CN203659459U - Transparent conductive film - Google Patents

Transparent conductive film Download PDF

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Publication number
CN203659459U
CN203659459U CN201320875149.5U CN201320875149U CN203659459U CN 203659459 U CN203659459 U CN 203659459U CN 201320875149 U CN201320875149 U CN 201320875149U CN 203659459 U CN203659459 U CN 203659459U
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CN
China
Prior art keywords
nesa coating
conducting layer
connecting line
transparency conducting
contact conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201320875149.5U
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Chinese (zh)
Inventor
程传新
张学颖
王本现
陈春明
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Nanchang OFilm Tech Co Ltd
Suzhou OFilm Tech Co Ltd
OFilm Group Co Ltd
Original Assignee
Nanchang OFilm Tech Co Ltd
Suzhou OFilm Tech Co Ltd
Shenzhen OFilm Tech Co Ltd
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Application filed by Nanchang OFilm Tech Co Ltd, Suzhou OFilm Tech Co Ltd, Shenzhen OFilm Tech Co Ltd filed Critical Nanchang OFilm Tech Co Ltd
Priority to CN201320875149.5U priority Critical patent/CN203659459U/en
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Publication of CN203659459U publication Critical patent/CN203659459U/en
Anticipated expiration legal-status Critical
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Abstract

The utility model provides a transparent conductive film. The transparent conductive film includes a substrate, a transparent conductive layer, electrode leads and connecting wires; the substrate comprises a first surface and a second surface opposite to the first surface; the transparent conductive layer is arranged at a visible region on the first surface; and the electrode leads are arranged on a frame area on the first surface; the electrode leads are electrically connected with connecting wires through the transparent conductive layer, wherein the connecting wires are curve-shaped. According to the transparent conductive film provided by the utility model, when the surface of the transparent conductive layer is cleaned, included angles between the direction of the scraping forces borne by each point on each curve-shaped connecting wire and the direction of the tangent line of the corresponding point are different from each other, and therefore, the resultant force of the scraping forces is small, the connecting wires do not tend to be fractured by scraping, and the performance of electric connection between the transparent conductive layer and the electrode leads can be improved, and the qualified rate of the transparent conductive film can be improved.

Description

Nesa coating
Technical field
The utility model relates to touch screen technology, relates in particular to a kind of nesa coating.
Background technology
At present, nesa coating has been widely used in the fields such as flat panel display, photovoltaic device, contact panel and electromagnetic shielding, has the extremely wide market space.Nesa coating has good conductivity, and nesa coating has very high light transmittance at visible light wave range.
Nesa coating is the sensing element that receives the input signals such as touch location in touch-screen.The contact conductor that existing nesa coating generally includes transparent base, is formed at the transparency conducting layer on transparent base and is electrically connected with transparency conducting layer, wherein, transparency conducting layer comprises spaced transparent conductive patterns, by rectilinear connecting line, each contact conductor is connected to the edge of transparent conductive patterns, connecting line is electrically connected each contact conductor with corresponding transparent conductive patterns.
In existing nesa coating, be electrically connected each contact conductor and corresponding transparent conductive patterns by rectilinear connecting line, in the time of clean transparent conductive layer surperficial, the scraping force direction that on rectilinear connecting line, each point is subject to is consistent with the angle of this some place tangential direction, making a concerted effort of scraping power stack is larger, so connecting line is easily wiped and broken; Cause the electrical connection properties of transparency conducting layer and contact conductor poor, the yields of nesa coating is lower.
Utility model content
The utility model provides a kind of nesa coating, poor for solving the electrical connection properties of transparency conducting layer in prior art nesa coating and contact conductor, the lower technological deficiency of yields of nesa coating.
The nesa coating that the utility model provides, comprising: substrate, transparency conducting layer, contact conductor and connecting line;
Described substrate comprises first surface and the second surface relative with described first surface; Described transparency conducting layer is arranged on the visible range on described first surface; Described contact conductor is arranged on the rim area on described first surface;
Described contact conductor is electrically connected by described connecting line with described transparency conducting layer; Wherein, described connecting line is curve shape.
Nesa coating as above, preferably, described transparency conducting layer is the patterned conductive grid being formed by electric conducting material.
Nesa coating as above, preferably, described contact conductor is patterned conductive grid or the conduction line segment being formed by electric conducting material.
Nesa coating as above, preferably, described conductive grid be embedded in described substrate first surface latticed groove and be filled in electric conducting material in described latticed groove and form, or form for the latticed electric conducting material of the first surface that is raised in described substrate.
Nesa coating as above, preferably, being shaped as square, rectangle, parallelogram, regular hexagon or being irregular random grid figure of described conductive grid.
Nesa coating as above, preferably, the conductive grid density of described transparency conducting layer is less than the conductive grid density of described contact conductor.
Nesa coating as above, preferably, described connecting line is regular sine curve figure, or is irregular curvilinear figure, sawtooth waveform or triangular waveform.
Nesa coating as above, preferably, described conduction line segment be embedded in described substrate first surface linear groove and be filled in electric conducting material in described linear groove and form, or form for the linear electric conducting material of the first surface that is raised in described substrate.
Nesa coating as above, preferably, described nesa coating also comprises transition grid;
The density of described transition grid is greater than the conductive grid density of described transparency conducting layer, is less than the conductive grid density of described lead-in wire electrode;
Described transition grid one end is connected with described connecting line, and the other end is connected with described contact conductor.
Nesa coating as above, preferably, the surface of described transparency conducting layer is also covered with protective clear layer.
The nesa coating that the utility model provides, connecting line is connected near the edge electric of contact conductor with transparency conducting layer, because connecting line is curve shape, in the time of clean transparent conductive layer surperficial, the angle of the scraping force direction that on curved connecting line, each point is subject to and this some place tangential direction is different, and making a concerted effort of scraping power stack is less, wipes disconnected so connecting line is difficult for quilt, thereby can improve the electrical connection properties of transparency conducting layer and contact conductor, improve the yields of nesa coating.
Brief description of the drawings
The structural representation of the nesa coating that Fig. 1 provides for the utility model embodiment;
The structural representation of three kinds of different nesa coatings that Fig. 2 A-Fig. 2 C provides for the utility model embodiment;
The structural representation of four kinds of different connecting lines that Fig. 3 A-Fig. 3 D provides for the utility model embodiment;
The two dimensional surface shape schematic diagram of five kinds of different conductive grids that Fig. 4 A-Fig. 4 E provides for the utility model embodiment;
The manufacture process schematic diagram of the nesa coating that Fig. 5 A-Fig. 5 F provides for the utility model embodiment.
Reference numeral:
1-substrate; 2-transparency conducting layer; 3-contact conductor;
4-connecting line; 5-transition grid; 11-transparent polymeric layer;
12-protective clear layer.
Embodiment
The structural representation of the nesa coating that Fig. 1 provides for the utility model embodiment; As shown in Figure 1, the nesa coating that the present embodiment provides comprises: substrate 1, transparency conducting layer 2, contact conductor 3 and connecting line 4.
Substrate 1 comprises first surface and the second surface relative with first surface.Particularly, substrate 1 is transparent substrates, and the material of substrate 1 is preferably glass, also can be insulating material glass, quartz, polyethylene terephthalate (PET) film, also can be the film of other materials, for example, polymethyl methacrylate (PMMA) or polycarbonate plastic (PC) etc.In addition, the composite substrate (shown in Fig. 5 E) that substrate 1 also can be made up of transparent substrates and the transparent polymeric layer in transparent substrates 11.Transparent polymeric layer 11 can impress the thermoplastic polymer material such as glue or Merlon for ultraviolet curing type impression glue, thermoplastics type.
Transparency conducting layer 2 is arranged on the visible range on the first surface of substrate 1; Contact conductor 3 is arranged on the rim area on first surface.Particularly, transparency conducting layer 2 can be the patterned conductive grid being formed by electric conducting material.Contact conductor 3 can be patterned conductive grid or the conduction line segment being formed by electric conducting material.Visible range on the first surface of substrate 1 is positioned at the middle part of first surface, for receiving touch information; Rim area on the first surface of substrate 1 is positioned at the periphery of visible range.
Contact conductor 3 is electrically connected by connecting line 4 with transparency conducting layer 2; Particularly, connecting line 4 is connected near the edge electric of contact conductor 3 with transparency conducting layer 2, and contact conductor 3 is electrically connected with connecting line 4; Connecting line 4 can be curve shape.
The nesa coating that the present embodiment provides, connecting line 4 is connected near the edge electric of contact conductor 3 with transparency conducting layer 2, because connecting line 4 is curve shape, in the time of clean transparent conductive layer 2 surperficial, the angle of the scraping force direction that on curved connecting line 4, each point is subject to and this some place tangential direction is different, and making a concerted effort of scraping power stack is less, wipes disconnected so connecting line 4 is difficult for quilt, thereby can improve the electrical connection properties of transparency conducting layer and contact conductor, improve the yields of nesa coating.
On the basis of above-described embodiment technical scheme, further, the structural representation of three kinds of different nesa coatings that Fig. 2 A-Fig. 2 C provides for the utility model embodiment; As shown in Figure 2 A, transparency conducting layer 2 is that the foursquare conductive grid being formed by electric conducting material forms, contact conductor 3 is that the conduction line segment being formed by electric conducting material forms, connecting line 4 is that the shaped form conduction line segment being formed by electric conducting material forms, and connecting line 4 is positioned on the edge of transparency conducting layer 2 near contact conductor 3; Transparency conducting layer 2 is electrically connected with connecting line 4, and contact conductor 3 is electrically connected with transparency conducting layer 2 by connecting line 4.What prevent like this that the electric conductive section between electrode 3 is counted and die-offed and cause at transparency conducting layer 2 and lead-in wire is electrically bad, also can reduce to a certain extent the technology difficulty of manufacturing nesa coating.
As shown in Figure 2 B, in the present embodiment, transparency conducting layer 2 and contact conductor 3 are all for the conductive grid being formed by electric conducting material forms, and connecting line 4 is the shaped form conduction line segment being formed by electric conducting material, and connecting line 4 is positioned on the edge of transparency conducting layer 2 near contact conductor 3; Transparency conducting layer 2 is electrically connected with connecting line 4, and contact conductor 3 is electrically connected with transparency conducting layer 2 by connecting line 4.Due to, the current capacity that lead-in wire electrode need to carry is larger than transparency conducting layer, needs conductive grid to adopt wider live width or larger mesh-density; And lead-in wire electrode is positioned at rim area, and rim area is not visible for user, and light transmission features is not had to restrictive requirement, so even if the visual experience that the density of conductive grid is large, live width slightly also can not have influence on user.If but lead-in wire electrode adopts the live width different from transparency conducting layer, can increase the complex process degree of manufacturing nesa coating, therefore preferably, the conductive grid density of contact conductor 3 is greater than the conductive grid density of transparency conducting layer 2.Can improve like this electric conductivity of nesa coating, improve product reliability.
As shown in Figure 2 C, in the present embodiment, transparency conducting layer 2 is that the conductive grid being formed by electric conducting material forms, contact conductor 3 is that the conductive grid being formed by electric conducting material forms, connecting line 4 is that the curved conduction line segment being formed by electric conducting material forms, connecting line 4 is positioned on the edge of transparency conducting layer 2 near contact conductor 3, between connecting line 4 and contact conductor 3, be also provided with transition grid 5, connecting line 4 is electrically connected with transition grid 5, transition grid 5 is electrically connected with contact conductor 3, contact conductor 3 is electrically connected with transparency conducting layer 2 by transition grid 5 and connecting line 4 successively, wherein, the density of transition grid 5 is greater than the conductive grid density of transparency conducting layer 2, and the conductive grid density of contact conductor 3 is greater than the density of transition grid 5.Transition grid 5 can reduce the conductive grid variable density gradient of borderline region between transparency conducting layer 2 and lead-in wire electrode 3, avoids because of the conductive grid density of both sides have big difference the manufacturing process difficulty that causes, the problem such as electrically bad.In above-described embodiment, the distributed areas width of transition grid 5 can be 0.3mm~1mm.
The structural representation of four kinds of different connecting lines that Fig. 3 A-Fig. 3 D provides for the utility model embodiment; On the basis of above-described embodiment technical scheme, preferably, as shown in Figure 3A, connecting line 4 can be regular sine curve figure, for example, can be the sine curve of one-period.
As shown in Figure 3 B, connecting line 4 can also be the sine curve in more than one cycle.Connecting line 4 can be also other irregular curve or broken line shapes.Connecting line 4 can be also sawtooth waveform (as shown in Figure 3 C) or triangular waveform (as shown in Figure 3 D) etc.
On the basis of above-described embodiment technical scheme, preferably, the conductive grid of transparency conducting layer 2 can for be embedded in substrate 1 first surface latticed groove and be filled in electric conducting material in latticed groove and form, or form for the latticed electric conducting material of the first surface that is raised in substrate 1.The two dimensional surface shape schematic diagram of five kinds of different conductive grids that Fig. 4 A-Fig. 4 E provides for the utility model embodiment; As shown in Figure 4 A, the grid pattern of conductive grid can be square.Conductive grid can also form with lattice for the electric conducting material being raised on the first surface of substrate 1.As shown in Fig. 4 B-Fig. 4 E, the grid pattern of conductive grid can be also other regular figures, and as rectangle, parallelogram and regular hexagon etc., the grid pattern of conductive grid also can be irregular random grid figure.Preferably, the grid pattern of conductive grid, adopts irregular random grid figure.Like this in the time arranging with display device stack, even if with display device in the regular periodicity figure of colored filter superimposed, also can suppress to have the obviously optical stripe of bright dark difference and produce, improve the image display effect of product.Irregular random grid figure can be combined to form by irregular polygon.The sideline of irregular polygon can be for being selected from one or more the combination in the middle of straightway, curved section, broken line.
Further, conduction line segment can for be embedded in substrate 1 first surface linear groove and be filled in electric conducting material in linear groove and form, or form for the linear electric conducting material of the first surface that is raised in substrate 1.
Preferably, conductive grid and conduction line segment by be embedded in substrate 1 first surface linear groove and be filled in electric conducting material in linear groove and form.Conductive grid and conduction line segment can integrally impress in substrate 1 simultaneously like this, and technique is easier, and production efficiency is high; And the scratch resistant anti-wiping performance of groove structure that is embedded in substrate 1 is more excellent, and structure is more stable, and properties of product are more reliable.
The manufacture process schematic diagram of the nesa coating that Fig. 5 A-Fig. 5 F provides for the utility model embodiment.Illustrate below in conjunction with Fig. 5 A-Fig. 5 F electrically conducting transparent film manufacturing method and the process that above-described embodiment provides.
The first step, as shown in Fig. 5 A and Fig. 5 B, uniform fold layer of transparent polymeric layer 11 on the first surface of substrate 1.Particularly, substrate 1 is transparent substrates, and material is glass, quartz, PET, PC or PMMA etc., and the material of substrate 1 can also be the transparent material of other suitable for making substrates, as PC or PMMA etc.The material of transparent polymeric layer 11 can impress glue or Merlon etc. for ultraviolet curing type impression glue, thermoplastics type; Transparent polymeric layer 11 can also select other plasticity transparent polymer to form.
Second step, as shown in Figure 5 C, use method for stamping on the visible range of transparent polymeric layer 11, to produce the patterned latticed groove 21 of transparency conducting layer 2, the latticed or linear groove 31 of contact conductor, and be located between the groove 21,31 of transparency conducting layer 2 and contact conductor 3 and the curve linear groove 41 of the connecting line 4 being connected with groove 21,31.
The 3rd step, as shown in Figure 5 D, use the method for blade coating that the conductive ink that contains electric conducting material 22 is filled in latticed groove 21, latticed or linear groove 31 and curve linear groove 41, then sintering forms contact conductor 3 and the curvilinear connecting line 4 of latticed transparency conducting layer 2, latticed or linear.Particularly, the live width of conductive grid and conduction line segment is 0.8 μ m-5 μ m, is highly 2 μ m-6 μ m; Latticed groove 21, latticed or linear groove 31 or curve linear groove 41 degree of depth are less than the thickness of transparent polymeric layer 11, and latticed groove 21, latticed or linear groove 31 or curve linear groove 41 depth-to-width ratios are for being not less than 1.
Or, in second step, use method for stamping on the visible range of transparent polymeric layer 11, only to produce the patterned latticed groove 21 of transparency conducting layer 2 and the curve linear groove 41 of connecting line 4 of connection with it.In the 3rd step, as shown in Fig. 5 E, use the method for blade coating that the conductive ink that contains electric conducting material 22 is filled in latticed groove 21 and curve linear groove 41, the shaped form connecting line 4 that then sintering forms latticed transparency conducting layer 2 and is electrically connected with it.The method such as silk screen printing, inkjet printing that re-uses is produced the contact conductor 3 being electrically connected with connecting line 4 on transparent polymer surface.
Particularly, the live width of conductive grid and conduction line segment is 0.8 μ m-5 μ m, is highly 2 μ m-6 μ m; Latticed groove 21, latticed or linear groove 31 or curve linear groove 41 degree of depth are less than the thickness of transparent polymeric layer 11, and latticed groove 21, latticed or linear groove 31 or curve linear groove 41 depth-to-width ratios are for being not less than 1.
In the present embodiment, electric conducting material can be nano silver material; Electric conducting material can be also the one in Cu, Ag, Ag-C, Al, Ni, Cr, Ni-P, carbon nano-tube, Graphene or conducting polymer composite, or the alloy of above-mentioned element.
In addition, transparency conducting layer 2 and connecting line 4 also can be for using the method for silk screen printing or inkjet printing to make.Preferably; as shown in Fig. 5 F; the surface of the transparency conducting layer 2 of nesa coating can also be covered with protective clear layer 12; the material of protective clear layer 12 can be selected transparent material; such as glass, quartz, PET, PC or PMMA etc.; the material of protective clear layer 12 can also be the transparent material of other suitable for making protective layers, makes nesa coating transmitance be not less than 86%.
Finally it should be noted that: above each embodiment, only in order to the technical solution of the utility model to be described, is not intended to limit; Although the utility model is had been described in detail with reference to aforementioned each embodiment, those of ordinary skill in the art is to be understood that: its technical scheme that still can record aforementioned each embodiment is modified, or some or all of technical characterictic is wherein equal to replacement; And these amendments or replacement do not make the essence of appropriate technical solution depart from the scope of the each embodiment technical scheme of the utility model.

Claims (10)

1. a nesa coating, is characterized in that, comprising: substrate, transparency conducting layer, contact conductor and connecting line;
Described substrate comprises first surface and the second surface relative with described first surface; Described transparency conducting layer is arranged on the visible range on described first surface; Described contact conductor is arranged on the rim area on described first surface;
Described contact conductor is electrically connected by described connecting line with described transparency conducting layer; Wherein, described connecting line is curve shape.
2. nesa coating according to claim 1, is characterized in that, described transparency conducting layer is the patterned conductive grid being formed by electric conducting material.
3. nesa coating according to claim 1, is characterized in that, described contact conductor is patterned conductive grid or the conduction line segment being formed by electric conducting material.
4. according to the nesa coating described in claim 2 or 3, it is characterized in that, described conductive grid be embedded in described substrate first surface latticed groove and be filled in electric conducting material in described latticed groove and form, or form for the latticed electric conducting material of the first surface that is raised in described substrate.
5. nesa coating according to claim 4, is characterized in that, being shaped as square, rectangle, parallelogram, regular hexagon or being irregular random grid figure of described conductive grid.
6. nesa coating according to claim 5, is characterized in that, the conductive grid density of described transparency conducting layer is less than the conductive grid density of described contact conductor.
7. nesa coating according to claim 1, is characterized in that, described connecting line is regular sine curve figure, or is irregular curvilinear figure, sawtooth waveform or triangular waveform.
8. nesa coating according to claim 3, it is characterized in that, described conduction line segment be embedded in described substrate first surface linear groove and be filled in electric conducting material in described linear groove and form, or form for the linear electric conducting material of the first surface that is raised in described substrate.
9. according to the arbitrary described nesa coating of claim 1-3, it is characterized in that, described nesa coating also comprises transition grid; The density of described transition grid is greater than the conductive grid density of described transparency conducting layer, is less than the conductive grid density of described lead-in wire electrode;
Described transition grid one end is electrically connected with described connecting line, and the other end is electrically connected with described contact conductor.
10. according to the arbitrary described nesa coating of claim 1-3, it is characterized in that, the surface of described transparency conducting layer is also covered with protective clear layer.
CN201320875149.5U 2013-12-27 2013-12-27 Transparent conductive film Expired - Fee Related CN203659459U (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105278739A (en) * 2014-07-17 2016-01-27 财团法人工业技术研究院 Sensing structure
CN106782741A (en) * 2015-11-24 2017-05-31 仇明侠 A kind of flexible transparent conducting film based on nano impression and preparation method thereof
CN110126370A (en) * 2018-02-09 2019-08-16 昇印光电(昆山)股份有限公司 Conductive film

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105278739A (en) * 2014-07-17 2016-01-27 财团法人工业技术研究院 Sensing structure
CN106782741A (en) * 2015-11-24 2017-05-31 仇明侠 A kind of flexible transparent conducting film based on nano impression and preparation method thereof
CN110126370A (en) * 2018-02-09 2019-08-16 昇印光电(昆山)股份有限公司 Conductive film

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C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20140618

Termination date: 20191227

CF01 Termination of patent right due to non-payment of annual fee