CN203037995U - Developing solution spraying device - Google Patents
Developing solution spraying device Download PDFInfo
- Publication number
- CN203037995U CN203037995U CN 201320043417 CN201320043417U CN203037995U CN 203037995 U CN203037995 U CN 203037995U CN 201320043417 CN201320043417 CN 201320043417 CN 201320043417 U CN201320043417 U CN 201320043417U CN 203037995 U CN203037995 U CN 203037995U
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- CN
- China
- Prior art keywords
- jet pipe
- nozzle
- nozzles
- substrate
- developer solution
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
The utility model discloses a developing solution spraying device, comprising a plurality of parallel spray pipes arranged above a substrate and a developing solution supply unit connected with the spray pipes, wherein a plurality of nozzles are arranged on each spray pipe, and developing solution is sprayed to the surface of the substrate through the nozzles; and the spray pipes are obliquely arranged relative to the moving direction of the substrate, and the nozzles on two adjacent spray pipes are alternately arranged along the central axes of the spray pipes. By adopting the device, the spray pipes are obliquely arranged relative to the moving direction of the substrate, so that the lengths of the corresponding spray pipes above the substrate can be increased, the setting quantity of the nozzles is increased, and the spraying uniformity of the developing solution is improved; and the nozzles on two adjacent spray pipes are alternately arranged, so that the nozzles can be distributed more uniformly, the mutual interference among the nozzles is reduced, and the spraying yield of the developing solution is improved.
Description
Technical field
The utility model relates to developing process, particularly relates to a kind of developer solution spray equipment.
Background technology
In LCDs preparation technology, the exposure imaging technology is used very extensive, traditional developing technique is by the developer solution spray equipment is set above the substrate after the exposure developer solution to be sprayed on the substrate surface uniformly, realizes the development to the back photoresist that exposes.
Traditional developer solution spray equipment comprises the many jet pipes that are parallel to each other that are arranged on the substrate top, and the central axis of jet pipe and the direction of motion of substrate are perpendicular, are provided with a plurality of nozzles that keep at a certain distance away on the every jet pipe, and nozzle opening is towards substrate surface.Jet pipe is connected with the developer solution feeding unit, developer solution is supplied in the jet pipe, by nozzle ejection to substrate surface.Because nozzle evenly arranges on jet pipe, the ranks form of all nozzle distribution formation rules, the easy like this developer solution that causes sprays inhomogeneous at substrate surface.And distance is nearer between adjacent jet pipe top nozzle, and the mutual interference of meeting phase can cause that the poor visualization phenomenon occurs.
The utility model content
(1) technical matters that will solve
The technical problems to be solved in the utility model is how to improve developer solution in the homogeneity of substrate surface spray, and can avoid the interference between the adjacent jet pipe top nozzle.
(2) technical scheme
In order to solve the problems of the technologies described above, the utility model provides a kind of developer solution spray equipment, comprising: the many jet pipes that are parallel to each other that are arranged on the substrate top, and the developer solution feeding unit that links to each other with described jet pipe; Offer a plurality of nozzles on the described jet pipe, spray developer solution by described nozzle to described substrate surface; Described jet pipe is obliquely installed with respect to the direction of motion of described substrate, and the nozzle on two adjacent jet pipes is arranged alternately along the central axial direction of jet pipe.
Wherein, the angle that becomes with the direction of motion of described substrate of the central axis of described jet pipe is between 80 ° ~ 85 °.
Wherein, in two adjacent jet pipes, the distance that wherein alternately is arranged in two nozzles of these nozzle both sides on nozzle distance second jet pipe on first jet pipe equates.
Wherein, the distance between adjacent two jet pipes equates.
Wherein, on the every jet pipe, the distance between adjacent two nozzles equates.
(3) beneficial effect
The developer solution spray equipment that technique scheme provides by jet pipe is obliquely installed with respect to the substrate motion direction, can prolong the length of corresponding jet pipe directly over the substrate, increases the quantity that arranges of nozzle, improves the homogeneity of developer solution spray; Being arranged alternately of adjacent two jet pipe top nozzles can make the distribution of nozzle more even, reduces the phase mutual interference between the nozzle, improves the yield of developer solution spray.
Description of drawings
Fig. 1 is the application synoptic diagram of the developer solution spray equipment of the utility model embodiment.
Wherein, 1: substrate; 2: jet pipe; 3: nozzle.
Embodiment
Below in conjunction with drawings and Examples, embodiment of the present utility model is described in further detail.Following examples are used for explanation the utility model, but are not used for limiting scope of the present utility model.
Fig. 1 shows the application synoptic diagram of present embodiment developer solution spray equipment, with reference to diagram, present embodiment developer solution spray equipment is for the substrate spray developer solution after exposure, it specifically comprises: the many jet pipes that are parallel to each other 2 that are arranged on substrate 1 top, and the developer solution feeding unit (not shown) that links to each other with described jet pipe 2; Offer a plurality of nozzles 3 on the described jet pipe 2, by described nozzle 3 to described substrate 1 surface spraying developer solution; For the certain substrate 1 of viewing area area, in order to increase the quantity of substrate 1 top nozzle 3, improve the homogeneity of developer solution spray, present embodiment is obliquely installed the direction of motion (in Fig. 1 arrow shown in reach the direction of mark v) of described jet pipe 2 with respect to described substrate 1, the effective length of described jet pipe 2 above described substrate 1 increases, the quantity of set nozzle 3 also can correspondingly increase on this effective length, can improve the homogeneity of developer solution spray; Further, nozzle 3 on two adjacent jet pipes 2 is arranged alternately along the central axial direction of jet pipe 2, namely in the ranks layout that all nozzles 3 form, each row nozzle 3 is in a certain angle with the direction of motion of described substrate 1, nozzle 3 on adjacent two jet pipes 2 is projected on the central axial direction of jet pipe 2, nozzle 3 on adjacent two jet pipes 2 alternately distributes in the central axial direction of its projection, this kind set-up mode can realize that nozzle 3 is evenly distributing on the direction of motion of substrate 1 and on the central axial direction of jet pipe 2, centered by any nozzle 3, nozzle 3 around it evenly distributes, can reduce the phase mutual interference between the nozzle 3, improve the yield of developer solution spray.
Preferably, the angle that the central axis of described jet pipe 2 becomes with the direction of motion of described substrate 1 between 80 ° ~ 85 ° so that the quantity that arranges of nozzle 3 non-interfering situation is issued at most between the nozzle satisfying.If this angle is excessive, then can not effectively increase the length of substrate 1 top jet pipe 2, correspondingly can not effectively increase the quantity that arranges of nozzle 3; If this angle is too small, under the situation that guarantees distance between distance between the adjacent jet pipe 2 and the adjacent nozzle 3, be difficult to realize that nozzle 3 on two adjacent jet pipes 2 is along the alternatively distributed effect of the central axial direction of jet pipe 2, the direction of motion that makes the row of nozzle 3 arrange easily to level off to substrate 1 is consistent, make nozzle 3 on perpendicular to the direction of motion of substrate 1, can not realize being alternately distributed like this, the even spray of developer solution is brought harmful effect.
In the present embodiment, in two adjacent jet pipes 2, the distance that wherein alternately is arranged in two nozzles of these nozzle both sides on nozzle distance second jet pipe on first jet pipe equates, described nozzle the projection of the central axial direction of jet pipe with equate in the distance of two adjacent nozzles between the projection of the central axial direction of described jet pipe on the adjacent jet pipe.
By this kind set-up mode, can realize that any one nozzle 3 all equates with distance between each nozzle 3 of arranging around it, when improving developer solution and evenly spray, avoid the phase mutual interference between each nozzle.
In field of liquid crystal display, the specification basically identical of the nozzle 3 that adopts when carrying out the developer solution spray, its spray rate and spray scope all have requirement routinely, therefore, for guaranteeing the homogeneity of developer solution spray, the distance between two adjacent jet pipes 2 all equates, between 140mm-160mm; And on the every jet pipe 2, the distance between adjacent two nozzles 3 also equates, between 140mm-160mm.
As can be seen from the above embodiments, the utility model is by being obliquely installed jet pipe with respect to the substrate motion direction, can prolong the length of corresponding jet pipe directly over the substrate, increases the quantity that arranges of nozzle, improves the homogeneity of developer solution spray; Being arranged alternately of adjacent two jet pipe top nozzles can make the distribution of nozzle more even, reduces the phase mutual interference between the nozzle, improves the yield of developer solution spray.
The above only is preferred implementation of the present utility model; should be understood that; for those skilled in the art; under the prerequisite that does not break away from the utility model know-why; can also make some improvement and replacement, these improvement and replacement also should be considered as protection domain of the present utility model.
Claims (5)
1. a developer solution spray equipment comprises: the many jet pipes that are parallel to each other that are arranged on the substrate top, and the developer solution feeding unit that links to each other with described jet pipe; Offer a plurality of nozzles on the described jet pipe, spray developer solution by described nozzle to described substrate surface; It is characterized in that described jet pipe is obliquely installed with respect to the direction of motion of described substrate, the nozzle on two adjacent jet pipes is arranged alternately along the central axial direction of jet pipe.
2. developer solution spray equipment as claimed in claim 1 is characterized in that, the angle that the central axis of described jet pipe becomes with the direction of motion of described substrate is between 80 ° ~ 85 °.
3. developer solution spray equipment as claimed in claim 1 is characterized in that, in two adjacent jet pipes, the distance that wherein alternately is arranged in two nozzles of these nozzle both sides on nozzle distance second jet pipe on first jet pipe equates.
4. developer solution spray equipment as claimed in claim 1 is characterized in that, the distance between two adjacent jet pipes equates.
5. developer solution spray equipment as claimed in claim 1 is characterized in that, on the every jet pipe, the distance between adjacent two nozzles equates.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320043417 CN203037995U (en) | 2013-01-25 | 2013-01-25 | Developing solution spraying device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320043417 CN203037995U (en) | 2013-01-25 | 2013-01-25 | Developing solution spraying device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203037995U true CN203037995U (en) | 2013-07-03 |
Family
ID=48690102
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201320043417 Expired - Fee Related CN203037995U (en) | 2013-01-25 | 2013-01-25 | Developing solution spraying device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203037995U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104785401A (en) * | 2015-05-13 | 2015-07-22 | 合肥京东方光电科技有限公司 | Spraying device and spraying method |
| CN107344151A (en) * | 2017-06-19 | 2017-11-14 | 武汉华星光电技术有限公司 | A kind of ink-jet glue spreading method and equipment |
| CN108031674A (en) * | 2017-12-20 | 2018-05-15 | 吴江南玻华东工程玻璃有限公司 | A kind of spray equipment being used in glass production |
-
2013
- 2013-01-25 CN CN 201320043417 patent/CN203037995U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104785401A (en) * | 2015-05-13 | 2015-07-22 | 合肥京东方光电科技有限公司 | Spraying device and spraying method |
| CN107344151A (en) * | 2017-06-19 | 2017-11-14 | 武汉华星光电技术有限公司 | A kind of ink-jet glue spreading method and equipment |
| CN108031674A (en) * | 2017-12-20 | 2018-05-15 | 吴江南玻华东工程玻璃有限公司 | A kind of spray equipment being used in glass production |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130703 Termination date: 20220125 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |