Czochralski crystal growing furnace
Technical field
The utility model belongs to monocrystalline producing apparatus technical field, relates to a kind of czochralski crystal growing furnace.
Background technology
Photovoltaic generation is a kind of as the main energy sources of green energy resource and human kind sustainable development, is day by day subject to the attention of countries in the world and is greatly developed.Monocrystalline silicon piece, as the base mateiral of photovoltaic generation, has the market requirement widely.Common monocrystalline silicon growing method is a vertical pulling method, that is, and and in single crystal growing furnace, polycrystalline silicon material is put in quartz crucible, and heat fused, then makes seed crystal contact with molten silicon, when rotating seed crystal and crucible, lift seed crystal, can growing single-crystal silicon rod in seed crystal lower end.In single crystal growth process, up to 1400 ℃ of left and right, there is the huge temperature difference with stove external environment in the temperature in thermal field of single crystal furnace, causes thus a large amount of thermal lossess.Especially the place contacting with furnace shell at thermal field component, water coolant can be taken away a large amount of heats.
Utility model content
The purpose of this utility model is to provide a kind of czochralski crystal growing furnace, solves the large problem of thermal losses that prior art exists.
The technical solution of the utility model is that czochralski crystal growing furnace, comprises housing and be arranged on the thermal-field device in housing, housing comprises drop-bottom and furnace sidewall, thermal-field device is positioned at drop-bottom top, is provided with river bottom protection plate between thermal-field device and drop-bottom, between drop-bottom and river bottom protection plate, is provided with isolating frame.
Feature of the present utility model is also:
Isolating frame comprises pallet and supporting structure, gapped between pallet and furnace sidewall.
Between isolating frame and river bottom protection plate, be provided with insulation quilt.
Supporting structure comprises the support ring of the coaxial setting of at least one and pallet, and support ring is enclosed and formed by the back up pad perpendicular to pallet.
Isolating frame also comprises a plurality of positioning elements, and a plurality of positioning elements distribute with respect to the center equal angles of pallet, and all protrudes from the outer rim of pallet, and the radical length of part that a plurality of positioning elements protrude from the outer rim of pallet equates.
A plurality of positioning elements all contact with furnace sidewall.
Pallet is provided with the perforate that is positioned at center, and supporting structure comprises two support rings, and one of them support ring is near the edge of perforate, and another support ring is near the outer rim of pallet.
Another kind of structure is:
Supporting structure comprises a plurality of supporters.
A plurality of supporters distribute with respect to the center equal angles of pallet, and all protrude from the outer rim of pallet, and the radical length of part that a plurality of supporters protrude from the outer rim of pallet equates.
A plurality of supporters all contact with furnace sidewall.
The utlity model has following beneficial effect:
1, between the drop-bottom of the utility model czochralski crystal growing furnace and river bottom protection plate, isolating frame is set, isolating frame only contacts with drop-bottom by supporting structure, solve thermal-field device and drop-bottom in existing thermal-field device and directly contacted the large problem of heat energy loss causing, significantly reduced the loss of heat energy.
2, the utility model is simple in structure, and result of use is good.Use the utility model czochralski crystal growing furnace, can not affect under the prerequisite of monocrystalline quality and pulling rate, reach isometrical power and reduce by 3~5KW.
Accompanying drawing explanation
Fig. 1 is the structural representation of the utility model embodiment 1 czochralski crystal growing furnace;
Fig. 2 is the isolating frame structural representation of the utility model embodiment 1 czochralski crystal growing furnace;
Fig. 3 is the czochralski crystal growing furnace structural representation of the utility model embodiment 2;
Fig. 4 is the isolating frame structural representation of the utility model embodiment 2 czochralski crystal growing furnaces.
In figure, 10. czochralski crystal growing furnace, 11. housings, 12 thermal-field devices, 13. isolating frames, 14. insulation quilts, 110. drop-bottoms, 111. furnace sidewall, 112. openings, 120. crucibles, 121. well heaters, 122. insulation constructions, 123. river bottom protection plates, 124. crucible shaft, 130. pallets, 131. supporting structures, 132. positioning elements, 232. supporters, 133. perforates, 134. surfaces, 135. bottom surfaces, 136. support rings.
Embodiment
Below in conjunction with drawings and Examples, the utility model is elaborated.
Embodiment 1, sees figures.1.and.2, and czochralski crystal growing furnace 10, comprises housing 11, thermal-field device 12 and isolating frame 13.Thermal-field device 12 and isolating frame 13 are all positioned at housing 11.
Housing 11 comprises the drop-bottom 110 and furnace sidewall 111 cooperatively interacting.The center of drop-bottom 110 is provided with opening 112.
Thermal-field device 12 is positioned at drop-bottom 110 tops.Thermal-field device 12 comprises crucible 120, well heater 121, insulation construction 122 and river bottom protection plate 123.Crucible 120 is for holding polycrystalline silicon material.Crucible 120 belows are provided with and are connected in the crucible shaft 124 of driving mechanism (not shown) to drive crucible 120 to rotate.Crucible shaft 124 is through the opening 112 of drop-bottom 110.Well heater 121 arranges around the periphery of crucible 120.Insulation construction 122 is positioned at the periphery of well heater 121, and relative with furnace sidewall 111.River bottom protection plate 123 is positioned at crucible 120 and well heater 121 belows, and near drop-bottom 110.
Isolating frame 13 is between drop-bottom 110 and river bottom protection plate 123.Preferably, between isolating frame 13 and river bottom protection plate 123, insulation quilt 14 is set.That is to say, on drop-bottom 110, be followed successively by isolating frame 13, insulation quilt 14 and river bottom protection plate 123.
Isolating frame 13 comprises a pallet 130, supporting structure 131 and a plurality of positioning elements 132.Supporting structure 131 is all connected in pallet 130 with a plurality of positioning elements 132.
Pallet 130 is ring structure, and is provided with the perforate 133 that is positioned at center.Crucible shaft 124 is through perforate 133.Pallet 130 is provided with relative surface 134 and bottom surface 135.Perforate 133 runs through surface 134 and bottom surface 135.Surface 134 is near insulation quilt 14 and river bottom protection plate 123.Bottom surface 135 is near drop-bottom 110.Gapped between pallet 130 and furnace sidewall 111, that is to say, pallet 130 does not contact with furnace sidewall 111.Supporting structure 131 is connected in the bottom surface 135 of pallet 130.Supporting structure 131 comprises at least one and the support ring 136 of the coaxial setting of pallet 130.Support ring 136 is enclosed and is formed by the back up pad perpendicular to pallet 130.In the present embodiment, supporting structure 131 comprises 136: one inner edges near pallet 130 of two support rings, that is, and and the edge of perforate 133; Another is near the outer rim of pallet 130, and internal diameter is greater than the external diameter of aforementioned support ring 136.Certainly, if the support strength of back up pad is enough large, the quantity of support ring 136 can be also only one, so, thereby be more conducive to reduce the heat that is passed to drop-bottom 110 from river bottom protection plate 123, further reduces thermal losses.
Positioning element 132 can be connected in bottom surface 135 or the outer edge surface of pallet 130.A plurality of positioning elements 132 all protrude from the outer rim of pallet 130, and all contact with furnace sidewall 111.A plurality of positioning elements 132 distribute with respect to pallet 130 center equal angles, and the radical length of part that protrudes from the outer rim of pallet 130 equates.In the present embodiment, the quantity of positioning element 132 is three, and the angle that adjacent two positioning elements are 132 is 120 degree.Each positioning element 132 is all along the radially setting of pallet 130, and a plurality of positioning elements 132 protrude from the equal in length of pallet 130 outer rims.Certainly, the quantity of positioning element 132 also can be two, four or more.Positioning element 132 also can be along other direction setting being different from radially, and the setting party of a plurality of positioning elements 132 is to can be identical or different, and the radial component of length that only needs a plurality of positioning elements 132 to protrude from the part of pallet 130 outer rims equates.
The czochralski crystal growing furnace 10 that the utility model embodiment 1 provides arranges isolating frame 13 between drop-bottom 110 and thermal-field device 12, avoids drop-bottom 110 and thermal-field device 12 directly to contact and takes away a large amount of heat energy.Further, the supporting structure 131 of isolating frame 13 has reduced the contact area of isolating frame 13 with drop-bottom 110, gapped between pallet 130 and furnace sidewall 111, all can further reduce thermal losses.In addition, a plurality of positioning elements 132 structures of isolating frame 13, can realize in the housing 11 that rapidly isolating frame 13 is coaxially installed on to czochralski crystal growing furnace 10, avoid tilting to install causing the unsettled phenomenon of thermal-field device 12.
Embodiment 2, and the czochralski crystal growing furnace 10 of the present embodiment is roughly the same with embodiment's 1, and difference is that the structure of isolating frame 13 is different.With reference to Fig. 3 and Fig. 4, isolating frame 13 comprises pallet 130 and is connected in pallet 130 near the supporting structure 131 of a side of drop-bottom 110.Supporting structure 131 comprises a plurality of supporters 232.A plurality of supporters 232 all protrude from the outer rim of pallet, and all contact with furnace sidewall 111.A plurality of supporters 232 distribute with respect to pallet 130 center equal angles, and the radical length of part that protrudes from the outer rim of pallet 130 equates.In the present embodiment, the quantity of supporter 232 is six, and each supporter 232 is all along the radially setting of pallet 130.A plurality of supporters 232 on the one hand can support tray 130, on the other hand, can realize in the housing 11 that rapidly isolating frame 13 is coaxially installed on to czochralski crystal growing furnace 10, avoids tilting to install causing the unsettled phenomenon of thermal-field device 12.
In the czochralski crystal growing furnace 10 that embodiment 2 provides, supporting structure 131 has the effect of supporting with positioned coaxially concurrently, and structure is simpler.
The czochralski crystal growing furnace that the utility model provides has solved thermal-field device and drop-bottom in existing thermal-field device and has directly contacted the large problem of heat energy loss causing.Use this czochralski crystal growing furnace, can not affect under the prerequisite of monocrystalline quality and pulling rate, reach isometrical power and reduce by 3~5KW.