test instrument, on-line measurement gluing Degree.
Further:In above-mentioned resist coating system, it also includes control system, described online viscosity test instrument and control System connection processed.Waste liquid tank, described control system control glue-coating pot, exhaust are also connected with by sebific duct on described filter Tank, waste liquid tank, filter and gluing head.The On-line Measuring Method of gumminess is:Described control system according to subscription parameters, The photoresist between three-pointswitch control valve conducting glue-coating pot and exhaust tank is controlled, opening leads to opening for photoresist viscosity test instrument Close, on-line measurement gumminess.
Further:In above-mentioned resist coating system, connected between described filter and gluing head by sebific duct There is flowmeter, described flowmeter electrically connects with three-pointswitch control valve.Described flowmeter is connected with control system.
The On-line Measuring Method of gumminess is:
A, described control system is according to subscription parameters, the light between control three-pointswitch control valve conducting glue-coating pot and exhaust tank Photoresist, open the switch for leading to photoresist viscosity test instrument, on-line measurement gumminess;
B, when control system read step A data are shown as " normal ", the switch for leading to photoresist viscosity test instrument is closed;And Feed back to flowmeter;
C, control system reads the data on flows of glue in flowmeter at any time;
D, when control system read step C data are shown as "No", adjusting parameter or photoresist is changed.
Compared with prior art, one three is increased between the sebific duct of glue-coating pot and exhaust tank of the present invention in coating system To switching control pilot, wherein leading to photoresist viscosity test instrument all the way, so during production, in the regular hour Interior this road sebific duct of opening is passed through a certain amount of photoresist into viscosity test instrument device and measured;In addition, in gluing cutter head annex One controllable flowmeter is installed, on the one hand this flowmeter ensures photoresist in the range of qualified viscosity to gluing cutter head Glue amount is certain;Another side, the change of its flow can feed back to photoresist viscosity test instrument, the glue amount monitored according to flowmeter Scope decides whether to test photoresist viscosity, and then judges the photoetching gumminess size that whether changes and change, so exists The decision of line can is improved the photoresist still more renewed to gluing parameter, ensure that the spreading knife in process of producing product The glue amount of head is certain, it is ensured that the uniformity and uniformity of the photoresist thickness of coating, and then ensure that the lithographic results of product. Such a way is particularly suitable for use in the production of industrial mass semiconductor technology, and method is simple, and feasibility is high.
Brief description of the drawings:
Fig. 1 is the structure principle chart of embodiment one;
Fig. 2 is the structure principle chart of embodiment two;
Fig. 3 is the structure principle chart of embodiment three;
Wherein 1 glue-coating pot, 2 exhaust tanks, 3 filters, 4 gluing heads, 5 three-pointswitch control valves, 6 viscosity test instruments, 7 waste liquid tanks, 8 flowmeters.
Embodiment:
The present invention is illustrated in greater detail in following embodiments.
Embodiment one
A kind of resist coating system, including glue-coating pot 1, exhaust tank 2, filter 3 and the gluing head 4 being linked in sequence by sebific duct, Three-pointswitch control valve 5, the control of described three-pointswitch are provided with sebific duct between described glue-coating pot 1 and exhaust tank 2 Valve both ends connect glue-coating pot 1 and exhaust tank 2 by sebific duct respectively, and the three-terminal link of three-pointswitch control valve 5 has online viscosity Tester 6.The On-line Measuring Method of gumminess is:Three-pointswitch control valve 5 turns on the photoetching between glue-coating pot 1 and exhaust tank 2 Glue, open the switch for leading to photoresist viscosity test instrument 6, on-line measurement gumminess.
Embodiment two
On the basis of embodiment one, in addition to control system, described online viscosity test instrument 6 are connected with control system. Waste liquid tank 7, described control system control glue-coating pot 1, exhaust tank 2, waste liquid are also connected with by sebific duct on described filter 3 Tank 7, filter 3 and gluing head 4.The On-line Measuring Method of gumminess is:Described control system is according to subscription parameters, control Three-pointswitch control valve turns on the photoresist between glue-coating pot and exhaust tank, opens the switch for leading to photoresist viscosity test instrument, On-line measurement gumminess.
Embodiment three
On the basis of embodiment two, flowmeter 8, institute are connected with by sebific duct between described filter 3 and gluing head 4 The flowmeter 8 stated electrically connects with three-pointswitch control valve 5.Described flowmeter 8 is connected with control system.The online survey of gumminess Amount method is:A, described control system is according to subscription parameters, control three-pointswitch control valve conducting glue-coating pot and exhaust tank it Between photoresist, open and lead to the switch of photoresist viscosity test instrument, on-line measurement gumminess;
B, when control system read step A data are shown as " normal ", the switch for leading to photoresist viscosity test instrument is closed;And Feed back to flowmeter;
C, control system reads the data on flows of photoresist in flowmeter at any time;
D, when control system read step C data are shown as "No", adjusting parameter or photoresist is changed.
Embodiments of the present invention are explained in detail above in conjunction with accompanying drawing, but the present invention is not limited to above-mentioned implementation Mode, can also be on the premise of present inventive concept not be departed from those of ordinary skill in the art's possessed knowledge Make a variety of changes.

Claims (10)

1. a kind of resist coating system, including the glue-coating pot being linked in sequence by sebific duct(1), exhaust tank(2), filter(3)And Gluing head(4), it is characterised in that:In described glue-coating pot(1)And exhaust tank(2)Between sebific duct on be provided with three-pointswitch control Valve processed(5), described three-pointswitch control valve both ends connect glue-coating pot respectively by sebific duct(1)And exhaust tank(2), three-pointswitch The three-terminal link of control valve has online viscosity test instrument(6).
2. resist coating system according to claim 1, it is characterised in that:Also include control system, described is online glutinous Spend tester(6)It is connected with control system.
3. resist coating system according to claim 2, it is characterised in that:Described filter(3)On also pass through sebific duct It is connected with waste liquid tank(7), the control system control glue-coating pot(1), exhaust tank(2), waste liquid tank(7), filter(3)And apply Rubber head(4).
4. resist coating system according to claim 2, it is characterised in that:Described filter(3)And gluing head(4) Between flowmeter is connected with by sebific duct(8), described flowmeter(8)With three-pointswitch control valve(5)Electrical connection.
5. resist coating system according to claim 4, it is characterised in that:Described flowmeter(8)Connect with control system Connect.
A kind of 6. gumminess On-line Measuring Method of the resist coating system described in claim 1, it is characterised in that:Three-pointswitch Control valve turns on the photoresist between glue-coating pot and exhaust tank, opens the switch for leading to photoresist viscosity test instrument, on-line measurement Gumminess.
7. On-line Measuring Method according to claim 6, it is characterised in that:Also include control system, described is online glutinous Spend tester(6)It is connected with control system;
Described control system control glue-coating pot(1), exhaust tank(2), waste liquid tank(7), filter(3)And gluing head(4);
Described filter(3)And gluing head(4)Between be provided with flowmeter(8), described flowmeter(8)With three-pointswitch control Valve processed(5)Electrical connection.
8. On-line Measuring Method according to claim 7, it is characterised in that:Described control system according to subscription parameters, The photoresist between three-pointswitch control valve conducting glue-coating pot and exhaust tank is controlled, opening leads to opening for photoresist viscosity test instrument Close, on-line measurement gumminess.
9. On-line Measuring Method according to claim 6, it is characterised in that:Described filter(3)And gluing head(4) Between sebific duct be provided with flowmeter(8), described flowmeter(8)With three-pointswitch control valve(5)Electrical connection;Described flow Meter(8)It is connected with control system.
10. On-line Measuring Method according to claim 9, its step are:
A, described control system is according to subscription parameters, the light between control three-pointswitch control valve conducting glue-coating pot and exhaust tank Photoresist, open the switch for leading to photoresist viscosity test instrument, on-line measurement gumminess;
B, when control system read step A data are shown as " normal ", the switch for leading to photoresist viscosity test instrument is closed;And Feed back to flowmeter;
C, control system reads the data on flows of photoresist in flowmeter at any time;
D, when control system read step C data are shown as "No", adjusting parameter or photoresist is changed.
CN201710801888.2A 2017-09-07 2017-09-07 Photoresist coating system and online measurement method of glue viscosity thereof Active CN107490937B (en)

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CN201710801888.2A CN107490937B (en) 2017-09-07 2017-09-07 Photoresist coating system and online measurement method of glue viscosity thereof

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1928720A (en) * 2005-09-06 2007-03-14 东京应化工业株式会社 Photoresist liquid feeding device and modified set using same
CN101930222A (en) * 2010-08-20 2010-12-29 陈炎 On-line glue viscosity control system
CN202450385U (en) * 2011-12-30 2012-09-26 厦门文仪电脑材料有限公司 System for controlling viscosity of glue solutions of thermosensitive printing paper automatically
CN204129434U (en) * 2014-08-27 2015-01-28 上海华力微电子有限公司 Photoresist feeding mechanism and system
WO2015064657A1 (en) * 2013-10-30 2015-05-07 東京エレクトロン株式会社 Flow adjustment mechanism, diluted drug solution supply mechanism, liquid treatment device, and operation method thereof
CN105675444A (en) * 2014-11-21 2016-06-15 中石化胜利石油工程有限公司钻井工艺研究院 Three-tube hybrid-type plastic fluid funnel viscosity on-line measuring device and method

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1928720A (en) * 2005-09-06 2007-03-14 东京应化工业株式会社 Photoresist liquid feeding device and modified set using same
CN101930222A (en) * 2010-08-20 2010-12-29 陈炎 On-line glue viscosity control system
CN202450385U (en) * 2011-12-30 2012-09-26 厦门文仪电脑材料有限公司 System for controlling viscosity of glue solutions of thermosensitive printing paper automatically
WO2015064657A1 (en) * 2013-10-30 2015-05-07 東京エレクトロン株式会社 Flow adjustment mechanism, diluted drug solution supply mechanism, liquid treatment device, and operation method thereof
CN204129434U (en) * 2014-08-27 2015-01-28 上海华力微电子有限公司 Photoresist feeding mechanism and system
CN105675444A (en) * 2014-11-21 2016-06-15 中石化胜利石油工程有限公司钻井工艺研究院 Three-tube hybrid-type plastic fluid funnel viscosity on-line measuring device and method

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