CN203910286U - Transparent conductive film and electronic device comprising the same - Google Patents

Transparent conductive film and electronic device comprising the same Download PDF

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Publication number
CN203910286U
CN203910286U CN201420083564.1U CN201420083564U CN203910286U CN 203910286 U CN203910286 U CN 203910286U CN 201420083564 U CN201420083564 U CN 201420083564U CN 203910286 U CN203910286 U CN 203910286U
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China
Prior art keywords
grid
conductive
transparent substrates
nesa coating
contact conductor
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CN201420083564.1U
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Chinese (zh)
Inventor
高育龙
方运
张晟
程传新
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Nanchang OFilm Tech Co Ltd
Suzhou OFilm Tech Co Ltd
OFilm Group Co Ltd
Original Assignee
Nanchang OFilm Tech Co Ltd
Suzhou OFilm Tech Co Ltd
Shenzhen OFilm Tech Co Ltd
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Priority to CN201420083564.1U priority Critical patent/CN203910286U/en
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Publication of CN203910286U publication Critical patent/CN203910286U/en
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Abstract

The utility model relates to a transparent conductive film. The transparent conductive film comprises a transparent substrate and a conductive layer arranged thereon. The conductive layer includes at least one transparent electrode. The transparent electrode is an irregular conductive grid formed by conductive material. The width of mesh lines of the conductive grid is not greater than 2.5 micrometers. The transparent electrode of the transparent conductive film is designed to be shaped like the irregular conductive grid formed by the conductive material, so that when the transparent conductive film is attached to a display device, the irregular conductive grid is prevented from superposing a periodical regular grid pattern, with a black matrix, on a color filter, thereby reducing strips that greatly differ in brightness and improving imaging effects. Moreover, the width of mesh lines of the conductive grid is not greater than 2.5 micrometers, therefore, visibility of the mesh lines of the conductive grid is substantially reduced when the transparent conductive film is applied to a high definition display device, and thus visual effects are improved and the imaging quality is increased. Furthermore, the utility model relates to an electronic device comprising the transparent conductive film.

Description

Nesa coating and the electronic installation that contains this nesa coating
Technical field
The utility model relates to touch display part field, the electronic installation that especially relates to a kind of nesa coating and contain this nesa coating.
Background technology
Nesa coating is a kind ofly to have satisfactory electrical conductivity and have the film of high transmission rate at visible light wave range, has been widely used in the fields such as flat panel display, photovoltaic device, contact panel and electromagnetic shielding.In the practical application of the electronic products such as touch-screen, nesa coating often needs to carry out graphically through multiple working procedures such as exposure, video picture, etching and cleanings, forms fixing conductive region and insulating regions according to graphic designs at substrate surface; Or form metal grill in the preparation of the appointed area of base material, can save so patterned technical process, there is the plurality of advantages such as low pollution, low cost.But conventionally adopt the good metal of conductivity to make for the grid line of nesa coating metal grill, light tight, therefore while only having grid line width below the resolution of human eye, visually just reach transparent effect.But in high-definition display screen, because wire netting live width is too wide, cause grid line visible, affect visual effect; The pel array cycle of regular grid and display screen repeats simultaneously, and can produce and there is the obviously striped of bright dark difference, thus impact effect.
Utility model content
Based on this, be necessary to provide a kind of electronic installation that there is the nesa coating of good display effect and contain this nesa coating.
A kind of nesa coating, comprise transparent substrates and be located at the conductive layer in described transparent substrates, described conductive layer comprises at least one transparency electrode, and described transparency electrode is configured to irregular the first conductive grid by electric conducting material, and the grid live width of described conductive grid is not more than 2.5 μ m.
In an embodiment, the grid aperture of described conductive grid is not more than 500 μ m therein.
Therein in an embodiment, the grid line of described conductive grid is evenly distributed in the plane parallel with described transparent substrates, the angle that the grid straight line Duan Yuyi at the tangent line of the grid line sending from the node of any grid or this node place is parallel to the straight line of described transparent substrates is α, described α value corresponding to each node that refers to each random grid of statistics that be uniformly distributed, according to the step pitch of 5 °, the probability that statistics drops on grid line in each angular interval is p i, 36 angular interval in 0~180 ° obtain p thus 1, p 2, p 3to p 36, p imeet standard deviation and be less than 20% of arithmetic equal value, wherein, the natural number that i is 1~36.
Therein in an embodiment, described conductive grid is by one or several constitute being selected from the middle of straightway, curved section, broken line.
In an embodiment, described conductive grid is located at a side surface of described transparent substrates therein; Or a side of described transparent substrates offers grid electrode groove, described conductive grid is filled in described electrode groove.
In an embodiment, the depth-to-width ratio of described electrode groove is between 0.5~2.0 therein.
In an embodiment, in described electrode groove, be provided with darkening layer therein, described darkening layer is coated described conductive grid.
In an embodiment, described nesa coating also comprises the contact conductor being electrically connected with each described transparency electrode therein, and described contact conductor is located at the edge of described conductive layer, and described in each, transparency electrode correspondence is provided with a described contact conductor.
In an embodiment, described each contact conductor is that many conductive lines that formed by electric conducting material form therein, and the contact conductor insulation between different described transparency electrodes arranges.
In an embodiment, described in each, between many conductive lines of transparency electrode, be provided with the overlap joint wire of described conductive line electrical connection therein.
In an embodiment, described each contact conductor is to configure by electric conducting material the second conductive grid forming therein, and the contact conductor insulation between different described transparency electrodes arranges.
In an embodiment, the live width of described contact conductor is not less than the live width of the first conductive grid of described transparency electrode therein.
In an embodiment, described contact conductor is located at the surface of described transparent substrates or embeds in described transparent substrates therein.
A kind of nesa coating, comprise transparent substrates and be located at the conductive layer in described transparent substrates, described conductive layer comprises at least one transparency electrode, and described transparency electrode is configured to irregular the first conductive grid by electric conducting material, and the grid live width w of described conductive grid meets w≤x min, described x minthe minimum feature of concealed wire bar under the bright background that can tell for human eye, x min=(π/180) * θ * d, wherein, θ is the angle of minimum resolution of human eye to the concealed wire bar under bright background, d is the distance between human eye and described nesa coating.
A kind of electronic installation, comprises the nesa coating described in above-mentioned arbitrary embodiment.
Above-mentioned nesa coating is by the irregular conductive grid shape that transparency electrode is designed to be formed by electric conducting material, in the time fitting with display device, can avoid with colored filter on the periodic regular grid pattern of black matrix" superimposed, there is the obviously striped of bright dark difference thereby can subdue, improve imaging effect.And the grid live width of this conductive grid is not more than 2.5 μ m, make, in the time being applied to high-clear display part (as PPI>330), can significantly reducing the visibility of the grid line of conductive grid, thereby improve visual effect, improve image quality.
Brief description of the drawings
Fig. 1 is the vertical view of the nesa coating of an execution mode;
Fig. 2 is the cutaway view of nesa coating in Fig. 1;
Fig. 3 is the structural representation of the first conductive grid in Fig. 1;
Fig. 4 is the structural representation of the first conductive grid in other execution modes;
Fig. 5 is the connection diagram of contact conductor and first conductive grid of the second conductive grid in other execution modes;
Fig. 6 a to Fig. 6 f is the structural representation of the contact conductor of the second conductive grid in other execution modes;
Fig. 7 to Figure 10 is transparency electrode and the position view of contact conductor in transparent substrates in other execution modes;
Figure 11 a to Figure 11 e is the cutaway view of electrode groove in other execution modes;
Figure 12 to Figure 14 is the connection diagram of adhesion layer in the electrode groove of other execution modes, conductive grid and darkening layer.
Embodiment
For the ease of understanding the utility model, below with reference to relevant drawings, the utility model is described more fully.In accompanying drawing, provide preferred embodiment of the present utility model.But the utility model can be realized in many different forms, be not limited to embodiment described herein.On the contrary, providing the object of these embodiment is to make to the understanding of disclosure of the present utility model more thoroughly comprehensively.
It should be noted that, when element is called as " being fixed on " another element, it can be directly on another element or also can have an element placed in the middle.When an element is considered to " connection " another element, it can be directly connected to another element or may have centering elements simultaneously.
Unless otherwise defined, all technology that use are herein identical with the implication that belongs to the common understanding of those skilled in the art of the present utility model with scientific terminology.The term using in specification of the present utility model herein, just in order to describe the object of specific embodiment, is not intended to be restriction the utility model.Term as used herein " and/or " comprise one or more relevant Listed Items arbitrarily with all combinations.
Incorporated by reference to Fig. 1 and Fig. 2, the nesa coating 10 of an execution mode comprises transparent substrates 100, conductive layer 200 and contact conductor 300.Conductive layer 200 is located at a side surface of transparent substrates 100.Contact conductor 300 is located on the surface that is provided with conductive layer 200 of transparent substrates 100 and is electrically connected with conductive layer 200.
The rectangular shape of the transparent substrates 100 of present embodiment for adopting glass to make, has the first surface and the second surface (not indicating in figure) that are oppositely arranged.First surface comprises visible range and invisible range (in figure, not indicating).Visible range is located at the middle part of transparent substrates 100, and invisible range is around the periphery setting of visible range.Can understand, in other embodiments, the shape of transparent substrates 100 is not limited to this; And the transparency carrier that transparent substrates 100 can also adopt the transparent materials such as Polyethyleneglycol Terephthalate (PET), polymethyl methacrylate (PMMA), Merlon (PC) plastics, quartz to make, or the composite substrate that adopts transparency carrier and the transparent polymeric layer that is located at transparency carrier surface to form, wherein, the material of transparent polymeric layer can be solidified for UV the curable transparent polymers such as glue or hot-setting adhesive.
Conductive layer 200 is located in the visible range of first surface of transparent substrates 100.The conductive layer 200 of present embodiment comprises multiple transparency electrodes 210.Multiple transparency electrodes 210 be arranged in parallel and mutually insulated, form electrod-array.Can understand, in other embodiments, the quantity of transparency electrode 210 also can be one.
Refer to Fig. 3, first conductive grid 212 of the transparency electrode 210 of present embodiment for adopting electric conducting material to make.In the present embodiment, the grid live width w(of the first conductive grid 212 is the live width of straightway) need meet w≤x min, x minthe minimum feature of concealed wire bar under the bright background that can tell for human eye, x min=(π/180) * θ * d, wherein, θ is the angle of minimum resolution of human eye to the concealed wire bar under bright background, d is the distance between human eye and nesa coating 10.In general, d gets 0.2m for better, θ=2.6arc second(second of arc), according to above-mentioned formula, can calculate the minimum feature x of concealed wire bar under the bright background that human eye can tell min=2.5 μ m.Therefore,, for the first conductive grid 212 in nesa coating 10 is not detected by human eye, the grid live width w of the first conductive grid 212 is set to be not more than 2.5 μ m, thereby can ensure the first conductive grid 212 transparency visually.
The first conductive grid 212 is irregular grid shape.The grid cell of the first conductive grid 212 of present embodiment is the polygonal shape that adopts straightway to form.In all angles of this first conductive grid 212 in the plane that is parallel to transparent substrates 100, be evenly distributed.Described being evenly distributed refers to: taking the straight line that is parallel to transparent substrates 100 as datum line, the angle of any grid line and this straight line is α, this angle α is evenly distributed, add up each grid line in the first conductive grid 212, then according to the step pitch of 5 °, statistics drops on the Probability p of the grid line in each angular interval i, 36 angular interval in 0~180 ° obtain p thus 1, p 2to p 36, p imeet standard deviation and be less than 20% of arithmetic equal value, wherein, i is the natural number between 1~36.There is this equally distributed the first conductive grid 212, when the pel array of irregular grid pattern and regular display screen is superimposed, can subdues and there is the obviously striped of bright dark difference, thereby improve image quality.
Further, in the present embodiment, the grid aperture of the first conductive grid 212 (being the maximum of any distance between two points on grid cell edge) is not more than 500 μ m.The grid aperture of the first conductive grid 212 is larger, and aperture opening ratio is higher, and the light transmittance of nesa coating 10 is higher, but correspondingly, because the distribution density of electric conducting material on nesa coating 10 reduces, can make the sheet resistivity of nesa coating 10 raise, electric conductivity reduces.And, the grid line adopting due to the first conductive grid of present embodiment is the narrow linewidth that is not more than 2.5 μ m, so the conductive capability of the independent grid line grid line wider than the thick line that is greater than 2.5 μ m is poor, so in order to ensure that nesa coating light transmittance and electric conductivity all can meet the demands simultaneously, select the grid aperture of the first conductive grid 212 to be not more than 500 μ m.The sheet resistivity of nesa coating 10 is lower, less current signal just more easily detected, and power consumption also reduces simultaneously.So, further, in order to improve the sensitivity of nesa coating and to reduce power consumption, the grid aperture of the first conductive grid 212 can be designed to be not more than 450 μ m, 400 μ m, 350 μ m or 300 μ m etc.
Can understand, in other embodiments, the shape of the first conductive grid 212 also can be by straightway, curved section, the irregular grid shape constituting of one or more in the middle of broken line, curved section, the common irregular grid shape forming of broken line and straightway or jointly formed by irregular grid unit and regular grid unit be on the whole the latticed etc. of irregular distribution, as shown in Figure 4, the grid line that only need meet conductive grid 212 is evenly distributed in the plane parallel with transparent substrates 100, the grid straight line section at the tangent line of the grid line sending from the node of any grid cell or this node place is α with the angle of a straight line that is parallel to transparent substrates 10, be uniformly distributed α value corresponding to each node that refers to each random grid of statistics, according to the step pitch of 5 °, the probability that statistics drops on grid line in each angular interval is p i, 36 angular interval in 0~180 ° obtain p thus 1, p 2, p 3to p 36, p imeet standard deviation and be less than 20% of arithmetic equal value, wherein, the natural number that i is 1-36.
In addition, in other embodiments, equally distributed set-up mode recited above also can adopt other angle step pitches, as 2 ° of step pitches, 6 ° of step pitches etc., correspondingly, the number of angular interval is 360 °/step pitch, and i is the natural number between 1~360 °/step pitch.
Refer to Fig. 1 and Fig. 2, the corresponding each transparency electrode 210 of contact conductor 300 arranges, and draws from the edge of transparency electrode 210, is located at the invisible range of transparent substrates 100 first surfaces.Contact conductor 300 is electrically connected with transparency electrode 210.Between the contact conductor 300 of corresponding different transparency electrodes 210, insulation arranges.The contact conductor 300 of present embodiment is conductive line.Each transparency electrode 210 correspondences are provided with a contact conductor 300, and each contact conductor 300 comprises at least one conductive line being formed by electric conducting material, and specifically in the present embodiment, each contact conductor 300 comprises two conductive lines.Conductive line is served as reasons and is selected from any one or a few constitute in the middle of straightway, curved section, broken line.Further, in the present embodiment, between two contact conductors 300 of corresponding each transparency electrode 210, be provided with at least one overlap joint wire 310.Overlap joint wire 310 is served as reasons and is selected from any one or a few constitute in the middle of straightway, curved section, broken line.Overlap joint wire 310 is set can be played and increase the go between effect of 300 conductivity of density, the intensifier electrode of the conductive node in contact conductor 300, and can reduce the risk of the electric conductivity decline being caused by the conductive line disconnection of contact conductor 300, thereby can significantly improve the yield of product.And, because overlap joint wire 310 has improved the conductive node density of contact conductor, therefore can, ensureing, on the basis that contact conductor electric conductivity meets the demands, suitably to reduce the invisible range width of transparent substrates 100 first surfaces, beautify the product appearance that touch-control shows.
As shown in Figure 5, in other embodiments, contact conductor 300 can also be the second conductive grid being formed by electric conducting material.The corresponding each transparency electrode 210 of the second conductive grid of this contact conductor 300 is arranged on the invisible range of the first surface of transparent substrates 100.Contact conductor 300 is designed to latticed, can significantly improve the conductivity of whole contact conductor 300, ensures good being electrically connected between transparency electrode 210 and other circuit elements.
As shown in Fig. 6 a-6f, in the execution mode of the second conductive grid of contact conductor 300, the grid pattern of the second conductive grid can be regular grid pattern, as the grid pattern of the rules such as square, rhombus, rectangle, parallelogram, triangle, pentagon or hexagon; Also can be irregular random grid figure, wherein, irregular random grid figure can be served as reasons and is selected from one or several the irregular polygon constituting in the middle of straightway, curved section, broken line; Or can be also regular grid pattern and mixing of irregular random grid figure etc.In the time that contact conductor 300 is the second conductive grid, the aperture opening ratio of the second conductive grid is not more than the aperture opening ratio of visible range the first conductive grid 212.The aperture opening ratio of grid is defined as the inverse of the shared area of electric conducting material on per unit area, the i.e. inverse of the duty ratio of electric conducting material in latticed figure.Aperture opening ratio is less, and the content of electric conducting material in latticed figure is higher, distributes closeer, and the sheet resistivity of conductive grid is lower, and conductivity is better, but light transmittance also can reduce simultaneously.Because transparency electrode 210 is positioned at the visible range of transparent substrates 100 first surfaces, need to be in meeting electric conductivity, ensure that the first conductive grid 212 has higher light transmittance, in appearance highly transparent as far as possible; And contact conductor 300 is positioned at invisible range, to not requirement of light transmittance, but need the electric current that carrying is larger, thereby electric conductivity that need to be higher, therefore the aperture opening ratio of the second conductive grid is configured to be not more than the aperture opening ratio of visible range the first conductive grid 212, can meets the requirement of nesa coating 10 aspect electric conductivity and light transmittance two simultaneously.
Transparency electrode 210 and the contact conductor 300 of present embodiment are all located on the first surface of transparent substrates 100.As shown in Fig. 7-Figure 10, in other embodiments, a side of transparent substrates 100 (as first surface or second surface) can offer at least one electrode groove 110 or lead-in wire groove 120 of accommodating transparency electrode 210 and contact conductor 300.Wherein electrode groove 110 is configured to the structure of irregular grid shape according to the flat shape of transparency electrode 210, and lead-in wire groove 120 is configured to linear or latticed structure according to the flat shape of contact conductor 300.The depth-to-width ratio (the width ratios of the degree of depth and electrode groove 110 cross sections) of electrode groove 110 or lead-in wire groove 120 is controlled between 0.5~2, as can be 0.5,0.8,1,1.2,1.5 or 2 etc., be preferably 0.8, in the time of filled conductive material in electrode groove 110 or lead-in wire groove 120, can obtain good filling effect.In other embodiment, the lead-in wire groove 120 of linear also comprises the groove part for accommodating overlap joint wire 310 according to the flat shape configuration of overlap joint wire 310.
As shown in Figure 7, the first conductive grid 212 of transparency electrode 210 is filled in electrode groove 110.Contact conductor 300 is for being convexly equipped with the second conductive grid at the first surface of transparent substrates 100.Electrode groove 110 is irregular grid shape structure, and transparency electrode 210 is by being filled in electric conducting material interior formation first conductive grid 212 of electrode groove 110 of irregular grid shape.The first surface that contact conductor 300 is layed in transparent substrates 100 by the method such as inkjet printing or silk screen printing by electric conducting material forms the second conductive grid.
As shown in Figure 8, transparency electrode 210 is filled in electrode groove 110.Contact conductor 300 is for being convexly equipped with the conductive line at the first surface of transparent substrates 100.Electrode groove 110 is irregular grid shape structure, and transparency electrode 210 is by being filled in electric conducting material irregular first conductive grid 212 of the interior formation of electrode groove 110 of irregular grid shape.The first surface that contact conductor 300 is layed in transparent substrates 100 by the method such as inkjet printing or silk screen printing by electric conducting material forms conductive line.In other embodiment, the overlap joint wire 310 arranging on the conductive line of contact conductor 300 also forms for the first surface that electric conducting material is layed in to transparent substrates 100 by the method such as inkjet printing or silk screen printing, and connects adjacent conductive lines.
As shown in Figure 9, transparency electrode 210 is filled in electrode groove 110.Contact conductor 300 is for being filled in the conductive line in lead-in wire groove 120.Electrode groove 110 is irregular grid shape structure, the groove that lead-in wire groove 120 is linear, form with the integrated impression of electrode groove 110, by electric conducting material is filled in the electrode groove 110 of irregular grid shape and the lead-in wire groove 120 of linear simultaneously, be integrally formed the first conductive grid 212 of transparency electrode 210 and the conductive line of contact conductor 300.In other embodiment, in lead-in wire groove 300, also comprise the groove part for accommodating overlap joint wire 310, in process electric conducting material being filled in lead-in wire groove 120, form overlap joint wire 310 simultaneously.In other embodiment, in lead-in wire groove 300, also comprise the groove part for accommodating overlap joint wire 310, in process electric conducting material being filled in lead-in wire groove 120, form overlap joint wire 310 simultaneously.In a further embodiment, the first surface that overlap joint wire 310 also can be layed in transparent substrates 100 by electric conducting material by the method such as inkjet printing or silk screen printing forms, and connects adjacent conductive lines.
As shown in figure 10, transparency electrode 210 is filled in electrode groove 110.Contact conductor 300 is filled in lead-in wire groove 120.Electrode groove 110 is irregular grid shape structure, and transparency electrode 210 is by being filled in electric conducting material interior formation first conductive grid 212 of electrode groove 110 of irregular grid shape.Lead-in wire groove 120 is fenestral fabric, and contact conductor 300 is by being filled in electric conducting material interior formation the second conductive grid of latticed lead-in wire groove 120.
In conjunction with present embodiment and other execution modes, the transparency electrode 210 of nesa coating 10 can be convexly equipped with at the first surface of transparent substrates 100 or be filled in the electrode groove 110 of transparent substrates 100, and contact conductor 300 and overlap joint wire 310 thereof can be convexly equipped with at the first surface of transparent substrates 100 or be filled in the lead-in wire groove 120 of transparent substrates, and transparency electrode 210 and the set-up mode of contact conductor 300 in transparent substrates 100 can be by above-mentioned several mode combination in any.
In one embodiment, the grid pattern of the first conductive grid 212 of composition transparency electrode 210 is the irregular polygon that curved section or broken line surround.When the first conductive grid 212 of transparency electrode 210 is filled in the electrode groove 110 of transparent substrates 100 when interior for electric conducting material, the filling effect of the electrode groove 110 of curve shape or broken line shape is better.Even if the grid live width at the first conductive grid 212 is very narrow, be only below 2.5 μ m, also can ensure that electric conducting material is filled in electrode groove 110 uniformly, prevent that electric conducting material filling is bad, strengthen the electric conductivity of transparency electrode, reduce sheet resistivity, improve product yield.
In the time offering electrode groove 110 or lead-in wire groove 120 in transparent substrates 100, preferably, electrode groove 110 is nonplanar structure with the bottom land of lead-in wire groove 120, and as shown in Figure 11 a to Figure 11 e, the cross section of the nonplanar structure of bottom land can be the shapes such as " V " shape, " W " shape, waveform.The groove bottom land of nonplanar structure can increase the contact area of electric conducting material and groove inwall, thereby increases the adhesive force of electric conducting material, strengthens the performance of electric conducting material Anti-scratching, improve the reliability of product structure, improve conductivity, reduce sheet resistivity, improve the yield of product.
Further, as shown in Figure 12 to Figure 14, being provided with in the execution mode of electrode groove 110, electrode groove 110 bottom lands are provided with adhesion layer 112.The first conductive grid 212 sticks to the bottom land of electrode groove 110 by this adhesion layer 112.Be provided with lead-in wire groove 120 execution mode in, lead-in wire groove 120 bottom land adhesion layer can be set equally, lead-in wire electrode 300 by this adhesion layer stick to lead-in wire groove 120 bottom land.Adhesion layer can increase the adhesive force of electric conducting material, strengthens the performance of electric conducting material Anti-scratching, improves the reliability of product structure, strengthens electrically, reduces sheet resistivity, improves yield.
Electric conducting material recited above can be metal or metal alloy material, as Cu, Ag, Al, Ni, Cr or its alloy etc., also can be non-metallic conducting material, as carbon, Graphene, carbon nano-tube or high molecular polymer electric conducting material etc., or be the alloy material of metal and non-metallic conducting material, as Ag-C alloy or Ni-P alloy etc.
In addition, as shown in Figure 12 to Figure 14, offer in the execution mode of electrode groove 110 when electric conducting material adopts in metal or metal alloy compositions and transparent substrates 110, on the first conductive grid 212, be further provided with darkening layer 114.Darkening layer 114 is at least arranged at a side surface or upper and lower two surfaces of the first conductive grid 212 Environment Oriented light and contacts with adhesion layer 112, or darkening layer 114 is directly set to same layer with adhesion layer 112.The material of darkening layer 114 can comprise at least one in the materials such as carbon black, metal oxide, metal sulfide, titanium, tungsten, nickel or chromium.Darkening layer 114 can suppress the reflection of surround lighting at the electric conducting material of metal or metal alloy material, thereby reduce the light reflection occurring because of electric conducting material surface and cause the probability that the first conductive grid 212 is observed in appearance, further improve the transparency of nesa coating 10.
Above-mentioned nesa coating 10 can be widely used in electronic installations such as touching demonstration, by the irregular conductive grid shape that transparency electrode 210 is designed to be formed by electric conducting material, while being to fit with display device, can avoid with colored filter on the periodic regular grid pattern of black matrix" superimposed, there is the obviously striped of bright dark difference thereby can subdue, improve imaging effect.And the grid live width of the first conductive grid 212 is not more than 2.5 μ m, make in the time being applied to high-clear display part (as PPI>330), can significantly reduce the visibility of the grid line of conductive grid, thereby improve visual effect, improve image quality.
The above embodiment has only expressed several execution mode of the present utility model, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection range of the present utility model.Therefore, the protection range of the utility model patent should be as the criterion with claims.

Claims (15)

1. a nesa coating, comprise transparent substrates and be located at the conductive layer in described transparent substrates, described conductive layer comprises at least one transparency electrode, and described transparency electrode is configured to irregular the first conductive grid by electric conducting material, and the grid live width of described conductive grid is not more than 2.5 μ m.
2. nesa coating as claimed in claim 1, is characterized in that, the grid aperture of described conductive grid is not more than 500 μ m.
3. nesa coating as claimed in claim 1 or 2, it is characterized in that, the grid line of described conductive grid is evenly distributed in the plane parallel with described transparent substrates, the angle that the grid straight line Duan Yuyi at the tangent line of the grid line sending from the node of any grid or this node place is parallel to the straight line of described transparent substrates is α, described α value corresponding to each node that refers to each random grid of statistics that be uniformly distributed, according to the step pitch of 5 °, the probability that statistics drops on grid line in each angular interval is p i, 36 angular interval in 0~180 ° obtain p thus 1, p 2, p 3to p 36, p imeet standard deviation and be less than 20% of arithmetic equal value, wherein, the natural number that i is 1~36.
4. nesa coating as claimed in claim 1 or 2, is characterized in that, described conductive grid is by one or several constitute being selected from the middle of straightway, curved section, broken line.
5. nesa coating as claimed in claim 1, is characterized in that, described conductive grid is located at a side surface of described transparent substrates; Or a side of described transparent substrates offers grid electrode groove, described conductive grid is filled in described electrode groove.
6. nesa coating as claimed in claim 5, is characterized in that, the depth-to-width ratio of described electrode groove is between 0.5~2.0.
7. nesa coating as claimed in claim 5, is characterized in that, in described electrode groove, is provided with darkening layer, and described darkening layer is coated described conductive grid.
8. nesa coating as claimed in claim 1, is characterized in that, also comprises the contact conductor being electrically connected with each described transparency electrode, and described contact conductor is located at the edge of described conductive layer, and described in each, transparency electrode correspondence is provided with a described contact conductor.
9. nesa coating as claimed in claim 8, is characterized in that, described each contact conductor is that many conductive lines that formed by electric conducting material form, and the contact conductor insulation between different described transparency electrodes arranges.
10. nesa coating as claimed in claim 9, is characterized in that, is provided with the overlap joint wire of described conductive line electrical connection described in each between many conductive lines of transparency electrode.
11. nesa coatings as claimed in claim 8, is characterized in that, described each contact conductor is to configure by electric conducting material the second conductive grid forming, and the contact conductor insulation between different described transparency electrodes arranges.
12. nesa coatings as claimed in claim 8, is characterized in that, the live width of described contact conductor is not less than the live width of the first conductive grid of described transparency electrode.
13. nesa coatings as claimed in claim 8, is characterized in that, described contact conductor is located at the surface of described transparent substrates or embeds in described transparent substrates.
14. 1 kinds of nesa coatings, comprise transparent substrates and be located at the conductive layer in described transparent substrates, described conductive layer comprises at least one transparency electrode, and described transparency electrode is configured to irregular the first conductive grid by electric conducting material, and the grid live width w of described conductive grid meets w≤x min, described x minthe minimum feature of concealed wire bar under the bright background that can tell for human eye, x min=(π/180) * θ * d, wherein, θ is the angle of minimum resolution of human eye to the concealed wire bar under bright background, d is the distance between human eye and described nesa coating.
15. 1 kinds of electronic installations, is characterized in that, comprise the nesa coating as described in any one in claim 1~14.
CN201420083564.1U 2014-02-26 2014-02-26 Transparent conductive film and electronic device comprising the same Expired - Fee Related CN203910286U (en)

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CN103871547A (en) * 2014-02-26 2014-06-18 南昌欧菲光科技有限公司 Transparent conducting film and electronic device containing same
CN105807985A (en) * 2015-01-21 2016-07-27 三星显示有限公司 Touch panel and display apparatus having the same
CN107066129A (en) * 2015-09-15 2017-08-18 现代自动车株式会社 Touch input device and its manufacture method
CN107122086A (en) * 2017-03-28 2017-09-01 深圳欧菲光科技股份有限公司 The preparation method of contact panel, display device and contact panel
CN107808820A (en) * 2017-11-06 2018-03-16 信利光电股份有限公司 A kind of nesa coating, circuit and preparation method thereof
CN110126370A (en) * 2018-02-09 2019-08-16 昇印光电(昆山)股份有限公司 Conductive film

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103871547A (en) * 2014-02-26 2014-06-18 南昌欧菲光科技有限公司 Transparent conducting film and electronic device containing same
CN105807985A (en) * 2015-01-21 2016-07-27 三星显示有限公司 Touch panel and display apparatus having the same
CN105807985B (en) * 2015-01-21 2020-11-24 三星显示有限公司 Touch panel and display device having the same
CN107066129A (en) * 2015-09-15 2017-08-18 现代自动车株式会社 Touch input device and its manufacture method
CN107122086A (en) * 2017-03-28 2017-09-01 深圳欧菲光科技股份有限公司 The preparation method of contact panel, display device and contact panel
CN107808820A (en) * 2017-11-06 2018-03-16 信利光电股份有限公司 A kind of nesa coating, circuit and preparation method thereof
CN110126370A (en) * 2018-02-09 2019-08-16 昇印光电(昆山)股份有限公司 Conductive film

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