CN203320124U - Device for promoting productivity of aluminum oxide coating equipment - Google Patents
Device for promoting productivity of aluminum oxide coating equipment Download PDFInfo
- Publication number
- CN203320124U CN203320124U CN2013203443163U CN201320344316U CN203320124U CN 203320124 U CN203320124 U CN 203320124U CN 2013203443163 U CN2013203443163 U CN 2013203443163U CN 201320344316 U CN201320344316 U CN 201320344316U CN 203320124 U CN203320124 U CN 203320124U
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- Prior art keywords
- reaction chamber
- aluminum oxide
- gas
- aluminium oxide
- oxide film
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Abstract
The utility model discloses a device for promoting the productivity of aluminum oxide coating equipment. The device comprises a reaction cavity, a plurality of gas intake pipes and one exhaust pipe, wherein the plurality of gas intake pipes and the exhaust pipe are respectively connected with the reaction cavity. The device also comprises a gas storage tank which is connected with the reaction cavity. The device overcomes the defects of the maintenance way of the existing equipment, and is additionally provided with one gas supply device on the basis of the existing equipment, and aluminum oxide is discharged out of the reaction cavity through the reaction (the reaction product is gas) between gas and aluminum oxide, so that the maintenance time is saved, and the aims of improving the equipment utilization ratio and reducing the production cost are achieved.
Description
Technical field
The utility model belongs to electronics, semiconductor industry and new energy field, specifically a kind of device that promotes the plating aluminium oxide film equipment capacity.
Background technology
The plating aluminium oxide film technology is widely used in electronics, semiconductor applications, also at new energy fields such as crystal silicon solar batteries, thin-film solar cells, has obtained certain progress in recent years, and application prospect is more wide.
Existing plating aluminium oxide film technology mainly contains the ALD(ald) method, CVD(chemical vapour deposition) wet chemical methods such as method and collosol and gel etc., wherein, mid-to high-end product adopts ALD method or CVD method.ALD method and CVD method have common characteristics that a reaction chamber is arranged, and film-coating workpiece is direct or be positioned over plated film in cavity by frock clamp, after technique finishes, take out.
During due to plated film, whole cavity all can deposition of aluminium oxide, and cavity wall and frock clamp need to be done the periodic cleaning maintenance, and the aluminum oxide that prevents deposition is too thick and come off and cause technological problems.Present maintenance procedure need to be unloaded cavity or fixture mechanical grinding down or soak by chemical liquids such as soda acids, to remove aluminum oxide.These methods waste time and energy, and have a strong impact on the utilization ratio of equipment, cause production efficiency lowly and the cost rising, need to find a kind of easier maintenance mode.
The utility model content
The utility model purpose: the problem and shortage existed for above-mentioned prior art, the purpose of this utility model is to provide a kind of device that maintains easy lifting plating aluminium oxide film equipment capacity.
Technical scheme: for realizing above-mentioned utility model purpose, the technical solution adopted in the utility model is a kind of device that promotes the plating aluminium oxide film equipment capacity, comprise reaction chamber, multichannel inlet pipe and a road vapor pipe, described multichannel inlet pipe is connected with reaction chamber respectively with a road vapor pipe, also comprise gas reservoir, described gas reservoir ligation chamber.
Further, the product that the gas stored in described gas reservoir reacts with aluminum oxide is gas.
Further, described gas reservoir is the gas reservoir of storage HCL, and described HCL passes into reaction chamber.
Further, described reaction chamber be shaped as spherical or square.
Further, the reaction chamber that described reaction chamber is 100-1000 ℃.The reaction chamber preferred, that described reaction chamber is 180-500 ℃.The reaction chamber most preferred, that described reaction chamber is 200 ℃.
Beneficial effect: the utility model overcomes the deficiency of existing installation maintenance mode, increase by a road air feeder on the basis of existing installation, react (and reaction product is gas) with aluminum oxide and aluminum oxide is discharged to reaction chamber by gas, thereby the saving service time, reach the purpose that improves plant factor, reduces production costs.
The accompanying drawing explanation
Fig. 1 is the reaction chamber structural representation before improving;
Fig. 2 is the reaction chamber structural representation after improving.
Embodiment
Below in conjunction with the drawings and specific embodiments, further illustrate the utility model, should understand these embodiment and only for the utility model is described, be not used in restriction scope of the present utility model, after having read the utility model, those skilled in the art all fall within the application's claims limited range to the modification of the various equivalent form of values of the present utility model.
Aluminum oxide is a kind of amphoteric substance, possesses slightly acidic and weakly alkaline simultaneously, under normal temperature, is white solid, can with acid or alkali reaction.Utilize this characteristics of aluminum oxide, can design a kind of device, pass into that a kind of gas reacts with aluminum oxide and reaction product is gas, by exhausting, discharge cavity, reach the purpose of cleaning chambers body wall.So just can save time and manpower, improve plant factor, thereby reduce costs Improve Efficiency.
Embodiment:
A kind of device that promotes the plating aluminium oxide film equipment capacity specifically describes as follows:
(1) Fig. 1 is the reaction chamber structural representation before improving, A in figure, and B ..., N is inlet pipe.
(2) Fig. 2 is the reaction chamber structural representation after improving, A in figure, and B ..., N is inlet pipe, newly-increased admission passage X, connect atmosphere storage steel cylinder (not shown).
(3) in the time of need to doing the aluminum oxide in maintenance cleaning cavity, open the valve of admission passage X, pass into gas (this gas can be, but not limited to HCl), react with aluminum oxide, reaction equation is as follows:
Al
2O
3+6HCl==2AlCl
3+3H
2O
Wherein, only need be set as 100-1000 ℃ of (preferably, 180-500 ℃ to cavity temperature; Most preferred, 200 ℃), aluminum chloride and water are gaseous state, can discharge cavity by exhausting.And this reaction without catalysis, also without supplementary condition, can realize, react thorough no coupling product.Can set the time of logical reactant gases according to the thickness of Aluminium oxide deposit, the embodiment simple and fast, can shorten service time and save manpower, and the lift technique rate of utilization, reduce production costs.In this example, it is the ALD(ald that plating aluminium oxide film equipment can be, but not limited to) formula and CVD(chemical vapour deposition) formula, chamber and exhausting device respond.Do weekly once maintenance before enforcement, be 7 hours stop time, and plant factor (uptime) is 95%, 0.14 yuan of this procedure monolithic cost; Maintain weekly after enforcement and only need to shut down 2 hours, plant factor is promoted to 99%, and 0.135 yuan of this procedure monolithic cost has reduced by 0.005 yuan, relative reduce 4% before implementing.
Claims (6)
1. a device that promotes the plating aluminium oxide film equipment capacity, comprise reaction chamber, multichannel inlet pipe and a road vapor pipe, described multichannel inlet pipe is connected with reaction chamber respectively with a road vapor pipe, it is characterized in that: also comprise gas reservoir, described gas reservoir ligation chamber.
2. promote according to claim 1 the device of plating aluminium oxide film equipment capacity, it is characterized in that: described gas reservoir is the gas reservoir of storage HCL, and described HCL passes into reaction chamber.
3. promote according to claim 1 the device of plating aluminium oxide film equipment capacity, it is characterized in that: being shaped as of described reaction chamber is spherical or square.
4. promote according to claim 1 the device of plating aluminium oxide film equipment capacity, it is characterized in that: the reaction chamber that described reaction chamber is 100-1000 ℃.
5. promote according to claim 4 the device of plating aluminium oxide film equipment capacity, it is characterized in that: the reaction chamber that described reaction chamber is 180-500 ℃.
6. promote according to claim 4 the device of plating aluminium oxide film equipment capacity, it is characterized in that: the reaction chamber that described reaction chamber is 200 ℃.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013203443163U CN203320124U (en) | 2013-06-17 | 2013-06-17 | Device for promoting productivity of aluminum oxide coating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013203443163U CN203320124U (en) | 2013-06-17 | 2013-06-17 | Device for promoting productivity of aluminum oxide coating equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203320124U true CN203320124U (en) | 2013-12-04 |
Family
ID=49659493
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2013203443163U Expired - Fee Related CN203320124U (en) | 2013-06-17 | 2013-06-17 | Device for promoting productivity of aluminum oxide coating equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203320124U (en) |
-
2013
- 2013-06-17 CN CN2013203443163U patent/CN203320124U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20131204 Termination date: 20180617 |