CN203265120U - Silicon wafer cleaning spin-drying device - Google Patents
Silicon wafer cleaning spin-drying device Download PDFInfo
- Publication number
- CN203265120U CN203265120U CN 201320311479 CN201320311479U CN203265120U CN 203265120 U CN203265120 U CN 203265120U CN 201320311479 CN201320311479 CN 201320311479 CN 201320311479 U CN201320311479 U CN 201320311479U CN 203265120 U CN203265120 U CN 203265120U
- Authority
- CN
- China
- Prior art keywords
- rinse bath
- drying device
- motor
- cylinder
- silicon wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Abstract
The utility model provides a silicon wafer cleaning spin-drying device which comprises a cylinder, a cover plate, a cleaning groove, a support, a motor, a rotating drum and silicon wafer carriers. The cleaning groove is fixedly arranged on the support, the motor is fixedly arranged at the bottom of the cleaning groove, an output shaft of the motor extends into the cleaning groove, the rotating drum is arranged in the cleaning groove, the bottom of the rotating drum is fixedly connected to the output shaft of the motor, and the surface of the rotating drum is provided with small holes. The silicon wafer carriers are circumferentially and evenly arranged in the rotating drum, the cylinder is perpendicularly arranged right above the cleaning groove, the cover plate is fixedly arranged on the output shaft of the cylinder, the bottom of the cover plate is provided with a spraying nozzle which is connected with a water inlet pipe, and the bottom of the cleaning groove is provided with a water outlet. The silicon wafer cleaning spin-drying device is simple in structure, integrates the cleaning function and spin-drying function, and improves production efficiency.
Description
Technical field
The utility model relates to a kind of cleaning device, particularly a kind of Wafer Cleaning spin-drying device.
Background technology
In silicon substrate manufacture of solar cells process, need to clean and drying silicon chip, in traditional handicraft, clean with a dry minute two procedures and complete, reduced production efficiency.
The utility model content
The technical problem that (one) will solve
The technical problems to be solved in the utility model is to provide and a kind ofly integrates cleaning, dries the Wafer Cleaning spin-drying device that can enhance productivity.
(2) technical scheme
for solving the problems of the technologies described above, the utility model provides a kind of Wafer Cleaning spin-drying device, comprise cylinder 1, cover plate 3, rinse bath 5, support 7, motor 9, rotating cylinder 10 and silicon wafer carrier 12, described rinse bath 5 is fixedly mounted on described support 7, described motor 9 is fixedly mounted on the bottom of described rinse bath 5, and the output shaft of described motor 9 extends in described rinse bath 5, described rotating cylinder 10 is arranged in described rinse bath 5, and the bottom of described rotating cylinder 10 is fixedly connected on the output shaft of described motor 9, the surface of described rotating cylinder 10 offers aperture, described silicon wafer carrier 12 circumferentially is distributed in described rotating cylinder 10, described cylinder 1 be vertically mounted on described rinse bath 5 directly over, described cover plate 3 is fixedly mounted on the output shaft of described cylinder 1, the bottom of described cover plate 3 is provided with nozzle 4, described nozzle 4 connects water inlet pipe 2, the bottom of described rinse bath 5 offers delivery port 8.
Further, the sidewall of described rinse bath 5 offers peep hole 11.
Further, described delivery port 8 is provided with magnetic valve.
Further, be provided with level sensor 6 in described rinse bath 5.
(3) beneficial effect
The utility model Wafer Cleaning spin-drying device when cleaning, is placed in silicon chip on silicon wafer carrier, the air cylinder driven cover plate covers rinse bath, water inlet pipe supplies water, through the cleaning of nozzle realization to silicon chip, motor-driven rotating cylinder rotation simultaneously, improve cleaning quality, after completing cleaning, opens solenoid valve flows out the water in rinse bath, the motor High Rotation Speed, utilize the dehydrate silicon chip simultaneously; The utility model Wafer Cleaning spin-drying device, simple in structure, integrate and clean and dry, improved production efficiency.
Description of drawings
Fig. 1 is the structural representation of the utility model Wafer Cleaning spin-drying device.
The specific embodiment
consult Fig. 1, the utility model provides a kind of Wafer Cleaning spin-drying device, comprise cylinder 1, cover plate 3, rinse bath 5, support 7, motor 9, rotating cylinder 10 and silicon wafer carrier 12, rinse bath 5 is fixedly mounted on support 7, motor 9 is fixedly mounted on the bottom of rinse bath 5, and the output shaft of this motor 9 extends in rinse bath 5, rotating cylinder 10 is arranged in rinse bath 5, and the bottom of this rotating cylinder 10 is fixedly connected on the output shaft of motor 9, surface at rotating cylinder 10 offers aperture, silicon wafer carrier 12 circumferentially is distributed in rotating cylinder 10, cylinder 1 be vertically mounted on rinse bath 5 directly over, cover plate 3 is fixedly mounted on the output shaft of cylinder 1, the bottom of cover plate 3 is provided with nozzle 4, nozzle 4 connects water inlet pipe 2, the bottom of rinse bath 5 offers delivery port 8, be provided with magnetic valve on delivery port 8, in order to understand in real time rinse bath internal washing situation, offer peep hole 11 at the sidewall of rinse bath 5, and be provided with level sensor 6 in rinse bath 5.
The utility model Wafer Cleaning spin-drying device when cleaning, is placed in silicon chip on silicon wafer carrier, the air cylinder driven cover plate covers rinse bath, water inlet pipe supplies water, through the cleaning of nozzle realization to silicon chip, motor-driven rotating cylinder rotation simultaneously, improve cleaning quality, after completing cleaning, opens solenoid valve flows out the water in rinse bath, the motor High Rotation Speed, utilize the dehydrate silicon chip simultaneously; The utility model Wafer Cleaning spin-drying device, simple in structure, integrate and clean and dry, improved production efficiency.
The above is only preferred embodiment of the present utility model; should be understood that; for those skilled in the art; under the prerequisite that does not break away from the utility model know-why; can also make some improvements and modifications, these improvements and modifications also should be considered as protection domain of the present utility model.
Claims (4)
1. Wafer Cleaning spin-drying device, it is characterized in that: comprise cylinder (1), cover plate (3), rinse bath (5), support (7), motor (9), rotating cylinder (10) and silicon wafer carrier (12), described rinse bath (5) is fixedly mounted on described support (7), described motor (9) is fixedly mounted on the bottom of described rinse bath (5), and the output shaft of described motor (9) extends in described rinse bath (5), described rotating cylinder (10) is arranged in described rinse bath (5), and the bottom of described rotating cylinder (10) is fixedly connected on the output shaft of described motor (9), the surface of described rotating cylinder (10) offers aperture, described silicon wafer carrier (12) circumferentially is distributed in described rotating cylinder (10), described cylinder (1) be vertically mounted on described rinse bath (5) directly over, described cover plate (3) is fixedly mounted on the output shaft of described cylinder (1), the bottom of described cover plate (3) is provided with nozzle (4), described nozzle (4) connects water inlet pipe (2), the bottom of described rinse bath (5) offers delivery port (8).
2. Wafer Cleaning spin-drying device as claimed in claim 1, it is characterized in that: the sidewall of described rinse bath (5) offers peep hole (11).
3. Wafer Cleaning spin-drying device as claimed in claim 1, it is characterized in that: described delivery port (8) is provided with magnetic valve.
4. Wafer Cleaning spin-drying device as claimed in claim 1, is characterized in that: be provided with level sensor (6) in described rinse bath (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320311479 CN203265120U (en) | 2013-05-31 | 2013-05-31 | Silicon wafer cleaning spin-drying device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320311479 CN203265120U (en) | 2013-05-31 | 2013-05-31 | Silicon wafer cleaning spin-drying device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203265120U true CN203265120U (en) | 2013-11-06 |
Family
ID=49495614
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201320311479 Expired - Fee Related CN203265120U (en) | 2013-05-31 | 2013-05-31 | Silicon wafer cleaning spin-drying device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203265120U (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103868332A (en) * | 2014-03-12 | 2014-06-18 | 张家港市港威超声电子有限公司 | Finished product bearing cleaning deoiling spin-drying device |
| CN106269305A (en) * | 2016-09-30 | 2017-01-04 | 四川大学华西第二医院 | A kind of chamber mirror apparatus dehydration device |
| CN106352681A (en) * | 2016-09-19 | 2017-01-25 | 苏州润桐专利运营有限公司 | Spray type dewatering device for finished bearing products |
| CN107042219A (en) * | 2017-04-07 | 2017-08-15 | 成都亨通兆业精密机械有限公司 | Cleaning device for machine components |
| CN108212831A (en) * | 2017-12-07 | 2018-06-29 | 广德盛源电器有限公司 | A kind of cleaning method of silicon materials |
| CN108284101A (en) * | 2017-12-07 | 2018-07-17 | 广德盛源电器有限公司 | A kind of silicon material cleaning device |
| CN108356011A (en) * | 2018-01-24 | 2018-08-03 | 青岛正典生物科技有限公司 | The bird's nest cleaning equipment of swallow hair and impurity on a kind of removal bird's nest |
-
2013
- 2013-05-31 CN CN 201320311479 patent/CN203265120U/en not_active Expired - Fee Related
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103868332A (en) * | 2014-03-12 | 2014-06-18 | 张家港市港威超声电子有限公司 | Finished product bearing cleaning deoiling spin-drying device |
| CN103868332B (en) * | 2014-03-12 | 2017-01-11 | 张家港市港威超声电子有限公司 | Finished product bearing cleaning deoiling spin-drying device |
| CN106352681A (en) * | 2016-09-19 | 2017-01-25 | 苏州润桐专利运营有限公司 | Spray type dewatering device for finished bearing products |
| CN106269305A (en) * | 2016-09-30 | 2017-01-04 | 四川大学华西第二医院 | A kind of chamber mirror apparatus dehydration device |
| CN106269305B (en) * | 2016-09-30 | 2019-05-24 | 四川大学华西第二医院 | A kind of hysteroscope instrument dehydration device |
| CN107042219A (en) * | 2017-04-07 | 2017-08-15 | 成都亨通兆业精密机械有限公司 | Cleaning device for machine components |
| CN108212831A (en) * | 2017-12-07 | 2018-06-29 | 广德盛源电器有限公司 | A kind of cleaning method of silicon materials |
| CN108284101A (en) * | 2017-12-07 | 2018-07-17 | 广德盛源电器有限公司 | A kind of silicon material cleaning device |
| CN108212831B (en) * | 2017-12-07 | 2019-10-11 | 广德盛源电器有限公司 | A kind of cleaning method of silicon materials |
| CN108356011A (en) * | 2018-01-24 | 2018-08-03 | 青岛正典生物科技有限公司 | The bird's nest cleaning equipment of swallow hair and impurity on a kind of removal bird's nest |
| CN108356011B (en) * | 2018-01-24 | 2021-07-09 | 青岛正典生物科技有限公司 | Cubilose cleaning equipment for removing cubilose hair and impurities on cubilose |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20131106 Termination date: 20170531 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |