CN103933811B - Optical wand sintering exhaust gas processing device and method - Google Patents
Optical wand sintering exhaust gas processing device and method Download PDFInfo
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- CN103933811B CN103933811B CN201410061147.1A CN201410061147A CN103933811B CN 103933811 B CN103933811 B CN 103933811B CN 201410061147 A CN201410061147 A CN 201410061147A CN 103933811 B CN103933811 B CN 103933811B
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Abstract
The present invention relates to environmental technology field, particularly a kind of optical wand sintering exhaust gas processing device and method.A kind of optical wand sintering exhaust gas processing device, this device is by venturi tube duster, wire gauzee filter, water scrubber, wet cottrell, secondary water scrubber, secondary wet cottrell, caustic wash tower is connected in sequence, venturi tube duster, water scrubber, wet cottrell, secondary water scrubber, secondary wet cottrell, caustic wash tower respectively by water circulating pump successively with one-level tube settler, secondary tube settler, three grades of tube settlers, level Four tube settler, Pyatyi tube settler is connected with six grades of tube settlers, the top of water scrubber and secondary water scrubber is provided with demister, the supernatant outlet of wire gauzee filter is connected with secondary tube settler, and the supernatant outlet of secondary tube settler is connected with venturi tube duster.This device is used for burning to optical wand the SiO separated in tail gas
2reclaim with HCl, the tail gas of higher concentration can be processed.
Description
Technical field
The present invention relates to environmental technology field, particularly a kind of optical wand sintering exhaust gas processing device and method.
Background technology
Optical wand sintering take silicon tetrachloride as raw material, and hydrogen, oxygen are supply gas, at high temperature carry out reacting and generate orthosilicic acid and hydrogen chloride, and orthosilicic acid is sloughed two water and generated silica.The key reaction formula of optical wand sintering: SiCl
4+ 4H
2o==H
4siO
4+ 4HCl, H
4siO
4==2H
2o+SiO
2.No. 201110164284.4, Chinese patent discloses a kind of gas-phase silicon dioxide tail gas treatment process device, and have and not easily block, by-product hydrochloric acid concentration is high, and can the advantage of by-product high-purity hydrogen chloride.But before science and engineering skill, tail gas is through bag-type dust process herein, describes the silica vent gas treatment that this device is only limitted to low concentration.
Summary of the invention
The invention provides a kind of optical wand sintering exhaust gas processing device, this device is used for burning to optical wand the SiO separated in tail gas
2reclaim with HCl, the tail gas of higher concentration can be processed.
The present invention also provides a kind of method utilizing described device to carry out optical wand sintering vent gas treatment.
The technical solution adopted for the present invention to solve the technical problems is:
A method for optical wand sintering vent gas treatment, is characterized in that comprising the following steps:
A, waste gas carry out cooling dust removal process through venturi tube duster, to reduce the dust concentration in waste gas, carry out processed afterwards by wire gauzee filter to waste gas, to reduce the processing pressure of subsequent wet electrostatic precipitation unit;
B, waste gas after a step process pass into " two-stage washing+two-stage wet static dedusting " processing unit, HCl and SiO in further effective recycling waste gas
2, also reach the effect of purifying exhaust air simultaneously;
C, finally waste gas is passed into caustic wash tower and carries out end treatment, the waste gas after up to standard by blower fan traction to aiutage high altitude discharge;
Enter tube settler after the unified collection of the waste water that d, each processing unit produce and carry out concentration and recovery, the mud that tube settler produces enters concentration basin and carries out concentration, then enters plate compression process, and the solid waste obtained is recycled.
Present invention process flow process is as follows: waste gas introduces (SiO
2)--venturi cooling dedusting--dehydration--washing--demist--wet-esp--secondary washing--demist--secondary wet-esp--alkali lye spray--demist--blower fan--gas qualified discharge;------mud is at concentration basin plate compression, and------SiO is reclaimed in washing--plate compression--to plate compression to precipitation to waste liquid (containing HCl) in alkali cleaning in supernatant backflow concentrated (HCl)
2.
As preferably, described tube settler has 6 at least, be connected with each unit for treating water or processed unit respectively, tube settler adopts FRP material, the supernatant of tube settler returns step by step, owing to containing HCl in supernatant, the purification that refluxes step by step makes HCl obtain concentration raising, finally concentrates.
As preferably, secondary tube settler, sewage backflow to wire gauzee filter between concentration basin and plate compression make the concentration of the HCl of subordinate reduce, SiO
2concentration improve.
A kind of optical wand sintering exhaust gas processing device, this device is by venturi tube duster, wire gauzee filter, water scrubber, wet cottrell, secondary water scrubber, secondary wet cottrell, caustic wash tower is connected in sequence, venturi tube duster, water scrubber, wet cottrell, secondary water scrubber, secondary wet cottrell, caustic wash tower respectively by water circulating pump successively with one-level tube settler, secondary tube settler, three grades of tube settlers, level Four tube settler, Pyatyi tube settler is connected with six grades of tube settlers, the top of water scrubber and secondary water scrubber is provided with demister, the supernatant outlet of wire gauzee filter is connected with secondary tube settler, and the supernatant outlet of secondary tube settler is connected with venturi tube duster.
As preferably, in caustic wash tower tower body, upper end is provided with demister, and the top of caustic wash tower is connected with blower fan.
As preferably, secondary tube settler, three grades of tube settlers, level Four tube settler, Pyatyi tube settlers are connected with concentration basin respectively with the sludge outlet of six grades of tube settlers.
As preferably, described concentration basin, be connected with plate and frame filter press, the second caustic wash tower, secondary plate and frame filter press, the second water scrubber and three grades of plate and frame filter press in turn, concentration basin and plate and frame filter press arrange the return line be connected with wire gauzee filter respectively, and the second caustic wash tower, secondary plate and frame filter press, the second water scrubber and three grades arrange return line between plate and frame filter press and caustic wash tower respectively.
The invention has the beneficial effects as follows: this device is used for burning to optical wand the SiO separated in tail gas
2reclaim with HCl, the tail gas of higher concentration can be processed.This device is provided with supernatant return line and carries out step by step concentration to supernatant, thus reclaims high concentration HCl.Sludge condensation and plate compression are also provided with return line and purify to mud, make the SO of recovery
2purity improve.
Accompanying drawing explanation
Fig. 1 is process chart of the present invention;
Fig. 2 is the structural representation of apparatus of the present invention;
In figure: 1 venturi tube duster, 2 wire gauzee filters, 3 water scrubbers, 4 wet cottrells, 5 secondary water scrubbers, 6 secondary wet cottrells, 7 caustic wash towers, 8 blower fans, 9 concentration basins, 10 plate and frame filter press, 11 second caustic wash towers, 12 secondary plate and frame filter press, 13 second water scrubbers, 14 3 grades of plate and frame filter press, 15 one-level tube settlers, 16 secondary tube settlers, 17 3 grades of tube settlers, 18 level Four tube settlers, 19 Pyatyi tube settlers, 20 6 grades of tube settlers.
Detailed description of the invention
Below by specific embodiment, and by reference to the accompanying drawings, technical scheme of the present invention is described in further detail.Should be appreciated that enforcement of the present invention is not limited to the following examples, any pro forma accommodation make the present invention and/or change all will fall into scope.
In the present invention, if not refer in particular to, all parts, percentage are unit of weight, and the equipment adopted and raw material etc. all can be buied from market or this area is conventional.Method in following embodiment, if no special instructions, is the conventional method of this area.
Embodiment:
The device of a kind of optical wand sintering vent gas treatment as shown in Figure 1, this device is connected in sequence by venturi tube duster 1, wire gauzee filter 2, water scrubber 3, wet cottrell 4, secondary water scrubber 5, secondary wet cottrell 6, caustic wash tower 7, in caustic wash tower tower body, upper end is provided with demister, and the top of caustic wash tower is connected with blower fan 8.Venturi tube duster, water scrubber, wet cottrell, secondary water scrubber, secondary wet cottrell, caustic wash tower are connected with six grades of tube settlers 20 with one-level tube settler 15, secondary tube settler 16, three grades of tube settlers 17, level Four tube settler 18, Pyatyi tube settler 19 successively respectively by water circulating pump, and the top in water scrubber and secondary water scrubber tower body is provided with demister; The supernatant outlet of wire gauzee filter is connected with secondary tube settler, and the supernatant outlet of secondary tube settler is connected with venturi tube duster.
Secondary tube settler, three grades of tube settlers, level Four tube settler, Pyatyi tube settlers are connected with concentration basin 9 respectively with the sludge outlet of six grades of tube settlers.Described concentration basin, be connected with plate and frame filter press 10, second caustic wash tower 11, secondary plate and frame filter press 12, second water scrubber 13 and three grades of plate and frame filter press 14 in turn, concentration basin and plate and frame filter press arrange the return line be connected with wire gauzee filter respectively, and the second caustic wash tower, secondary plate and frame filter press, the second water scrubber and three grades arrange return line between plate and frame filter press and caustic wash tower respectively.
Secondary tube settler, sewage backflow between concentration basin and plate and frame filter press, to wire gauzee filter, make the concentration of the HCl of subordinate reduce, SiO
2concentration improve.The cleaning press filtration (two-stage plate compression) repeated makes SiO
2purity higher, effectively can reclaim in waste gas and have the composition of value and make waste gas qualified discharge.
Wet cottrell is treatment S iO
2the core visual plant of dust, wet cottrell is vertical structure.Equipment material: shell material FRP, dust collector pole material C-FRP, through the SiO of cooling tower decreasing temperature and increasing humidity
2dust enters from wet cottrell bottom air inlet, discharges from top.By the SiO that dust collector pole traps
2dust, through being arranged on washing away of the spray system water at wet cottrell top, SiO
2dust flows into the cyclic water tank of electric cleaner with current.Wet cottrell dust collector pole developed area is 2022.4 ㎡, and gather dust very rectangle, with pole span 396mm, and electrode height 5m; Be 0.334m/s by the dust-contained airflow speed of one-level wet cottrell; This device can trap the particle of more than 0.03 μm, efficiency of dust collection >=93%.
The water tank of caustic wash tower is provided with pH meter one, detects the basicity of water tank, and as pH value < 8, high-order alkali groove metering pumping NaOH, as pH value > 9, high-order alkali groove measuring pump stops sending NaOH.
Tube settler uses level inclination to be the swash plate of 60, and be that the sedimentation basin of A1 is divided into n layer by original area, then the total settlement area of current is A=n*A1*cos α, namely calculates its discharge capacity theoretically and improves n*cos α doubly.The current sedimentation time of this tube settler is about 100min-200min, water capacity 20m
3.For convenience of spoil disposal, tube settler is placed on frame height platform.Tube settler material FRP manufactures, and frame structure made by outsourcing SS steel pipe, the anticorrosion rear and fiberglass coverboard strong bond of steelframe external application FRP.
Water scrubber and caustic wash tower built-in one deck many-sided ball filler (43.96m
3), individual layer filler height 3500mm.Filler DN50 many-sided ball, PP material.Every layer of filler is arranged a spray equipment, 7 detachable spiral solid type nozzles (190L/min) are housed, layer spray flux 80m
3/ h, hydraulic load 6.3m
3/ m
2h.
Following content is the process adopting apparatus of the present invention to carry out exhaust-gas treatment, and process chart is shown in Fig. 2:
A, exhaust-gas treatment and HCl reclaim:
150 DEG C are mixed with SiO
2concentration 1.5g/Nm
3, HCl concentration 7g/Nm
3optical wand sintering exhaust emissions after first enter venturi tube duster 1 and lower the temperature after dedusting, gas temperature drops within the scope of 45 DEG C ~ 55 DEG C, then enter wire gauzee filter 2 to dewater, the waste liquid part produced enters one-level tube settler 15 by water pump, and another part is returned venturi tube duster and carried out cooling dedusting.The supernatant of one-level tube settler 15 removes concentrated HCl.
Waste gas after wire gauzee filter 2 dewaters enters water scrubber 3 and washes, and the waste liquid gone out from water scrubber tower bottom flow enters secondary tube settler 16, and the supernatant of secondary tube settler is back to venturi tube duster.Part waste gas, after the demister demist at water scrubber top, enters wet cottrell, and the waste liquid that wet cottrell the flows out supernatant part that then a part enters three grades of tube settlers, 17, three grades of tube settlers is back to water scrubber.Secondary water scrubber 5 is entered from wet cottrell waste gas out.
After waste gas enters secondary water scrubber 5 washing, waste gas enters the demister of tower top, and waste liquid enters level Four tube settler 18 by water pump part water at the bottom of tower, and another part water then loops back secondary water scrubber.The supernatant of level Four tube settler is back to wet cottrell.Waste gas is after demister demist, and waste gas enters secondary wet cottrell 6, and waste liquid enters Pyatyi tube settler 19, and the supernatant of Pyatyi tube settler is back to secondary water scrubber.Waste gas enters the dedusting once again of secondary wet cottrell, and add quantitative water to secondary wet cottrell, secondary wet cottrell waste gas out enters caustic wash tower 7 and carries out alkali lye spray simultaneously.
Waste gas enters caustic wash tower 7 and carries out alkali lye spray, adds alkali lye simultaneously.Waste gas enters the demister of tower top after demist, and by blower fan qualified discharge, now HCl concentration is 100mg/Nm
3(20 DEG C); Waste liquid enters six grades of tube settlers 20 by water pump part water, and another part water then loops back caustic wash tower.In six grades of tube settlers, waste liquid includes sewage network discharge in.
B, liquid waste processing and SiO
2reclaim:
Secondary to the mud in Pyatyi tube settler enters concentration basin 9 and concentrates, and after concentrated, mud enters plate and frame filter press 10, and the waste reflux of concentration basin 9 and plate and frame filter press 10 is to secondary tube settler.Mud is after plate and frame filter press 10 press filtration, mud enters the second caustic wash tower 11 and processes and supplement alkali lye and water in time, after secondary plate and frame filter press 12 press filtration, mud enters the second water scrubber 13 and adds water toward water scrubber simultaneously, after washing, mud enters three grades of plate and frame filter press 14, reclaims SiO after mud plate compression
2, SiO
2concentration 60mg/Nm
3(20 DEG C).
The liquid that second caustic wash tower 11, secondary plate and frame filter press 12, second water scrubber 13 and three grades of plate and frame filter press 14 flow out all is back to caustic wash tower 7 and processes further.
Above-described embodiment is one of the present invention preferably scheme, not does any pro forma restriction to the present invention, also has other variant and remodeling under the prerequisite not exceeding the technical scheme described in claim.
Claims (2)
1. an optical wand sintering exhaust gas processing device, it is characterized in that: this device is connected in sequence by venturi tube duster, wire gauzee filter, water scrubber, wet cottrell, secondary water scrubber, secondary wet cottrell, caustic wash tower, in caustic wash tower tower body, upper end is provided with demister, and the top of caustic wash tower is connected with blower fan; Venturi tube duster, water scrubber, wet cottrell, secondary water scrubber, secondary wet cottrell, caustic wash tower are connected with six grades of tube settlers with one-level tube settler, secondary tube settler, three grades of tube settlers, level Four tube settler, Pyatyi tube settlers successively respectively by water circulating pump, and the top in water scrubber and secondary water scrubber tower body is provided with demister; The supernatant outlet of wire gauzee filter is connected with secondary tube settler, and the supernatant outlet of secondary tube settler is connected with venturi tube duster;
Secondary tube settler, three grades of tube settlers, level Four tube settler, Pyatyi tube settlers are connected with concentration basin respectively with the sludge outlet of six grades of tube settlers; Described concentration basin, be connected with plate and frame filter press, the second caustic wash tower, secondary plate and frame filter press, the second water scrubber and three grades of plate and frame filter press in turn, concentration basin and plate and frame filter press arrange the return line be connected with wire gauzee filter respectively, and the second caustic wash tower, secondary plate and frame filter press, the second water scrubber and three grades arrange return line between plate and frame filter press and caustic wash tower respectively;
Secondary tube settler, sewage backflow between concentration basin and plate and frame filter press are to wire gauzee filter; Wet cottrell is vertical structure, equipment material: shell material FRP, dust collector pole material C-FRP, through the SiO of cooling tower decreasing temperature and increasing humidity
2dust enters from wet cottrell bottom air inlet, discharges, by the SiO that dust collector pole traps from top
2dust, through being arranged on washing away of the spray system water at wet cottrell top, SiO
2dust flows into the cyclic water tank of electric cleaner with current; Wet cottrell dust collector pole developed area is 2022.4 ㎡, and gather dust very rectangle, with pole span 396mm, and electrode height 5m; Be 0.334m/s by the dust-contained airflow speed of one-level wet cottrell;
The water tank of caustic wash tower is provided with pH meter one, detects the basicity of water tank, as pH value < 8, and high-order alkali groove metering pumping NaOH, as pH value > 9, high-order alkali groove measuring pump stops sending NaOH;
Tube settler use level inclination is the inclined tube of 60 °, and the current sedimentation time of this tube settler is 100min-200min, water capacity 20m
3, tube settler is placed on frame height platform, and tube settler material FRP manufactures, and frame structure made by outsourcing SS steel pipe, the anticorrosion rear and fiberglass coverboard strong bond of steelframe external application FRP;
Water scrubber and caustic wash tower built-in one deck many-sided ball filler, individual layer filler height 3500mm, filler DN50 many-sided ball, PP material, every layer of filler is arranged a spray equipment, and 7 detachable spiral solid type nozzles are housed.
2. utilize the optical wand described in claim 1 to sinter a method for the optical wand sintering vent gas treatment that exhaust gas processing device carries out, it is characterized in that comprising the following steps:
A, exhaust-gas treatment and HCl reclaim:
150 DEG C are mixed with SiO
2concentration 1.5g/Nm
3, HCl concentration 7g/Nm
3optical wand sintering exhaust emissions after first enter venturi tube duster cooling dedusting after, gas temperature drops within the scope of 45 DEG C ~ 55 DEG C, then enter wire gauzee filter to dewater, the waste liquid part produced enters one-level tube settler by water pump, another part is returned venturi tube duster and is carried out cooling dedusting, and the supernatant of one-level tube settler removes concentrated HCl;
Waste gas after wire gauzee filter dehydration enters water scrubber and washes, the waste liquid gone out from water scrubber tower bottom flow enters secondary tube settler, the supernatant of secondary tube settler is back to venturi tube duster, part waste gas is after the demister demist at water scrubber top, enter wet cottrell, the waste liquid that wet cottrell flows out a then part enters three grades of tube settlers, a supernatant part for three grades of tube settlers is back to water scrubber, enters secondary water scrubber from wet cottrell waste gas out;
After waste gas enters the washing of secondary water scrubber, waste gas enters the demister of tower top, waste liquid enters level Four tube settler by water pump part water at the bottom of tower, another part water then loops back secondary water scrubber, the supernatant of level Four tube settler is back to wet cottrell, waste gas is after demister demist, waste gas enters secondary wet cottrell, waste liquid enters Pyatyi tube settler, the supernatant of Pyatyi tube settler is back to secondary water scrubber, waste gas enters the dedusting once again of secondary wet cottrell, add quantitative water to secondary wet cottrell simultaneously, secondary wet cottrell waste gas out enters caustic wash tower and carries out alkali lye spray,
Waste gas enters caustic wash tower and carries out alkali lye spray, adds alkali lye simultaneously, and waste gas enters the demister of tower top after demist, and by blower fan qualified discharge, now HCl concentration is 100mg/Nm
3; Waste liquid enters six grades of tube settlers by water pump part water, and another part water then loops back caustic wash tower, and in six grades of tube settlers, waste liquid includes sewage network discharge in;
B, liquid waste processing and SiO
2reclaim:
Secondary to the mud in Pyatyi tube settler enters concentration basin and concentrates, after concentrated, mud enters plate and frame filter press, the waste reflux of concentration basin and plate and frame filter press is to secondary tube settler, mud is after plate and frame filter press press filtration, mud enters the second caustic wash tower process and supplements alkali lye and water in time, and after the press filtration of secondary plate and frame filter press, mud enters the second water scrubber and adds water toward water scrubber simultaneously, after washing, mud enters three grades of plate and frame filter press, reclaims SiO after mud plate compression
2, SiO
2concentration 60mg/Nm
3;
The liquid that second caustic wash tower, secondary plate and frame filter press, the second water scrubber and three grades of plate and frame filter press flow out all is back to caustic wash tower and processes further.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410061147.1A CN103933811B (en) | 2014-02-24 | 2014-02-24 | Optical wand sintering exhaust gas processing device and method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410061147.1A CN103933811B (en) | 2014-02-24 | 2014-02-24 | Optical wand sintering exhaust gas processing device and method |
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| CN103933811A CN103933811A (en) | 2014-07-23 |
| CN103933811B true CN103933811B (en) | 2015-11-18 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104556070B (en) * | 2014-12-26 | 2017-01-11 | 中天科技精密材料有限公司 | Method and device for recycling high-purity silica |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102757148A (en) * | 2011-04-28 | 2012-10-31 | 陕西天宏硅材料有限责任公司 | System and method for processing waste gas and waste liquor in polysilicon production |
| CN202962208U (en) * | 2012-12-11 | 2013-06-05 | 中国瑞林工程技术有限公司 | High-temperature selenium-containing flue gas treatment device |
| CN103382032A (en) * | 2013-06-26 | 2013-11-06 | 内蒙古同远企业管理咨询有限责任公司 | Preparation method for trichlorosilane from silicon tetrachloride |
| CN203816429U (en) * | 2014-02-24 | 2014-09-10 | 杭州碧空环境科技有限公司 | Device for treating tail gas in sintering of polished rod |
-
2014
- 2014-02-24 CN CN201410061147.1A patent/CN103933811B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102757148A (en) * | 2011-04-28 | 2012-10-31 | 陕西天宏硅材料有限责任公司 | System and method for processing waste gas and waste liquor in polysilicon production |
| CN202962208U (en) * | 2012-12-11 | 2013-06-05 | 中国瑞林工程技术有限公司 | High-temperature selenium-containing flue gas treatment device |
| CN103382032A (en) * | 2013-06-26 | 2013-11-06 | 内蒙古同远企业管理咨询有限责任公司 | Preparation method for trichlorosilane from silicon tetrachloride |
| CN203816429U (en) * | 2014-02-24 | 2014-09-10 | 杭州碧空环境科技有限公司 | Device for treating tail gas in sintering of polished rod |
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Address after: Pu Yang Zhen Jian Hu Cun, Xiaoshan District, Hangzhou City, Zhejiang Province Patentee after: Blue Sky Environmental Technology Co.,Ltd. Address before: Pu Yang Zhen Jian Hu Cun, Xiaoshan District, Hangzhou City, Zhejiang Province Patentee before: HANGZHOU BIKONG ENVIRONMENT TECHNOLOGY Co.,Ltd. |