CN204480210U - Touch-screen - Google Patents
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- CN204480210U CN204480210U CN201520164740.9U CN201520164740U CN204480210U CN 204480210 U CN204480210 U CN 204480210U CN 201520164740 U CN201520164740 U CN 201520164740U CN 204480210 U CN204480210 U CN 204480210U
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Abstract
The utility model relates to a kind of touch-screen, comprises cover sheet; Be arranged on the first conductive layer of cover sheet bottom surface, described first conductive layer comprises the first electrode of patterning; Matrix, is bonded on the first conductive layer; And second conductive layer, comprise carrier and be embedded the conductive nano silk thread in carrier, the material of described carrier is identical with the material of matrix, the interlaced overlap joint of described conductive nano silk thread, described second conductive layer is patterned formation second electrode, and the first electrode and the second electrode electrically completely cut off by described matrix.This touch-screen without the need to using optical cement, can reduce thickness by matrix, and the dissimilar collocation of other first conductive layer and the second conductive layer can improving optical effect.
Description
Technical field
The utility model relates to technical field of touch control, particularly relates to a kind of touch-screen.
Background technology
Touch-screen, also known as contact panel (touch panel), is to receive the inductive arrangement touching input signal.Touch-screen imparts the brand-new looks of information interaction, is extremely attractive brand-new information interaction equipment.The development of touch screen technology causes the common concern of domestic and international information medium circle, has become the Chaoyang new high-tech industry that photovoltaic industry is a dark horse.
Existing touch screen structure roughly has G+G (cover-plate glass+touch-control glass), G1F (Hybrid, respectively on cover-plate glass and touch control film form one deck electrode), GFF (Film sensor, double-deck touch control film), OGS (OneGlass Solution), TOL (Touch On Lens), the type such as In cell.Wherein G+G is divided into again Dito (touch-control glass top and bottom respectively form one deck electrode), Sito (touch-control glass forms two-layer electrode and adopts bridge formation therebetween), Mastouch (cover-plate glass and touch-control glass respectively form one deck electrode) several type.
No matter which kind of type above-mentioned, has the defect of himself.Such as, G+G, because adopting double glazing, more difficultly realizes the lightening of end product, and also need repeatedly to adopt gold-tinted processing procedure when wherein forming electrode, complexity is high, and cost is large.The touch control film type complex manufacturing technology such as G1F and GFF, the part of film is more difficult realizes low resistance, is difficult to make large-sized touch screen.OGS and TOL has different understanding in different document, one OGS being interpreted as TOL had, and OGS and the TOL that looks had is equivalent, no matter which kind of sorting technique, and its manufacture craft has complicated and that cost is high disappearance, and has the visual obstacle of wire jumper.In cell refers to touch control electrode to integrate and is arranged in the liquid crystal layer of display, has complex process and the high disappearance of cost equally.
Utility model content
Based on this, be necessary the touch-screen providing a kind of excellent combination property for above-mentioned defect, it can solve the problems such as the too large and manufactured size of complex process, thickness is limited.
A kind of touch-screen, comprising:
Cover sheet;
Be arranged on the first conductive layer of cover sheet bottom surface, described first conductive layer comprises the first electrode of patterning;
Matrix, is bonded on the first conductive layer; And
Second conductive layer, comprise carrier and be embedded the conductive nano silk thread in carrier, the material of described carrier is identical with the material of matrix, the interlaced overlap joint of described conductive nano silk thread, described second conductive layer is patterned formation second electrode, and the first electrode and the second electrode electrically completely cut off by described matrix.
Wherein in an embodiment, described cover sheet is glass cover-plate, and described first conductive layer is ITO conductive layer, metal grill conductive layer, graphene conductive layer, carbon nanotube conducting layer or conductive polymer conducting layer.
Wherein in an embodiment, described matrix is the transparent feel photopolymer resin of solidification, and the diameter of described conductive nano silk thread is 10nm ~ 1000nm, and length is 20nm ~ 50 μm.
Wherein in an embodiment, the thickness of described matrix is 0.05 μm ~ 10 μm, and the thickness of described second conductive layer is 10nm ~ 1000nm.
Wherein in an embodiment, also comprise the light shield layer being arranged on cover sheet bottom surface, described light shield layer is positioned at the one side or the multi-lateral of the periphery of the first conductive layer.
Wherein in an embodiment, also comprise the first conductive trace with the first Electrode connection, with the second conductive trace of the second Electrode connection, and flexible PCB, described first conductive trace and the second conductive trace are electrically connected with same flexible PCB.
Wherein in an embodiment, described first conductive trace and the second conductive trace are directed to the same side of touch-screen.
Wherein in an embodiment, also comprise the protective seam of covering second electrode.
Wherein in an embodiment, the first conductive trace of described protective seam cover part and the second conductive trace of part.
Above-mentioned touch-screen carries out bonding by matrix with the first conductive layer, cover sheet due to the second conductive layer; without the need to re-using other optical cement layer; decrease the laminating processing procedure in conventional touch screen manufacturing process, simplify manufacture craft, also reduce the integral thickness of touch-screen simultaneously.Secondly, because the first conductive layer and the second conductive layer all can be avoided using membrane carrier, the restriction of resistance can not be subject to, larger sized touch-screen can be made.In addition, because first, second conductive trace of the first conductive layer and the second conductive layer is roughly formed in same plane, first, second conductive trace is made to be electrically connected same flexible PCB, decrease flexible PCB usage quantity, reduce the use cost of flexible PCB, simplify nation and determine technique, simultaneously by the line design of first, second conductive trace, also can reduce the pitch of flexible PCB, release taken up space.Moreover the first conductive layer adopts carrier bearing-type, the second conductive layer adopts carrier inserted, and compared with all adopting carrier bearing-type with two conductive layers, escapable cost, reduces the integral thickness of touch-screen simultaneously.And with two conductive layers all adopt carrier inserted compared with, because two conductive layers all adopt carrier inserted, still a cover sheet is needed, thus the utility model has less thickness, on the other hand owing to adopting the inserted manufacturing process of carrier to need exposure imaging, wherein one deck can through the exposure imaging processing procedure of at least twice undoubtedly, inevitably the quality of conductive layer is impacted, the third aspect, the inserted conductive layer of carrier due to light transmission weak compared with carrier bearing-type conductive layer, the utility model adopts the first conductive layer of carrier bearing-type, adopt the second conductive layer that carrier is inserted, compared to adopting two inserted conductive layers of carrier simultaneously, there is better optical effect.
Accompanying drawing explanation
The sectional structure schematic diagram of the touch-screen that Fig. 1 provides for an embodiment;
The part-structure schematic diagram of the touch-screen that Fig. 2 provides for an embodiment;
The matrix of the touch-screen that Fig. 3 provides for an embodiment and the structural representation of the second conductive layer;
The structural representation of the dry film provided in the method for making of the touch-screen that Fig. 4 provides for an embodiment;
Each step schematic diagram of the method for making of the touch-screen that Fig. 5-Fig. 7 provides for an embodiment;
A wherein step schematic diagram of the method for making of the touch-screen that Fig. 8 provides for another embodiment.
Embodiment
For the ease of understanding the utility model, below with reference to relevant drawings, the utility model is described more fully.First-selected embodiment of the present utility model is given in accompanying drawing.But the utility model can realize in many different forms, is not limited to embodiment described herein.On the contrary, the object of these embodiments is provided to be make to disclosure of the present utility model more thoroughly comprehensively.
Unless otherwise defined, all technology used herein and scientific terminology are identical with belonging to the implication that those skilled in the art of the present utility model understand usually.The object of term used in the description herein just in order to describe specific embodiment, is not intended to be restriction the utility model.
As depicted in figs. 1 and 2, the touch-screen that an embodiment provides, comprises cover sheet 100, first conductive layer 200, matrix 301 and the second conductive layer 300 from top to bottom successively.
Cover sheet 100 is preferably glass cover-plate, also can be other suitable materials, such as sapphire, polycarbonate, polyethylene terephthalate or poly-first methacrylate etc.Cover sheet 100 thickness is 0.1mm ~ 2.5mm.Further, in the present embodiment, the thickness of cover sheet 100 is preferably 0.3mm ~ 0.7mm.The bottom surface 102 of cover sheet 100 and/or end face 104 by intensive treatment, or through antireflection, anti-glare process to form corresponding optical film.
First conductive layer 200 is arranged on the bottom surface 102 of cover sheet 100, and patterned and form multiple first electrode 210.The forming process of the first electrode 210 normally in the bottom surface 102 of cover sheet 100 in every way (such as sputter, coating etc.) form the first membranaceous conductive layer 200; etch again, or the step such as exposure/development is to obtain the first electrode 210 of patterning.First electrode 210 of part is shown with the elongate in shape be parallel to each other in Fig. 2.Be appreciated that shape and the distribution pattern of the first electrode 210 are not limited to situation shown in Fig. 2.First conductive layer 200 is ITO conductive layer.Be appreciated that in other embodiments, the first conductive layer 200 also can be metal grill conductive layer, graphene conductive layer, carbon nanotube conducting layer or conductive polymer conducting layer.
Please also refer to Fig. 3, matrix 301 obtains through overcuring process for flow-like or semi-solid transparent feel photopolymer resin, and matrix 301 itself is non-conductive.
Described second conductive layer 300 comprises carrier 30 as one kind 5 and is embedded the conductive nano silk thread 303 in carrier 30 as one kind 5.Wherein carrier 30 as one kind 5 is identical with matrix 301 material.Therefore also carrier 30 as one kind 5 can being regarded as a part for matrix 301, when making this second conductive layer 300, conductive nano silk thread 303 can be embedded the first surface 302 in matrix 301, described conductive nano silk thread 303 be embedded the thickness that the degree of depth is less than matrix 301.The interlaced overlap joint of described conductive nano silk thread 303, described carrier 30 as one kind 5 and conductive nano silk thread 303 are patterned formation second electrode 310 (Fig. 2), and the second surface 304 of described matrix 301 is directly bonding with the first conductive layer 200.
Mutually electrically isolated by matrix 301 between first conductive layer 200 and the second conductive layer 300.Form mutual capacitance between the first electrode 210 in first conductive layer 200 and the second electrode 310 in the second conductive layer 300, detect the capacitance variations between first, second electrode 210,310 by function element such as circuit boards, to realize the function touching location.
Thickness d (being also the thickness of the second conductive layer 300) scope of the second electrode 310 can be 10nm ~ 1000nm.Specific in present embodiment, the diameter of conductive nano silk thread 303 is 10nm ~ 1000nm, and length is 20nm ~ 50 μm.Diameter due to conductive nano silk thread 303 is less than the visual width of naked eyes, thus ensures the visual clarity of the second electrode 310.Conductive nano silk thread 303 can be easy to prepare for gold nanowires line, silver nanoparticle silk thread, Cu nanowire line, aluminium nanometer silk thread, carbon nanometer silk thread etc. and have the conductive thread of better electric conductivity.Specific in present embodiment, conductive nano silk thread 303 adopts silver nanoparticle silk thread.
Specific in present embodiment, the sheet resistance of the second electrode 310 is 0.1 Ω/ ~ 500 Ω/, compared to ITO conductive layer, there is better electric conductivity, be more suitable for for making as panel computer (Tablet PersonalComputer), all-in-one (All in one, AIO), touch-control product that notebook (Note Book) equidimension is larger.
The electric conductivity of the second electrode 310 is relevant to the diameter of conductive nano silk thread 303 and conductive nano silk thread 303 distribution density, and diameter is larger, and distribution density is larger, then electric conductivity is better, and namely sheet resistance is lower.But the diameter of conductive nano silk thread 303 is larger, distribution density is larger, the transmitance of the second electrode 310 is lower.Therefore, in order to ensure the balance of transmitance and electric conductivity, the sheet resistance of the second electrode 310 is preferably 50 Ω/ ~ 200 Ω/.
Specific in present embodiment, part conductive nano silk thread 303 exposes the first surface 302 (being also the first surface 302 of carrier 30 as one kind 5) of matrix 301, to make whole of first surface 302 conduction.Although part conductive nano silk thread 303 is exposed to carrier 30 as one kind 5 (matrix 301) outward, but the main part of the conductive grid that conductive nano silk thread 303 is cross-linked to form is still coated by matrix 301, therefore, relative to traditional touch screen, there is better anti-oxidant and scratch resistance capability.
The thickness D of matrix 301 is 0.05 μm ~ 10 μm.When designing the thickness of matrix 301, need to consider whether conductive nano silk thread 303 can embed in matrix 301 and the factor such as the integral thickness of touch-screen preferably.After amid all these factors, the thickness of matrix 301 is preferably 0.08 μm ~ 2 μm.
Because matrix 301 self has viscosity, therefore the combination of the second conductive layer 300 and the first conductive layer 200 is without the need to adopting traditional optical cement in addition, and can directly the mode of matrix 301 by solidification pressing be combined with the first conductive layer 200.
For preventing the second conductive layer 300 to be scraped off in production and use procedure, also on the surface of the second conductive layer 300, also namely the first surface 302 of carrier 30 as one kind 5 arranges protective seam 400, and this protective seam 400 covers the second electrode 310 to protect the second electrode 310.In the present embodiment, the material of protective seam 400 is the isolation material such as heat reactive resin, ultraviolet-curing resin.
Further, this touch-screen also comprises the light shield layer 105 being arranged on cover sheet 100 bottom surface 102, and described light shield layer 105 is positioned at the one side or the multi-lateral of the periphery of the first conductive layer 200.According to the thickness of the first conductive layer 200, second conductive layer 300 and the thickness relationship of light shield layer 105, one or two or multiple light shield layer 105 can be set on the bottom surface 102 of cover sheet 100.
Further, this touch-screen also comprises the first conductive trace 212 be connected with the first electrode 210.First conductive trace 212 can be made up of conductive materials such as silver, and is reached with the first electrode 210 of the first conductive layer 200 be electrically connected by the mode of printing.First conductive trace 212 to be arranged on light shield layer 105 and to be blocked layer 105 and blocks, and thus can not be observed by user.
Further, this touch-screen also comprises the second conductive trace 312 be connected with the second electrode 310.The material of the second conductive trace 312 and generation type can identical with the first conductive trace 212.Because matrix 301, second conductive layer 300 has less thickness, directly can be crossed over the tomography between the second conductive layer 200 and light shield layer 105 by the mode of printing, the second conductive trace 312 be formed with the second conductive layer 300 and is electrically connected.
Be appreciated that when formation the first conductive trace 212, if the tomography between light shield layer 105 and the first conductive layer 200 is comparatively large, first can forms conductive pole 213 on the first conductive layer 200, to reduce tomography, thus be convenient to the printing of the first conductive trace 212.
Further, this touch-screen also comprises flexible PCB 500, and flexible PCB 500 is by anisotropic conductive film 501 (Anisotropic Conductive Film; ACF) be bonded on the first conductive trace 212, be electrically connected to be formed with the first conductive trace 212, and described second conductive trace 312 be also electrically connected with same flexible PCB 500.As shown in Figure 2, first, second conductive trace 212,312 can be caused the same side of touch-screen, to facilitate the electrical connection of this same flexible PCB 500 and first, second conductive trace 212,312.
The touch-screen that the utility model provides, because the second conductive layer 300 carries out bonding through matrix 301 with the first conductive layer 200, without the need to re-using other optical cement layer, decrease the laminating processing procedure in conventional touch screen manufacturing process, simplify manufacture craft, also reduce the integral thickness of touch-screen simultaneously.Secondly, because the first conductive layer 200 and the second conductive layer 300 all can be avoided using membrane carrier, the restriction of resistance can not be subject to, larger sized touch-screen can be made.In addition, because first, second conductive trace 212,312 of the first conductive layer 200 and the second conductive layer 300 is roughly formed in same plane, first, second conductive trace 212,312 is made to be electrically connected same flexible PCB 500, decrease flexible PCB usage quantity, reduce the use cost of flexible PCB, simplify nation and determine technique, simultaneously by the line design of first, second conductive trace 212,312, also can reduce the pitch of flexible PCB, release taken up space.Moreover the first conductive layer 200 adopts carrier bearing-type, the second conductive layer 300 adopts carrier inserted, and compared with all adopting carrier bearing-type with two conductive layers, escapable cost, reduces the integral thickness of touch-screen simultaneously.And with two conductive layers all adopt carrier inserted compared with, because two conductive layers all adopt carrier inserted, still a cover sheet is needed, thus the utility model has less thickness, on the other hand owing to adopting the inserted manufacturing process of carrier to need exposure imaging (will be described in detail in the method for making of this touch-screen of the present utility model hereinafter), wherein one deck can through the exposure imaging processing procedure of at least twice undoubtedly, inevitably the quality of conductive layer is impacted, the third aspect, the inserted conductive layer of carrier due to light transmission weak compared with carrier bearing-type conductive layer, the utility model adopts the first conductive layer 200 of carrier bearing-type, adopt the second conductive layer 300 that carrier is inserted, compared to adopting two inserted conductive layers of carrier simultaneously, there is better optical effect.
The utility model also provides the method for making of above-mentioned touch-screen, and concrete steps are as follows.
Cover sheet 100 is provided.Cover sheet 100 is preferably glass cover-plate, also can be other suitable materials, such as sapphire, polycarbonate, polyethylene terephthalate or poly-first methacrylate etc.Cover sheet 100 thickness is 0.1mm ~ 2.5mm.Further, in the present embodiment, the thickness of cover sheet 100 is preferably 0.3mm ~ 0.7mm.The bottom surface 102 of cover sheet 100 and/or end face 104 by intensive treatment, or through antireflection, anti-glare process to form corresponding optical film.
The bottom surface 102 of cover sheet 100 is formed the first conductive layer 200, and forms multiple first electrodes 210 of patterning.In one embodiment, the first conductive layer 200 is ITO conductive layer, and forms multiple first electrodes 210 of patterning through etching.
Be appreciated that in certain embodiments, before or after formation first conductive layer 200, on the bottom surface 102 of cover sheet 100, one deck or light shield layer 105 that is two-layer or multilayer can be formed depending on real needs.
As shown in Figure 4; one dry film 500 is provided; dry film 500 is formed by the transparent feel photopolymer resin precuring of flow-like and compacting; the transparent feel photopolymer resin of dry film 500 is semisolid; dry film 500 is embedded in conductive nano silk thread from the certain thickness scope of a side surface and forms transparent conductive layer 520; the region that dry film 500 does not embed conductive nano silk thread forms transparent bonding layer 510, and conductive layer 520 surface is provided with diaphragm 530, and transparent bonding layer 510 surface is provided with diaphragm 540.
Wherein, semi-solid transparent feel photopolymer resin comprises each component of following parts by weight: 60 ~ 80 parts of film-forming resins, 1 ~ 10 part of emulsion, 5 ~ 20 parts of solvents, 0.1 ~ 5 part of stabilizing agent, 0.1 ~ 5 part of levelling agent, 0.1 ~ 5 part of defoamer, the number sum of each component is 100.
The transparent feel photopolymer resin of solidification comprises each component of following parts by weight: 30 ~ 50 parts of film-forming resins, 1 ~ 10 part of emulsion, 0.1 ~ 5 part of stabilizing agent, 0.1 ~ 5 part of levelling agent and 0.1 ~ 5 part of defoamer.
Film-forming resin is at least one in polymethylmethacrylate, linear phenolic resin, epoxy resin, crotonic acid, acrylate, vinyl ether and M Cr.Emulsion is at least one in diazobenzene quinone, diazo naphthoquinone ester, polyvinyl cinnamate, poly-Chinese cassia tree fork malonic acid glycol ester polyester, aromatic diazo salt, aromatic sulfonium salts, aromatic iodonium salt and ferrocene salt.Solvent is tetrahydrofuran, methyl ethyl ketone, cyclohexanone, propylene glycol, N, at least one in dinethylformamide, ethyl cellosolve acetate, ethyl acetate and butyl acetate, toluene, dimethylbenzene, tripropylene glycol diacrylate, trimethylolpropane triacrylate, ethoxylated trimethylolpropane triacrylate, dipentaerythrite six acrylate, 1,6-hexanediol methoxyl mono acrylic ester and ethoxylation neopentyl glycol methoxyl mono acrylic ester.Stabilizing agent is p-dihydroxy-benzene, p methoxy phenol, 1,4-benzoquinone, 2, at least one in 6 one di-t-butyl cresols, phenothiazine and anthraquinone.Levelling agent is at least one in polyacrylate, acetate butyrate fiber, nitrocellulose and polyvinyl butyral.Defoamer is phosphate, fatty acid ester and organosilyl at least one.
As shown in Figure 5, remove the diaphragm 540 on transparent bonding layer 510 surface, dry film 500 is fitted on the first conductive layer 200 of patterning.Because dry film 500 self has viscosity, transparent bonding layer 510 therefore can be made directly to be attached on the first conductive layer 200 of patterning.Conductive layer 520 is positioned at the side of dry film 500 away from cover sheet 100.
Because diaphragm 540 needs to remove prior to diaphragm 530, dry film 500 hot pressing is fitted on cover sheet 100.Therefore, when design protection film 530 is with diaphragm 540, make viscous force between transparent bonding layer 510 and diaphragm 540 lower than the viscous force between conductive layer 520 and diaphragm 530.
Next, patterned process is carried out to dry film 500, with the second electrode 312 making conductive layer 520 form patterning.
Particularly, as illustrated in figs. 5-7, in the present embodiment, the transparent feel photopolymer resin forming this dry film 500 is radical photoinitiator initiator system negative photosensitive resin, namely, there is chemical polymerization and be insoluble to developer solution in illumination place, but this photosensitive resin in atmosphere polymerization reaction take place time, oxygen inhibition effect can be produced.Double exposure mode is adopted to expose dry film 500 in present embodiment.When first time exposes; conductive layer 520 surface of dry film 500 is also provided with diaphragm 530, does not first remove this diaphragm 530, makes the isolated air in dry film 500 surface; now because transparent bonding layer 510 be attached on cover sheet 100, so also with oxygen-barrier.Adopt the mask plate 600 pairs of dry films 500 selected according to the shape of the second electrode 312 to expose, make dry film 500 be produced polyreaction by the drafting department of illumination.Then remove mask plate 600 and be arranged at the diaphragm 530 on dry film 500 surface.Directly second time exposure is carried out to dry film 500, now, for first time exposure not by the region of illumination, surface is owing to contacting with air, not exclusively liquid corrosion can be developed because oxygen inhibition effect makes dry film 500 expose aerial surface reaction, and the part that surface is following, due to not with air contact, can chemical polymerization be there is and not be developed liquid corrosion.The energy of second time exposure is larger, and the region of the following generation in its surface chemical polymerization is thicker.Therefore, by regulating exposure energy, the part in conductive layer 520 except the second electrode can be made to be developed the complete corrosion of liquid, the difference in height of drafting department and background portion can be reduced again, avoid pattern to be not easy by identification.
As shown in Figure 8, in other embodiments, the transparent feel photopolymer resin forming this dry film 500 is positive type photosensitive matrix.That is, illumination place is dissolved in developer solution.Before dry film 500 is exposed, also comprise the step of the diaphragm 530 removing conductive layer 520 surface.Then adopt and carry out according to the shape of the second electrode the mask board to explosure selected.Because illumination place is dissolved in developer solution, so when will retain the figure of the second electrode, the mask board to explosure with the second electrode shape complementation should be adopted.In the present embodiment, reaction depth can be regulated by adjustment exposure energy, thus reduce the drafting department retained and the difference in height of background portion being dissolved in developer solution, avoid pattern to be not easy by identification.
In the process expose dry film 500, exposure wavelength is 300nm ~ 400nm, and exposure energy is 10mJ/cm
2~ 500mJ/cm
2.In the process that dry film after overexposure is developed, adopt massfraction be 0.1% ~ 10% weak base salt solution develop.Weak base salt can be sal tartari, sodium carbonate etc.
Then, dry film 500 is cured, makes transparent bonding layer 510 form described matrix 301.
The mode of heat curing or UV solidification can be adopted: when adopting heat curing mode to solidify, the temperature of heat curing is 80 DEG C ~ 150 DEG C, admittedly the roasting time is 10min ~ 60min.When adopting the solidification of UV curing mode, it is 200mJ/cm that UV solidifies energy
2~ 2000mJ/cm
2.Transparent feel photopolymer resin has photosensitive property when being in fluid state or semi-cured state, does not have photosensitive property when transparent feel photopolymer resin is in solid state.
Conductive layer 520 after solidification and transparent bonding layer 510 are the second conductive layer 300 as shown in Figure 1 and matrix 301.
Further, also comprise the step of formation first conductive trace 212 and the second conductive trace 312, the first conductive trace 212 is electrically connected with the first electrode 210, and the second conductive trace 312 is electrically connected with the second electrode 310.
Further, also comprise and flexible PCB 500 is provided, by the step that flexible electrical pole plate 500 is electrically connected with first, second conductive trace 212,312 simultaneously.
Further, the surface being also included in the second conductive layer 300 arranges the step of protective seam 400.Protective seam 400 can first, second conductive trace 212,312 of cover part.
Above embodiment only have expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but therefore can not be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.
Claims (9)
1. a touch-screen, is characterized in that comprising:
Cover sheet;
Be arranged on the first conductive layer of cover sheet bottom surface, described first conductive layer comprises the first electrode of patterning;
Matrix, is bonded on the first conductive layer; And
Second conductive layer, comprise carrier and be embedded the conductive nano silk thread in carrier, the material of described carrier is identical with the material of matrix, the interlaced overlap joint of described conductive nano silk thread, described second conductive layer is patterned formation second electrode, and the first electrode and the second electrode electrically completely cut off by described matrix.
2. touch-screen according to claim 1, is characterized in that, described cover sheet is glass cover-plate, and described first conductive layer is ITO conductive layer, metal grill conductive layer, graphene conductive layer, carbon nanotube conducting layer or conductive polymer conducting layer.
3. touch-screen according to claim 1, is characterized in that, described matrix is the transparent feel photopolymer resin of solidification, and the diameter of described conductive nano silk thread is 10nm ~ 1000nm, and length is 20nm ~ 50 μm.
4. touch-screen according to claim 3, is characterized in that, the thickness of described matrix is 0.05 μm ~ 10 μm, and the thickness of described second conductive layer is 10nm ~ 1000nm.
5. touch-screen according to claim 1, is characterized in that, also comprises the light shield layer being arranged on cover sheet bottom surface, and described light shield layer is positioned at the one side or the multi-lateral of the periphery of the first conductive layer.
6. touch-screen according to claim 1, it is characterized in that, also comprise the first conductive trace with the first Electrode connection, with the second conductive trace of the second Electrode connection, and flexible PCB, described first conductive trace and the second conductive trace are electrically connected with same flexible PCB.
7. touch-screen according to claim 6, is characterized in that, described first conductive trace and the second conductive trace are directed to the same side of touch-screen.
8. touch-screen according to claim 6, is characterized in that, also comprises the protective seam of covering second electrode.
9. touch-screen according to claim 8, is characterized in that, the first conductive trace of described protective seam cover part and the second conductive trace of part.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520164740.9U CN204480210U (en) | 2015-03-23 | 2015-03-23 | Touch-screen |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520164740.9U CN204480210U (en) | 2015-03-23 | 2015-03-23 | Touch-screen |
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|---|---|
| CN204480210U true CN204480210U (en) | 2015-07-15 |
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ID=53635989
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| CN201520164740.9U Active CN204480210U (en) | 2015-03-23 | 2015-03-23 | Touch-screen |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106155369A (en) * | 2015-03-23 | 2016-11-23 | 南昌欧菲光显示技术有限公司 | Touch-screen and preparation method thereof |
| CN107300999A (en) * | 2017-07-07 | 2017-10-27 | 南昌欧菲光科技有限公司 | Pressure sensitive touch display screen, pressure sensitive touch-screen and preparation method thereof |
| CN108181785A (en) * | 2016-12-08 | 2018-06-19 | 邢勇程 | Nano silver wire photoresist and application thereof in manufacturing of touch screen device |
-
2015
- 2015-03-23 CN CN201520164740.9U patent/CN204480210U/en active Active
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106155369A (en) * | 2015-03-23 | 2016-11-23 | 南昌欧菲光显示技术有限公司 | Touch-screen and preparation method thereof |
| CN108181785A (en) * | 2016-12-08 | 2018-06-19 | 邢勇程 | Nano silver wire photoresist and application thereof in manufacturing of touch screen device |
| CN108181785B (en) * | 2016-12-08 | 2021-05-25 | 深圳市邦得凌触控显示技术有限公司 | Nano silver wire photoresist and application thereof in manufacturing of touch screen device |
| CN107300999A (en) * | 2017-07-07 | 2017-10-27 | 南昌欧菲光科技有限公司 | Pressure sensitive touch display screen, pressure sensitive touch-screen and preparation method thereof |
| CN107300999B (en) * | 2017-07-07 | 2022-11-25 | 安徽精卓光显技术有限责任公司 | Pressure-sensitive touch display screen, pressure-sensitive touch screen and manufacturing method thereof |
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