CN203859104U - Exhaust device of process pipe of vertical thermal treatment equipment for semiconductors - Google Patents

Exhaust device of process pipe of vertical thermal treatment equipment for semiconductors Download PDF

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Publication number
CN203859104U
CN203859104U CN201420243244.8U CN201420243244U CN203859104U CN 203859104 U CN203859104 U CN 203859104U CN 201420243244 U CN201420243244 U CN 201420243244U CN 203859104 U CN203859104 U CN 203859104U
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China
Prior art keywords
flange
exhaust
gas
blast pipe
sealing ring
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Withdrawn - After Issue
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CN201420243244.8U
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Chinese (zh)
Inventor
徐冬
宋新丰
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Beijing Sevenstar Electronics Co Ltd
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Beijing Sevenstar Electronics Co Ltd
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Abstract

The utility model discloses a exhaust device of a process pipe of vertical thermal treatment equipment for semiconductors. An air outlet of the process pipe of the vertical thermal treatment equipment for the semiconductors and an exhaust pipe communicated with an exhaust pipeline are jointed through flanges, a gap exists between the connection surfaces of the flanges, a sealing ring is disposed between the connection surfaces of the flanges for sealing, an air-blowing opening is disposed at a connection surface, which is located between the sealing ring and the inner wall of the flange, of the flange at one side, the gas blowing opening is communicated to a blowing gas inlet through a gas blowing chamber channel in the flange body, the flanges at two sides are fixedly connected through clamping adjustment mechanisms. Cooling purging gas goes into the gap between the connection surfaces of the flanges through the blowing gas inlet, the gas blowing chamber channel, and the gas blowing opening, and plays a role in isolating high temperature exhaust gas, cooling the sealing ring and adjusting the internal temperature and pressure of the exhaust pipe. In addition, an effect of purifying the exhaust pipe is achieved through gas purging before technology processing. The exhaust device has characteristics of being good in sealing performance, being capable of improving the temperature resistant performance, being simple in structure design, and being adjustable.

Description

A kind of process duct exhaust apparatus of semiconductor vertical thermal-processing device
Technical field
The utility model relates to a kind of exhaust apparatus of semiconductor vertical thermal-processing device, more specifically, relate to and a kind ofly can realize effective sealing and cooling, adjusting gas exhaust piping internal temperature and pressure and the process duct exhaust apparatus of the semiconductor vertical thermal-processing device that purifies by isolation high-temperature tail gas.
Background technology
Semiconductor vertical heater equipment for Heating Processing is the one of integrated circuit equipment, warm treatment facility, high temperature thermal treatment etc. in can comprising.
Semiconductor vertical thermal-processing device is in the process that wafer is heat-treated, and the process tail gas in process duct can be discharged through gas exhaust piping.Because be middle high-temperature heat treatment processing procedure, so the exhaust temperature of discharging via gas exhaust piping generally can be more than 600 DEG C.When process tail gas is from the exhaust outlet of semiconductor heat treatment facility process duct is discharged, enter blast pipe, and reclaim after exhaust gas cooling device is cooling along gas exhaust piping.Because the tail gas of process gas is special gas, so, whole gas exhaust piping is required to have excellent sealing property.And due to the excess Temperature of process tail gas, therefore, in the junction of gas exhaust piping, particularly in the exhaust outlet of semiconductor heat treatment facility process duct and the junction of blast pipe, need design to seal and can resistant to elevated temperatures structure.
At present, existing process duct exhaust apparatus, in the junction of exhaust outlet and blast pipe, adopts sealing ring form to seal conventionally.Even and the sealing ring material of excellent performance, its high-temperature resistant also can only reach below 300 DEG C.So single sealing ring hermetically-sealed construction can not practical requirement.Because process duct, exhaust outlet and gas exhaust piping generally adopt quartz material, and near Pipeline more complicated exhaust outlet, therefore, what require need to try one's best in the connection of exhaust ports and design of Sealing Structure is simple.The specific demand of above-mentioned semiconductor vertical heater equipment for Heating Processing process gases, causes existing process duct exhaust apparatus difficulty in design, thereby lacks effective corrective measure.This causes the sealing ring of existing process duct exhaust apparatus, and not only useful life is short, replacement frequency is high, and has increased the risk that tail gas is revealed.For the demand of semiconductor vertical heater equipment for Heating Processing process gases, need to design and meet high leakproofness, high temperature tolerance, exhaust apparatus simple in structure.
Utility model content
The purpose of this utility model is to overcome the above-mentioned defect that prior art exists, a kind of process duct exhaust apparatus of novel semiconductor vertical thermal-processing device is provided, purge structure by design refrigerating gas in the flange that connects process duct exhaust outlet and blast pipe, can form a gas isolation effect at the gapped flange connections of tool on the one hand, intercept high-temperature tail gas, on the other hand the sealing ring surface between flange is lowered the temperature, and clamp the gap between governor motion adjustment flange connection surface by adjusting the flange of crush, to improve sealing ring cooler environment around, realize sealing ring high-temperature tail gas is around isolated, the effect of coolant seal circle and adjusting blast pipe internal temperature and pressure, in addition,, before PROCESS FOR TREATMENT, by gas purging, can also reach the effect of purifying exhaust gas pipeline.
For achieving the above object, the technical solution of the utility model is as follows:
A kind of process duct exhaust apparatus of semiconductor vertical thermal-processing device, comprise the exhaust outlet of semiconductor vertical thermal-processing device process duct, connect the blast pipe of exhaust outlet, described blast pipe is connected to exhaust gas cooling device by gas exhaust piping, the junction of described exhaust outlet and described blast pipe is provided with sealing ring, it is characterized in that, described exhaust outlet and described blast pipe adopt flange to connect, between the flange connection surface of exhaust side flange and blast pipe side flange, there is certain interval, between described flange connection surface by sealing mutually around the sealing ring of circumference of flange setting; The joint face of the wherein side flange in two side flanges locates to be provided with inflatable mouth between described sealing ring and flange inner wall, described inflatable mouth is communicated with the intrinsic air blowing cavity of this side flange, and described air blowing cavity is provided with and leads to this external air blowing air inlet of this side flange; Described two side flanges are connected mutually by clamping governor motion; Wherein, can be blown into different cooling purge gas by described air blowing air inlet, enter the described gap between described two side flange joint faces via described air blowing cavity, described inflatable mouth, and enter described flange inner wall by described gap, pass through described gas exhaust piping discharged to described exhaust gas cooling device along described blast pipe.
While discharge due to process tail gas, maximum temperature can reach 600 DEG C, even and the sealing ring material of excellent performance, its high-temperature resistant also can only reach below 300 DEG C, the utility model is to solve the problem of sealing ring heatproof lower than exhaust temperature, connecting in the flange of process duct exhaust outlet and blast pipe, design gas purging structure.When process tail gas is discharged, when high temperature gas flow is flowed through flange connections, on the one hand flange is heated and makes the sealing ring temperature rise that contacts with it, and high temperature gas flow directly contacts with sealing ring via the gap at flange connection surface place on the other hand.Now, can pass into low temperature purge gas to air blowing air inlet, flange region of interest is carried out cooling and isolated high-temperature tail gas.The cryogenic gas being blown out by inflatable mouth blows to flange connection surface, on the one hand can stop high temperature gas flow to contact with sealing ring, play air bound from effect, on the other hand, cryogenic gas directly contacts with sealing ring, can reduce the temperature of sealing ring.According to the different process of semiconductor heat treatment facility, can the different purge gas of choice for use, for example can use nitrogen, air, argon gas etc.And, can be by controlling temperature and the flow of purge gas, internal temperature and pressure to blast pipe regulate.In addition, in use, the particle in process tail gas can deposit at the inwall of pipeline gas exhaust piping gradually, and gas exhaust piping is polluted, and need to regularly purify gas exhaust piping.Therefore, before PROCESS FOR TREATMENT, can be at air blowing air inlet access purge gas, the purge gas passing into enters the gap between two side flange joint faces via air blowing cavity, inflatable mouth, and enter flange inner wall by gap, along blast pipe by gas exhaust piping discharged to exhaust gas cooling device, thereby realize purified treatment to the whole gas exhaust piping outside process duct.
Further, described two side flanges joint face place near described flange inner wall between described sealing ring and described flange inner wall has the concavo-convex turnover face structure matching around circumference of flange setting, between the described concavo-convex turnover face forming, has certain interval.Concavo-convex turnover face structural design can avoid the flowing through large flow tail gas of blast pipe causes directly temperature shock to sealing ring; Simultaneously, because the material of blast pipe and exhaust outlet and flange is generally quartz, can not tolerate larger side direction mechanical erection power, this concavo-convex turnover face structural design can ensure the concentricity of two flanges in the time coordinating installation, avoids blast pipe and exhaust outlet to damage.
Further, the joint face of the wherein side flange in described two side flanges locates to be provided with around circumference of flange the baffle of a circle projection between described sealing ring and described inflatable mouth, can prevent from refluxing after purge gas from contacting with high-temperature tail gas, the cooling-down effect of impact to sealing ring.
Further, the top of described baffle has certain interval between the joint face of side flange corresponding thereto.Leave certain gap value, can make low temperature purge gas cross baffle, directly act on sealing ring, accelerate cooling to sealing ring, can store certain refrigerating gas in the space between sealing ring and baffle again, prevent the adverse effect that the heat transfer of high-temperature tail gas causes.
Further, the joint face of the wherein side flange of described inflatable mouth in described two side flanges arranges multiple around flange even circumferential, and described inflatable mouth is communicated with the air blowing cavity arranging around circumference of flange in this side flange body.Inflatable mouth arranges multiple along even circumferential at flange connection surface, can ensure the uniformity that purge gas is blown into, with equilibrium to the cooling of sealing ring and intercept high-temperature tail gas.
Further, described baffle and described inflatable mouth are located at the joint face place of flange described in the same side.
Further, described baffle and described inflatable mouth also can be located at respectively the joint face place of flange described in two sides.Baffle and inflatable mouth are located on same flange connection surface, or on different flange connection surfaces, the effect playing is the same.
Further, described clamping governor motion comprises two clamping plate that are oppositely arranged, described two clamping plate are connected with nut mutually by the adjustment screw matching, described two clamping plate are clamped in described exhaust side flange and described blast pipe side flange therebetween, and are fixed by the described adjustment screw and the nut that match that arrange on described two clamping plate; Described two clamping plate have by the hatch frame of described exhaust outlet and described blast pipe.Because the material of blast pipe and exhaust outlet and flange is quartz, can not tolerate larger mechanical erection power, unsuitable flange fixed structure, can produce and destroy quartz piece.Clamping governor motion of the present utility model, specially for above-mentioned quartz material design, by the fixing quartz flange of form of clamping plate, can make flange uniform stressed, has avoided flange rapid wear phenomenon when mounted.
Further, the described adjustment screw matching and the quantity of nut are 4, are divided into four bights of described two clamping plate, and in described adjustment screw, cover has Compress Spring; Wherein, by the rotation of described nut, make described Compress Spring there is different thrusts, adjust the gap value between described exhaust side flange and the described blast pipe side flange joint face of described two clamping plate clampings.The tightness of adjusting nut, can adjust the decrement of sealing ring, changes the gap length of flange connection surface.When being delivered to the heat of sealing ring by flange when larger, because the gap of flange connection surface is certain, purge gas can not reduce the temperature of sealing ring in time, now, adjustable gripping governor motion, unscrews nut, makes Compress Spring lax, to increase the gap of flange connection surface, realize the temperature of fast reducing sealing ring.
Further, described two clamping plate are clamped in described exhaust side flange and described blast pipe side flange therebetween, between the corresponding side flange of two described clamping plate and its clamping, are provided with flexible gasket.In the time fixing to clamp governor motion, in the time that adjusting nut screws, the distortion that fastening force produces can be cushioned by pad.
Can find out from technique scheme, the utility model purges structure by design refrigerating gas in the flange that connects process duct exhaust outlet and blast pipe, can pass into the refrigerating gas of uniform temperature and flow, form a gas isolation effect at the gapped flange connections of tool, intercept high-temperature tail gas, sealing ring surface between flange is lowered the temperature, and clamp the gap between governor motion adjustment flange connection surface by adjusting the flange of crush, to improve sealing ring cooler environment around, realize sealing ring high-temperature tail gas is around isolated, the effect of coolant seal circle and adjusting blast pipe internal temperature and pressure, can also be before PROCESS FOR TREATMENT, pass through gas purging, reach the effect of purifying exhaust gas pipeline.Therefore, the utlity model has good airproof performance, improve temperature tolerance, structural design is simple and there is the distinguishing features such as adjustability.
Brief description of the drawings
Fig. 1 is the mounting structure schematic diagram of the process duct exhaust apparatus of a kind of semiconductor vertical thermal-processing device of the utility model;
Fig. 2 is the structure cutaway view of the process duct exhaust apparatus adpting flange of a kind of semiconductor vertical thermal-processing device of the utility model;
Fig. 3 is the plan structure cutaway view of the blast pipe adpting flange of Fig. 2;
Fig. 4 is the structural representation that the process duct exhaust apparatus of a kind of semiconductor vertical thermal-processing device of the utility model clamps governor motion.
Embodiment
Below in conjunction with accompanying drawing, embodiment of the present utility model is described in further detail.
In the present embodiment, refer to Fig. 1, Fig. 1 is the mounting structure schematic diagram of the process duct exhaust apparatus of a kind of semiconductor vertical thermal-processing device of the utility model.As shown in the figure, process duct exhaust apparatus of the present utility model is located at the outside of semiconductor vertical thermal-processing device process duct 5, and process duct 5 sidewalls are provided with the air inlet 2 of process gas and the exhaust outlet 1 of process tail gas.Air inlet 2 and exhaust outlet 1 are quartz material.Process duct exhaust apparatus of the present utility model comprises the exhaust outlet 1 of process duct 5, connects the quartzy blast pipe 3 of exhaust outlet 1, and blast pipe 3 is connected to exhaust gas cooling device (figure slightly) by gas exhaust piping.Exhaust outlet 1 adopts quartz flange 14,15 to connect with blast pipe 3.Wherein, exhaust side flange 14 is fixed together by clamping governor motion 4 with blast pipe side flange 15.From the process tail gas of process duct 5 interior generations, enter gas exhaust piping by exhaust outlet 1, adpting flange 14 and 15, blast pipe 3, and finally process and reclaim through exhaust gas cooling device.
Refer to Fig. 2, Fig. 2 is the structure cutaway view of the process duct exhaust apparatus adpting flange of a kind of semiconductor vertical thermal-processing device of the utility model.As shown in the figure, between exhaust side flange 14 and the flange connection surface of blast pipe side flange 15, have certain gap 16, flange 14,15 is connected with exhaust outlet 1, blast pipe 3 by flange inner wall 19,20.Between flange connection surface, seal mutually by the sealing ring 7 arranging around circumference of flange.Sealing ring 7 can fix installation by the groove on the flange connection surface of flange 14.Joint face at blast pipe side flange 15 locates to be provided with inflatable mouth 9 between sealing ring 7 and blast pipe side flange inwall 20, inflatable mouth 9 is communicated with the intrinsic air blowing cavity 8 of blast pipe side flange 15, and air blowing cavity 8 is provided with and leads to 15 external air blowing air inlets 6 of blast pipe side flange.Sealing ring 7 being carried out when cooling by exhaust apparatus of the present utility model, the cooling purge gas being blown into by air blowing air inlet 6 enters the gap 16 between two side flange 14,15 joint faces via air blowing cavity 8, inflatable mouth 9, and enter flange inner wall 19,20 by gap 16, along the blast pipe 3 that is communicated with flange inner wall 20 by gas exhaust piping discharged to exhaust gas cooling device (as shown in the direction of arrow in figure).
Please continue to refer to Fig. 2.Exhaust side flange 14 has the concavo-convex turnover face matching 17,18 structures around circumference of flange setting with blast pipe side flange 15 joint face place near flange inner wall between sealing ring 7 and flange inner wall 19,20, between the concavo-convex turnover face 17,18 forming, also has certain interval.Concavo-convex turnover face structural design can avoid the flowing through large flow tail gas of blast pipe causes directly temperature shock to sealing ring.Meanwhile, because the material of blast pipe and exhaust outlet and flange is quartz, can not tolerate larger side direction mechanical erection power, this concavo-convex turnover face structural design can ensure the concentricity of two side flanges in the time coordinating installation, avoids blast pipe and exhaust outlet to damage.
Please continue to refer to Fig. 2.Between sealing ring 7 and inflatable mouth 9, locate to be provided with around circumference of flange the baffle 10 of a circle projection at the joint face of blast pipe side flange 15, can prevent from refluxing after purge gas from contacting with the high-temperature tail gas in blast pipe, the cooling-down effect of impact to sealing ring 7.Between the joint face of the top of baffle 10 and exhaust side flange 14, also there is certain interval.Leave certain gap value, can make low temperature purge gas cross baffle 10, directly act on sealing ring 7, acceleration is cooling to sealing ring 7, can store certain refrigerating gas in the space between sealing ring 7 and baffle 10 again, prevent the adverse effect that the heat transfer of high-temperature tail gas causes.
Refer to Fig. 3, Fig. 3 is the plan structure cutaway view of the blast pipe adpting flange of Fig. 2.As shown in the figure, inflatable mouth 9 arranges multiple at the joint face of blast pipe side flange around flange even circumferential.These inflatable mouths are connected around the air blowing cavity 8 of circumference of flange setting with in blast pipe side flange body.Air blowing cavity 8 has one and leads to this external air blowing air inlet 6 of blast pipe side flange.Inflatable mouth arranges multiple along even circumferential at flange connection surface, the uniformity that the purge gas (as shown in the direction of arrow figure) that can ensure to pass into from air blowing air inlet is blown into, with equilibrium to the cooling of sealing ring and intercept high-temperature tail gas.
Refer to Fig. 4, Fig. 4 is the structural representation that the process duct exhaust apparatus of a kind of semiconductor vertical thermal-processing device of the utility model clamps governor motion.As shown in the figure, clamp governor motion and comprise that 11,22, two clamping plate 11,22 of two clamping plate that are oppositely arranged link together by the 4 pairs of adjustment screw 24 that match and the nut 13 of being located at four bights.Two clamping plate 22,11 can be clamped in exhaust side flange 14 and blast pipe side flange 15 therebetween, and are fixed by the adjustment screw matching 24 and the nut 13 that arrange on two clamping plate.Two clamping plate 11,22 are respectively equipped with corresponding slit opening 25,26, are used for by exhaust outlet 1 and blast pipe 3.Blast pipe and exhaust outlet and flange adopt quartz material, can not tolerate larger mechanical erection power, and unsuitable flange fixed structure can produce and destroy quartz piece.The utility model, by the fixing quartz flange of form of clamping plate, can make flange uniform stressed, has avoided flange rapid wear phenomenon when mounted.
Please continue to refer to Fig. 4.Position cover in adjustment screw 24 between clamping plate 11 and nut 13 has Compress Spring 21 (totally 4).In the time that Compress Spring 21 is installed, first make Compress Spring there is certain decrement, in the time of rotating nut 13, can make Compress Spring 21 there is different thrusts, be used for adjusting the gap value between exhaust side flange 14 and blast pipe side flange 15 joint faces of two clamping plate, 22,11 clampings.Therefore, can, by the tightness of adjusting nut, carry out the decrement of corresponding adjustment sealing ring, to change the gap length of flange connection surface.When being delivered to the heat of sealing ring by flange when larger, because the gap of flange connection surface is certain, purge gas can not reduce the temperature of sealing ring in time, now, adjustable gripping governor motion, unscrews nut, makes Compress Spring lax, to increase the gap of flange connection surface, realize the temperature of fast reducing sealing ring.
Please continue to refer to Fig. 4.Two clamping plate are clamped in exhaust side flange and blast pipe side flange therebetween, between two clamping plate 22,11 and the corresponding side flange of its clamping, are provided with polytetrafluoroethylene (Polytetrafluoroethylene, PTFE) pad 23,12.PTFE pad has certain flexibility, and in the time fixing to clamp governor motion, in the time that adjusting nut screws, the distortion that fastening force produces can be cushioned by pad, to prevent that flange from damaging compared with large thrust because being directly subject to.
While discharge due to process tail gas, maximum temperature can reach 600 DEG C, even and the sealing ring material of excellent performance, its high-temperature resistant also can only reach below 300 DEG C.The utility model is to solve the problem of sealing ring heatproof lower than exhaust temperature, connecting in the flange of process duct exhaust outlet and blast pipe, has designed gas purging structure.When application the utility model, when discharging from exhaust outlet 1 in the process duct 5 of process tail gas by semiconductor heat treatment facility, when high temperature gas flow is flowed through flange 14,15 junction, on the one hand flange is heated and can makes sealing ring 7 temperature rises that contact with it, and high temperature gas flow also can directly contact with sealing ring 7 via the gap at flange connection surface place 16 on the other hand.Now, according to the different process of semiconductor heat treatment facility, can the different purge gas of choice for use, for example can use nitrogen, air, argon gas etc., pass into cooling purge gas at air blowing air inlet 6, blow out the gas of low temperature by air blowing cavity 8 to inflatable mouth 9.Purge gas blows to flange connection surface along the gap 16 between two side flanges 14,15, owing to being subject to stopping of baffle 10, only have small part to enter the space between baffle 10 and sealing ring 7, all the other major parts are by the gap along flange connection surface, blow to along concavo-convex turnover face 17,18 discharge duct that flange inner wall 19,20 is communicated with, thereby stoped high-temperature tail gas to enter the gap of flange connection surface.When being delivered to the heat of sealing ring 7 by flange when larger, adjustable gripping governor motion 4, unscrews nut 13, make Compress Spring 21 lax, to increase the gap 16 of flange connection surface, expand cooling space, allow more refrigerating gas enter gap, realize the temperature of fast reducing sealing ring 7.In the process that passes into purge gas, also can be by controlling temperature and the flow of purge gas, internal temperature and pressure to blast pipe regulate.In addition, in use, the particle in process tail gas can deposit at the inwall of pipeline gas exhaust piping gradually, and gas exhaust piping is polluted, and need to regularly purify gas exhaust piping.At this moment, before PROCESS FOR TREATMENT, can be at air blowing air inlet access purge gas, the purge gas passing into enters the gap between two side flange joint faces via air blowing cavity, inflatable mouth, and enter flange inner wall by gap, along blast pipe by gas exhaust piping discharged to exhaust gas cooling device, thereby realize purified treatment to the whole gas exhaust piping outside process duct.
Therefore, process duct exhaust apparatus of the present utility model can stop high temperature gas flow to contact with sealing ring on the one hand, play air bound from effect; On the other hand, cryogenic gas directly contacts with sealing ring, can reduce the temperature of sealing ring.And, can be by controlling temperature and the flow of purge gas, internal temperature and pressure to blast pipe regulate.In addition,, before PROCESS FOR TREATMENT, can also carry out purified treatment to gas exhaust piping by passing into purge gas.
It should be noted that, the structure of inflatable mouth, air blowing cavity and air blowing air inlet in above-described embodiment also can arrange in the relevant position of exhaust side flange; Baffle and inflatable mouth are located on same flange connection surface, or on different flange connection surfaces, the effect playing is all the same; Air blowing air inlet needs to arrange one according to the control of refrigerating gas flow, or multiple; Compress Spring also can be contained in other positions of screw, as long as its length and pressuring action adapt.Industry those of ordinary skill can be understood well, so locate to repeat no more.
Above-described is only preferred embodiment of the present utility model; described embodiment is not in order to limit scope of patent protection of the present utility model; therefore the equivalent structure that every utilization specification of the present utility model and accompanying drawing content are done changes, and in like manner all should be included in protection range of the present utility model.

Claims (10)

1. the process duct exhaust apparatus of a semiconductor vertical thermal-processing device, comprise the exhaust outlet of semiconductor vertical thermal-processing device process duct, connect the blast pipe of exhaust outlet, described blast pipe is connected to exhaust gas cooling device by gas exhaust piping, the junction of described exhaust outlet and described blast pipe is provided with sealing ring, it is characterized in that, described exhaust outlet and described blast pipe adopt flange to connect, between the flange connection surface of exhaust side flange and blast pipe side flange, there is certain interval, between described flange connection surface by sealing mutually around the sealing ring of circumference of flange setting; The joint face of the wherein side flange in two side flanges locates to be provided with inflatable mouth between described sealing ring and flange inner wall, described inflatable mouth is communicated with the intrinsic air blowing cavity of this side flange, and described air blowing cavity is provided with and leads to this external air blowing air inlet of this side flange; Described two side flanges are connected mutually by clamping governor motion; Wherein, can be blown into different cooling purge gas by described air blowing air inlet, enter the described gap between described two side flange joint faces via described air blowing cavity, described inflatable mouth, and enter described flange inner wall by described gap, pass through described gas exhaust piping discharged to described exhaust gas cooling device along described blast pipe.
2. process duct exhaust apparatus as claimed in claim 1, it is characterized in that, described two side flanges joint face place near described flange inner wall between described sealing ring and described flange inner wall has the concavo-convex turnover face structure matching around circumference of flange setting, between the described concavo-convex turnover face forming, has certain interval.
3. process duct exhaust apparatus as claimed in claim 1, is characterized in that, the joint face of the wherein side flange in described two side flanges locates to be provided with around circumference of flange the baffle of a circle projection between described sealing ring and described inflatable mouth.
4. process duct exhaust apparatus as claimed in claim 3, is characterized in that, the top of described baffle has certain interval between the joint face of side flange corresponding thereto.
5. process duct exhaust apparatus as claimed in claim 1, it is characterized in that, the joint face of the wherein side flange of described inflatable mouth in described two side flanges arranges multiple around flange even circumferential, described inflatable mouth is communicated with the air blowing cavity arranging around circumference of flange in this side flange body.
6. process duct exhaust apparatus as claimed in claim 3, is characterized in that, described baffle and described inflatable mouth are located at the joint face place of flange described in the same side.
7. process duct exhaust apparatus as claimed in claim 3, is characterized in that, described baffle and described inflatable mouth are located at respectively the joint face place of flange described in two sides.
8. process duct exhaust apparatus as claimed in claim 1, it is characterized in that, described clamping governor motion comprises two clamping plate that are oppositely arranged, described two clamping plate are connected with nut mutually by the adjustment screw matching, described two clamping plate are clamped in described exhaust side flange and described blast pipe side flange therebetween, and are fixed by the described adjustment screw and the nut that match that arrange on described two clamping plate; Described two clamping plate have by the hatch frame of described exhaust outlet and described blast pipe.
9. process duct exhaust apparatus as claimed in claim 8, is characterized in that, the described adjustment screw matching and the quantity of nut are 4, is divided into four bights of described two clamping plate, and in described adjustment screw, cover has Compress Spring; Wherein, by the rotation of described nut, make described Compress Spring there is different thrusts, adjust the gap value between described exhaust side flange and the described blast pipe side flange joint face of described two clamping plate clampings.
10. process duct exhaust apparatus as claimed in claim 8 or 9, it is characterized in that, described two clamping plate are clamped in described exhaust side flange and described blast pipe side flange therebetween, between the corresponding side flange of two described clamping plate and its clamping, are provided with flexible gasket.
CN201420243244.8U 2014-05-13 2014-05-13 Exhaust device of process pipe of vertical thermal treatment equipment for semiconductors Withdrawn - After Issue CN203859104U (en)

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Application Number Priority Date Filing Date Title
CN201420243244.8U CN203859104U (en) 2014-05-13 2014-05-13 Exhaust device of process pipe of vertical thermal treatment equipment for semiconductors

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Application Number Priority Date Filing Date Title
CN201420243244.8U CN203859104U (en) 2014-05-13 2014-05-13 Exhaust device of process pipe of vertical thermal treatment equipment for semiconductors

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103985632A (en) * 2014-05-13 2014-08-13 北京七星华创电子股份有限公司 Exhaust device of process pipe
CN111998155A (en) * 2020-08-26 2020-11-27 北京北方华创微电子装备有限公司 Exhaust device of semiconductor process equipment and semiconductor process equipment
CN113445027A (en) * 2021-05-31 2021-09-28 北京北方华创微电子装备有限公司 Tail gas treatment device for semiconductor equipment and semiconductor equipment

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103985632A (en) * 2014-05-13 2014-08-13 北京七星华创电子股份有限公司 Exhaust device of process pipe
CN103985632B (en) * 2014-05-13 2016-09-07 北京七星华创电子股份有限公司 A kind of process duct exhaust apparatus
CN111998155A (en) * 2020-08-26 2020-11-27 北京北方华创微电子装备有限公司 Exhaust device of semiconductor process equipment and semiconductor process equipment
CN113445027A (en) * 2021-05-31 2021-09-28 北京北方华创微电子装备有限公司 Tail gas treatment device for semiconductor equipment and semiconductor equipment

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