CN103787582A - Acid spraying device for etching machine table - Google Patents
Acid spraying device for etching machine table Download PDFInfo
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- CN103787582A CN103787582A CN201410029986.5A CN201410029986A CN103787582A CN 103787582 A CN103787582 A CN 103787582A CN 201410029986 A CN201410029986 A CN 201410029986A CN 103787582 A CN103787582 A CN 103787582A
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- spray
- rolling door
- etching
- acidic liquid
- jet apparatus
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Abstract
The invention discloses an acid spraying device which is used for an etching machine table. The etching machine table is provided with a central cavity and an etching cavity, wherein a rolling door is arranged between the central cavity and the etching cavity. The acid spraying device comprises an acid containing liquid source, a connecting pipe and an injection device, wherein the acid containing liquid source is used for storing the acid containing liquid, the connecting pipe is connected to the acid containing liquid source so as to transfer the acid containing liquid, and the injection device is arranged at the tail end of the connecting pipe and is used for injecting the acid containing liquid to the rolling door so as to prevent crystals from being formed on the rolling door. The acid spraying device can be used for preventing the crystals from being formed on the rolling door between the central cavity and the etching cavity.
Description
Technical field
The present invention relates to display panel manufacturing technology field, relate in particular to a kind of acid of the spray for etching machine device.
Background technology
In prior art, in nonmetal etching machine (non-metal etcher) and indium tin oxide etching machine (ITO etcher) because of sour gas (chemical gas, be called for short acid gas) can take (the neu chamber of central bore to by the transmission of glass substrate (glass), also claim BUFFER), via central bore's gas barrier (neu chamber exhaust), moisture in acid gas is reduced, be deposited on the rolling door (shuttle door) between central bore and etching chamber through forming chemistry (chemical) crystallization after a while.
Because of rolling door crystallization meeting scratch glass baseplate surface, cause scrapping of product and form defect.And remove crystallization and need spend human and material resources with the time.Therefore, need to reduce the new technology of scrapping (Scrap), minimizing processing procedure cost, improving product yield (Yield) of product.
Figure 1 shows that one of the prior art commonly uses etching machine, it is a kind of wet etching board (WET etcher), and it transmits glass mode is in U-shaped (U-type) mode.Glass substrate, by after blocking casket (Cassette) and taking out, is put into entrance transfer roller 21 (Entrance conveyor, be called for short IN CV), and the transmission that starts to carry out glass substrate with and etch process.
As shown in Figure 1, the central authorities of etching machine are central horse block 1, both sides arrange respectively entrance transfer roller 21, outlet transfer roller 31 and each chamber.
Current being designed to of wet etching board as shown in Figure 1: by automation (Robot, robot or mechanical arm) glass substrate 8 is taken out by the clip deposited after, be put into IN CV21, pass through successively EUV22 → central bore's 23 → etching chamber 24,25,26,27 → wash chamber (RINSE) 37,36,35 → air knife unit 34(A/K) → CV33,32, until outlet transfer roller 31(OUT CV), then by automation, glass substrate is deposited into clip (Cassette).
As shown in Figure 2, while transmission to the etching chamber 24 being adjacent by central bore 23 due to glass substrate 8, acid gas can overflow and shed from rolling door 4, get off for a long time and can on rolling door 4, form acid crystal (chemical crystal), can be to glass substrate 8 below by causing scratch after crystallization forms, the area of scratch will cause and scrap when large.
The etching machine of prior art, although there is rolling door 4 can block most acid gas, is not enough to avoid form crystallization on rolling door 4.
Therefore need to avoid forming crystallization on the rolling door between central bore 23 and etching chamber 24.
Summary of the invention
For problems of the prior art, object of the present invention is for providing a kind of acid of the spray for the etching machine device that can avoid forming crystallization on the rolling door between central bore and etching chamber.
For achieving the above object, technical scheme of the present invention is as follows:
The sour device of a kind of spray, for etching machine, described etching machine has center cavity and etching chamber, and has rolling door between described central bore and described etching chamber, it is characterized in that, and the sour device of described spray comprises: Acidic Liquid body source, stores acidic liquid; Connecting pipeline, is connected in described Acidic Liquid body source to transmit described acidic liquid; Jet apparatus, is arranged at described connecting pipeline end, in order to spray described acidic liquid to described rolling door to avoid forming crystallization on described rolling door.
Avoid forming a method for crystallization, on the rolling door between central bore and the etching chamber of etching machine, form crystallization for avoiding, wherein, described in avoid the method that forms crystallization to comprise step; Step S1: connecting pipeline is set, to transmit acidic liquid to described rolling door present position; Step S2: the end at described connecting pipeline arranges jet apparatus; Step S3: control device is set, controls described jet apparatus and spray acidic liquid, to adjust the humidity of described rolling door environment of living in.
Etching machine of the present invention, has the sour device of spray of the present invention.
Beneficial effect of the present invention is:
1. can effectively remove crystallization produces
Can accelerate crystallisate generation because set up gas barrier in central bore.If installing the sour device of spray of the present invention can effectively make rolling door keep for a long time moisture state and be difficult for producing crystallisate.
2. promote yield
Because generating, crystallisate will cause damaged the scrapping of scratch, ILD/ITO of normal product.Therefore what the present invention can reduce product scraps, reduces processing procedure cost, improving product yield (Yield).
3. before reducing, processing procedure substrate disorder causes manpower cost
Based on the advantage of Section 1, also can reduce personnel's burden (Loading), reduce the cost cost of manpower, make company can obtain manpower (Man power) operation efficiency of the best to the greatest extent.
4. reduce board downtime, promote board rate of utilization
Based on the advantage of Section 1, also can reduce that ILD/ITO density causes when the machine time (Down time), promote board rate of utilization (Up time), the rate of capacity utilization is brought into play to maximum efficiency.
5. reduce various production cost
Based on above-mentioned advantage, can significantly reduce (Cost down) to the various production cost of company.
6. the installation cost of setting up is low
Require seldom, only connecting pipeline (pipe) need be set and be installed on etching machine with adapter, and control by programmable logic controller for the required material of the sour device of spray (spray device).
Accompanying drawing explanation
The schematic diagram of a kind of etching machine of Fig. 1 prior art.
Fig. 2 is the setting position schematic diagram of the spray acid device of the embodiment of the present invention.
Fig. 3 is the schematic diagram of the spray acid device of the embodiment of the present invention.
Fig. 4 is the schema of avoiding the method that forms crystallization of the embodiment of the present invention.
Embodiment
The exemplary embodiments that embodies feature & benefits of the present invention will describe in detail in the following description.It should be understood that the present invention can have various variations on different embodiment, it neither departs from the scope of the present invention, and explanation wherein and accompanying drawing be when the use that explain in itself, but not in order to limit the present invention.
The method of avoiding forming crystallization of the embodiment of the present invention, can be realized by the spray acid device of the embodiment of the present invention, and the etching machine of the embodiment of the present invention has the spray acid device of the embodiment of the present invention.
First introduce the spray acid device of the embodiment of the present invention below.
The spray acid device of the embodiment of the present invention, comprises jet apparatus, connecting pipeline and control device.Below make introductions all round:
One, jet apparatus
As shown in Figures 2 and 3, the jet apparatus of the spray acid device 5 of the embodiment of the present invention, is arranged in the etching chamber 24 of etching machine of the embodiment of the present invention, and jet apparatus multiple jet orifices that preferably end of connecting pipeline arranges.If the end of connecting pipeline is the cylindrical tube arranging on the floor of etching chamber 24, and the axially parallel of cylindrical tube is in rolling door 4, and jet orifice can be arranged on the upper limb of cylindrical tube, and the distance between each jet orifice can equate.
The effect of jet apparatus is to spray acidic liquid, to adjust the humidity of rolling door 4 environment of living in.Because acid gas only, below certain humidity, just can form crystallization on object, therefore, the humidity range that can make acid gas form crystallization on object must have a maximum value, i.e. maximal humidity, and this specification sheets claims that this maximal humidity is crystallization humidity.Therefore,, if the humidity of rolling door 4 environment of living in is greater than crystallization humidity, can avoid forming crystallization on rolling door 4.Therefore, jet apparatus sprays the object of acidic liquid, is to make more than the humidity of rolling door 4 environment of living in remains on crystallization humidity, to avoid the formation of crystallization.
Because jet apparatus is arranged on the floor of etching chamber 24, therefore, jet apparatus is bottom-up to spray acidic liquid to rolling door 4.
The acidic liquid spraying for jet apparatus, the etching solution that preferably etching machine uses, for example, include the etching solution of oxalic acid.Why choosing etching solution as the acidic liquid spraying, is because etching solution can be gathered materials on the spot, and is convenient to, by connecting pipeline, etching solution is sent to etching chamber 24, and sprays from jet orifice.
Two, connecting pipeline
The connecting pipeline of the spray acid device of the embodiment of the present invention, for the transmission acidic liquid to the sour device of described spray;
Connecting pipeline can be made up of a series of pipeline, tube stub and the valve that can hold acidic liquid.Pipeline need be selected erosion resistance, is mainly the pipeline that acid-resistant corrosion is good; Between adjacent tubes, connecting to carry out pipeline with tube stub turns to.Valve is the action in order to control jet apparatus, for example, be pneumavalve, but the present invention is not as limit.If need to regulate the spraying pressure of jet apparatus, can on connecting pipeline, install relief valve.
If acidic liquid is etching solution, the source of connecting pipeline is the etching solution storing device of etching chamber 24, and end is on the floor at etching chamber 24, and be the position near the rolling door 4 between central bore 23 and etching chamber 24, the closer to rolling door 4, more can guarantee that the humidity of rolling door 4 environment of living in is on crystallization humidity.
Three, control device
The control device of the spray acid device of the embodiment of the present invention, for controlling the injection action of described jet apparatus.Comprise injection opportunity, the pressure spraying when injection and spraying the lasting time etc.
For the control on the opportunity of injection, mainly consider two aspects, or the combination of these two aspects.The one, in the time that obviously can changing, humidity sprays, and the 2nd, in real time the humidity of rolling door 4 residing environment is detected, if humidity is greater than crystallization humidity, needn't spray, if humidity has been less than crystallization humidity, need to spray, in order to avoid form crystallization on rolling door 4.
Wherein, when humidity obviously can change, mainly refer to when rolling door 4 is opened, at this moment, glass substrate 8 is transmitted to etching chamber 24 by central bore 23 under the transmission of upper and lower transfer roller 7, now needs to carry out the injection of acidic liquid.
Also can humidity sensor be installed near rolling door 4, in the time that the humidity that rolling door 4 environment of living in detected is less than crystallization humidity, carry out the injection of acidic liquid, to improve the humidity of rolling door 4 environment of living in.
Control device is generally programmable logic controller (PLC), controls the injection action of described jet apparatus by the open and close of remote control pneumatic valve.Programmable logic controller can be by computing, controlling the action of jet apparatus, for example, can be through after certain hour, jet apparatus action one or many, or after the glass substrate 8 of a stator number has transmitted, jet apparatus action one or many.
Introduce the method for avoiding forming crystallization of the embodiment of the present invention below, the identical or corresponding feature of mentioning in device, in the time of introduction method, repeats no more again.
As shown in Figure 4, the method for avoiding forming crystallization of the embodiment of the present invention, forms crystallization for avoiding on the rolling door 4 between central bore 23 and the etching chamber 24 of etching machine, specifically comprises the following steps;
Step S1: connecting pipeline is set, to transmit acidic liquid to rolling door 4 present positions;
Step S2: the end at described connecting pipeline arranges jet apparatus;
Step S3: control device is set, controls described jet apparatus and spray acidic liquid, to adjust the humidity of described rolling door 4 environment of living in.
Concrete, in step S3, control device can control that the rolling door 4 of jet apparatus between central bore 23 and etching chamber 24 opened and glass substrate 8 sprays described acidic liquid during by rolling door 4.
Concrete, in step S3, control device can be controlled by the open and close of the pneumavalve that arranges on control linkage pipeline the injection action of jet apparatus.
Those skilled in the art should recognize change and the retouching the scope and spirit of the present invention that the appended claim of the present invention discloses, done in the case of not departing from, within all belonging to the protection domain of claim of the present invention.
Claims (4)
1. the sour device of spray, for etching machine, described etching machine has center cavity and etching chamber, and has rolling door between described central bore and described etching chamber, it is characterized in that, and the sour device of described spray comprises:
Acidic Liquid body source, stores acidic liquid;
Connecting pipeline, is connected in described Acidic Liquid body source to transmit described acidic liquid;
Jet apparatus, is arranged at described connecting pipeline end, in order to spray described acidic liquid to described rolling door to avoid forming crystallization on described rolling door.
2. the sour device of spray as claimed in claim 1, wherein, the sour device of described spray also comprises control device, is connected in described connecting pipeline to control the injection action of described jet apparatus.
3. the sour device of spray as claimed in claim 2, wherein, on described connecting pipeline, be provided with pneumatic control valve, described pneumatic control valve is connected with described control device so that described control device is controlled the injection action of described jet apparatus by controlling the open and close of described pneumavalve.
4. the sour device of spray as claimed in claim 1, wherein, described jet apparatus comprises multiple jet orifices.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410029986.5A CN103787582A (en) | 2014-01-22 | 2014-01-22 | Acid spraying device for etching machine table |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410029986.5A CN103787582A (en) | 2014-01-22 | 2014-01-22 | Acid spraying device for etching machine table |
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| Publication Number | Publication Date |
|---|---|
| CN103787582A true CN103787582A (en) | 2014-05-14 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410029986.5A Pending CN103787582A (en) | 2014-01-22 | 2014-01-22 | Acid spraying device for etching machine table |
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| CN (1) | CN103787582A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1540447A (en) * | 2003-04-24 | 2004-10-27 | 统宝光电股份有限公司 | Wet etching device |
| US20040262265A1 (en) * | 2003-06-26 | 2004-12-30 | Trecenti Technologies, Inc. | Wet processing apparatus, wet processing method and manufacturing method of semiconductor device |
| CN203339121U (en) * | 2013-06-17 | 2013-12-11 | 京东方科技集团股份有限公司 | A wet etching apparatus and a wet etching device |
-
2014
- 2014-01-22 CN CN201410029986.5A patent/CN103787582A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1540447A (en) * | 2003-04-24 | 2004-10-27 | 统宝光电股份有限公司 | Wet etching device |
| US20040262265A1 (en) * | 2003-06-26 | 2004-12-30 | Trecenti Technologies, Inc. | Wet processing apparatus, wet processing method and manufacturing method of semiconductor device |
| CN203339121U (en) * | 2013-06-17 | 2013-12-11 | 京东方科技集团股份有限公司 | A wet etching apparatus and a wet etching device |
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Application publication date: 20140514 |