CN203339121U - A wet etching apparatus and a wet etching device - Google Patents
A wet etching apparatus and a wet etching device Download PDFInfo
- Publication number
- CN203339121U CN203339121U CN201320346494XU CN201320346494U CN203339121U CN 203339121 U CN203339121 U CN 203339121U CN 201320346494X U CN201320346494X U CN 201320346494XU CN 201320346494 U CN201320346494 U CN 201320346494U CN 203339121 U CN203339121 U CN 203339121U
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- gas curtain
- wet etching
- scavenge pipe
- etching chamber
- signal
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Abstract
The utility model discloses a wet etching apparatus comprising an etching chamber, a gas curtain, and a cleaning device. The gas curtain is arranged at the exit of the etching chamber and is installed on the inner wall of the etching chamber. The cleaning device is installed on the inner wall of the etching chamber and cleans the gas outlet of the gas curtain. The wet etching apparatus provided in the utility model is capable of cleaning the gas outlet of the gas curtain at the exit of the etching chamber, and cleaning acid crystal congealed at the gas outlet of the gas curtain in order to prevent the acid crystal from colliding with photoresistive glue to fracture the photoresistive glue. As a result, the wet etching apparatus is capable of decreasing the generation of phenomena of disconnection of signal lines. In addition, the utility model also provides a wet etching device increasing the yield of substrates.
Description
Technical field
The utility model relates to the display technology field, particularly a kind of wet etching device and wet etching equipment.
Background technology
Semiconductor especially all needs in array (Array) manufacturing process of Thin Film Transistor-LCD (TFT-LCD) by some layers of metal level being carried out to the circuit pattern of formation rule after plated film, photoetching, etching, degumming process, thereby drives each components and parts action.
Wet etching equipment generally comprises wet etching device and water washing device, the wet etching device has a substrate and enters the import of etching chamber and substrate from outlet out in etching chamber, and the exit of etching chamber and import department all are respectively equipped with gas curtain, the Main Function of gas curtain is to remove impurity on substrate or unnecessary etching liquid, and the structure of gas curtain 01 as shown in Figure 1.
Etching liquid is generally the mixed acid that nitric acid, sulfuric acid, phosphoric acid and additive etc. form by a certain percentage, acid vapor is met cold meeting in the place's crystallization of the gas outlet of the gas curtain in etching chamber exit, when this gas curtain of substrate process, the crystalline solid of acid can be ejected to be pounded on photoresistance glue, cause photoresistance glue damaged, while carrying out next step etching technics again, easily cause holding wire to open circuit.
The utility model content
The utility model provides a kind of wet etching device, in order to solve wet etching device under prior art to base plate carving and corrosion the time, easily causes the generation of the holding wire breaking phenomena on substrate.
For addressing the above problem, the utility model provides following technical scheme:
The utility model provides a kind of wet etching device, comprising:
Etching chamber;
Be positioned at the exit of described etching chamber and be installed on the gas curtain of the inwall of described etching chamber;
Be installed on the inwall of described etching chamber, the cleaning device that the gas outlet of described gas curtain is cleaned.
In some optional execution modes, above-mentioned wet etching device also comprises:
Be positioned at the import department of described etching chamber, and be installed on the gas curtain of the inwall of described etching chamber;
Be installed on the inwall of described etching chamber, the cleaning device that the gas outlet of described gas curtain is cleaned.
In some optional execution modes, described cleaning device comprises:
The scavenge pipe arranged along described gas curtain length direction, the first end of described scavenge pipe seals, and has the spray-hole of a plurality of gas outlets towards described gas curtain on described scavenge pipe;
The cleaning solution supplying device of cleaning fluid is provided to described scavenge pipe, and described cleaning solution supplying device is communicated with the second end of described scavenge pipe.
In some optional execution modes, described cleaning solution supplying device comprises:
Be positioned at the liquid storage groove of described etching chamber;
The supply-water pump that water inlet is communicated with described liquid storage groove;
The feed pipe that one end is communicated with the delivery port of described supply-water pump, the other end is communicated with the second end of described scavenge pipe.
In some optional execution modes, the rotatable inwall that is installed on described etching chamber in described scavenge pipe two ends, and be provided with the drive unit that drives described scavenge pipe rotation in described etching chamber.
In some optional execution modes, described drive unit is motor, and the output of described motor and the first end of described scavenge pipe are in transmission connection.
In some optional execution modes, the first end of described scavenge pipe is connected by shaft coupling transmission with described motor.
In some optional execution modes, above-mentioned wet etching device also comprises:
When substrate is carried to close described gas curtain direction, gather the signal gathering unit of range information between described substrate and described gas curtain;
Produce the signal processing unit of control signal when the range information collected when the described signal gathering unit received is less than setpoint distance, described signal processing unit is connected with described signal gathering unit signal;
The control unit be connected with described signal processing unit signal; Wherein, when not receiving described control signal, described control unit is controlled described supply-water pump unlatching, described gas curtain is closed; When receiving described control signal, described control unit controls that described supply-water pump cuts out, described gas curtain starts.
In some optional execution modes, described signal gathering unit is transducer.
The utility model also provides a kind of wet etching equipment, comprising: to the water washing device that on substrate, residual etching liquid is cleaned, also comprise the described wet etching device of above-mentioned any one.
The utility model provides a kind of wet etching device, comprising:
Etching chamber;
Be positioned at the exit of described etching chamber and be installed on the gas curtain of the inwall of described etching chamber;
Be installed on the inwall of described etching chamber, the cleaning device that the gas outlet of described gas curtain is cleaned.
The wet etching device that the utility model provides, can be cleaned the gas outlet of the gas curtain in etching chamber exit, the acid crystal that condenses in the place, gas outlet of gas curtain can be washed, and avoids sour crystallization to pound on photoresistance glue, causes photoresistance glue damaged.
So the wet etching device that the utility model provides, can reduce the generation of holding wire breaking phenomena.
The utility model also provides a kind of wet etching equipment, comprising: to the water washing device that on substrate, residual etching liquid is cleaned, also comprise the described wet etching device of above-mentioned any one.Because above-mentioned wet etching device can reduce the generation of holding wire breaking phenomena, so the wet etching equipment that the utility model provides, can improve the yields of substrate.
The accompanying drawing explanation
Accompanying drawing described herein is used to provide further understanding of the present utility model, forms a part of the present utility model, and schematic description and description of the present utility model, for explaining the utility model, does not form improper restriction of the present utility model.In the accompanying drawings:
Fig. 1 is the gas curtain structural representation under prior art;
The gas curtain structural representation that Fig. 2 provides for the utility model;
The cleaning solution supplying apparatus structure schematic diagram that Fig. 3 provides for the utility model.
In figure:
01. gas curtain 1. gas curtain 2. cleaning device 21. scavenge pipe 22. cleaning solution supplying device 221. liquid storage groove 222. supply-water pump 223. feed pipes
Embodiment
Below in conjunction with the accompanying drawing in the utility model embodiment, the technical scheme in the utility model embodiment is clearly and completely described, obviously, described embodiment is only the utility model part embodiment, rather than whole embodiment.Embodiment based in the utility model, those of ordinary skills are not making under the creative work prerequisite the every other embodiment obtained, and all belong to the scope of the utility model patent protection.
Embodiment mono-
Please refer to Fig. 2, the gas curtain structural representation that Fig. 2 provides for the utility model, the wet etching device that the utility model embodiment provides comprises:
Etching chamber;
Be positioned at the exit of etching chamber and be installed on the gas curtain 1 of the inwall of etching chamber;
Be installed on the inwall of etching chamber, the cleaning device 2 that the gas outlet of gas curtain 1 is cleaned.
The wet etching device that the utility model embodiment provides, can be cleaned the gas outlet of the gas curtain 1 in etching chamber exit, the acid crystal that condenses in the place, gas outlet of gas curtain 1 can be washed, and avoids sour crystallization to pound on photoresistance glue, causes photoresistance glue to disconnect.
So the wet etching device that the utility model embodiment provides, can reduce the generation of holding wire breaking phenomena.
Cleaning device 2 can have multiple implementation, and the structure of cleaning device as shown in Figure 2 is only a kind of preferably execution mode, comprising:
The scavenge pipe 21 arranged along gas curtain 1 length direction, the first end of scavenge pipe 21 seals, and has the spray-hole of a plurality of gas outlets towards gas curtain 1 on scavenge pipe 21;
The cleaning solution supplying device 22 of cleaning fluid is provided to scavenge pipe 21, and cleaning solution supplying device 22 is communicated with the second end of scavenge pipe 21.
Cleaning solution supplying device 22 provides cleaning fluid to scavenge pipe 21, because an end of scavenge pipe 21 seals, under the effect of pressure, cleaning fluid in scavenge pipe 21 is by a plurality of spray-hole ejections from scavenge pipe 21, the cleaning fluid of ejection is ejected into the place, gas outlet of gas curtain 1, the acid crystal that can be condensed in the place, gas outlet rinses out, and makes the place, gas outlet of gas curtain 1 keep clean.
Certainly, the scavenge pipe 21 in above-mentioned cleaning device 2 can be also a plurality of injector heads, and the input of each injector head is communicated with the cleaning solution supplying device, and the ejiction opening of each injector head is towards the gas outlet of gas curtain 1.Here the structure of cleaning device just repeated no longer one by one.
Further, please refer to Fig. 3, wherein, the cleaning solution supplying apparatus structure schematic diagram that Fig. 3 provides for the utility model embodiment, above-mentioned cleaning solution supplying device 22 also can have multiple implementation, the structure of cleaning solution supplying device 22 as shown in Figure 3 is only a kind of preferably execution mode, and particularly, cleaning solution supplying device 22 comprises:
Be positioned at the liquid storage groove 221 of etching chamber;
The supply-water pump 222 that water inlet is communicated with liquid storage groove 221;
The feed pipe 223 that one end is communicated with the delivery port of supply-water pump 222, the other end is communicated with the second end of scavenge pipe 21.
Cleaning fluid in liquid storage groove 221 sucks and flows to feed pipe 223 again by supply-water pump 222, and feed pipe 223 offers cleaning fluid scavenge pipe 21 again.Certainly, the liquid storage groove 221 here can be the groove of the storage etching liquid in etching chamber in prior art, can be also the groove arranged in addition, and cleaning fluid can be also etching liquid for water, just repeats no longer one by one here.
In order to make cleaning fluid a little from the great efforts that eject in scavenge pipe 21, preferably, the rotatable inwall that is installed on etching chamber in scavenge pipe 21 two ends, and be provided with the drive unit that drives scavenge pipe 21 rotations in etching chamber.That is to say, scavenge pipe 21 is rotating cleaning fluid is being sprayed from spray-hole.
Further, drive unit is motor, and the first end of the output of motor and scavenge pipe 21 is in transmission connection.Drive motors drives scavenge pipe 21 rotations.Certainly, also can adopt other drive unit to drive scavenge pipe 21 to rotate, just repeat no longer one by one here.
Further, the first end of above-mentioned scavenge pipe 21 is connected by shaft coupling transmission with motor.That is to say motor and scavenge pipe 21 coaxial rotation.Certainly also can be connected by link transmission between scavenge pipe 21 and motor, just repeat no longer one by one here.
For the cleaning fluid that prevents scavenge pipe 21 ejections is ejected on substrate, above-mentioned wet etching device 2 also comprises:
When substrate is carried to close gas curtain 1 direction, gather the signal gathering unit of range information between substrate and gas curtain 1;
Produce the signal processing unit of control signal when the range information collected when the signal gathering unit received is less than setpoint distance, signal processing unit is connected with the signal gathering unit signal;
The control unit be connected with the signal processing unit signal; Wherein, when not receiving control signal, control unit is controlled supply-water pump 222 unlatchings, gas curtain 1 is closed; When receiving control signal, control unit control supply-water pump 222 cuts out, gas curtain 1 starts.
Explanation herein, the minimum range that setpoint distance is substrate distance gas curtain 1, before substrate arrives gas curtain 1 place, if control unit does not receive the control signal that signal processing unit sends, gas curtain 1 is closed condition, supply-water pump 222 is opening, make the gas outlet of 21 pairs of gas curtains 1 of scavenge pipe be cleared up, when substrate arrives a certain ad-hoc location when (distance that is the substrate distance gas curtain surpasses setpoint distance), image acquisition units passes to signal processing unit by the substrate position signal of sensing, signal processing unit produces control signal according to receiving signal, and control signal is passed to control unit, controlling supply-water pump 222 closes, start gas curtain 1, impurity on substrate is blown down to processing.
Preferably, above-mentioned signal gathering unit is transducer.Certain above-mentioned collecting unit also can for other can Information Monitoring device, just repeat no longer one by one here.
Embodiment bis-
The present embodiment provide the wet etching device provided in wet etching device and above-described embodiment one do not exist together for: the wet etching device that the present embodiment provides also comprises: be positioned at the import department of etching chamber and be installed on the gas curtain 1 of the inwall of etching chamber; Be installed on the inwall of etching chamber, the cleaning device 2 that the gas outlet of gas curtain 1 is cleaned.
When above-mentioned wet etching device is safeguarded, scavenge pipe 21 can be cleaned the gas curtain 1 in etching chamber import department and exit.
Cleaning device 2 can have multiple implementation, and the structure of cleaning device as shown in Figure 2 is only a kind of preferably execution mode, comprising:
The scavenge pipe 21 arranged along gas curtain 1 length direction, the first end of scavenge pipe 21 seals, and has the spray-hole of a plurality of gas outlets towards gas curtain 1 on scavenge pipe 21;
The cleaning solution supplying device 22 of cleaning fluid is provided to scavenge pipe 21, and cleaning solution supplying device 22 is communicated with the second end of scavenge pipe 21.
Cleaning solution supplying device 22 provides cleaning fluid to scavenge pipe 21, because an end of scavenge pipe 21 seals, under the effect of pressure, cleaning fluid in scavenge pipe 21 is by a plurality of spray-hole ejections from scavenge pipe 21, the cleaning fluid of ejection is ejected into the place, gas outlet of gas curtain 1, the acid crystal that can be condensed in the place, gas outlet rinses out, and makes the place, gas outlet of gas curtain 1 keep clean.
Certainly, the scavenge pipe 21 in above-mentioned cleaning device 2 can be also a plurality of injector heads, and the input of each injector head is communicated with the cleaning solution supplying device, and the ejiction opening of each injector head is towards the gas outlet of gas curtain 1.Here the structure of cleaning device just repeated no longer one by one.
Further, please refer to Fig. 3, wherein, the cleaning solution supplying apparatus structure schematic diagram that Fig. 3 provides for the utility model embodiment, above-mentioned cleaning solution supplying device 22 can have multiple implementation, the structure of cleaning solution supplying device 22 as shown in Figure 3 is only a kind of preferably execution mode, and particularly, cleaning solution supplying device 22 comprises:
Be positioned at the liquid storage groove 221 of etching chamber;
The supply-water pump 222 that water inlet is communicated with liquid storage groove 221;
The feed pipe 223 that one end is communicated with the delivery port of supply-water pump 222, the other end is communicated with the second end of scavenge pipe 21.
Cleaning fluid in liquid storage groove 221 sucks and flows to feed pipe 223 again by supply-water pump 222, and feed pipe 223 offers cleaning fluid scavenge pipe 21 again.Certainly, the liquid storage groove 221 here can be the groove of the storage etching liquid in etching chamber in prior art, can be also the groove arranged in addition, and cleaning fluid can be also etching liquid for water, just repeats no longer one by one here.
In order to make cleaning fluid a little from the great efforts that eject in scavenge pipe 21, preferably, the rotatable inwall that is installed on etching chamber in scavenge pipe 21 two ends, and be provided with the drive unit that drives scavenge pipe 21 rotations in etching chamber.That is to say, scavenge pipe 21 is rotating cleaning fluid is being sprayed from spray-hole.
Further, drive unit is motor, and the first end of the output of motor and scavenge pipe 21 is in transmission connection.Drive motors drives scavenge pipe 21 rotations.Certainly, also can adopt other drive unit to drive scavenge pipe 21 to rotate, just repeat no longer one by one here.
Further, the first end of above-mentioned scavenge pipe 21 is connected by shaft coupling transmission with motor.That is to say motor and scavenge pipe 21 coaxial rotation.Certainly also can be connected by link transmission between scavenge pipe 21 and motor, just repeat no longer one by one here.
For the cleaning fluid that prevents scavenge pipe 21 ejections is ejected on substrate, above-mentioned wet etching device also comprises:
When substrate is carried to close gas curtain 1 direction, gather the signal gathering unit of range information between substrate and gas curtain 1;
Produce the signal processing unit of control signal when the range information collected when the signal gathering unit received is less than setpoint distance, signal processing unit is connected with the signal gathering unit signal;
The control unit be connected with the signal processing unit signal; Wherein, when not receiving control signal, control unit is controlled supply-water pump 222 unlatchings, gas curtain 1 is closed; When receiving control signal, control unit control supply-water pump 222 cuts out, gas curtain 1 starts.
Explanation herein, the minimum range that setpoint distance is substrate distance gas curtain 1, before substrate arrives gas curtain 1 place, if control unit does not receive the control signal that signal processing unit sends, gas curtain 1 is closed condition, supply-water pump 222 is opening, make the gas outlet of 21 pairs of gas curtains 1 of scavenge pipe be cleared up, when substrate arrives a certain ad-hoc location when (distance that is the substrate distance gas curtain surpasses setpoint distance), image acquisition units passes to signal processing unit by the substrate position signal of sensing, signal processing unit produces control signal according to receiving signal, and control signal is passed to control unit, controlling water pump 222 closes, start gas curtain 1, impurity on substrate is blown down to processing.
Preferably, above-mentioned signal gathering unit is transducer.Certain above-mentioned collecting unit also can for other can Information Monitoring device, just repeat no longer one by one here.
Embodiment tri-
The utility model embodiment provides a kind of wet etching equipment, comprising: the water washing device of residual etching liquid on cleaning base plate also comprises the wet etching device of any one in embodiment mono-, embodiment bis-.Because above-mentioned wet etching device can reduce the generation of holding wire breaking phenomena, so the wet etching equipment that the utility model embodiment provides, can improve the yields of substrate.
Obviously, those skilled in the art can carry out various changes and modification and not break away from spirit and scope of the present utility model the utility model.Like this, if within of the present utility model these are revised and modification belongs to the scope of the utility model claim and equivalent technologies thereof, the utility model also is intended to comprise these changes and modification interior.
Claims (10)
1. a wet etching device, is characterized in that, comprising:
Etching chamber;
Be positioned at the exit of described etching chamber and be installed on the gas curtain of the inwall of described etching chamber;
Be installed on the inwall of described etching chamber, the cleaning device that the gas outlet of described gas curtain is cleaned.
2. wet etching device according to claim 1, is characterized in that, also comprises:
Be positioned at the import department of described etching chamber, and be installed on the gas curtain of the inwall of described etching chamber;
Be installed on the inwall of described etching chamber, the cleaning device that the gas outlet of described gas curtain is cleaned.
3. wet etching device according to claim 1 and 2, is characterized in that, described cleaning device comprises:
The scavenge pipe arranged along described gas curtain length direction, the first end of described scavenge pipe seals, and has the spray-hole of a plurality of gas outlets towards described gas curtain on described scavenge pipe;
The cleaning solution supplying device of cleaning fluid is provided to described scavenge pipe, and described cleaning solution supplying device is communicated with the second end of described scavenge pipe.
4. wet etching device according to claim 3, is characterized in that, described cleaning solution supplying device comprises:
Be positioned at the liquid storage groove of described etching chamber;
The supply-water pump that water inlet is communicated with described liquid storage groove;
The feed pipe that one end is communicated with the delivery port of described supply-water pump, the other end is communicated with the second end of described scavenge pipe.
5. wet etching device according to claim 4, is characterized in that, the rotatable inwall that is installed on described etching chamber in described scavenge pipe two ends, and be provided with the drive unit that drives described scavenge pipe rotation in described etching chamber.
6. wet etching device according to claim 5, is characterized in that, described drive unit is motor, and the output of described motor and the first end of described scavenge pipe are in transmission connection.
7. wet etching device according to claim 6, is characterized in that, the first end of described scavenge pipe is connected by shaft coupling transmission with described motor.
8. wet etching device according to claim 6, is characterized in that, also comprises:
When substrate is carried to close described gas curtain direction, gather the signal gathering unit of range information between described substrate and described gas curtain;
Produce the signal processing unit of control signal when the range information collected when the described signal gathering unit received is less than setpoint distance, described signal processing unit is connected with described signal gathering unit signal;
The control unit be connected with described signal processing unit signal; Wherein, when not receiving described control signal, described control unit is controlled described supply-water pump unlatching, described gas curtain is closed; When receiving described control signal, described control unit controls that described supply-water pump cuts out, described gas curtain starts.
9. wet etching device according to claim 8, is characterized in that, described signal gathering unit is transducer.
10. a wet etching equipment comprises: the water washing device on substrate, residual etching liquid is cleaned, it is characterized in that, and also comprise wet etching device as described as claim 1～9 any one.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320346494XU CN203339121U (en) | 2013-06-17 | 2013-06-17 | A wet etching apparatus and a wet etching device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320346494XU CN203339121U (en) | 2013-06-17 | 2013-06-17 | A wet etching apparatus and a wet etching device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203339121U true CN203339121U (en) | 2013-12-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320346494XU Expired - Fee Related CN203339121U (en) | 2013-06-17 | 2013-06-17 | A wet etching apparatus and a wet etching device |
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| Country | Link |
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| CN (1) | CN203339121U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103787582A (en) * | 2014-01-22 | 2014-05-14 | 上海和辉光电有限公司 | Acid spraying device for etching machine table |
| CN105044943A (en) * | 2015-08-25 | 2015-11-11 | 深圳市华星光电技术有限公司 | Etching device |
| CN105080877A (en) * | 2015-06-11 | 2015-11-25 | 合肥鑫晟光电科技有限公司 | Cleaning system for wet etching |
-
2013
- 2013-06-17 CN CN201320346494XU patent/CN203339121U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103787582A (en) * | 2014-01-22 | 2014-05-14 | 上海和辉光电有限公司 | Acid spraying device for etching machine table |
| CN105080877A (en) * | 2015-06-11 | 2015-11-25 | 合肥鑫晟光电科技有限公司 | Cleaning system for wet etching |
| US20160365259A1 (en) * | 2015-06-11 | 2016-12-15 | Boe Technology Group Co., Ltd. | System for wet etching |
| CN105044943A (en) * | 2015-08-25 | 2015-11-11 | 深圳市华星光电技术有限公司 | Etching device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20131211 |