CN203909749U - Touch screen - Google Patents
Touch screen Download PDFInfo
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- CN203909749U CN203909749U CN201420287617.1U CN201420287617U CN203909749U CN 203909749 U CN203909749 U CN 203909749U CN 201420287617 U CN201420287617 U CN 201420287617U CN 203909749 U CN203909749 U CN 203909749U
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- touch
- conductive layer
- conductive
- transparent
- silk thread
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Abstract
A touch screen comprises a touch substrate, a protective substrate and a transparent optical cement layer, wherein the touch substrate comprises a transparent substrate body and a first conductive layer arranged on one side of the transparent substrate body; the protective substrate comprises a panel body and a second conductive layer arranged on one side of the panel body; the transparent optical cement layer is arranged between the touch substrate and the side, provided with the second conductive layer, of the protective substrate; at least one of the first conductive layer and the second conductive layer comprises a solidified transparent photosensitive resin matrix and nano conductive wires embedded in the solidified transparent photosensitive resin matrix; the nano conductive wires are connected in a staggered mode to form conductive grids; the first conductive layer is patterned to form multiple parallel first touch electrodes distributed at intervals, and the first touch electrodes are in a long strip shape; the second conductive layer is patterned to form multiple parallel second touch electrodes distributed at intervals, the second touch electrodes are in a long strip shape, and the first touch electrodes are perpendicular to the second touch electrodes. The touch screen has good conductivity.
Description
Technical field
The utility model relates to touch technology field, particularly relates to a kind of touch-screen.
Background technology
Touch-screen is to receive the inductive arrangement that touches input signal.Touch-screen has given information interaction brand-new looks, is extremely attractive brand-new information interaction equipment.The development of touch screen technology has caused the common concern of domestic and international information medium circle, has become the Chaoyang new high-tech industry that photoelectricity industry is a dark horse.
Touch-screen comprises touch base plate and is laminated in the panel body on touch base plate.The method for making of traditional touch base plate is generally:
(1) directly in transparent substrates, form conductive layer.With ITO (Indium Tin Oxide, tin indium oxide) conductive layer, be example, need to first carry out ITO plated film, then the ITO layer obtaining is carried out to graphical treatment.Because conductive layer is outside exposed, be easily scratched, and then cause the electric conductivity of conductive layer to reduce.
(2) residuite layer is set in transparent substrates, then adopts the modes such as impression on residuite layer, to form latticed groove, then in latticed groove filled conductive material (for example, metal, Graphene etc.), form latticed conductive layer.Because a side of latticed conductive layer is exposed to outside residuite layer, and the easily oxidation by air of a lot of conductive materials (for example, argent).And the oxidized meeting of conductive material causes the electric conductivity of latticed conductive layer to reduce.
Utility model content
Based on this, be necessary to provide a kind of touch-screen with better electric conductivity.
A touch-screen, comprising:
Touch base plate, comprises transparent substrates and is located at the first conductive layer of described transparent substrates one side;
Protective substrate, comprises panel body and is located at the second conductive layer of described panel body one side; And
Transparent optical glue-line, is located between the side that described touch base plate and described protective substrate have described the second conductive layer;
Wherein, at least one in described the first conductive layer and described the second conductive layer comprise curing transparent feel photopolymer resin matrix and embed the electrical-conductive nanometer silk thread in described curing transparent feel photopolymer resin matrix, and described electrical-conductive nanometer silk thread is cross-linked to form conductive grid; Described the first conductive layer is patterned and forms the first touch-control electrode that many parallel interval are arranged, and described the first touch-control electrode is strip; Described the second conductive layer is patterned and forms the second touch-control electrode that many parallel interval are arranged, and described the second touch-control electrode is strip, and described the first touch-control electrode is with described second touch-control electrode is vertical arranges.
In an embodiment, the thickness of described transparent substrates is 0.02mm～0.5mm therein.
In an embodiment, the thickness of described transparent substrates is 0.05mm～0.2mm therein.
Therein in an embodiment, described the first conductive layer comprises curing transparent feel photopolymer resin matrix and embeds the electrical-conductive nanometer silk thread in described curing transparent feel photopolymer resin matrix, and described electrical-conductive nanometer silk thread is cross-linked to form conductive grid.
In an embodiment, the thickness of described the first conductive layer is 0.05 μ m～10 μ m therein.
In an embodiment, the thickness of described the first conductive layer is 0.08 μ m～2 μ m therein.
In an embodiment, at least part of described electrical-conductive nanometer silk thread exposes outside the side of described curing transparent feel photopolymer resin matrix away from described transparent substrates therein.
In an embodiment, the diameter of described electrical-conductive nanometer silk thread is 10nm～1000nm therein, and length is 20nm～50 μ m, and the sheet resistance of described the first conductive layer is 0.1 Ω/～200 Ω/.
In an embodiment, the sheet resistance of described the first conductive layer is 10 Ω/～100 Ω/ therein.
In an embodiment, the thickness of described panel body is 0.1mm～2.5mm therein.
In an embodiment, the thickness of described panel body is 0.3mm～0.7mm therein.
Conductive grid in above-mentioned the first conductive layer is coated by transparent feel photopolymer resin matrix, thereby makes above-mentioned the first conductive layer can avoid preferably scratching, and is not easy to damage.Greatly reduce the chance that conductive grid contacts with air simultaneously, make above-mentioned the first conductive layer be not easy oxidized.Therefore, above-mentioned touch-screen has better electric conductivity.And the conductive grid that is cross-linked to form with electrical-conductive nanometer silk thread of above-mentioned the first conductive layer realizes conduction, with respect to ITO conductive layer, it has relatively low resistivity.And electrical-conductive nanometer silk thread has good pliability, thereby make above-mentioned touch-screen there is good bending resistance folding endurance.In addition, it is carrier that the conductive grid that electrical-conductive nanometer silk thread is cross-linked to form be take transparent feel photopolymer resin matrix, when making the first conductive layer, directly by exposure imaging (ITO conductive layer also needs through overetched step), can obtain, and can simplify technique.And when making the first conductive layer, without additionally making with photoresist, further simplify technique.
Accompanying drawing explanation
Fig. 1 is the structural representation of the touch-screen of an embodiment;
Fig. 2 is the exploded view of the touch-screen in figure;
Fig. 3 is the structural representation of the first conductive layer;
Fig. 4 is the structural representation of the touch-screen of another embodiment;
Fig. 5 is the process flow diagram of method for making of the touch-screen of an embodiment;
Fig. 6 is the process flow diagram of the method for making of the touch base plate in Fig. 5.
Embodiment
Below in conjunction with drawings and the specific embodiments, touch-screen is further detailed.
As shown in Figures 1 and 2, the touch-screen 10 of an embodiment, comprises touch base plate 100, protective substrate 200 and transparent optical glue-line 300.
Touch base plate 100 comprises transparent substrates 110 and the first conductive layer 120.
The material of transparent substrates 110 can be glass, polymethylmethacrylate, polycarbonate, polyethylene terephthalate, cyclic olefine copolymer or cyclic olefin polymer.The thickness of transparent substrates 110 is 0.02mm～0.5mm.Further, in the present embodiment, after considering the processing complexity of transparent substrates 110 and the integral thickness of touch-screen 10, the thickness of transparent substrates 110 is preferably 0.05mm～0.2mm.
As Figure 1-3, the first conductive layer 120 is located at transparent substrates 110 1 sides.The first conductive layer 120 comprises curing transparent feel photopolymer resin matrix 122 and evenly embeds the electrical-conductive nanometer silk thread 124 in curing transparent feel photopolymer resin matrix 122.These electrical-conductive nanometer silk threads 124 are cross-linked to form conductive grid, make the whole homogeneous conductive of this first conductive layer 120.The first conductive layer 120 is patterned and forms the first touch-control electrode 126 that many parallel interval are arranged.The first touch-control electrode 126 is strip.
In the present embodiment, electrical-conductive nanometer silk thread 124 exposes this curing transparent feel photopolymer resin matrix 122 away from a side of transparent substrates 110 at least partly, thereby makes the surface conduction of this first conductive layer 120.Although partially conductive nanometer silk thread 124 is exposed to outside curing transparent feel photopolymer resin matrix 122, but the transparent feel photopolymer resin matrix that the main part of the conductive grid that electrical-conductive nanometer silk thread 124 is cross-linked to form is still cured 122 is coated, therefore, above-mentioned touch base plate 100 has better anti-oxidant and scratch resistance ability with respect to traditional touch base plate.
In the present embodiment, the thickness of the first conductive layer 120 is 0.05 μ m～10 μ m.When the thickness of design the first conductive layer 120, need to consider whether electrical-conductive nanometer silk thread 124 can embed in curing transparent feel photopolymer resin matrix 122 and the factors such as integral thickness of touch-screen 10 preferably.After amid all these factors, the thickness of the first conductive layer 120 is preferably 0.08 μ m～2 μ m.
In the present embodiment, the diameter of electrical-conductive nanometer silk thread 124 is 10nm～1000nm, and length is 20nm～50 μ m.Because the diameter of electrical-conductive nanometer silk thread 124 is less than the visual width of human eye, thereby guarantee the visually-clear of the first conductive layer 120.Electrical-conductive nanometer silk thread 124 can be easy to prepare and have for gold nanowires line, silver nanoparticle silk thread, Cu nanowire line, aluminium nanometer silk thread, carbon nanometer silk thread etc. the conductive thread of better electric conductivity.
Further, in the present embodiment, the sheet resistance of the first conductive layer 120 is 0.1 Ω/～200 Ω/, compared to ITO conductive layer, there is better electric conductivity, be more suitable for for making as panel computer (pad), all-in-one (All in one, AIO), the larger touch-control product of notebook (Note Book) equidimension.
The electric conductivity of the first conductive layer 120 is relevant to diameter and electrical-conductive nanometer silk thread 124 distribution densities of electrical-conductive nanometer silk thread 124, and diameter is larger, and distribution density is larger, and electric conductivity is better, and sheet resistance is lower.Yet the diameter of electrical-conductive nanometer silk thread 124 is larger, distribution density is larger, the transmitance of conductive layer is lower.Therefore,, in order to guarantee the balance of transmitance and electric conductivity, the sheet resistance of the first conductive layer 120 is preferably 10 Ω/～100 Ω/.
Protective substrate 200 comprises panel body 210 and the second conductive layer 220.
The material of panel body 210 can be glass, sapphire, carbonic acid polyester, polyethylene terephthalate or poly-first acrylic acid formicester.The thickness of panel body 210 is 0.1mm～2.5mm.Further, in the present embodiment, after considering the processing complexity of panel body 210 and the integral thickness of touch-screen 10, the thickness of panel body 210 is preferably 0.3mm～0.7mm.
The second conductive layer 220 is located at panel body 210 1 sides.The second conductive layer 220 is patterned and forms the second touch-control electrode 222 that many parallel interval are arranged.The second touch-control electrode 222 is strip, and the first touch-control electrode 126 and the vertical setting of the second touch-control electrode 222.Work as conductor, for example during finger touch, the first touch-control electrode 126 and the second touch-control electrode 222, because capacitance variations forms touching signals, are respectively used to determine X axis coordinate and the Y-axis coordinate of touch point.
In the present embodiment, the second conductive layer 220 is ITO conductive layer.Be appreciated that in other embodiments, the second conductive layer 220 can be also metal grill conductive layer, graphene conductive layer, carbon nanotube conducting layer or conducting polymer conductive layer.The second conductive layer 220 also can have similar structure to the first conductive layer 120, comprise curing transparent feel photopolymer resin matrix and evenly embed the electrical-conductive nanometer silk thread in this matrix, these electrical-conductive nanometer silk threads are cross-linked to form conductive grid, make the whole homogeneous conductive of this second conductive layer 220.
Transparent optical glue-line 300 is located at touch base plate 100 and protective substrate 200 has between a side of the second conductive layer 220.In the present embodiment, transparent optical glue-line 300 is located in the side that touch base plate 100 has the first conductive layer 120.As shown in Figure 4, in other embodiments, transparent optical glue-line 300 also can be located in the side of touch base plate 100 away from the first conductive layer 120.
As shown in Figure 5, in the present embodiment, also provide a kind of method for making of touch-screen, comprise the steps:
Step S410, provides touch base plate, and touch base plate comprises transparent substrates and is located at the first conductive layer of transparent substrates one side; The first conductive layer comprises curing transparent feel photopolymer resin matrix and embeds the electrical-conductive nanometer silk thread in curing transparent feel photopolymer resin matrix, and electrical-conductive nanometer silk thread is cross-linked to form conductive grid; The first conductive layer is patterned and forms the first touch-control electrode that many parallel interval are arranged, and the first touch-control electrode is strip.
As shown in Figure 6, in the present embodiment, the method for making of touch base plate comprises the steps:
Step S412, one nesa coating is provided, this nesa coating comprises transparent substrates and is located at the electrically conducting transparent photosensitive resin hypothallus of the semi-solid preparation of transparent substrates one side, the electrically conducting transparent photosensitive resin hypothallus of semi-solid preparation comprises the electrical-conductive nanometer silk thread in the transparent feel photopolymer resin matrix of semi-solid preparation and the transparent feel photopolymer resin matrix of embedding semi-solid preparation, wherein, electrical-conductive nanometer silk thread is cross-linked to form conductive grid.
Wherein, the method for making of this nesa coating comprises the steps:
Step S4122, provides transparent feel photopolymer resin, electrical-conductive nanometer silk thread and the transparent substrates of flow-like.
Step S4124, is scattered in electrical-conductive nanometer silk thread in transparent feel photopolymer resin, obtains electrically conducting transparent photosensitive resin.
Step S4126, is coated on electrically conducting transparent photosensitive resin in one side of transparent substrates, and obtains the first nesa coating through solidifying to process.
In the present embodiment, transparent feel photopolymer resin comprises each component of following parts by weight: 30～50 parts of film-forming resins, 1～10 part of emulsion, 10～40 parts of organic solvents, 0.1～5 part of stabilizing agent, 0.1～5 part of levelling agent and 0.1～5 part of defoamer, the umber of each component and be 100.
Film-forming resin is at least one in polymethylmethacrylate, linear phenolic resin, epoxy resin, crotonic acid, acrylate, vinyl ether and M Cr.Emulsion is at least one in diazobenzene quinone, diazo naphthoquinone ester, polyvinyl cinnamate, poly-Chinese cassia tree fork malonic acid glycol ester polyester, aromatic diazo salt, aromatic sulfonium salts, fragrant salt compounded of iodine and ferrocene salt.Organic solvent is tetrahydrofuran, methyl ethyl ketone, cyclohexanone, propylene glycol, N, dinethylformamide, ethyl cellosolve acetate, ethyl acetate and butyl acetate, toluene, dimethylbenzene, tripropylene glycol diacrylate, trimethylolpropane triacrylate, ethoxylated trimethylolpropane triacrylate, dipentaerythrite six acrylate, 1, at least one in 6-hexanediol methoxyl mono acrylic ester and ethoxylation neopentyl glycol methoxyl mono acrylic ester.Stabilizing agent is at least one in p-dihydroxy-benzene, p methoxy phenol, 1,4-benzoquinone, 2,6 one di-t-butyl cresols, phenothiazine and anthraquinone.Levelling agent is at least one in polyacrylate, acetate butyrate fiber, nitrocellulose and polyvinyl butyral.Defoamer is at least one in phosphate, fatty acid ester and organosilicon.
Transparent feel photopolymer resin has photosensitive property when fluid state or semi-cured state, and transparent feel photopolymer resin does not have photosensitive property when solid state.
Step S414, is placed in mask plate above the electrically conducting transparent photosensitive resin hypothallus of semi-solid preparation, adopts the ultraviolet light corresponding with the electrically conducting transparent photosensitive resin hypothallus of semi-solid preparation to carry out exposure-processed to the electrically conducting transparent photosensitive resin hypothallus of semi-solid preparation.
Wherein, at the electrically conducting transparent photosensitive resin hypothallus to semi-solid preparation, carry out in the process of exposure-processed, the wavelength of exposure-processed is 300nm～400nm, and the energy of exposure-processed is 50mj/cm
2～500mj/cm
2.
Step S416, adopts developer solution to carry out development treatment to the electrically conducting transparent photosensitive resin hypothallus of the semi-solid preparation through exposure-processed, so that the electrically conducting transparent photosensitive resin hypothallus of semi-solid preparation forms the first touch-control electrode that many parallel interval are arranged.
Wherein, developer solution is that massfraction is the aqueous solution of 0.1%～10% weak base salt.Weak base salt can be sal tartari, sodium carbonate etc.
Step S418, is cured processing to the electrically conducting transparent photosensitive resin hypothallus of the semi-solid preparation through development treatment, obtains the first conductive layer.
Wherein, in the present embodiment, the electrically conducting transparent photosensitive resin hypothallus of the semi-solid preparation of process development treatment is cured in the process of processing, solidify and be treated to heat curing, the temperature of heat curing is 80 ℃～150 ℃, and the time of heat curing is 10min～60min.Be appreciated that, in other embodiments, the electrically conducting transparent photosensitive resin hypothallus of the semi-solid preparation of process development treatment is cured in the process of processing, solidify and be treated to ultra-violet curing, the wavelength of ultra-violet curing is 300nm～400nm, and the energy of ultra-violet curing is 200mj/cm
2～2000mj/cm
2.
Step S420; protective substrate is provided; protective substrate comprises panel body and is located at the second conductive layer of panel body one side; the second conductive layer is patterned and forms the second touch-control electrode that many parallel interval are arranged; the second touch-control electrode is strip, and the first touch-control electrode is with second touch-control electrode is vertical arranges.
In the present embodiment, the method for making of protective substrate comprises the steps:
Step S422, provides an electrically-conductive backing plate, and this electrically-conductive backing plate comprises panel body and is located at the ITO layer that whole face is covered in panel body one side.
Step S424, carries out exposure-processed, development treatment and etch processes successively to ITO layer, forms the second touch-control electrode that many parallel interval are arranged, and obtains the second conductive layer.
Step S430; transparent optical cement is provided; the side that one side, touch base plate at touch base plate with the first conductive layer has the second conductive layer away from a side or the protective substrate of the first conductive layer applies transparent optical cement; touch base plate is connected with protective substrate by transparent optical cement, and the transparent optical cement having at touch base plate and protective substrate between a side of the second conductive layer forms transparent optical glue-line.
Conductive grid in above-mentioned the first conductive layer 120 is coated by transparent feel photopolymer resin matrix, thereby makes above-mentioned the first conductive layer 120 can avoid preferably scratching, and is not easy to damage.Greatly reduce the chance that conductive grid contacts with air simultaneously, make above-mentioned the first conductive layer 120 be not easy oxidized.Therefore, above-mentioned touch-screen 10 has better electric conductivity.And the conductive grid that is cross-linked to form with electrical-conductive nanometer silk thread 124 of above-mentioned the first conductive layer 120 realizes conduction, with respect to ITO conductive layer, it has relatively low resistivity.And electrical-conductive nanometer silk thread 124 has good pliability, thereby make above-mentioned touch-screen 10 there is good bending resistance folding endurance.In addition, it is carrier that the conductive grid that electrical-conductive nanometer silk thread 124 is cross-linked to form be take the transparent feel photopolymer resin matrix 122 of solidifying, when making the first conductive layer 120, directly by exposure imaging (ITO conductive layer also needs through overetched step), can obtain, can simplify technique.And when making the first conductive layer 120, without additionally making with photoresist, further simplify technique.
Above embodiment has only expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.
Claims (11)
1. a touch-screen, is characterized in that, comprising:
Touch base plate, comprises transparent substrates and is located at the first conductive layer of described transparent substrates one side;
Protective substrate, comprises panel body and is located at the second conductive layer of described panel body one side; And
Transparent optical glue-line, is located between the side that described touch base plate and described protective substrate have described the second conductive layer;
Wherein, at least one in described the first conductive layer and described the second conductive layer comprise curing transparent feel photopolymer resin matrix and embed the electrical-conductive nanometer silk thread in described curing transparent feel photopolymer resin matrix, and described electrical-conductive nanometer silk thread is cross-linked to form conductive grid; Described the first conductive layer is patterned and forms the first touch-control electrode that many parallel interval are arranged, and described the first touch-control electrode is strip; Described the second conductive layer is patterned and forms the second touch-control electrode that many parallel interval are arranged, and described the second touch-control electrode is strip, and described the first touch-control electrode is with described second touch-control electrode is vertical arranges.
2. touch-screen according to claim 1, is characterized in that, the thickness of described transparent substrates is 0.02mm～0.5mm.
3. touch-screen according to claim 2, is characterized in that, the thickness of described transparent substrates is 0.05mm～0.2mm.
4. touch-screen according to claim 1, it is characterized in that, described the first conductive layer comprises curing transparent feel photopolymer resin matrix and embeds the electrical-conductive nanometer silk thread in described curing transparent feel photopolymer resin matrix, and described electrical-conductive nanometer silk thread is cross-linked to form conductive grid.
5. touch-screen according to claim 4, is characterized in that, the thickness of described the first conductive layer is 0.05 μ m～10 μ m.
6. touch-screen according to claim 5, is characterized in that, the thickness of described the first conductive layer is 0.08 μ m～2 μ m.
7. touch-screen according to claim 4, is characterized in that, at least part of described electrical-conductive nanometer silk thread exposes outside the side of described curing transparent feel photopolymer resin matrix away from described transparent substrates.
8. touch-screen according to claim 4, is characterized in that, the diameter of described electrical-conductive nanometer silk thread is 10nm～1000nm, and length is 20nm～50 μ m, and the sheet resistance of described the first conductive layer is 0.1 Ω/～200 Ω/.
9. touch-screen according to claim 8, is characterized in that, the sheet resistance of described the first conductive layer is 10 Ω/～100 Ω/.
10. touch-screen according to claim 1, is characterized in that, the thickness of described panel body is 0.1mm～2.5mm.
11. touch-screens according to claim 10, is characterized in that, the thickness of described panel body is 0.3mm～0.7mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420287617.1U CN203909749U (en) | 2014-05-30 | 2014-05-30 | Touch screen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420287617.1U CN203909749U (en) | 2014-05-30 | 2014-05-30 | Touch screen |
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| CN203909749U true CN203909749U (en) | 2014-10-29 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201420287617.1U Expired - Fee Related CN203909749U (en) | 2014-05-30 | 2014-05-30 | Touch screen |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104020886A (en) * | 2014-05-30 | 2014-09-03 | 南昌欧菲光科技有限公司 | Touch screen |
| CN106784393A (en) * | 2016-11-17 | 2017-05-31 | 昆山工研院新型平板显示技术中心有限公司 | A kind of conducting nanowires layer, its graphic method and application |
-
2014
- 2014-05-30 CN CN201420287617.1U patent/CN203909749U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104020886A (en) * | 2014-05-30 | 2014-09-03 | 南昌欧菲光科技有限公司 | Touch screen |
| CN104020886B (en) * | 2014-05-30 | 2017-09-29 | 南昌欧菲光科技有限公司 | Touch-screen |
| CN106784393A (en) * | 2016-11-17 | 2017-05-31 | 昆山工研院新型平板显示技术中心有限公司 | A kind of conducting nanowires layer, its graphic method and application |
| CN106784393B (en) * | 2016-11-17 | 2019-06-04 | 昆山工研院新型平板显示技术中心有限公司 | A kind of conducting nanowires layer, graphic method and application |
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| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20141029 Termination date: 20180530 |