CN203816429U - Device for treating tail gas in sintering of polished rod - Google Patents
Device for treating tail gas in sintering of polished rod Download PDFInfo
- Publication number
- CN203816429U CN203816429U CN201420078766.7U CN201420078766U CN203816429U CN 203816429 U CN203816429 U CN 203816429U CN 201420078766 U CN201420078766 U CN 201420078766U CN 203816429 U CN203816429 U CN 203816429U
- Authority
- CN
- China
- Prior art keywords
- tube
- water scrubber
- grades
- caustic wash
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005245 sintering Methods 0.000 title claims abstract description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 58
- 239000003518 caustics Substances 0.000 claims description 31
- 230000003287 optical effect Effects 0.000 claims description 13
- 239000006228 supernatant Substances 0.000 claims description 13
- 239000010802 sludge Substances 0.000 claims description 3
- 239000000428 dust Substances 0.000 abstract description 17
- 238000005406 washing Methods 0.000 abstract description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 8
- 239000000377 silicon dioxide Substances 0.000 abstract description 4
- 230000007613 environmental effect Effects 0.000 abstract description 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 14
- 239000002912 waste gas Substances 0.000 description 13
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 12
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 10
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 10
- 229910004298 SiO 2 Inorganic materials 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000002699 waste material Substances 0.000 description 8
- 239000003513 alkali Substances 0.000 description 6
- 239000007921 spray Substances 0.000 description 5
- 239000000945 filler Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000006835 compression Effects 0.000 description 3
- 238000007906 compression Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 239000010865 sewage Substances 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 208000005156 Dehydration Diseases 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000010808 liquid waste Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012946 outsourcing Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000007634 remodeling Methods 0.000 description 1
- 239000011257 shell material Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
Abstract
The utility model relates to the technical field of environmental protection and particularly relates to a device for treating tail gas in sintering of a polished rod. The device comprises a Venturi-tube dust remover, a wire-mesh filter, a washing tower, a wet type electrostatic dust remover, a second-stage washing tower, a second-stage wet type electrostatic dust remover and an alkaline washing tower which are connected in sequence, wherein the Venturi-tube dust remover, the washing tower, the wet type electrostatic dust remover, the second-stage washing tower, the second-stage wet type electrostatic dust remover and the alkaline washing tower are respectively connected with a first-stage inclined-tube settling pond, a second-stage inclined-tube settling pond, a third-stage inclined-tube settling pond, a fourth-stage inclined-tube settling pond, a fifth-stage inclined-tube settling pond and a sixth-stage inclined-tube settling pond in sequence by a circulating pump; the top parts of the washing tower and the second-stage washing tower are provided with demisters; a supernate outlet on the wire-mesh filter is connected with the second-stage inclined-tube settling pond; and a supernate outlet on the second-stage inclined-tube settling pond is connected with the Venturi-tube dust remover. The device is used for recovering SiO2 and HCl in the tail gas in sintering of the polished rod, and can be used for treating the tail gas with high concentration.
Description
Technical field
The utility model relates to environmental technology field, particularly a kind of optical wand sintering exhaust gas processing device.
Background technology
Optical wand sintering is taking silicon tetrachloride as raw material, and hydrogen, oxygen are supply gas, at high temperature reacts and generates orthosilicic acid and hydrogen chloride, and orthosilicic acid is sloughed two water and generated silica.The key reaction formula of optical wand sintering: SiCl
4+ 4H
2o==H
4siO
4+ 4HCl, H
4siO
4==2H
2o+SiO
2.Chinese patent discloses a kind of gas-phase silicon dioxide tail gas treatment process device for No. 201110164284.4, has and is difficult for stopping up, and by-product hydrochloric acid concentration is high, and advantage that can by-product high-purity hydrogen chloride.But before science and engineering skill, tail gas was processed through bag-type dust herein, had illustrated that this device only limits to the silica vent gas treatment of low concentration.
Utility model content
The utility model provides a kind of optical wand sintering exhaust gas processing device, and this device is for burning the SiO that separates tail gas to optical wand
2reclaim with HCl, can process the tail gas of higher concentration.
The utility model solves the technical scheme that its technical problem adopts:
A kind of optical wand sintering exhaust gas processing device, this device is by venturi tube duster, wire gauzee filter, water scrubber, wet cottrell, secondary water scrubber, secondary wet cottrell, caustic wash tower is connected in sequence, venturi tube duster, water scrubber, wet cottrell, secondary water scrubber, secondary wet cottrell, caustic wash tower respectively by water circulating pump successively with one-level tube settler, secondary tube settler, three grades of tube settlers, level Four tube settler, Pyatyi tube settler is connected with six grades of tube settlers, the top of water scrubber and secondary water scrubber is provided with demister, the supernatant outlet of wire gauzee filter is connected with secondary tube settler, and the supernatant outlet of secondary tube settler is connected with venturi tube duster.
As preferably, in caustic wash tower tower body, upper end is provided with demister, and the top of caustic wash tower is connected with blower fan.
As preferably, the sludge outlet of secondary tube settler, three grades of tube settlers, level Four tube settler, Pyatyi tube settler and six grades of tube settlers is connected with concentration basin respectively.
As preferably, described concentration basin, be connected with plate and frame filter press, the second caustic wash tower, secondary plate and frame filter press, the second water scrubber and three grades of plate and frame filter press in turn, concentration basin arranges respectively with plate and frame filter press the return line being connected with wire gauzee filter, between the second caustic wash tower, secondary plate and frame filter press, the second water scrubber and three grades of plate and frame filter press and caustic wash tower, return line is set respectively.
The beneficial effects of the utility model are: this device is for burning the SiO that separates tail gas to optical wand
2reclaim with HCl, can process the tail gas of higher concentration.This device is provided with supernatant return line supernatant is carried out to step by step concentration, thereby reclaims high concentration HCl.Concentrated and the plate compression of mud is also provided with return line mud is purified, and makes the SO reclaiming
2purity improve.
Brief description of the drawings
Fig. 1 is process chart of the present utility model;
Fig. 2 is the structural representation of the utility model device;
In figure: 1 venturi tube duster, 2 wire gauzee filters, 3 water scrubbers, 4 wet cottrells, 5 secondary water scrubbers, 6 secondary wet cottrells, 7 caustic wash towers, 8 blower fans, 9 concentration basins, 10 plate and frame filter press, 11 second caustic wash towers, 12 secondary plate and frame filter press, 13 second water scrubbers, 14 3 grades of plate and frame filter press, 15 one-level tube settlers, 16 secondary tube settlers, 17 3 grades of tube settlers, 18 level Four tube settlers, 19 Pyatyi tube settlers, 20 6 grades of tube settlers.
Detailed description of the invention
Below by specific embodiment, and by reference to the accompanying drawings, the technical solution of the utility model is described in further detail.Should be appreciated that enforcement of the present utility model is not limited to the following examples, any pro forma accommodation that the utility model is made and/or change all will fall into the utility model protection domain.
Embodiment:
The device of a kind of optical wand sintering vent gas treatment as shown in Figure 1, this device is connected in sequence by venturi tube duster 1, wire gauzee filter 2, water scrubber 3, wet cottrell 4, secondary water scrubber 5, secondary wet cottrell 6, caustic wash tower 7, in caustic wash tower tower body, upper end is provided with demister, and the top of caustic wash tower is connected with blower fan 8.Venturi tube duster, water scrubber, wet cottrell, secondary water scrubber, secondary wet cottrell, caustic wash tower are connected with six grades of tube settlers 20 with one-level tube settler 15, secondary tube settler 16, three grades of tube settlers 17, level Four tube settler 18, Pyatyi tube settlers 19 successively by water circulating pump respectively, and the top in water scrubber and secondary water scrubber tower body is provided with demister; The supernatant outlet of wire gauzee filter is connected with secondary tube settler, and the supernatant outlet of secondary tube settler is connected with venturi tube duster.
The sludge outlet of secondary tube settler, three grades of tube settlers, level Four tube settler, Pyatyi tube settler and six grades of tube settlers is connected with concentration basin 9 respectively.Described concentration basin, be connected with plate and frame filter press 10, the second caustic wash tower 11, secondary plate and frame filter press 12, the second water scrubber 13 and three grades of plate and frame filter press 14 in turn, concentration basin arranges respectively with plate and frame filter press the return line being connected with wire gauzee filter, between the second caustic wash tower, secondary plate and frame filter press, the second water scrubber and three grades of plate and frame filter press and caustic wash tower, return line is set respectively.
Sewage backflow between secondary tube settler, concentration basin and plate and frame filter press, to wire gauzee filter, reduces the concentration of the HCl of subordinate, SiO
2concentration improve.The cleaning press filtration (two-stage plate compression) repeating makes SiO
2purity higher, can effectively reclaim and in waste gas, have the composition of value and make waste gas qualified discharge.
Wet cottrell is treatment S iO
2the core visual plant of dust, wet cottrell is vertical structure.Equipment material: shell material FRP, dust collector pole material C-FRP, through the SiO of cooling tower decreasing temperature and increasing humidity
2dust enters from wet cottrell bottom air inlet, discharges from top.Trapped the SiO getting off by dust collector pole
2dust, through being arranged on the washing away of spray system water at wet cottrell top, SiO
2dust flows into the cyclic water tank of electric cleaner with current.Wet cottrell dust collector pole developed area is 2022.4 ㎡, the very rectangle that gathers dust, and with pole span 396mm, the high 5m of electrode; Be 0.334m/s by the dust-contained airflow speed of one-level wet cottrell; This device can trap particle more than 0.03 μ m, efficiency of dust collection >=93%.
The water tank of caustic wash tower is provided with one of pH meter, detects the basicity of water tank, in the time of pH value < 8, and high-order alkali groove metering pumping NaOH, in the time of pH value > 9, high-order alkali groove measuring pump stops sending NaOH.
The swash plate that tube settler usage level inclination angle is 60, the sedimentation basin that is A1 by original area is divided into n layer, and the total settlement area of current is A=n*A1*cos α, calculates theoretically its discharge capacity and has improved n*cos α doubly.The current sedimentation time of this tube settler is about 100min-200min, water capacity 20m
3.For convenience of spoil disposal, tube settler is placed on the high platform of frame.Tube settler material is manufactured with FRP, and outsourcing SS steel pipe is made frame structure, the anticorrosion rear and fiberglass coverboard strong bond of steelframe external application FRP.
The built-in one deck many-sided ball of water scrubber and caustic wash tower filler (43.96m
3), the high 3500mm of individual layer filler.DN50 many-sided ball, PP material for filler.One spray equipment is set on every layer of filler, 7 detachable spiral solid type nozzles (190L/min) are housed, layer spray flux 80m
3/ h, hydraulic load 6.3m
3/ m
2h.
Following content is to adopt the utility model device to carry out the process of exhaust-gas treatment, and process chart is shown in Fig. 2:
A, exhaust-gas treatment and HCl reclaim:
150 DEG C are mixed with SiO
2concentration 1.5g/Nm
3, HCl concentration 7g/Nm
3optical wand sintering exhaust emissions after first enter venturi tube duster 1 and lower the temperature after dedusting, gas temperature drops within the scope of 45 DEG C～55 DEG C, then entering wire gauzee filter 2 dewaters, the waste liquid part producing enters one-level tube settler 15 by water pump, and another part is returned the venturi tube duster dedusting of lowering the temperature.The supernatant of one-level tube settler 15 removes concentrated HCl.
Waste gas after wire gauzee filter 2 dehydrations enters water scrubber 3 and washes, and the waste liquid going out from water scrubber tower bottom flow enters secondary tube settler 16, and the supernatant of secondary tube settler is back to venturi tube duster.Part waste gas, after the demister demist at water scrubber top, enters wet cottrell, and the waste liquid that wet cottrell the flows out supernatant part that a part enters 17, three grades of tube settlers of three grades of tube settlers is back to water scrubber.Enter secondary water scrubber 5 from wet cottrell waste gas out.
Waste gas enters after 5 washings of secondary water scrubber, and waste gas enters the demister of tower top, and waste liquid enters level Four tube settler 18 by water pump part water at the bottom of tower, and another part water loops back secondary water scrubber.The supernatant of level Four tube settler is back to wet cottrell.Waste gas is after demister demist, and waste gas enters secondary wet cottrell 6, and waste liquid enters Pyatyi tube settler 19, and the supernatant of Pyatyi tube settler is back to secondary water scrubber.Waste gas enters the dedusting once again of secondary wet cottrell, adds quantitative water to secondary wet cottrell simultaneously, and secondary wet cottrell waste gas out enters caustic wash tower 7 and carries out alkali lye spray.
Waste gas enters caustic wash tower 7 and carries out alkali lye spray, adds alkali lye simultaneously.Waste gas enters the demister of tower top after demist, and by blower fan qualified discharge, now HCl concentration is 100mg/Nm
3(20 DEG C); Waste liquid enters six grades of tube settlers 20 by water pump part water, and another part water loops back caustic wash tower.In six grades of tube settlers, waste liquid is included sewage network discharge in.
B, liquid waste processing and SiO
2reclaim:
It is concentrated that secondary to the mud in Pyatyi tube settler enters concentration basin 9, and concentrated rear mud enters plate and frame filter press 10, and the waste reflux of concentration basin 9 and plate and frame filter press 10 is to secondary tube settler.Mud is after plate and frame filter press 10 press filtrations, mud enters the second caustic wash tower 11 and processes and supplement in time alkali lye and water, after 12 press filtrations of secondary plate and frame filter press, mud enters the second water scrubber 13 and adds water toward water scrubber simultaneously, after washing, mud enters three grades of plate and frame filter press 14, after mud plate compression, reclaims SiO
2, SiO
2concentration 60mg/Nm
3(20 DEG C).
The liquid that the second caustic wash tower 11, secondary plate and frame filter press 12, the second water scrubber 13 and three grades of plate and frame filter press 14 flow out is all back to caustic wash tower 7 and further processes.
Above-described embodiment is preferably scheme of one of the present utility model, not the utility model is done to any pro forma restriction, also has other variant and remodeling under the prerequisite that does not exceed the technical scheme that claim records.
Claims (4)
1. an optical wand sintering exhaust gas processing device, it is characterized in that: this device is by venturi tube duster, wire gauzee filter, water scrubber, wet cottrell, secondary water scrubber, secondary wet cottrell, caustic wash tower is connected in sequence, venturi tube duster, water scrubber, wet cottrell, secondary water scrubber, secondary wet cottrell, caustic wash tower respectively by water circulating pump successively with one-level tube settler, secondary tube settler, three grades of tube settlers, level Four tube settler, Pyatyi tube settler is connected with six grades of tube settlers, the top of water scrubber and secondary water scrubber is provided with demister, the supernatant outlet of wire gauzee filter is connected with secondary tube settler, and the supernatant outlet of secondary tube settler is connected with venturi tube duster.
2. optical wand sintering exhaust gas processing device according to claim 1, is characterized in that: in caustic wash tower tower body, upper end is provided with demister, and the top of caustic wash tower is connected with blower fan.
3. optical wand sintering exhaust gas processing device according to claim 1, is characterized in that: the sludge outlet of secondary tube settler, three grades of tube settlers, level Four tube settler, Pyatyi tube settler and six grades of tube settlers is connected with concentration basin respectively.
4. according to the optical wand sintering exhaust gas processing device described in claim 1 or 2 or 3, it is characterized in that: described concentration basin, be connected with plate and frame filter press, the second caustic wash tower, secondary plate and frame filter press, the second water scrubber and three grades of plate and frame filter press in turn, concentration basin arranges respectively with plate and frame filter press the return line being connected with wire gauzee filter, between the second caustic wash tower, secondary plate and frame filter press, the second water scrubber and three grades of plate and frame filter press and caustic wash tower, return line is set respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420078766.7U CN203816429U (en) | 2014-02-24 | 2014-02-24 | Device for treating tail gas in sintering of polished rod |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420078766.7U CN203816429U (en) | 2014-02-24 | 2014-02-24 | Device for treating tail gas in sintering of polished rod |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203816429U true CN203816429U (en) | 2014-09-10 |
Family
ID=51471973
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420078766.7U Expired - Lifetime CN203816429U (en) | 2014-02-24 | 2014-02-24 | Device for treating tail gas in sintering of polished rod |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203816429U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103933811A (en) * | 2014-02-24 | 2014-07-23 | 杭州碧空环境科技有限公司 | Optical fiber perform rod sintering tail gas processing apparatus and method |
| CN113663489A (en) * | 2021-08-26 | 2021-11-19 | 云南云铜锌业股份有限公司 | Treatment system and method for zinc leaching residue volatilizing kiln tail gas |
| CN114226066A (en) * | 2021-12-20 | 2022-03-25 | 中国建筑材料科学研究总院有限公司 | SiO recycled from tail gas2Method and apparatus for powder |
-
2014
- 2014-02-24 CN CN201420078766.7U patent/CN203816429U/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103933811A (en) * | 2014-02-24 | 2014-07-23 | 杭州碧空环境科技有限公司 | Optical fiber perform rod sintering tail gas processing apparatus and method |
| CN103933811B (en) * | 2014-02-24 | 2015-11-18 | 杭州碧空环境科技有限公司 | Optical wand sintering exhaust gas processing device and method |
| CN113663489A (en) * | 2021-08-26 | 2021-11-19 | 云南云铜锌业股份有限公司 | Treatment system and method for zinc leaching residue volatilizing kiln tail gas |
| CN114226066A (en) * | 2021-12-20 | 2022-03-25 | 中国建筑材料科学研究总院有限公司 | SiO recycled from tail gas2Method and apparatus for powder |
| CN114226066B (en) * | 2021-12-20 | 2024-04-12 | 中国建筑材料科学研究总院有限公司 | SiO recovered from tail gas 2 Method and device for powder |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN203816429U (en) | Device for treating tail gas in sintering of polished rod | |
| CN101732963A (en) | Multiphase flow smoke purifying process | |
| CN202700308U (en) | Spray painting waste gas purification device | |
| JP5511667B2 (en) | Method for producing hydrogen gas from hydrogen halide, mixed gas containing hydrogen and silicon halide, method for producing silicon compound using the hydrogen gas, and plant for the method | |
| CN110467155A (en) | A kind of system and technique of the hydrogen chloride that processing hydrolyzing chlorosilane generates | |
| CN104906920B (en) | System for recycling fluorine and silicon resources from wet-process phosphoric acid tail gas and recovery method thereof | |
| CN205913932U (en) | Novel spray column | |
| CN205832865U (en) | Compound fertilizer's exhaust gas purification system | |
| CN109650339A (en) | Hydrolyzing chlorosilane prepares the technique and device of hydrogen chloride | |
| CN104671498A (en) | Treatment method and device of wastewater containing superfine silicon powder | |
| CN107537285B (en) | Multi-level recycling system and method for acid-making wastewater from smelting flue gas | |
| CN103933811B (en) | Optical wand sintering exhaust gas processing device and method | |
| CN203568858U (en) | Production system for synthesis of silicon tetrachloride | |
| CN202070281U (en) | Tail gas recovery and purification treatment device for polycrystalline silicon production line | |
| CN1471997A (en) | Washing method and apparatus for phosphoric acid reacting trough extracting tail gas | |
| CN207287062U (en) | A kind of exhaust gas processing device prepared using fluosilicic acid during anhydrous hydrogen fluoride | |
| CN203222476U (en) | System for removing chloro-silane in HCl tail gas | |
| CN206837832U (en) | A kind of Multifunction water-saving stone desulphurization water dust scrubber | |
| CN202449862U (en) | Device for treating silicon tetrachloride raffinate | |
| CN217249719U (en) | Integrated wet purification device suitable for electrolytic aluminum overhaul slag waste gas treatment | |
| CN214513725U (en) | Titanium tetrachloride tail gas treatment system | |
| CN201704059U (en) | Hydrogen chloride purifying device | |
| CN204714537U (en) | Full-automatic car-washing sewage disposal device | |
| CN204485544U (en) | Water deposition type smoke and dust purifier | |
| CN207913468U (en) | A kind of device for recovering tail gas in fluosilicic acid concentration process |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: Pu Yang Zhen Jian Hu Cun, Xiaoshan District, Hangzhou City, Zhejiang Province Patentee after: Blue Sky Environmental Technology Co.,Ltd. Address before: Pu Yang Zhen Jian Hu Cun, Xiaoshan District, Hangzhou City, Zhejiang Province Patentee before: HANGZHOU BIKONG ENVIRONMENT TECHNOLOGY Co.,Ltd. |
|
| CP01 | Change in the name or title of a patent holder | ||
| CX01 | Expiry of patent term |
Granted publication date: 20140910 |
|
| CX01 | Expiry of patent term |