CN203644810U - Roll-to-roll coated film annealing device for flexible substrate - Google Patents
Roll-to-roll coated film annealing device for flexible substrate Download PDFInfo
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- CN203644810U CN203644810U CN201320813598.7U CN201320813598U CN203644810U CN 203644810 U CN203644810 U CN 203644810U CN 201320813598 U CN201320813598 U CN 201320813598U CN 203644810 U CN203644810 U CN 203644810U
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The utility model relates to a roll-to-roll coated film annealing device for a flexible substrate. The roll-to-roll coated film annealing device comprises a roll-feeding chamber, a first sputtering chamber, a second sputtering chamber and a rolling-up chamber which are formed by dividing a vacuum cavity through baffle plates; an unrolling roller, a tension roller and a guide roller are disposed in the roll-feeding chamber; and a rolling-up roller, a tension roller and a guide roller are disposed in the rolling-up chamber. The roll-to-roll coated film annealing device is characterized in that an annealing chamber is also disposed between the second sputtering chamber and the rolling-up chamber through division of a baffle plate, and heating backboards are disposed in the annealing chamber; and each baffle plate is provided with a gas isolator passing through the flexible substrate. Due to the fact that the annealing chamber is also disposed between the second sputtering chamber and the rolling-up chamber through division of the baffle plate, when the roll-to-roll continuous coating is carried out for the flexible substrate, annealing processing for the flexible substrate after coated is also completed; the annealing for the flexible substrate is single sheet annealing, compared with annealing for the whole roll of the flexible substrate, performance of materials for producing film cells is improved, and production efficiency is largely improved; and manufacturing process is simple, and production and maintenance costs are low.
Description
Technical field
The utility model belongs to thin film solar cell manufacturing process technical field, particularly relates to a kind of flexible substrate volume to volume plated film annealing device.
Background technology
At present, flexible substrate solar cell is because its technique advanced person, with low cost and be easy to bendingly and of many uses, can be used for automobile top, solar energy spacious paulin, solar powered aircraft and roof, house and exterior wall.In extensive volume to volume flexible substrate, adopt magnetron sputtering technique to be widely used in the production fields such as window layer of solar battery.And take post growth annealing can significantly improve the properties of film to rete under different atmosphere.
At present the known volume to volume magnetron sputtering for flexible substrate adopts the technology of preparing one deck or multilayer by methods such as magnetron sputterings on flexible parent metal surface in vacuum chamber and have the film of certain function more, for example, the absorbed layer of CIGS battery, resilient coating, Window layer etc. all available the method are prepared.Although uninterruptedly continuous production function film, but its weak point is sputtering equipment and does not possess post growth annealing or post growth annealing simplicity of design, cannot be after sputtering technology completes continuous carry out the post growth annealing under different atmosphere, film performance uniformity is affected, and production efficiency cannot improve.
Summary of the invention
The utility model provides for solving the technical problem existing in known technology that a kind of production efficiency is high, the material property of making hull cell and good uniformity, making is simple, cost is low a kind of flexible substrate volume to volume plated film annealing device.
The utility model comprises following technical scheme: be characterized in:
A kind of flexible substrate volume to volume plated film annealing device, comprises vacuum chamber, and described vacuum chamber is cut apart successively from left to right and had the first sputtering chamber that send volume chamber, place the first sputtering target, the second sputtering chamber and the rolling chamber of placement the second sputtering target by baffle plate; Described volume chamber and the indoor roller bearing that drives flexible substrate to move that is respectively placed with of rolling of sending, send the indoor roller bearing of volume to comprise let off roll, jockey pulley and guide roller, the indoor roller bearing of rolling comprises wind-up roll, jockey pulley and guide roller, be characterized in: between described the second sputtering chamber and rolling chamber, also cut apart and have annealing chamber with baffle plate, in annealing chamber, have heating backboard; On each baffle plate, be all equipped with the gas separators by flexible substrate.
The utility model can also adopt following technical measures:
On the roof of described the first sputtering chamber, the second sputtering chamber and annealing chamber, be all connected with vacuum gauge and the snorkel with gas flowmeter.
Described heating backboard is the corrosion resistant plate that is tied with resistance wire.
Described flexible substrate material is metal forming or polyimides.
The advantage the utlity model has and good effect:
1, the utility model by being partitioned into an annealing chamber with baffle plate between the second sputtering chamber and rolling chamber, in the time that flexible substrate is carried out volume to volume continuous coating, also completed the annealing in process of flexible substrate after plated film, and flexible substrate is monolithic annealing in the time of annealing, with respect to the annealing of entire volume flexible substrate, not only improve the material property that hull cell is made, and greatly improved production efficiency, and manufacturing process is simple, production maintenance cost is low.
2, annealing system is isolated into separately an independently annealing chamber by the utility model, by gas separators, annealing chamber passed into separately to N
2as anneal gas, make the flexible substrate atmosphere of plated film and the flexible substrate atmosphere of annealing independent separately, further improve the material property that hull cell is made.
Accompanying drawing explanation
Fig. 1 is the utility model flexible substrate volume to volume plated film annealing device schematic diagram.
In figure, 1-chamber, 2-send volume chamber, 3-jockey pulley, 4-let off roll, 5-guide roller, 6-gas separators, 7-snorkel, 8-gas flowmeter, 9-vacuum gauge, 10-baffle plate, 11-the first sputtering chamber, 12-the first sputtering target, 13-the second sputtering chamber, 14-flexible substrate, 15-the second sputtering target, 16-annealing chamber, 17-heats backboard, 18-rolling chamber, 19-wind-up roll.
Embodiment
For further disclosing summary of the invention of the present utility model, Characteristic, be also elaborated by reference to the accompanying drawings as follows especially exemplified by following instance:
A kind of flexible substrate volume to volume plated film annealing device, comprises vacuum chamber, and described vacuum chamber is cut apart successively from left to right and had the first sputtering chamber that send volume chamber, place the first sputtering target, the second sputtering chamber and the rolling chamber of placement the second sputtering target by baffle plate; Described volume chamber and the indoor roller bearing that drives flexible substrate to move that is respectively placed with of rolling of sending, send the indoor roller bearing of volume to comprise let off roll, jockey pulley and guide roller, the indoor roller bearing of rolling comprises wind-up roll, jockey pulley and guide roller, be characterized in: between described the second sputtering chamber and rolling chamber, also cut apart and have annealing chamber with baffle plate, in annealing chamber, have heating backboard; On each baffle plate, be all equipped with the gas separators by flexible substrate.
The utility model can also adopt following technical measures:
On the roof of described the first sputtering chamber, the second sputtering chamber and annealing chamber, be all connected with vacuum gauge and the snorkel with gas flowmeter.
Described heating backboard is the corrosion resistant plate that is tied with resistance wire.
Described flexible substrate material is metal forming or polyimides.
Making of the present utility model and the course of work:
As shown in Figure 1, corrosion resistant plate is carried out to seamless welding and go out to prepare the integrated required chamber 1 of flexible substrate volume to volume masking annealing, with four can be by flexible substrate 14 stainless steel baffle plates 10 and chamber inner walls welding, chamber interior is isolated into successively from left to right and send volume chamber 2, the first sputtering chamber 11, the second sputtering chamber 13, annealing chamber 16 and rolling chamber 18; On each piece baffle plate, be all fixedly mounted with a gas separators 6 by flexible liner bottom; The equal passband in top of the first sputtering chamber, the second sputtering chamber and annealing chamber has snorkel 7 and the vacuum gauge 9 of gas flowmeter 8; Send that volume is indoor to be parallel to each other and let off roll 4 from bottom to top along front and back two ledge own centre lines, jockey pulley 3 and guide roller 5, wherein jockey pulley along continuous straight runs shifts out a segment distance left, the tension force when guaranteeing that flexible substrate volume to volume moves; Rolling is indoor to be parallel to each other and wind-up roll 19 from bottom to top along front and back two ledge own centre lines, jockey pulley and guide roller, and wherein jockey pulley along continuous straight runs shifts out a segment distance to the right, the tension force when guaranteeing that flexible substrate volume to volume moves; Send guide roller in volume chamber and rolling chamber to be parallel to each other and in same level, send jockey pulley in volume chamber and rolling chamber to be parallel to each other and in same level, send the let off roll in volume chamber and the wind-up roll in rolling chamber to be parallel to each other and in same level; In the first sputtering chamber, be placed with the native oxide zinc target as the first sputtering target 12, in the second sputtering chamber, be placed with the ZnO as the second sputtering target 15: Al target, ZnO:In
2o
3(IZO) target or ZnO:Ga
2o
3target; Send on the let off roll in volume chamber and have outermost end to be rolled onto successively the flexible substrate that is coated with Copper Indium Gallium Selenide or copper indium tin sulphur absorbed layer of wind-up roll in rolling chamber by the gas separators on each baffle plate, wherein titanium foil volume, polyimides or metal forming are as flexible substrate; Send volume chamber absorbed layer between rolling chamber be positioned at flexible substrate below; Be fixedly mounted with one group in annealing chamber near the equal level in above and below of flexible substrate and be tied with 304 stainless steel substrates that resistance wire 10mm is thick as heating backboard 17, on each heating backboard, be fixedly mounted with a temperature-measuring heat couple of controlling annealing chamber's temperature.
Before work, show vacuum degree with vacuum gauge, the first sputtering chamber and the second sputtering chamber and annealing chamber vacuumized, by gas flowmeter control, by snorkel to the first sputtering chamber and the second sputtering chamber input Ar gas and O
2the mist of gas, gas pressure intensity is 0.2～0.5Pa; When work, flexible substrate with the winding speed of 40～60mm/min from let off roll successively by sending jockey pulley, guide roller volume chamber, sending the gas separators between gas separators, annealing chamber and the rolling chamber between gas separators, the second sputtering chamber and the annealing chamber between volume chamber, the first sputtering chamber and the second sputtering chamber, guide roller, the jockey pulley in rolling chamber, be finally rolled onto on wind-up roll; In the process of reeling, in the first sputtering chamber, be splashed on the Copper Indium Gallium Selenide layer absorbed layer below flexible substrate with the power DC of 700～1500W as the native oxide zinc target of the first sputtering target, Copper Indium Gallium Selenide layer absorbed layer surface forms one deck native oxide zinc layer; In the time that sputter has the flexible substrate of native oxide zinc layer to be wound up into the second sputtering chamber, in the second sputtering chamber as the ZnO of the second sputtering target: Al target is splashed to the power DC of 900～1000W on the native oxide zinc layer of flexible substrate, and native oxide zinc layer surface forms layer of ZnO: Al layer; Being coated with ZnO: the flexible substrate of Al layer is wound up into before annealing chamber, passes into N by snorkel to annealing chamber
2as anneal gas, by temperature-measuring heat couple control, keep the temperature of flexible substrate upper and lower faces heating backboard to remain on 150～400 ℃, in the time that flexible substrate is passed through annealing chamber, to being coated with ZnO: the flexible substrate of Al layer has been carried out annealing in process; Be transferred into rolling chamber by the flexible substrate after annealing, the guide roller that the indoor placement center line of rolling is parallel to each other, jockey pulley and wind-up roll, flexible substrate complete plated film, annealing after through guide roller and jockey pulley, be wound around rolling by wind-up roll, complete the volume to volume flexible substrate plated film integrated manufacturing process of annealing.
Although by reference to the accompanying drawings preferred embodiment of the present utility model is described above; but the utility model is not limited to above-mentioned embodiment; above-mentioned embodiment is only schematic; be not restrictive; those of ordinary skill in the art is under enlightenment of the present utility model; not departing from the scope situation that the utility model aim and claim protect, can also make a lot of forms.Within these all belong to protection range of the present utility model.
Claims (4)
1. a flexible substrate volume to volume plated film annealing device, comprises vacuum chamber, and described vacuum chamber is cut apart successively from left to right and had the first sputtering chamber that send volume chamber, place the first sputtering target, the second sputtering chamber and the rolling chamber of placement the second sputtering target by baffle plate; Described volume chamber and the indoor roller bearing that drives flexible substrate to move that is respectively placed with of rolling of sending, send the indoor roller bearing of volume to comprise let off roll, jockey pulley and guide roller, the indoor roller bearing of rolling comprises wind-up roll, jockey pulley and guide roller, it is characterized in that: between described the second sputtering chamber and rolling chamber, also cut apart and have annealing chamber with baffle plate, in annealing chamber, have heating backboard; On each baffle plate, be all equipped with the gas separators by flexible substrate.
2. a kind of flexible substrate volume to volume plated film annealing device according to claim 1, is characterized in that: on the roof of described the first sputtering chamber, the second sputtering chamber and annealing chamber, be all connected with vacuum gauge and the snorkel with gas flowmeter.
3. a kind of flexible substrate volume to volume plated film annealing device according to claim 1, is characterized in that: described heating backboard is the corrosion resistant plate that is tied with resistance wire.
4. a kind of flexible substrate volume to volume plated film annealing device according to claim 1, is characterized in that: described flexible substrate material is metal forming or polyimides.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320813598.7U CN203644810U (en) | 2013-12-11 | 2013-12-11 | Roll-to-roll coated film annealing device for flexible substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320813598.7U CN203644810U (en) | 2013-12-11 | 2013-12-11 | Roll-to-roll coated film annealing device for flexible substrate |
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| Publication Number | Publication Date |
|---|---|
| CN203644810U true CN203644810U (en) | 2014-06-11 |
Family
ID=50876034
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320813598.7U Expired - Fee Related CN203644810U (en) | 2013-12-11 | 2013-12-11 | Roll-to-roll coated film annealing device for flexible substrate |
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| CN (1) | CN203644810U (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106282958A (en) * | 2016-11-03 | 2017-01-04 | 成都捷翼电子科技有限公司 | A kind of volume to volume fine vacuum sputter system for flexible electronic component and method |
| CN106521427A (en) * | 2016-11-22 | 2017-03-22 | 北京印刷学院 | Device and method for continuously producing high-adhesive-force aluminized film |
| CN111118451A (en) * | 2020-01-20 | 2020-05-08 | 昆山浦元真空技术工程有限公司 | Sponge aluminum production process and sponge aluminum production equipment used by same |
| CN111719132A (en) * | 2020-06-29 | 2020-09-29 | 东部超导科技（苏州）有限公司 | Multi-channel winding device integrating film coating and heat treatment of superconducting strip |
| CN116180206A (en) * | 2023-02-07 | 2023-05-30 | 西湖烟山科技(杭州)有限公司 | Roll-to-roll equipment and method for annealing polycrystalline copper strips |
| CN116288687A (en) * | 2023-02-07 | 2023-06-23 | 西湖烟山科技(杭州)有限公司 | Roll-to-roll apparatus and method for epitaxial growth of large-size GaN on flexible substrates |
-
2013
- 2013-12-11 CN CN201320813598.7U patent/CN203644810U/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106282958A (en) * | 2016-11-03 | 2017-01-04 | 成都捷翼电子科技有限公司 | A kind of volume to volume fine vacuum sputter system for flexible electronic component and method |
| CN106521427A (en) * | 2016-11-22 | 2017-03-22 | 北京印刷学院 | Device and method for continuously producing high-adhesive-force aluminized film |
| CN106521427B (en) * | 2016-11-22 | 2019-01-22 | 北京印刷学院 | A kind of device and method of continuous production high adhesion force aluminizer |
| CN111118451A (en) * | 2020-01-20 | 2020-05-08 | 昆山浦元真空技术工程有限公司 | Sponge aluminum production process and sponge aluminum production equipment used by same |
| CN111719132A (en) * | 2020-06-29 | 2020-09-29 | 东部超导科技（苏州）有限公司 | Multi-channel winding device integrating film coating and heat treatment of superconducting strip |
| CN116180206A (en) * | 2023-02-07 | 2023-05-30 | 西湖烟山科技(杭州)有限公司 | Roll-to-roll equipment and method for annealing polycrystalline copper strips |
| CN116288687A (en) * | 2023-02-07 | 2023-06-23 | 西湖烟山科技(杭州)有限公司 | Roll-to-roll apparatus and method for epitaxial growth of large-size GaN on flexible substrates |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140611 Termination date: 20171211 |