CN203592408U - Dust removing wind hood - Google Patents
Dust removing wind hood Download PDFInfo
- Publication number
- CN203592408U CN203592408U CN201320656243.1U CN201320656243U CN203592408U CN 203592408 U CN203592408 U CN 203592408U CN 201320656243 U CN201320656243 U CN 201320656243U CN 203592408 U CN203592408 U CN 203592408U
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- China
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- silicon chip
- conveyer belt
- dedusting wind
- wind cupboard
- utility
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Abstract
The utility model relates to a dust removing wind hood used for manufacturing an impurity suction source through silicon chip back dry process sand blasting to eliminate silicon polished surface oxidation fog. The dust removing wind hood is a closed wind hood, is arranged above a silicon chip conveyer belt, and extends from the space above the silicon chip conveyer belt to the upper surface of the silicon chip conveyer belt; a carborundum nozzle is arranged in the dust removing hood. According to the utility model, the dust removing wind hood is arranged outside the carborundum nozzle, so that the dust removing wind hood extends from the space above the carborundum nozzle to the upper surface of the silicon chip conveyer belt, dust generated during sand blasting is effectively controlled, and the phenomenon that dust flies in all directions is prevented.
Description
Technical field
The utility model relates to IC grade silicon polished silicon wafer technical field, particularly relates to a kind ofly manufacturing gettering source to eliminate the dedusting wind cupboard of silicon polishing surface oxidation mist for silicon chip back side dry abrasive blasting.
Background technology
IC grade silicon polished silicon wafer is to manufacture the core material of extensive and super large-scale integration, is mainly used in the high-tech area such as high-speed computer, Aero-Space.The microdefect " oxidation fog " of silicon single-crystal polishing plate is perplexing the quality of high reliability device silicon single-crystal polishing plate always.For a long time, people adopt several different methods to eliminate the oxidation fog on silicon polished surface.The method adopting is mainly the mode by gettering, has two kinds of intrinsic gettering and outer getterings.Intrinsic gettering is mainly to utilize the oxygen precipitation in silicon chip to produce the oxidation fog on elimination silicon polishing surface, gettering district, and because of its apparatus expensive, complex process, requires the interior oxygen precipitation profile of silicon chip even, wayward, and poor repeatability, therefore applies less at home and abroad.Outer gettering is mainly to utilize external means to form damage or stress at silicon chip back side, concrete mode has at the damage of silicon chip back side grinder belt, damage from laser or LPCVD growing polycrystalline silicon layer etc., or adopts the methods such as irradiation, heat pre-treatment, the soft damage of silicon chip back side to eliminate the oxidation fog of silicon chip.
Adopting dry abrasive blasting to manufacture the oxidation fog of eliminating silicon polishing surface in gettering source to the back side of silicon chip is emergingly in recent years a kind ofly can effectively eliminate the oxidation fog on silicon polished surface, while technique advantages of simple again, invest little, workable, easy to implement outer impurity absorption method.It is to damage gettering principle according to the back of the body, at silicon chip back side dry abrasive blasting, produce lattice damage or distortion, manufacture gettering source, by control and modulation to sand size, blasting pressure, an operation pitch of fins, time course, at the uniform stacking fault density of silicon chip back side manufacture, produce 6-38 × 104/cm at silicon chip back side
2damage fault, induce heap diamicton mistake, make silicon chip there is extrinsic gettering ability.At high temperature, the impurity of silicon chip can be shifted, and transfer to the non-critical position at silicon chip the inside and the back side, in the making integrated circuit region on polished silicon wafer surface, form the clean area of the several um of thickness, thereby the high-quality that obtains nothing " oxidation fog " is silicon polished, guarantees that IC product circuit characteristic is unaffected.
In the prior art, adopt dry abrasive blasting to manufacture gettering source to eliminate the oxidation fog on silicon polishing surface to the back side of silicon chip, normally by above transporting the conveyer belt of silicon chip, diamond dust nozzle being set, spray diamond dust by diamond dust nozzle to the silicon chip on conveyer belt 2 and realize.One fan housing 1 wherein can be set on diamond dust nozzle, and for exhausting-dusting, the dust flying upward during to sandblast is removed, and as shown in Figure 1, Fig. 1 prior art arranges the schematic diagram of fan housing above conveyer belt.Although set up fan housing 1 above diamond dust nozzle, can play certain dust removing effects, but owing to existing larger unlimited space between fan housing 1 and conveyer belt 2, a large amount of dust that produce in the time that diamond dust sprays still have partly and fly upward and enter atmosphere, cause environmental pollution.
Summary of the invention
The purpose of this utility model is, overcome the defect that prior art exists, and provide a kind of dedusting wind cupboard of new structure, technical problem to be solved is to make it by dedusting wind cupboard is set at diamond dust nozzle outward, make dedusting wind cupboard be extended to the upper surface of silicon chip conveyer belt by the top of diamond dust nozzle, the dust producing can be to sandblast time control effectively, and avoids dust from flying, is very suitable for practicality.
The purpose of this utility model and solve its technical problem and realize by the following technical solutions.According to a kind of dedusting wind cupboard the utility model proposes, manufacture gettering source to eliminate silicon polishing surface oxidation mist for silicon chip back side dry abrasive blasting, wherein said dedusting wind cupboard is closed wind cupboard, be arranged at the top of silicon chip conveyer belt, and extended downward the upper surface of described silicon chip conveyer belt by the top of described silicon chip conveyer belt; In described dedusting wind cupboard, be provided with diamond dust nozzle.
The purpose of this utility model and solve its technical problem and also can be applied to the following technical measures to achieve further.
Aforesaid dedusting wind cupboard, is wherein provided with through hole at the top of described dedusting wind cupboard, and described dedusting wind cupboard passes through pipeline communication by described through hole and dust collecting.
Aforesaid dedusting wind cupboard, is wherein provided with observable silicon chip back side diamond dust on just to the one side of described diamond dust nozzle at described dedusting wind cupboard and sprays the organic glass door of hacking situation.
The utility model compared with prior art has obvious advantage and beneficial effect.By technique scheme, a kind of dedusting wind of the utility model cupboard at least has following advantages and beneficial effect: the utility model is by arranging dedusting wind cupboard outward at diamond dust nozzle, make dedusting wind cupboard be extended to the upper surface of silicon chip conveyer belt by the top of diamond dust nozzle, the dust producing can be to sandblast time control effectively, and avoids dust from flying.
Above-mentioned explanation is only the general introduction of technical solutions of the utility model, in order to better understand technological means of the present utility model, and can be implemented according to the content of description, and for above and other object of the present utility model, feature and advantage can be become apparent, below especially exemplified by preferred embodiment, and coordinate accompanying drawing, be described in detail as follows.
Accompanying drawing explanation
Fig. 1 prior art arranges the schematic diagram of fan housing above conveyer belt.
Fig. 2 is the schematic diagram that the utility model arranges dedusting wind cupboard on conveyer belt.
The specific embodiment
Technological means and effect of taking for reaching predetermined goal of the invention for further setting forth the utility model, below in conjunction with accompanying drawing and preferred embodiment, to a kind of its specific embodiment of dedusting wind cupboard, structure, feature and effect thereof according to the utility model proposes, be described in detail as follows.
Relevant aforementioned and other technology contents of the present utility model, Characteristic can be known and present in the following detailed description coordinating with reference to graphic preferred embodiment.By the explanation of the specific embodiment, should obtain one more deeply and concrete understanding for technological means and effect of reaching predetermined object and taking to the utility model, but appended graphic be only to provide with reference to the use of explanation, be not used for the utility model to be limited.
Referring to shown in Fig. 2, is the schematic diagram that the utility model arranges dedusting wind cupboard on conveyer belt.Dedusting wind cupboard 3 of the present utility model is closed wind cupboard, manufactures gettering source to eliminate silicon polishing surface oxidation mist for silicon chip back side dry abrasive blasting.Wherein dedusting wind cupboard 3 is arranged at the top of silicon chip conveyer belt 4, and is extended downward the upper surface of silicon chip conveyer belt 4 by the top of silicon chip conveyer belt 4, is provided with diamond dust nozzle (not shown) in dedusting wind cupboard 3.
As shown in Figure 2, be provided with through hole 5 at the top of dedusting wind cupboard 3, dedusting wind cupboard 3 can pass through pipeline communication with dust collecting (not shown) by through hole 5.Can be provided with observable silicon chip back side diamond dust on just to the one side of diamond dust nozzle 1 at dedusting wind cupboard 3 and spray the organic glass door 6 of hacking situation.
The utility model is by arranging dedusting wind cupboard 3 outward at diamond dust nozzle, with respect to diamond dust nozzle is set above silicon chip conveyer belt, or above diamond dust nozzle, add the mode of a fan housing, the dust producing can make diamond dust spray time is effectively controlled, and avoids dust from flying again.
The above, it is only preferred embodiment of the present utility model, not the utility model is done to any pro forma restriction, although the utility model discloses as above with preferred embodiment, but not in order to limit the utility model, any those skilled in the art, do not departing within the scope of technical solutions of the utility model, when can utilizing the technology contents of above-mentioned announcement to make a little change or being modified to the equivalent embodiment of equivalent variations, in every case be not depart from technical solutions of the utility model content, any simple modification of above embodiment being done according to technical spirit of the present utility model, equivalent variations and modification, all still belong in the scope of technical solutions of the utility model.
Claims (3)
1. a dedusting wind cupboard, manufacture gettering source to eliminate silicon polishing surface oxidation mist for silicon chip back side dry abrasive blasting, it is characterized in that: described dedusting wind cupboard is closed wind cupboard, be arranged at the top of silicon chip conveyer belt, and extended downward the upper surface of described silicon chip conveyer belt by the top of described silicon chip conveyer belt; In described dedusting wind cupboard, be provided with diamond dust nozzle.
2. dedusting wind cupboard according to claim 1, is characterized in that being wherein provided with through hole at the top of described dedusting wind cupboard, and described dedusting wind cupboard passes through pipeline communication by described through hole and dust collecting.
3. dedusting wind cupboard according to claim 2, is characterized in that being wherein provided with observable silicon chip back side diamond dust at described dedusting wind cupboard on just to the one side of described diamond dust nozzle sprays the organic glass door of hacking situation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320656243.1U CN203592408U (en) | 2013-10-23 | 2013-10-23 | Dust removing wind hood |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320656243.1U CN203592408U (en) | 2013-10-23 | 2013-10-23 | Dust removing wind hood |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203592408U true CN203592408U (en) | 2014-05-14 |
Family
ID=50673348
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320656243.1U Expired - Lifetime CN203592408U (en) | 2013-10-23 | 2013-10-23 | Dust removing wind hood |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203592408U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103846815A (en) * | 2013-10-23 | 2014-06-11 | 洛阳市鼎晶电子材料有限公司 | Dedusting draught cupboard |
-
2013
- 2013-10-23 CN CN201320656243.1U patent/CN203592408U/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103846815A (en) * | 2013-10-23 | 2014-06-11 | 洛阳市鼎晶电子材料有限公司 | Dedusting draught cupboard |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |