CN203959838U - 一种去除三氯化硼中氯气杂质的反应装置 - Google Patents
一种去除三氯化硼中氯气杂质的反应装置 Download PDFInfo
- Publication number
- CN203959838U CN203959838U CN201420412691.1U CN201420412691U CN203959838U CN 203959838 U CN203959838 U CN 203959838U CN 201420412691 U CN201420412691 U CN 201420412691U CN 203959838 U CN203959838 U CN 203959838U
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- China
- Prior art keywords
- reactor tube
- main reactor
- base plate
- boron trichloride
- reaction unit
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 title claims abstract description 18
- 238000006243 chemical reaction Methods 0.000 title claims abstract description 17
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 title claims abstract description 15
- 229910052801 chlorine Inorganic materials 0.000 title claims abstract description 15
- 239000000460 chlorine Substances 0.000 title claims abstract description 15
- 239000012535 impurity Substances 0.000 title claims abstract description 12
- 238000005245 sintering Methods 0.000 claims abstract description 4
- 239000002994 raw material Substances 0.000 abstract description 3
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 239000000126 substance Substances 0.000 abstract description 2
- 229910052580 B4C Inorganic materials 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
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- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
Abstract
Description
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Priority Applications (1)
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CN201420412691.1U CN203959838U (zh) | 2014-07-25 | 2014-07-25 | 一种去除三氯化硼中氯气杂质的反应装置 |
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CN201420412691.1U CN203959838U (zh) | 2014-07-25 | 2014-07-25 | 一种去除三氯化硼中氯气杂质的反应装置 |
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CN203959838U true CN203959838U (zh) | 2014-11-26 |
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CN201420412691.1U Expired - Lifetime CN203959838U (zh) | 2014-07-25 | 2014-07-25 | 一种去除三氯化硼中氯气杂质的反应装置 |
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CN (1) | CN203959838U (zh) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106957061A (zh) * | 2017-05-25 | 2017-07-18 | 江西瑞合精细化工有限公司 | 一种低光气含量的三氯化硼生产装置及方法 |
CN108892147A (zh) * | 2018-09-05 | 2018-11-27 | 欧中电子材料(重庆)有限公司 | 一种用于纯化介质中分离碳酰氯的分离方法及装置 |
CN109195909A (zh) * | 2016-06-23 | 2019-01-11 | 昭和电工株式会社 | 三氯化硼的制造方法 |
CN112108097A (zh) * | 2020-09-10 | 2020-12-22 | 军事科学院系统工程研究院军需工程技术研究所 | 一种新型管式增粘设备 |
-
2014
- 2014-07-25 CN CN201420412691.1U patent/CN203959838U/zh not_active Expired - Lifetime
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109195909A (zh) * | 2016-06-23 | 2019-01-11 | 昭和电工株式会社 | 三氯化硼的制造方法 |
CN109195909B (zh) * | 2016-06-23 | 2022-08-16 | 昭和电工株式会社 | 三氯化硼的制造方法 |
CN106957061A (zh) * | 2017-05-25 | 2017-07-18 | 江西瑞合精细化工有限公司 | 一种低光气含量的三氯化硼生产装置及方法 |
CN108892147A (zh) * | 2018-09-05 | 2018-11-27 | 欧中电子材料(重庆)有限公司 | 一种用于纯化介质中分离碳酰氯的分离方法及装置 |
CN108892147B (zh) * | 2018-09-05 | 2023-09-05 | 欧中电子材料(重庆)有限公司 | 一种用于纯化介质中分离碳酰氯的分离方法及装置 |
CN112108097A (zh) * | 2020-09-10 | 2020-12-22 | 军事科学院系统工程研究院军需工程技术研究所 | 一种新型管式增粘设备 |
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Date | Code | Title | Description |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
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TR01 | Transfer of patent right |
Effective date of registration: 20180518 Address after: 116092 2-4-1, 8 Garden Street, Ganjingzi District, Dalian, Liaoning. Co-patentee after: Zhao Chao Patentee after: Zhao Yi Co-patentee after: Ji Yanqiu Co-patentee after: Wang Tianyuan Address before: 116600 Liaoning Dalian bonded area storage processing area IE-33 Patentee before: DALIAN FREE TRADE ZONE CREDIT CHEMICAL SCIENCE AND TECHNOLOGY DEVELOPMENT CO.,LTD. |
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EE01 | Entry into force of recordation of patent licensing contract | ||
EE01 | Entry into force of recordation of patent licensing contract |
Assignee: Quanjiao kelide Electronic Materials Co.,Ltd. Assignor: Zhao Yi|Zhao Chao|Ji Yanqiu|Wang Tianyuan Contract record no.: X2020340000006 Denomination of utility model: A reaction device for removing chlorine impurities in boron trichloride Granted publication date: 20141126 License type: Exclusive License Record date: 20200806 |
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EC01 | Cancellation of recordation of patent licensing contract | ||
EC01 | Cancellation of recordation of patent licensing contract |
Assignee: Quanjiao kelide Electronic Materials Co.,Ltd. Assignor: Zhao Yi|Zhao Chao|Ji Yanqiu|Wang Tianyuan Contract record no.: X2020340000006 Date of cancellation: 20230419 |
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Effective date of registration: 20230531 Address after: No. 1-1, Haike Road, Dalian Free Trade Zone, Liaoning 116600 Patentee after: Dalian Kelide Semiconductor Materials Co.,Ltd. Address before: 116092 2-4-1, 8 Garden Street, Ganjingzi District, Dalian, Liaoning. Patentee before: Zhao Yi Patentee before: Zhao Chao Patentee before: Ji Yanqiu Patentee before: Wang Tianyuan |
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Granted publication date: 20141126 |