CN202070281U - Tail gas recovery and purification treatment device for polycrystalline silicon production line - Google Patents
Tail gas recovery and purification treatment device for polycrystalline silicon production line Download PDFInfo
- Publication number
- CN202070281U CN202070281U CN2011200718771U CN201120071877U CN202070281U CN 202070281 U CN202070281 U CN 202070281U CN 2011200718771 U CN2011200718771 U CN 2011200718771U CN 201120071877 U CN201120071877 U CN 201120071877U CN 202070281 U CN202070281 U CN 202070281U
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- CN
- China
- Prior art keywords
- hydrochloric acid
- pipeline
- tail gas
- connects
- heat exchanger
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 238000011084 recovery Methods 0.000 title claims abstract description 82
- 229910021420 polycrystalline silicon Inorganic materials 0.000 title claims abstract description 30
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 29
- 238000000746 purification Methods 0.000 title abstract description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 332
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 53
- 239000005046 Chlorosilane Substances 0.000 claims abstract description 27
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims abstract description 27
- 230000008676 import Effects 0.000 claims description 44
- 238000004140 cleaning Methods 0.000 claims description 39
- 239000000243 solution Substances 0.000 claims description 39
- 238000004064 recycling Methods 0.000 claims description 38
- 229920005591 polysilicon Polymers 0.000 claims description 26
- 239000003513 alkali Substances 0.000 claims description 19
- 238000005406 washing Methods 0.000 claims description 16
- 239000002826 coolant Substances 0.000 claims description 11
- 238000007710 freezing Methods 0.000 claims description 7
- 230000008014 freezing Effects 0.000 claims description 7
- 239000012266 salt solution Substances 0.000 claims description 4
- 239000006096 absorbing agent Substances 0.000 claims description 3
- 239000012530 fluid Substances 0.000 claims description 3
- 238000006386 neutralization reaction Methods 0.000 abstract description 4
- 239000006227 byproduct Substances 0.000 abstract description 2
- 239000006229 carbon black Substances 0.000 abstract 2
- 235000011167 hydrochloric acid Nutrition 0.000 description 114
- 239000007789 gas Substances 0.000 description 90
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 11
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 11
- 238000000034 method Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 4
- 239000005052 trichlorosilane Substances 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 235000012241 calcium silicate Nutrition 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000007726 management method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000010865 sewage Substances 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
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- Treating Waste Gases (AREA)
- Silicon Compounds (AREA)
Abstract
Description
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2011200718771U CN202070281U (en) | 2011-03-14 | 2011-03-14 | Tail gas recovery and purification treatment device for polycrystalline silicon production line |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2011200718771U CN202070281U (en) | 2011-03-14 | 2011-03-14 | Tail gas recovery and purification treatment device for polycrystalline silicon production line |
Publications (1)
Publication Number | Publication Date |
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CN202070281U true CN202070281U (en) | 2011-12-14 |
Family
ID=45108397
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2011200718771U Expired - Lifetime CN202070281U (en) | 2011-03-14 | 2011-03-14 | Tail gas recovery and purification treatment device for polycrystalline silicon production line |
Country Status (1)
Country | Link |
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CN (1) | CN202070281U (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102160962A (en) * | 2011-03-14 | 2011-08-24 | 蒋超 | Tail gas recovering and purifying treatment device for polycrystalline production line |
CN105036141A (en) * | 2015-08-03 | 2015-11-11 | 昆明理工大学 | Method for producing nanosilicon dioxide and by-product hydrochloric acid through chlorosilane waste gas |
CN108837662A (en) * | 2018-08-13 | 2018-11-20 | 金能科技股份有限公司 | A kind of dry kiln gas of carbon black takes off white device and technique |
CN109569262A (en) * | 2018-12-25 | 2019-04-05 | 亚洲硅业(青海)有限公司 | The method, apparatus and application of chlorosilane in a kind of removal polysilicon tail gas |
-
2011
- 2011-03-14 CN CN2011200718771U patent/CN202070281U/en not_active Expired - Lifetime
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102160962A (en) * | 2011-03-14 | 2011-08-24 | 蒋超 | Tail gas recovering and purifying treatment device for polycrystalline production line |
CN102160962B (en) * | 2011-03-14 | 2013-03-20 | 蒋超 | Tail gas recovering and purifying treatment device for polycrystalline production line |
CN105036141A (en) * | 2015-08-03 | 2015-11-11 | 昆明理工大学 | Method for producing nanosilicon dioxide and by-product hydrochloric acid through chlorosilane waste gas |
CN108837662A (en) * | 2018-08-13 | 2018-11-20 | 金能科技股份有限公司 | A kind of dry kiln gas of carbon black takes off white device and technique |
CN108837662B (en) * | 2018-08-13 | 2024-05-28 | 金能化学(青岛)有限公司 | Carbon black drying furnace flue gas whitening device and process |
CN109569262A (en) * | 2018-12-25 | 2019-04-05 | 亚洲硅业(青海)有限公司 | The method, apparatus and application of chlorosilane in a kind of removal polysilicon tail gas |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
EE01 | Entry into force of recordation of patent licensing contract |
Assignee: JIANGSU HONGYUAN FRP EQUIPMENT CO., LTD. Assignor: Jiang Chao Contract record no.: 2012320000058 Denomination of utility model: Tail gas recovering and purifying treatment device for polycrystalline production line Granted publication date: 20111214 License type: Exclusive License Record date: 20120209 |
|
ASS | Succession or assignment of patent right |
Owner name: JIANGSU HONGYUAN FRP EQUIPMENT CO., LTD. Free format text: FORMER OWNER: JIANG CHAO Effective date: 20120308 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20120308 Address after: 213175 Changzhou District, Jiangsu City, Wujin Province town of Cao Yun Village Post Office Xijiang Su Hongyuan glass fiber reinforced plastic Co., Ltd. Patentee after: JIANGSU HONGYUAN FRP EQUIPMENT CO., LTD. Address before: 213175, No. 1, Dahe head, Tan Town, Wujin District, Jiangsu, Changzhou Patentee before: Jiang Chao |
|
AV01 | Patent right actively abandoned |
Granted publication date: 20111214 Effective date of abandoning: 20130320 |
|
RGAV | Abandon patent right to avoid regrant |