CN103474133A - Transparent electric conduction film - Google Patents

Transparent electric conduction film Download PDF

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Publication number
CN103474133A
CN103474133A CN2013104446604A CN201310444660A CN103474133A CN 103474133 A CN103474133 A CN 103474133A CN 2013104446604 A CN2013104446604 A CN 2013104446604A CN 201310444660 A CN201310444660 A CN 201310444660A CN 103474133 A CN103474133 A CN 103474133A
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CN
China
Prior art keywords
layer
nesa coating
electric conduction
grid line
grid
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Pending
Application number
CN2013104446604A
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Chinese (zh)
Inventor
王立新
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SUZHOU SHENGLI OPTICAL GLASS Co Ltd
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SUZHOU SHENGLI OPTICAL GLASS Co Ltd
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Application filed by SUZHOU SHENGLI OPTICAL GLASS Co Ltd filed Critical SUZHOU SHENGLI OPTICAL GLASS Co Ltd
Priority to CN2013104446604A priority Critical patent/CN103474133A/en
Publication of CN103474133A publication Critical patent/CN103474133A/en
Pending legal-status Critical Current

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Abstract

The invention discloses a transparent electric conduction film which comprises a base material. A plating bottom layer, a black layer, an electric conduction layer and a protective layer are sequentially arranged on the surface of the base material. Pattern etching is performed on the black layer, the electric conducting layer and the protection layer, and grid line patterns are formed. Grid lines are distributed in the first direction and in the second direction. Grid units formed between every two adjacent grid lines are transparent areas, and the transparent areas are in quadrangle shapes. The electric conduction layer is a metal grid, impedance is low, and the transparent electric conduction film is suitable for middle-screen touch screens and large-screen touch screens. In addition, the transparent electric conduction film has high transmittance and the high anti-interference capacity and reduces power consumption of equipment. Compared with an ITO electric conduction film in the prior art, the metal grid greatly reduces cost.

Description

A kind of nesa coating
Technical field
the present invention relates to the conductive layer technical field, particularly a kind of nesa coating of metal grill.
Background technology
nesa coating is widely used in the fields such as touch-screen, flat panel display, photovoltaic device, electromagnetic shielding, the special application rapid growth in the capacitive touch screen field.Touch-screen is the induction installation that can receive the input signals such as touch.Touch-screen has given information interaction brand-new looks, is extremely attractive brand-new information interaction equipment.The development of touch screen technology has caused common concern both domestic and external, has become the Chaoyang new high-tech industry that the photoelectricity industry is a dark horse.
nesa coating is as vital part in touch-screen, and at present, the conducting film of touch-screen is mainly with the ITO(tin indium oxide) by vacuum coating, graphical etched technique, be formed on insulating substrate.But the ITO material expensive, production cost is very high; And limited by coating temperature, ITO is plated on base material can not accomplish Low ESR, is unfavorable for making large-area touch-screen, the impedance height capacitive touch screen can reduce performance, even drive integrated circult can't drive its normal operation.
in addition, the light transmittance of the conducting film that ITO makes is not very high, usually only has the 80%-88% left and right, brightness, contrast and the color etc. that show have been had influence on like this, when light transmittance is low, just must heighten brightness if want to see clearly screen, the power consumption of equipment will inevitably increase, and to the stimulation of eyes, also can increase simultaneously.
Summary of the invention
the present invention seeks to: a kind of nesa coating is provided, with the clathrum of multi-layer compound structure, substitutes ITO, reduce impedance, Cost reduction, and there is good light transmittance (light transmittance can reach 88%-90%).
technical scheme of the present invention is:
a kind of nesa coating comprises base material and grid line layer.Base material comprises first surface and second surface, and first surface and second surface are oppositely arranged.The grid line layer is plated on second surface, and the grid cell formed between the grid line in the grid line layer is clear area, and the grid line layer comprises black layer, conductive layer and protective layer, and black layer forms in second surface, and it is metal oxide layer; Conductive layer is metal level; Protective layer is metal alloy layer, for preventing the conductive layer oxidation.
preferably, the grid line in described grid line layer is laid along first direction and second direction respectively, and first direction and second direction intersect, and clear area is quadrangle.
preferably, also be formed with bottom between described second surface and black layer, bottom is the SiO2 layer.
preferably, described black layer can replace described protective layer.
preferably, the metal in described conductive layer is copper.
preferably, the thickness of described conductive layer is 0.5-5um.
preferably, the mixture that the metal oxide in described black layer is chromium oxide, nickel oxide, the thickness of black layer is 40nm-100nm.
preferably, the metal alloy in described protective layer is corronil or stainless steel, and the thickness of protective layer is 20nm-500nm.
preferably, described base material is glass or overlay.
the light transmittance of conducting film in the present invention, impedance are relevant with live width and the line-spacing of grid line.The grid line distance is larger, and live width is less, and light transmittance is just higher; And the distance of grid line is less, live width is larger, and electric conductivity is just higher, and impedance is just lower.
described nesa coating, the method for utilizing vacuum sputtering coating or evaporation coating successively by each layer of plating on base material, form each coating, and then utilize etching method to make grid line.
advantage of the present invention is:
1. replace the ITO conducting film by metal grid lines, impedance obviously diminishes, and can stablize and be applicable to middle large-screen touch-screen; Compare the ITO conducting film and have higher light transmittance, in identical display brightness situation, the power consumption while using conducting film of the present invention is lower, also less to the stimulation of eyes; And the price of metal grill is significantly less than the ITO conducting film, reduced the cost of touch-screen.
. it is black that black layer utilizes optical interference to obtain surface, can reduce visible reverberation, makes grid line be difficult for being seen by naked eyes.
. after the second surface of base material sprays some ink logos, be not easy to carry out plated film, yet, after between second surface and black layer, adding the bottom of SiO2, more easily carry out plated film, make each layer can firmly be plated on the second surface of base material, difficult drop-off.
The accompanying drawing explanation
below in conjunction with drawings and Examples, the invention will be further described:
fig. 1 is the structural representation before etching of the present invention,
fig. 2 is structural representation of the present invention.
wherein: 1. base material, 2. bottom, 3. black layer, 4. conductive layer, 5. protective layer.
Embodiment
embodiment 1:
the embodiment of the present invention 1 provides a kind of nesa coating, as shown in Figure 1, the nesa coating the present invention relates to includes base material 1, bottom 2, black layer 3, conductive layer 4, protective layer 5 from bottom to up successively, base material 1 is glass or is overlay, it comprises first surface and the second surface be oppositely arranged, at the second surface of base material 1 at first with the method plating bottom 2 of vacuum sputtering coating or evaporation coating, bottom 2 is transparent SiO2 layer, can spray printing ink on second surface, form ink logo; Then plating black layer 3, conductive layer 4 and protective layer 5 successively on bottom 2, wherein, the mixture that black layer 3 is chromium oxide and nickel oxide, its thickness is 40nm-100nm, what utilize the method for optical interference can make that naked eyes see is black surface; Conductive layer 4 is metal level, is preferably copper, and its thickness is 0.5-5um; Protective layer 5 is metal alloy layer, is preferably corronil or stainless steel, and its thickness is 20nm-500nm, and protective layer 5 is used for preventing conductive layer 4 oxidations.After overlay film completes, then black layer 3, conductive layer 4 and protective layer 5 are carried out to etching, form grid line; grid line is divided into both direction, is divided into first direction and second direction, between grid line, intersects; it is clear area that gap between grid line forms grid cell, and grid cell is quadrangle.When the nesa coating in the present embodiment and display screen are used in conjunction with; display screen is in the outside of protective layer 5; naked eyes are observed towards second surface from first surface; on the printing opacity direction; the projection of conductive layer 4 and protective layer 5 all projects on black layer 3, and naked eyes will be can't see the waffle-like pattern of conductive layer 4 and protective layer 5.In the present embodiment, by the thickness setting of conductive layer 4, be 2um, the live width of metal grid lines is 4-5um, and line-spacing is 300-500um, and the numerical value of surface resistance now is 10 ohm of left and right, when base material 1 use be the thick simple glass of 1.1mm the time, light transmittance can reach 90% left and right.
embodiment 2:
the embodiment of the present invention 2 provides another kind of nesa coating, and the present embodiment is compared with embodiment 1, changes protective layer 5 into black layer 3, and black layer 3 also can play the function of anti-oxidation, and like this, naked eyes also can be observed from opposite side.
those skilled in the art will readily understand; the foregoing is only preferred embodiment of the present invention; not in order to limit the present invention, all any modifications of doing within the spirit and principles in the present invention, be equal to and replace and improvement etc., within all should being included in protection scope of the present invention.

Claims (9)

1. a nesa coating, is characterized in that, comprising:
Base material, comprise first surface and second surface, and first surface and second surface are oppositely arranged;
Described second surface plating has the grid line layer, and the grid cell formed between the grid line in the grid line layer is clear area, and the grid line layer comprises:
Black layer, form in second surface, and it is metal oxide layer,
Conductive layer, it is metal level,
Protective layer, it is metal alloy layer, prevents the conductive layer oxidation.
2. nesa coating according to claim 1, is characterized in that, the grid line in described grid line layer is laid along first direction and second direction respectively, and first direction and second direction intersect, and clear area is quadrangle.
3. nesa coating according to claim 1, is characterized in that, also is formed with bottom between described second surface and black layer, and bottom is SiO 2layer.
4. nesa coating according to claim 1, is characterized in that, described black layer can replace described protective layer.
5. nesa coating according to claim 1, is characterized in that, the metal in described conductive layer is copper.
6. nesa coating according to claim 1, is characterized in that, the thickness of described conductive layer is 0.5-5um.
7. according to the described nesa coating of claim 1 or 4, it is characterized in that, the mixture that the metal oxide in described black layer is chromium oxide, nickel oxide, the thickness of black layer is 40nm-100nm.
8. nesa coating according to claim 1, is characterized in that, the metal alloy in described protective layer is corronil or stainless steel, and the thickness of protective layer is 20nm-500nm.
9. nesa coating according to claim 1, is characterized in that, described base material is glass or overlay.
CN2013104446604A 2013-09-26 2013-09-26 Transparent electric conduction film Pending CN103474133A (en)

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103777835A (en) * 2014-02-11 2014-05-07 苏州胜利光学玻璃有限公司 Double-sided conductive transparent film
CN104049804A (en) * 2014-06-17 2014-09-17 福州智创触控技术有限公司 Touch screen network type electrode and manufacturing method thereof
CN106251945A (en) * 2016-08-01 2016-12-21 业成科技(成都)有限公司 Electrically conducting transparent film manufacturing method and structure thereof
WO2017097204A1 (en) * 2015-12-08 2017-06-15 金英花 Metal mesh single-film dual sided capacitive screen sensor and manufacturing method thereof
CN107731349A (en) * 2017-08-29 2018-02-23 苏州泛普科技股份有限公司 A kind of hollow out plain conductor and preparation method and application
CN108376588A (en) * 2018-03-19 2018-08-07 西北大学 A kind of nano silver wire and nickel oxide compound transparent electricity conductive film preparation method
CN108762569A (en) * 2018-05-31 2018-11-06 信利光电股份有限公司 A kind of touch-control sensor and touch-control display panel
CN109658828A (en) * 2018-11-27 2019-04-19 李成奎 Transparent flexible display screen and its transparent circuitry
CN113613480A (en) * 2021-07-23 2021-11-05 中国科学院上海光学精密机械研究所 Electromagnetic shielding optical window for eliminating F-P cavity effect

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JP2006140220A (en) * 2004-11-10 2006-06-01 Bridgestone Corp Low-reflectivity conductive film, electromagnetic wave shielding film, and electromagnetic wave shielding translucent window material
CN101615555A (en) * 2008-06-27 2009-12-30 佳能株式会社 Luminescent screen and image display
CN101675485A (en) * 2007-04-16 2010-03-17 日本写真印刷株式会社 Transparent thin board
KR20120100760A (en) * 2011-03-04 2012-09-12 주식회사 엘지화학 Conductive structure body and method for preparing the same
KR20120110065A (en) * 2011-03-28 2012-10-09 주식회사 엘지화학 Conductive structure, touch panel and method for manufacturing the same
CN103173226A (en) * 2011-12-26 2013-06-26 Mec股份有限公司 Wiring forming method and etching solution for wiring formation
CN203465963U (en) * 2013-09-26 2014-03-05 苏州胜利光学玻璃有限公司 Transparent conductive film

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Publication number Priority date Publication date Assignee Title
JP2006140220A (en) * 2004-11-10 2006-06-01 Bridgestone Corp Low-reflectivity conductive film, electromagnetic wave shielding film, and electromagnetic wave shielding translucent window material
CN101675485A (en) * 2007-04-16 2010-03-17 日本写真印刷株式会社 Transparent thin board
CN101615555A (en) * 2008-06-27 2009-12-30 佳能株式会社 Luminescent screen and image display
KR20120100760A (en) * 2011-03-04 2012-09-12 주식회사 엘지화학 Conductive structure body and method for preparing the same
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CN103173226A (en) * 2011-12-26 2013-06-26 Mec股份有限公司 Wiring forming method and etching solution for wiring formation
CN203465963U (en) * 2013-09-26 2014-03-05 苏州胜利光学玻璃有限公司 Transparent conductive film

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103777835A (en) * 2014-02-11 2014-05-07 苏州胜利光学玻璃有限公司 Double-sided conductive transparent film
CN104049804A (en) * 2014-06-17 2014-09-17 福州智创触控技术有限公司 Touch screen network type electrode and manufacturing method thereof
CN104049804B (en) * 2014-06-17 2017-08-25 福建科创光电有限公司 A kind of touch-screen grid type electrode and preparation method thereof
WO2017097204A1 (en) * 2015-12-08 2017-06-15 金英花 Metal mesh single-film dual sided capacitive screen sensor and manufacturing method thereof
CN106251945A (en) * 2016-08-01 2016-12-21 业成科技(成都)有限公司 Electrically conducting transparent film manufacturing method and structure thereof
CN107731349A (en) * 2017-08-29 2018-02-23 苏州泛普科技股份有限公司 A kind of hollow out plain conductor and preparation method and application
CN108376588A (en) * 2018-03-19 2018-08-07 西北大学 A kind of nano silver wire and nickel oxide compound transparent electricity conductive film preparation method
CN108762569A (en) * 2018-05-31 2018-11-06 信利光电股份有限公司 A kind of touch-control sensor and touch-control display panel
CN109658828A (en) * 2018-11-27 2019-04-19 李成奎 Transparent flexible display screen and its transparent circuitry
CN113613480A (en) * 2021-07-23 2021-11-05 中国科学院上海光学精密机械研究所 Electromagnetic shielding optical window for eliminating F-P cavity effect
CN113613480B (en) * 2021-07-23 2024-02-09 中国科学院上海光学精密机械研究所 Electromagnetic shielding optical window for eliminating F-P cavity effect

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Application publication date: 20131225