CN102951854A - Neutral color double silver composite structure low radiation coated glass and manufacturing process thereof - Google Patents
Neutral color double silver composite structure low radiation coated glass and manufacturing process thereof Download PDFInfo
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- CN102951854A CN102951854A CN2012104258371A CN201210425837A CN102951854A CN 102951854 A CN102951854 A CN 102951854A CN 2012104258371 A CN2012104258371 A CN 2012104258371A CN 201210425837 A CN201210425837 A CN 201210425837A CN 102951854 A CN102951854 A CN 102951854A
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Abstract
A purpose of the present invention is to disclose a neutral color double silver composite structure low radiation coated glass and a manufacturing process thereof. The glass comprises a glass substrate, wherein the outer side of the glass substrate is sequentially provided with a first composite dielectric layer, a first silver layer, a first protection layer, a second composite dielectric layer, a second silver layer, a second protection layer and a dielectric layer. Compared with the process in the prior art, the process of the present invention has the following characteristics that: based on the existing neutral color double silver composite structure low radiation coated glass, the film layer structure of the intermediate layer is improved, such that the product can be subjected to a tempering treatment so as to achieve remote place processing and achieve the purpose of the present invention.
Description
Technical field
The present invention relates to a kind of coated glass and manufacturing process thereof, particularly a kind of muted color double-silver composite structure low radiation coated glass and manufacturing process thereof that is applicable to strange land processing.
Background technology
In currently available products; effectively provide protection can't be played to silver layer in bottom in the double-silver composite structure low radiation coated glass of existing muted color and middle layer; process so that the double-silver composite structure low radiation coated glass of existing muted color can't carry out tempering, can not realize strange land processing.
Therefore, need especially a kind of muted color double-silver composite structure low radiation coated glass and manufacturing process thereof, to solve the above-mentioned existing problem that exists.
Summary of the invention
The object of the present invention is to provide a kind of muted color double-silver composite structure low radiation coated glass and manufacturing process thereof; for the deficiencies in the prior art; improve on the double-silver composite structure low radiation coated glass basis of containing copper alloy layer; can effectively protect silver layer; process so that product innovation can carry out tempering, thereby but realized strange land processing.
Technical problem solved by the invention can realize by the following technical solutions:
On the one hand; the invention provides a kind of muted color double-silver composite structure low radiation coated glass; it comprises glass substrate; it is characterized in that, be disposed with the first composite dielectric layer, the first silver layer, the first protective layer, the second composite dielectric layer, the second silver layer, the second protective layer and dielectric layer in the described glass substrate outside.
In one embodiment of the invention, between described the first composite dielectric layer and the second composite dielectric layer, also be provided with a copper alloy layer.
Further, described copper alloy layer is CuAlNx, and the thickness of described copper alloy layer is 2-10nm.
In one embodiment of the invention, described the first composite dielectric layer is for plating the composite bed of ZnSnOx layer again on the SiNx layer, and the thickness of described the first composite dielectric layer is 30nm-80nm.
In one embodiment of the invention, described the first silver layer and the second silver layer are Ag, and the thickness of described the first silver layer and the second silver layer is respectively 5nm-15nm.
In one embodiment of the invention, described the first protective layer and the second protective layer are NiCr, and the thickness of described the first protective layer and the second protective layer is respectively 0nm-14nm.
In one embodiment of the invention, described the second composite dielectric layer is for plating successively the composite bed of SiNx layer and ZnSnOx layer again on the ZnSnOx layer, and the thickness of described the second composite dielectric layer is 50nm-150nm.
In one embodiment of the invention, described dielectric layer is Si
3N
4, the thickness of described dielectric layer is 35nm-50nm.
On the other hand, the invention provides a kind of manufacturing process of muted color double-silver composite structure low radiation coated glass, it is characterized in that, its adopts vacuum magnetron sputtering coating film technique coatings successively on glass substrate:
The first composite dielectric layer is being coated with by exchanging the sputter in oxygen argon atmosphere of cathode zinc tin alloy target on the silicon nitride film layer by exchanging silicon target sputter in argon nitrogen atmosphere of negative electrode;
Copper alloy layer is by using the sputter in the atmosphere of nitrogen of copper aluminium target;
The first silver layer and the second silver layer are by the sputter in argon atmosphere of direct current horizontal target;
The first protective layer and the second protective layer are by direct current horizontal target sputter nichrome in argon atmosphere;
The second composite dielectric layer is coated with the sputter in oxygen argon atmosphere of Zinc-tin alloy target, the sputter in nitrogen argon atmosphere of silumin target by Zinc-tin alloy target, silumin target and the Zinc-tin alloy target that exchanges negative electrode;
Dielectric layer is by exchanging silumin target sputter in nitrogen argon atmosphere of negative electrode.
In one embodiment of the invention, in described the first protective layer and the second protective layer, Ni:Cr=80:20.
Muted color double-silver composite structure low radiation coated glass of the present invention and manufacturing process thereof, compared with prior art, on the basis of the double-silver composite structure low radiation coated glass of existing muted color, improved the film layer structure in middle layer, so that can carrying out tempering, processes product, but thereby realized strange land processing, realize purpose of the present invention.
Characteristics of the present invention can be consulted the detailed description of the graphic and following better embodiment of this case and be obtained to be well understood to.
Description of drawings
Fig. 1 is the structural representation of muted color double-silver composite structure low radiation coated glass of the present invention.
Embodiment
For technique means, creation characteristic that the present invention is realized, reach purpose and effect is easy to understand, below in conjunction with concrete diagram, further set forth the present invention.
As shown in Figure 1; muted color double-silver composite structure low radiation coated glass of the present invention; it comprises glass substrate, is disposed with the first composite dielectric layer 200, the first silver layer 300, the first protective layer 400, the second composite dielectric layer 500, the second silver layer 600, the second protective layer 700 and dielectric layer 800 in described glass substrate 100 outsides.
In the present invention, between described the first composite dielectric layer 200 and the second composite dielectric layer 500, also be provided with a copper alloy layer 900; Described copper alloy layer 900 is CuAlNx, and the thickness of described copper alloy layer 900 is 2-10nm.Described the first composite dielectric layer 200 is for plating the composite bed of ZnSnOx layer again on the SiNx layer, the thickness of described the first composite dielectric layer 200 is 30nm-80nm.Described the first silver layer 300 and the second silver layer 600 are Ag, and the thickness of described the first silver layer 300 and the second silver layer 600 is respectively 5nm-15nm.Described the first protective layer 400 and the second protective layer 700 are NiCr, and the thickness of described the first protective layer 400 and the second protective layer 700 is respectively 0nm-14nm.Described the second composite dielectric layer 500 is for plating successively the composite bed of SiNx layer and ZnSnOx layer again on the ZnSnOx layer, the thickness of described the second composite dielectric layer 500 is 50nm-150nm.Described dielectric layer 800 is Si
3N
4, the thickness of described dielectric layer 800 is 35nm-50nm.
On the other hand, the manufacturing process of muted color double-silver composite structure low radiation coated glass of the present invention, its adopts vacuum magnetron sputtering coating film technique coatings successively on glass substrate:
The first composite dielectric layer is being coated with by exchanging the sputter in oxygen argon atmosphere of cathode zinc tin alloy target on the silicon nitride film layer by exchanging silicon target sputter in argon nitrogen atmosphere of negative electrode;
Copper alloy layer is by using the sputter in the atmosphere of nitrogen of copper aluminium target;
The first silver layer and the second silver layer are by the sputter in argon atmosphere of direct current horizontal target;
The first protective layer and the second protective layer are by direct current horizontal target sputter nichrome in argon atmosphere;
The second composite dielectric layer is coated with the sputter in oxygen argon atmosphere of Zinc-tin alloy target, the sputter in nitrogen argon atmosphere of silumin target by Zinc-tin alloy target, silumin target and the Zinc-tin alloy target that exchanges negative electrode;
Dielectric layer is by exchanging silumin target sputter in nitrogen argon atmosphere of negative electrode.
In the present invention, in described the first protective layer and the second protective layer, Ni:Cr=80:20.
Muted color double-silver composite structure low radiation coated glass of the present invention is produced with sheet glass both-end continous way coating equipment, a kind of preferred process program wherein, use 6 to exchange two targets, 6 direct current list targets, totally 12 target position are produced, make the double-silver composite structure low radiation coated glass of muted color of the present invention, the list of locations of its processing parameter and target is as follows:
The double-silver composite structure low radiation coated glass target position of table 1 muted color distributes and processing parameter
Above demonstration and described ultimate principle of the present invention and principal character and advantage of the present invention.The technician of the industry should understand, and the present invention is not restricted to the described embodiments, and that describes in above-described embodiment and the specification sheets just illustrates principle of the present invention, without departing from the spirit and scope of the present invention,
The present invention also has various changes and modifications, and these changes and improvements all fall in the claimed scope of the invention, and the claimed scope of the present invention is defined by appending claims and equivalent thereof.
Claims (10)
1. a muted color double-silver composite structure low radiation coated glass and manufacturing process thereof; it is characterized in that; it comprises glass substrate; it is characterized in that, be disposed with the first composite dielectric layer, the first silver layer, the first protective layer, the second composite dielectric layer, the second silver layer, the second protective layer and dielectric layer in the described glass substrate outside.
2. muted color double-silver composite structure low radiation coated glass as claimed in claim 1 is characterized in that, also is provided with a copper alloy layer between described the first composite dielectric layer and the second composite dielectric layer.
3. muted color double-silver composite structure low radiation coated glass as claimed in claim 2 is characterized in that, described copper alloy layer is CuAlNx, and the thickness of described copper alloy layer is 2-10nm.
4. muted color double-silver composite structure low radiation coated glass as claimed in claim 1 is characterized in that, described the first composite dielectric layer is for plating the composite bed of ZnSnOx layer again on the SiNx layer, and the thickness of described the first composite dielectric layer is 30nm-80nm.
5. muted color double-silver composite structure low radiation coated glass as claimed in claim 1 is characterized in that, described the first silver layer and the second silver layer are Ag, and the thickness of described the first silver layer and the second silver layer is respectively 5nm-15nm.
6. muted color double-silver composite structure low radiation coated glass as claimed in claim 1 is characterized in that, described the first protective layer and the second protective layer are NiCr, and the thickness of described the first protective layer and the second protective layer is respectively 0nm-14nm.
7. muted color double-silver composite structure low radiation coated glass as claimed in claim 1, it is characterized in that, described the second composite dielectric layer is for plating successively the composite bed of SiNx layer and ZnSnOx layer again on the ZnSnOx layer, the thickness of described the second composite dielectric layer is 50nm-150nm.
8. muted color double-silver composite structure low radiation coated glass as claimed in claim 1 is characterized in that, described dielectric layer is Si
3N
4, the thickness of described dielectric layer is 35nm-50nm.
9. the manufacturing process of a muted color double-silver composite structure low radiation coated glass is characterized in that, its adopts vacuum magnetron sputtering coating film technique coatings successively on glass substrate:
The first composite dielectric layer is being coated with by exchanging the sputter in oxygen argon atmosphere of cathode zinc tin alloy target on the silicon nitride film layer by exchanging silicon target sputter in argon nitrogen atmosphere of negative electrode;
Copper alloy layer is by using the sputter in the atmosphere of nitrogen of copper aluminium target;
The first silver layer and the second silver layer are by the sputter in argon atmosphere of direct current horizontal target;
The first protective layer and the second protective layer are by direct current horizontal target sputter nichrome in argon atmosphere;
The second composite dielectric layer is coated with the sputter in oxygen argon atmosphere of Zinc-tin alloy target, the sputter in nitrogen argon atmosphere of silumin target by Zinc-tin alloy target, silumin target and the Zinc-tin alloy target that exchanges negative electrode;
Dielectric layer is by exchanging silumin target sputter in nitrogen argon atmosphere of negative electrode.
10. the manufacturing process of muted color double-silver composite structure low radiation coated glass as claimed in claim 9 is characterized in that, in described the first protective layer and the second protective layer, and Ni:Cr=80:20.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103434216A (en) * | 2013-08-16 | 2013-12-11 | 东莞南玻工程玻璃有限公司 | Double-silver low-emissivity coated glass and preparation method thereof |
| CN106746729A (en) * | 2016-12-30 | 2017-05-31 | 广东中航特种玻璃技术有限公司 | Based on many metal levels can tempering muted color double-silver low-emissivity coated glass and preparation method |
| CN111807716A (en) * | 2020-07-24 | 2020-10-23 | 东莞南玻工程玻璃有限公司 | Golden three-silver low-emissivity coated glass and preparation method thereof |
| CN112010567A (en) * | 2020-08-19 | 2020-12-01 | 江门耀皮工程玻璃有限公司 | Novel film system structure of large-angle non-color-cast double-layer silver-plated glass and processing technology thereof |
| CN116535106A (en) * | 2023-05-15 | 2023-08-04 | 咸宁南玻节能玻璃有限公司 | High-transmittance neutral-color toughened double-silver low-emissivity coated glass and preparation method thereof |
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| CN101072734A (en) * | 2004-11-08 | 2007-11-14 | 格拉沃贝尔公司 | Glazing |
| CN101531471A (en) * | 2009-03-10 | 2009-09-16 | 上海耀华皮尔金顿玻璃股份有限公司 | Toughened low-radiation coated glass with double-silver composite structure and technique thereof |
| CN101830643A (en) * | 2010-05-28 | 2010-09-15 | 中航三鑫股份有限公司 | Double silver coating glass and manufacturing method thereof |
-
2012
- 2012-10-31 CN CN2012104258371A patent/CN102951854A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101072734A (en) * | 2004-11-08 | 2007-11-14 | 格拉沃贝尔公司 | Glazing |
| CN101531471A (en) * | 2009-03-10 | 2009-09-16 | 上海耀华皮尔金顿玻璃股份有限公司 | Toughened low-radiation coated glass with double-silver composite structure and technique thereof |
| CN101830643A (en) * | 2010-05-28 | 2010-09-15 | 中航三鑫股份有限公司 | Double silver coating glass and manufacturing method thereof |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103434216A (en) * | 2013-08-16 | 2013-12-11 | 东莞南玻工程玻璃有限公司 | Double-silver low-emissivity coated glass and preparation method thereof |
| CN106746729A (en) * | 2016-12-30 | 2017-05-31 | 广东中航特种玻璃技术有限公司 | Based on many metal levels can tempering muted color double-silver low-emissivity coated glass and preparation method |
| CN111807716A (en) * | 2020-07-24 | 2020-10-23 | 东莞南玻工程玻璃有限公司 | Golden three-silver low-emissivity coated glass and preparation method thereof |
| CN111807716B (en) * | 2020-07-24 | 2022-10-28 | 东莞南玻工程玻璃有限公司 | Golden three-silver low-emissivity coated glass and preparation method thereof |
| CN112010567A (en) * | 2020-08-19 | 2020-12-01 | 江门耀皮工程玻璃有限公司 | Novel film system structure of large-angle non-color-cast double-layer silver-plated glass and processing technology thereof |
| CN116535106A (en) * | 2023-05-15 | 2023-08-04 | 咸宁南玻节能玻璃有限公司 | High-transmittance neutral-color toughened double-silver low-emissivity coated glass and preparation method thereof |
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Application publication date: 20130306 |