CN203490009U - Low-range sputtered thin film type force transducer - Google Patents
Low-range sputtered thin film type force transducer Download PDFInfo
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- CN203490009U CN203490009U CN201320558902.8U CN201320558902U CN203490009U CN 203490009 U CN203490009 U CN 203490009U CN 201320558902 U CN201320558902 U CN 201320558902U CN 203490009 U CN203490009 U CN 203490009U
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- elastic body
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- screw rod
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- 239000010409 thin film Substances 0.000 title abstract 5
- 238000004544 sputter deposition Methods 0.000 claims abstract description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 4
- 229910001120 nichrome Inorganic materials 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 238000005516 engineering process Methods 0.000 abstract description 8
- 238000000034 method Methods 0.000 abstract description 6
- 239000011248 coating agent Substances 0.000 abstract description 3
- 238000000576 coating method Methods 0.000 abstract description 3
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 238000011326 mechanical measurement Methods 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 229920001971 elastomer Polymers 0.000 abstract 5
- 239000000806 elastomer Substances 0.000 abstract 5
- 238000004519 manufacturing process Methods 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 238000009966 trimming Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
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Abstract
The utility model discloses a low-range sputtered thin film type force transducer, which comprises an elastomer, a base, a cover board and a connection screw rod; the middle part of the elastomer is a sheet; a thin film resistance strain sensing unit is sputtered on the sheet; a concave structure is in the centre of the base; the base and the elastomer are fixed into a whole; the middle part of the elastomer can be deformed in the depression of the base; one end of the connection screw rod is fixed on the elastomer; and the other end of the connection screw rod is used as one force applying end of tension or pressure. According to the strainometer disclosed by the utility model, a Wheatstone bridge circuit is manufactured in manners of sputtering and coating through the semiconductor process technology; the low-range sputtered thin film type force transducer is small in size, high in precision and long in service life; the moisture resistance and the humidity resistance are greatly increased; the low-range sputtered thin film type force transducer is beneficial to being used under harsh environments, and therefore, application of the sputtering technology in low-range mechanical measurement is expanded.
Description
Technical field
The utility model content belongs to electronics sensing equalizer technology field, relates to a kind of force cell, relates in particular to the lower range sputtered film type force cell of a kind of high reliability, long-life adverse environment resistant.
Background technology
Common dynamometry or LOAD CELLS adopt the mode of adhering resistance strainometer more, Applicable temperature narrow range, and volume is large, but the particular application high for reliability requirement, quality is light, volume is little, traditional stickup sensor cannot meet the demands.
As improved application structure, sputter coating strain gauge technology also has disclosed report, as patent No. patent of invention---the diaphragm pressure sensor of integrated temperature that is ZL200910022781.3, this patent is applied to spatter film forming technology in the design production of pressure transducer, can manufacture small size, integrated pressure transducer, but be subject to the restriction of sensor construction, the stress parameters that this technology is still difficult in wider temperature range, realize lower range is reliably measured.
Utility model content
The purpose of this utility model is exactly to realize being difficult to of solving that existing sensor exists the defect that the stress parameters of lower range is measured in wider temperature range, provides that a kind of volume is little, quality light, the lower range sputtered film type force cell of long service life, good reliability.
Technical solutions of the utility model are as follows:
A lower range sputtered film type force cell, comprises elastic body, base, cover plate and connecting screw rod, and elastomeric middle part is thin slice, and on thin slice, sputter has sheet resistance strain sensitive unit; Base center is sunk structure, and base and elastic body are solidified as a whole, and elastic body middle part can produce deformation at the recess of base; One end of connecting screw rod is fixed on elastic body, and the other end is as a force side of pulling force or pressure.
In above-mentioned lower range sputtered film type force cell, cover plate center is provided with through hole, and connecting screw rod is through the through hole at cover plate center, and its one end is fixed on elastic body, and the other end is as a force side of pulling force or pressure; The center, outer end of base is provided with extension rod, and as another force side of pulling force or pressure.
In above-mentioned lower range sputtered film type force cell, base center is provided with through hole, and connecting screw rod packs in elastic body through the through hole at base center, and the outer end of connecting screw rod is as a force side of pulling force or pressure; On cover plate, be evenly equipped with threaded hole, can be used for fixedly force application part, and as another force side of pulling force or pressure.
In above-mentioned lower range sputtered film type force cell, connecting screw rod and elastomeric stiff end are provided with set nut.
In above-mentioned lower range sputtered film type force cell, elastomeric middle part is the elastic beam of three symmetrical structures, the elastic beam structure that is centrosymmetric, and one end is arranged on elastic body center, the other end is arranged on elastomeric periphery, at the surface sputtering of elastic beam, has sheet resistance strain sensitive unit.
In above-mentioned lower range sputtered film type force cell, sheet resistance strain sensitive unit is comprised of silica medium film and the outer field nichrome film of internal layer.
In above-mentioned lower range sputtered film type force cell, the width of elastic beam is 1mm～3mm, and thickness is 0.3mm～1.0mm.
In above-mentioned lower range sputtered film type force cell, the wide of elastic beam is 1mm, 2mm or 3mm, and thickness is 0.3mm, 0.6mm or 1mm.
In above-mentioned lower range sputtered film type force cell, together with base passes through laser bonding with elastic body.
In above-mentioned lower range sputtered film type force cell, the making material of elastic body, base, cover plate, connecting screw rod and set nut is 17-4PH.
Compared with prior art, the utlity model has following advantage and technique effect:
1, the utility model is by manufacture of semiconductor technique; employing sputters at sheet resistance strain sensitive unit the process structure on the elastic body of thin slice and adopts the base of central concave to protect sensor; the size of product is little, quality is light, precision is high, the life-span is long; there is high reliability simultaneously; the serviceability temperature scope of this force cell is-60 ℃～120 ℃, and applicable vacuum environment is low to moderate 10
-5pa, ambient humidity, is beneficial to sensor and uses under rugged surroundings, thereby expanded the application of sputtering technology in lower range mechanical measurement substantially without impact product;
2, on elastic body of the present utility model, be provided with the elastic beam of three symmetrical structures, sheet resistance strain sensitive unit sputters on elastic beam, elastic beam thickness and width are less, increased the sensitivity of system, its stress that can be used for lower range is processed, and different sensor measurement ranges can be made by changing thickness and the width of elastic beam, has applicability widely;
3, connecting screw rod of the present utility model and elastomeric stiff end are provided with set nut, have guaranteed on the one hand the reliable connection of the two, and set nut has played protection and overload position-limiting action to elastomeric strain simultaneously, have increased the reliability of sensor;
4, sensing unit of the present utility model adopts spatter film forming technique, by multistep operations such as polishing, sputter deielectric-coating, sputter alloy film, photoetching, plasma etching, laser resistor trimmings, combine with integrated circuit production process precision, both properties of product had been improved, increase production capacity simultaneously, reduced cost.
Accompanying drawing explanation
Fig. 1 is the structural representation of a specific embodiment of the utility model.
Fig. 2 is the elastomeric structural representation of the utility model.
Fig. 3 is the structural representation of another specific embodiment of the utility model.
Reference numeral is as follows: 1-elastic body, 2-base, 3-cover plate; 4-connecting screw rod, 5-set nut, 6-gib screw, 7-sheet resistance strain sensitive unit, 8-extension rod, 9-elastic beam.
Embodiment
Below with reference to accompanying drawing, the utility model content is described further, but actual fabrication structure of the present utility model is not limited in following embodiment.
Embodiment mono-:
Sputtered film type force cell as shown in Figure 1, comprises elastic body 1, base 2, cover plate 3 and connecting screw rod 4, and it is made material and is 17-4PH stainless steel.The middle part of elastic body 1 is flake structure, and on thin slice, sputter has sheet resistance strain sensitive unit 7; Base 2 centers are sunk structure, base 2 and elastic body 1 adopt laser bonding or other modes to be solidified as a whole, and elastic body 1 middle part can produce deformation at the recess of base 2, and one end of connecting screw rod 4 is fixed on elastic body 1, and the other end is as a force side of pulling force or pressure.Cover plate 3 centers are provided with through hole, and connecting screw rod 4 is through the through hole at cover plate center; The center, outer end of base 2 is provided with extension rod 8, and as another force side of pulling force or pressure.On base 2, also can adopt hickey to connect with outside force application part, sensor be applied to the power of drawing or pressing to.
As a kind of optimal way, connecting screw rod 4 is provided with set nut 5 with the stiff end of elastic body 1, and set nut material is also 17-4PH.Connecting screw rod 4 is appeared outside not in one end of set nut 5; and set nut 5 has certain gap apart from base 2; set nut 5 has guaranteed that connecting screw rod 4 is connected with the reliable of elastic body 1 on the one hand; 5 pairs of elastomeric strains of set nut have simultaneously played protection and overload position-limiting action, have increased the reliability of sensor.
As a kind of optimal way, as shown in Figure 2, the middle part of elastic body 1 is the elastic beam 9 (three Symmetric Beam 120 ° be distributed on elastic body 1 circumferencial direction) of three symmetrical structures, outer being exposed on symmetrical elastic beam protruded in strain regions, by group bridge, form wheatstone bridge circuits, thereby force signal is converted to electric signal.Elastic beam 9 structure that is centrosymmetric, one end is arranged on elastic body 1 center, and the other end is arranged on the periphery of elastic body 1, and sheet resistance strain sensitive unit 7 sputters on the surface exposed strain regions of elastic beam.When assurance meets measuring accuracy needs, on elastic body 1, uniform 3 screws that are not more than M2, play the effect of fixation of sensor.
The width of elastic beam 9 is 1mm～3mm, and thickness is 0.3mm～1.0mm, is distributed in the dimensional space that external diameter is not more than Φ 17, and wherein the wide of preferred elastomeric beam 9 is 1mm, 2mm or 3mm, and thickness is 0.3mm, 0.6mm or 1mm.Result of implementation shows, as deck-siding 2mm, thick 0.6mm, can be made into the force cell that range is 40N, and sensor slightly large or small-range is realized by changing width and the thickness of elastic beam.
Sheet resistance strain sensitive unit 7 is comprised of silica medium film and the outer field nichrome film of internal layer, it is manufactured and adopts spatter film forming technique, by multistep operations such as polishing, sputter deielectric-coating, sputter alloy film, photoetching, plasma etching, laser resistor trimmings, combine with integrated circuit production process precision, both properties of product had been improved, increase production capacity simultaneously, reduced cost of products.
Embodiment bis-
As shown in Figure 3, the difference of itself and embodiment 1 is slightly to change in structure, the mechanical interface of this sensor is threaded and is changed to monolateral being threaded by both sides, base 2 centers are provided with through hole simultaneously, replaced the through hole in Fig. 1 cover plate 3, connecting screw rod 4 is through the through hole at base 2 centers, as a force side of pulling force or pressure.On this outer cover plate 3, be evenly equipped with threaded hole, can be used for fixedly force application part, as another force side of pulling force or pressure, to meet different application environmental demand.
The sensor of order first two structure all can accomplish to measure the minimum 6N of range, maximum 160N, and serviceability temperature scope-60 ℃～120 ℃, applicable vacuum environment is low to moderate 10
-5pa, ambient humidity on product substantially without impact.
Claims (10)
1. a lower range sputtered film type force cell, it is characterized in that: comprise elastic body (1), base (2), cover plate (3) and connecting screw rod (4), the middle part of described elastic body (1) is thin slice, and on described thin slice, sputter has sheet resistance strain sensitive unit (7); Described base (2) center is sunk structure, and base (2) and elastic body (1) are solidified as a whole, and elastic body (1) middle part can produce deformation at the recess of base (2); It is upper that one end of described connecting screw rod (4) is fixed on elastic body (1), and the other end is as a force side of pulling force or pressure.
2. lower range sputtered film type force cell according to claim 1, it is characterized in that: described cover plate (3) center is provided with through hole, described connecting screw rod (4) is through the through hole at cover plate (3) center, it is upper that its one end is fixed on elastic body (1), and the other end is as a force side of pulling force or pressure; The center, outer end of described base (2) is provided with extension rod (8), and as another force side of pulling force or pressure.
3. lower range sputtered film type force cell according to claim 1, it is characterized in that: described base (2) center is provided with through hole, described connecting screw rod (4) packs in elastic body (1) through the through hole at base (2) center, and the outer end of connecting screw rod (4) is as a force side of pulling force or pressure; Described cover plate is evenly equipped with threaded hole on (3), can be used for fixedly force application part, and as another force side of pulling force or pressure.
4. according to the lower range sputtered film type force cell described in claim 1 or 2 or 3, it is characterized in that: described connecting screw rod (4) is provided with set nut (5) with the stiff end of elastic body (1).
5. according to the lower range sputtered film type force cell described in claim 1 or 2 or 3, it is characterized in that: the middle part of described elastic body (1) is the elastic beam (9) of three symmetrical structures, described elastic beam (9) structure that is centrosymmetric, one end is arranged on elastic body (1) center, the other end is arranged on the periphery of elastic body (1), at the surface sputtering of elastic beam, has sheet resistance strain sensitive unit (7).
6. lower range sputtered film type force cell according to claim 5, is characterized in that: described sheet resistance strain sensitive unit (7) is comprised of silica medium film and the outer field nichrome film of internal layer.
7. lower range sputtered film type force cell according to claim 5, is characterized in that: the width of described elastic beam (9) is 1mm～3mm, and thickness is 0.3mm～1.0mm.
8. lower range sputtered film type force cell according to claim 5, is characterized in that: the wide of described elastic beam (9) is 1mm, 2mm or 3mm, and thickness is 0.3mm, 0.6mm or 1mm.
9. according to the lower range sputtered film type force cell described in claim 1 or 2 or 3, it is characterized in that: described base (1) and elastic body (1) are by laser bonding together.
10. according to the lower range sputtered film type force cell described in claim or 2 or 3, it is characterized in that: the making material of described elastic body (1), base (2), cover plate (3), connecting screw rod (4) and set nut (5) is 17-4PH stainless steel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320558902.8U CN203490009U (en) | 2013-09-09 | 2013-09-09 | Low-range sputtered thin film type force transducer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320558902.8U CN203490009U (en) | 2013-09-09 | 2013-09-09 | Low-range sputtered thin film type force transducer |
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| Publication Number | Publication Date |
|---|---|
| CN203490009U true CN203490009U (en) | 2014-03-19 |
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|---|---|---|---|
| CN201320558902.8U Expired - Fee Related CN203490009U (en) | 2013-09-09 | 2013-09-09 | Low-range sputtered thin film type force transducer |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105509936A (en) * | 2015-11-27 | 2016-04-20 | 北京卫星制造厂 | Thin-film sputtering force transducer adapting to lunar environment |
| CN109632006A (en) * | 2019-01-11 | 2019-04-16 | 重庆大学 | A kind of intelligent wireless bolt and on-line monitoring system |
| CN109994596A (en) * | 2017-12-30 | 2019-07-09 | 湖南启泰传感科技有限公司 | A kind of high-performance wide-range band temperature sensitive type film chip varistor |
| CN110857896A (en) * | 2018-08-10 | 2020-03-03 | 新东工业株式会社 | Force sensor |
| CN113008421A (en) * | 2021-04-09 | 2021-06-22 | 山东省计量科学研究院 | Single-column type tension-compression bidirectional force cell |
-
2013
- 2013-09-09 CN CN201320558902.8U patent/CN203490009U/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105509936A (en) * | 2015-11-27 | 2016-04-20 | 北京卫星制造厂 | Thin-film sputtering force transducer adapting to lunar environment |
| CN105509936B (en) * | 2015-11-27 | 2018-04-10 | 北京卫星制造厂 | A kind of thin film sputtering force snesor for being suitable for lunar surface environment |
| CN109994596A (en) * | 2017-12-30 | 2019-07-09 | 湖南启泰传感科技有限公司 | A kind of high-performance wide-range band temperature sensitive type film chip varistor |
| CN110857896A (en) * | 2018-08-10 | 2020-03-03 | 新东工业株式会社 | Force sensor |
| CN109632006A (en) * | 2019-01-11 | 2019-04-16 | 重庆大学 | A kind of intelligent wireless bolt and on-line monitoring system |
| CN113008421A (en) * | 2021-04-09 | 2021-06-22 | 山东省计量科学研究院 | Single-column type tension-compression bidirectional force cell |
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140319 |
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| CF01 | Termination of patent right due to non-payment of annual fee |