CN203405124U - Heat exchanger cleaning device used for silicon wafer production - Google Patents
Heat exchanger cleaning device used for silicon wafer production Download PDFInfo
- Publication number
- CN203405124U CN203405124U CN201320377647.7U CN201320377647U CN203405124U CN 203405124 U CN203405124 U CN 203405124U CN 201320377647 U CN201320377647 U CN 201320377647U CN 203405124 U CN203405124 U CN 203405124U
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- Prior art keywords
- heat exchanger
- water
- control valve
- water pot
- water inlet
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- Expired - Fee Related
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- 238000004140 cleaning Methods 0.000 title claims abstract description 55
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 27
- 239000010703 silicon Substances 0.000 title claims abstract description 27
- 238000004519 manufacturing process Methods 0.000 title abstract description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 149
- 239000007788 liquid Substances 0.000 claims abstract description 14
- 239000000463 material Substances 0.000 claims abstract description 13
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 claims description 4
- 238000005406 washing Methods 0.000 claims description 4
- 239000008399 tap water Substances 0.000 abstract 3
- 235000020679 tap water Nutrition 0.000 abstract 3
- 239000012530 fluid Substances 0.000 abstract 1
- 101100298222 Caenorhabditis elegans pot-1 gene Proteins 0.000 description 17
- 238000011010 flushing procedure Methods 0.000 description 9
- 239000004570 mortar (masonry) Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000004576 sand Substances 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 206010016825 Flushing Diseases 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- Cleaning Or Drying Semiconductors (AREA)
- Silicon Compounds (AREA)
Abstract
The utility model relates to the technical field of the silicon wafer processing equipment, and provides a heat exchanger cleaning device used for silicon wafer production. The heat exchanger cleaning device used for the silicon wafer production includes a circulating water tank; a water outlet of the circulating water tank is communicated with a material inlet of a heat exchanger through a water inlet pipe of the circulating water; the water inlet pipe of the circulating water is provided with a circulating pump; a water outlet of the circulating water tank is communicated with a material outlet of the heat exchanger through a backwater mouth of the circulating water tank; a hot water inlet mouth of the circulating water tank is communicated with a hot water source through a hot water inlet pipe; a hot water inlet pipe is provided with a hot water pump; a water inlet of tap water in the circulating water tank is communicated with a tap water source; the pipe between the tap water source and the circulating water tank is provided with a first control valve; a cleaning fluid inlet of the circulating water tank is communicated with a cleaning liquid source; the pipe between the cleaning liquid source and the circulating water tank is provided with a second control valve; a lower part of the circulating water tank is provided with a drainage pipe; and the drainage pipe is provided with a third control valve. The heat exchanger cleaning device can not only improve the cleaning efficiency, but also ensure the cleanness degree after cleaning.
Description
Technical field
The utility model relates to silicon wafer processing equipment technical field, relates in particular to a kind of heat exchanger cleaning device of producing for silicon chip.
Background technology
In the production process of solar silicon wafers, during cutting silicon wafer, the temperature of mortar mixed liquor is higher, in the process that recirculation is used, needs to use the heat exchanger processing of being lowered the temperature.Because working long hours, the fixed residues such as the material channel of the heat exchanger residual a large amount of mortar of interior meeting and rail grain, need cleaning in time in order to avoid affect its service behaviour.
At present, the cleaning work of heat exchanger is by manually completing, and because residue is cemented in heat exchanger inside, labor cleaning gets up, and not only workload is large, expends time in, and very easily causes the damage to heat exchanger.
Utility model content
The purpose of this utility model is to provide a kind of heat exchanger cleaning device of producing for silicon chip, is intended to solve in silicon chip production process the problem that its inner fixed residue that heat exchanger causes because working long hours is difficult to cleaning.
The utility model is to realize like this, the heat exchanger cleaning device of producing for silicon chip comprises circulation water pot, the delivery port of described circulation water pot is connected with the material inlet of heat exchanger by circulating water inlet, described circulating water inlet is provided with circulating pump, and the water return outlet of circulation water pot is connected with the material outlet of described heat exchanger by recirculated water return pipe;
The water inlet of hot water of described circulation water pot is communicated with thermal water source by hot water inlet pipe, described hot water inlet pipe is provided with heat-exchanger pump, the running water water inlet of described circulation water pot is communicated with water source from the beginning, and the pipeline between described water source from the beginning and described circulation water pot is provided with the first control valve;
The filter washing water inlet of described circulation water pot is communicated with cleaning liquid source, and the pipeline between described cleaning liquid source and described circulation water pot is provided with the second control valve, and the bottom of described circulation water pot is provided with drainpipe, and described drainpipe is provided with the 3rd control valve.
As a kind of improved plan, in described circulation water pot, be provided with temperature sensor, the signal output part of described temperature sensor is electrically connected to computer control unit; The signal output part of described computer control unit is electrically connected to the signal input part of described circulating pump, described heat-exchanger pump, described the first control valve, described the second control valve and described the 3rd control valve respectively.
The heat exchanger cleaning device of producing for silicon chip that the utility model provides, because the circulation water pot of its setting can be realized heat exchanger circulation flushing is dissolved to the object of rinsing to reach by the fixed residue that is cemented in mortar in heat exchanger and silicon grain, and the cleaning liquid source being connected with circulation water pot can provide the KOH solution of accelerating its dissolving for cleaning sand slurry residual thing, and the thermal water source who is connected with circulation water pot and from the beginning water source can be the water source that its chemical reaction provides preference temperature, accelerated the efficiency of its cleaning, not only guaranteed the clean level of cleaning, can also effectively prevent the damage to heat exchanger.
Accompanying drawing explanation
Fig. 1 is the structural representation of the heat exchanger cleaning device of producing for silicon chip that provides of the utility model;
In figure: 1-circulation water pot, 2-circulating water inlet, 3-heat exchanger, 4-circulating pump, 5-recirculated water return pipe, 6-hot water inlet pipe, 7-thermal water source, 8-heat-exchanger pump, 9-is water source from the beginning, 10-the first control valve, 11-cleaning liquid source, 12-the second control valve, 13-drainpipe, 14-the 3rd control valve, 15-temperature sensor, 16-computer control unit.
The specific embodiment
In order to make the purpose of this utility model, technical scheme and advantage clearer, below in conjunction with drawings and Examples, the utility model is further elaborated.Should be appreciated that specific embodiment described herein is only in order to explain the utility model, and be not used in restriction the utility model.
The heat exchanger cleaning device of producing for silicon chip that the utility model provides comprises circulation water pot, the delivery port of this circulation water pot is connected with the material inlet of heat exchanger by circulating water inlet, circulating water inlet is provided with circulating pump, and the water return outlet of circulation water pot is connected with the material outlet of heat exchanger by recirculated water return pipe;
The water inlet of hot water of circulation water pot is communicated with thermal water source by hot water inlet pipe, and hot water inlet pipe is provided with heat-exchanger pump, and the running water water inlet of circulation water pot is communicated with water source from the beginning, and the pipeline between water source and circulation water pot is provided with the first control valve from the beginning;
The filter washing water inlet of circulation water pot is communicated with cleaning liquid source, and the pipeline between cleaning liquid source and circulation water pot is provided with the second control valve, and the bottom of circulation water pot is provided with drainpipe, and drainpipe is provided with the 3rd control valve.
Fig. 1 shows the structural representation of the heat exchanger cleaning device of producing for silicon chip that the utility model provides, and for convenience of explanation, this figure only provides the structure division relevant with the utility model.
The heat exchanger cleaning device of producing for silicon chip comprises circulation water pot 1, the delivery port of circulation water pot 1 is connected with the material inlet of heat exchanger 3 by circulating water inlet 2, circulating water inlet 2 is provided with circulating pump 4, and the water return outlet of circulation water pot 1 is connected with the material outlet of heat exchanger 3 by recirculated water return pipe 5;
The water inlet of hot water of circulation water pot 1 is communicated with thermal water source 7 by hot water inlet pipe 6, hot water inlet pipe 6 is provided with heat-exchanger pump 8, the running water water inlet of circulation water pot 1 is communicated with water source 9 from the beginning, and the pipeline between water source 9 and circulation water pot 1 is provided with the first control valve 10 from the beginning;
The filter washing water inlet of circulation water pot 1 is communicated with cleaning liquid source 11, and the pipeline between cleaning liquid source 11 and circulation water pot 1 is provided with the second control valve 12, and the bottom of circulation water pot 1 is provided with drainpipe 13, and drainpipe 13 is provided with the 3rd control valve 14.
Adopt after this kind of structure, the circulation water pot 1 that the heat exchanger cleaning device that should produce for silicon chip arranges can be realized heat exchanger 3 circulation flushings are dissolved to the object of rinsing to reach by the fixed residue being cemented in heat exchanger 3, and the cleaning liquid source 11 being connected with circulation water pot 1 can provide the KOH solution of accelerating its dissolving for cleaning sand slurry residual thing, and the thermal water source 7 who is connected with circulation water pot 1 and from the beginning 9, water source can be the water source that its chemical reaction provides preference temperature, accelerated the efficiency of its cleaning, not only guaranteed the clean level of cleaning, can also effectively prevent the damage to heat exchanger.
In this embodiment, be provided with temperature sensor 15 in circulation water pot 1, the signal output part of temperature sensor 15 is electrically connected to computer control unit 16; The signal output part of computer control unit 16 is electrically connected to the signal input part of circulating pump 4, heat-exchanger pump 8, the first control valve 10, the second control valve 12 and the 3rd control valve 14 respectively.Adopt after this kind of structure, can realize the automation of whole cleaning process and control, can improve cleaning efficiency, can reduce again the waste of human resources.
For the ease of understanding, following is this course of work of cleaning the heat exchanger using in silicon chip production process for heat exchanger cleaning device of silicon chip production:
First, the material inlet of heat exchanger 3 is connected with circulating water inlet 2, the material outlet of heat exchanger 3 is connected with recirculated water return pipe 5;
Then, start the heat exchanger cleaning device that this is produced for silicon chip, under the signal controlling of computer control unit 16, heat-exchanger pump 8 and the first control valve 10 are opened, and to the interior injection hot water of circulation water pot 1 and running water, are watered for the first time;
When the water temperature in circulation water pot 1 reaches 40OC, temperature sensor 15 sends detection signal to computer control unit, then under the signal controlling of control module 16, heat-exchanger pump 8 and the first control valve 10 are closed, circulating pump 4 is opened, then start heat exchanger 3 to carry out the flushing of first stage, after circulation flushing 60min, circulating pump 4 stops operation;
Under the signal controlling of control module 16, the 3rd control valve 14 is opened, and recirculated water is discharged, and after water emptying to be recycled, the 3rd control valve is closed;
Then, under the signal controlling of computer control unit 16, heat-exchanger pump 8 and the first control valve 10 are opened, in circulation water pot 1, re-inject hot water and running water, be watered for the second time, simultaneously, the second control valve 12 is opened, and to the appropriate KOH solution of the interior injection of circulation water pot 1, after having injected, the second control valve 12 is closed, when water temperature reaches 30～40OC, heat-exchanger pump 8 and the first control valve 10 are closed, and circulating pump 4 is opened, and heat exchanger 3 is carried out to the flushing of second stage, after circulation flushing 100min, circulating pump 4 stops operation;
Under the signal controlling of control module 16, the 3rd control valve 14 is opened again, and recirculated water is discharged, and after water emptying to be recycled, the 3rd control valve 14 is closed;
Then, repeat the flushing operation of first stage, after operation, the heat exchanger cleaning device that should produce for silicon chip is out of service.
Finally, by hand inspection, whether rinsed well, if do not reach cleaning performance, repeat successively the flushing of first stage and second stage, until reach cleaning requirement.
The heat exchanger cleaning device of producing for silicon chip that the utility model provides, because the circulation water pot of its setting can be realized heat exchanger circulation flushing is dissolved to the object of rinsing to reach by the fixed residue that is cemented in mortar in heat exchanger and silicon grain, and the cleaning liquid source being connected with circulation water pot can provide the KOH solution of accelerating its dissolving for cleaning sand slurry residual thing, and the thermal water source who is connected with circulation water pot and from the beginning water source can be the water source that its chemical reaction provides preference temperature, accelerated the efficiency of its cleaning, not only guaranteed the clean level of cleaning, can also effectively prevent the damage to heat exchanger.
The foregoing is only preferred embodiment of the present utility model; not in order to limit the utility model; all any modifications of doing within spirit of the present utility model and principle, be equal to and replace and improvement etc., within all should being included in protection domain of the present utility model.
Claims (2)
1. a heat exchanger cleaning device of producing for silicon chip, it is characterized in that: it comprises circulation water pot, the delivery port of described circulation water pot is connected with the material inlet of heat exchanger by circulating water inlet, described circulating water inlet is provided with circulating pump, and the water return outlet of circulation water pot is connected with the material outlet of described heat exchanger by recirculated water return pipe;
The water inlet of hot water of described circulation water pot is communicated with thermal water source by hot water inlet pipe, described hot water inlet pipe is provided with heat-exchanger pump, the running water water inlet of described circulation water pot is communicated with water source from the beginning, and the pipeline between described water source from the beginning and described circulation water pot is provided with the first control valve;
The filter washing water inlet of described circulation water pot is communicated with cleaning liquid source, and the pipeline between described cleaning liquid source and described circulation water pot is provided with the second control valve, and the bottom of described circulation water pot is provided with drainpipe, and described drainpipe is provided with the 3rd control valve.
2. the heat exchanger cleaning device of producing for silicon chip as claimed in claim 1, is characterized in that: in described circulation water pot, be provided with temperature sensor, the signal output part of described temperature sensor is electrically connected to computer control unit; The signal output part of described computer control unit is electrically connected to the signal input part of described circulating pump, described heat-exchanger pump, described the first control valve, described the second control valve and described the 3rd control valve respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320377647.7U CN203405124U (en) | 2013-06-27 | 2013-06-27 | Heat exchanger cleaning device used for silicon wafer production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320377647.7U CN203405124U (en) | 2013-06-27 | 2013-06-27 | Heat exchanger cleaning device used for silicon wafer production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203405124U true CN203405124U (en) | 2014-01-22 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320377647.7U Expired - Fee Related CN203405124U (en) | 2013-06-27 | 2013-06-27 | Heat exchanger cleaning device used for silicon wafer production |
Country Status (1)
| Country | Link |
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| CN (1) | CN203405124U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104251645A (en) * | 2014-09-29 | 2014-12-31 | 宁夏共享装备有限公司 | Washing device for heat exchanger |
| CN107282535A (en) * | 2017-07-26 | 2017-10-24 | 盈信共创能源科技（青岛）有限公司 | Wind-driven generator wheel-box cleaning device for radiating fin and cleaning method |
| CN113154934A (en) * | 2021-04-29 | 2021-07-23 | 徐国涛 | Be applied to abluent two medium circulation belt cleaning device of heat exchanger inner chamber |
-
2013
- 2013-06-27 CN CN201320377647.7U patent/CN203405124U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104251645A (en) * | 2014-09-29 | 2014-12-31 | 宁夏共享装备有限公司 | Washing device for heat exchanger |
| CN107282535A (en) * | 2017-07-26 | 2017-10-24 | 盈信共创能源科技（青岛）有限公司 | Wind-driven generator wheel-box cleaning device for radiating fin and cleaning method |
| CN113154934A (en) * | 2021-04-29 | 2021-07-23 | 徐国涛 | Be applied to abluent two medium circulation belt cleaning device of heat exchanger inner chamber |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140122 Termination date: 20180627 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |