CN202406373U - 一种等离子体处理装置 - Google Patents
一种等离子体处理装置 Download PDFInfo
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- CN202406373U CN202406373U CN2011205103699U CN201120510369U CN202406373U CN 202406373 U CN202406373 U CN 202406373U CN 2011205103699 U CN2011205103699 U CN 2011205103699U CN 201120510369 U CN201120510369 U CN 201120510369U CN 202406373 U CN202406373 U CN 202406373U
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CN2011205103699U CN202406373U (zh) | 2011-12-08 | 2011-12-08 | 一种等离子体处理装置 |
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CN2011205103699U CN202406373U (zh) | 2011-12-08 | 2011-12-08 | 一种等离子体处理装置 |
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CN202406373U true CN202406373U (zh) | 2012-08-29 |
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CN2011205103699U Expired - Lifetime CN202406373U (zh) | 2011-12-08 | 2011-12-08 | 一种等离子体处理装置 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108668422A (zh) * | 2017-03-30 | 2018-10-16 | 北京北方华创微电子装备有限公司 | 一种等离子体产生腔室和等离子体处理装置 |
CN115852319A (zh) * | 2023-03-02 | 2023-03-28 | 北京理工大学 | 一种电爆炸-icp电感耦合等离子体高速率气相沉积系统 |
CN117080062A (zh) * | 2023-10-13 | 2023-11-17 | 无锡邑文微电子科技股份有限公司 | 碗状刻蚀的方法 |
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2011
- 2011-12-08 CN CN2011205103699U patent/CN202406373U/zh not_active Expired - Lifetime
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108668422A (zh) * | 2017-03-30 | 2018-10-16 | 北京北方华创微电子装备有限公司 | 一种等离子体产生腔室和等离子体处理装置 |
CN115852319A (zh) * | 2023-03-02 | 2023-03-28 | 北京理工大学 | 一种电爆炸-icp电感耦合等离子体高速率气相沉积系统 |
CN117080062A (zh) * | 2023-10-13 | 2023-11-17 | 无锡邑文微电子科技股份有限公司 | 碗状刻蚀的方法 |
CN117080062B (zh) * | 2023-10-13 | 2024-01-26 | 无锡邑文微电子科技股份有限公司 | 碗状刻蚀的方法 |
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Legal Events
Date | Code | Title | Description |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of utility model: Plasma processing device and processing method thereof Effective date of registration: 20150202 Granted publication date: 20120829 Pledgee: China Development Bank Co Pledgor: Advanced Micro-Fabrication Equipment (Shanghai) Inc. Registration number: 2009310000663 |
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PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20170809 Granted publication date: 20120829 Pledgee: China Development Bank Co Pledgor: Advanced Micro-Fabrication Equipment (Shanghai) Inc. Registration number: 2009310000663 |
|
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: 201201 No. 188 Taihua Road, Jinqiao Export Processing Zone, Pudong New Area, Shanghai Patentee after: Medium and Micro Semiconductor Equipment (Shanghai) Co., Ltd. Address before: 201201 No. 188 Taihua Road, Jinqiao Export Processing Zone, Pudong New Area, Shanghai Patentee before: Advanced Micro-Fabrication Equipment (Shanghai) Inc. |
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CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20120829 |