CN202388887U - Double-sided film stripping machine - Google Patents
Double-sided film stripping machine Download PDFInfo
- Publication number
- CN202388887U CN202388887U CN2012200052977U CN201220005297U CN202388887U CN 202388887 U CN202388887 U CN 202388887U CN 2012200052977 U CN2012200052977 U CN 2012200052977U CN 201220005297 U CN201220005297 U CN 201220005297U CN 202388887 U CN202388887 U CN 202388887U
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- dyestripping
- diaphragm
- platform
- motion
- lifting platform
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Abstract
The utility model discloses a double-sided film stripping machine which is used for stripping the upper and lower protection films stuck on a membrane and comprises a film stripping lower platform, a film stripping X-direction moving platform, a film stripping mechanism, a lifting platform and a lifting platform component, wherein film stripping lower platform is used for the para-position adsorption of the membrane; the film stripping X-direction moving platform is mounted on the film stripping lower platform and can move on the film stripping lower platform along the Y direction; the film stripping mechanism is mounted on the film stripping X-direction moving platform and can move along the X direction; the lifting platform is fixed on the film stripping lower platform; the lifting platform component is mounted on the lifting platform and can move up and down relative to the lifting platform; the film stripping mechanism comprises a film stripping head capable of turning; when the membrane is subjected to para-position absorption on the film stripping lower platform, the film stripping head can adsorb the upper protection film of the membrane, and the film stripping mechanism moves in the X direction and Y direction to strip the upper protection film of the membrane; and when the lifting platform component adsorbs the membrane, the film stripping head is turned and adsorbed on the lower protection film of the membrane, and the film stripping mechanism moves in the X direction and Y direction to strip the lower protection film of the membrane.
Description
Technical field
The utility model relates to a kind of Coating-removing machine, particularly relates to a kind of two-sided Coating-removing machine.
Background technology
In the existing TFT module assembly equipment backlight, the dyestripping board is the single face dyestripping, for the blooming piece with two-sided diaphragm; Generally all be to adopt two dyestripping platform designs; And the switching mechanism of diaphragm will be set, so that diaphragm is turned over turnback, accomplish two sides dyestripping process.The shortcoming of existing scheme mainly shows as: equipment occupation space is big, and the diaphragm switching mechanism is complicated, and the board manufacturing cost is high.
The utility model content
In view of above content, be necessary to provide a kind of two-sided Coating-removing machine simple in structure.
A kind of two-sided Coating-removing machine; Be used to tear and stick to up and down two lip-deep diaphragms of diaphragm; Include dyestripping lower platform, dyestripping X to motion platform, dyestripping mechanism, lifting platform and lifting platform assembly; The dyestripping lower platform is used for the contraposition absorption of diaphragm; Dyestripping X to motion platform be installed on the dyestripping lower platform, and can be at dyestripping lower platform upper edge Y to motion, dyestripping mechanism be installed in dyestripping X on motion platform, and can be at dyestripping X to motion platform upper edge X to motion, lifting platform is fixed on the dyestripping lower platform; The lifting platform assembly is installed on the lifting platform, also lifting platform moves up and down relatively; Dyestripping mechanism comprises turnover dyestripping head, and when the diaphragm contraposition was adsorbed on the dyestripping lower platform, said dyestripping head can be adsorbed on the upper protective film of diaphragm; Dyestripping mechanism is torn the upper protective film of diaphragm to motion to the Y of motion platform on the dyestripping lower platform to motion and dyestripping X to the X on the motion platform at dyestripping X; When lifting platform assembly absorption diaphragm, upset dyestripping head is so that the dyestripping head can adsorb on the following diaphragm of diaphragm, and dyestripping mechanism is torn the following diaphragm of diaphragm to motion to the Y of motion platform on the dyestripping lower platform to motion and dyestripping X to the X on the motion platform at dyestripping X.
In one embodiment, the both sides of dyestripping lower platform are fixed with dyestripping Y to motion guide rail, and dyestripping X is installed on the dyestripping lower platform to motion guide rail through dyestripping Y to motion platform.
In one embodiment, dyestripping mechanism also includes the dyestripping tong, and the dyestripping tong can be in order to clamp the diaphragm on the diaphragm.
In one embodiment, dyestripping mechanism also includes dyestripping upset cylinder, and dyestripping upset cylinder can be in order to order about the upset of mucous membrane wheel.
In one embodiment, dyestripping mechanism also includes dyestripping assembly lift cylinder, and dyestripping assembly lift cylinder can move up and down to motion platform in order to order about the relative dyestripping X of dyestripping mechanism.
In one embodiment, dyestripping mechanism also includes mucous membrane head lift cylinder, and mucous membrane head lift cylinder can move up and down in order to order about the mucous membrane wheel.
In one embodiment, the lifting platform assembly is provided with the diaphragm vacuum cup, and the diaphragm vacuum cup can be used in four bights of absorption diaphragm.
In one embodiment, the lifting platform assembly is provided with top dyestripping absorption chain-wales, in order to an angle of absorption diaphragm, and when dyestripping mechanism is torn the following diaphragm of diaphragm, can guarantee that diaphragm can not break away from top dyestripping absorption chain-wales.
In one embodiment, the lifting platform assembly is preset with and inhales film, the film of tearing, idle three anchor points.
In one embodiment, the position of diaphragm vacuum cup can suitably be adjusted, to adapt to the diaphragm of multiple size.
Compared with prior art; Above-mentioned two-sided Coating-removing machine only has the dyestripping lower platform, and moves up and down diaphragm through the lifting platform assembly, in addition; The dyestripping head can adsorb the diaphragm on the diaphragm upper and lower surfaces; Dyestripping mechanism at dyestripping X to the X on the motion platform to motion and dyestripping X to the Y of motion platform on the dyestripping lower platform to motion with diaphragm diaphragm is torn, do not need the switching mechanism of two dyestripping platforms designs and diaphragm, simple in structure.
Description of drawings
Fig. 1 is a preferred embodiments of the two-sided Coating-removing machine of the utility model and a three-dimensional assembly diagram of diaphragm.
Fig. 2 is the enlarged drawing of the II part of Fig. 1.
Fig. 3 is a stereogram of the dyestripping mechanism of Fig. 1.
Fig. 4 is a stereogram of the up-down stand of Fig. 1.
Fig. 5 is the enlarged drawing of the V part of Fig. 1.
Fig. 6 is the stereogram that dyestripping mechanism spreads film.
Fig. 7 is another three-dimensional assembly diagram of Fig. 1.
Fig. 8 is a part of stereogram that the top dyestripping among Fig. 7 adsorbs chain-wales and vacuum cup.
Fig. 9 is the top dyestripping absorption chain-wales of Fig. 7, a three-dimensional body figure of vacuum cup dyestripping mechanism.
The main element symbol description
| The dyestripping lower platform | ?1 |
| The dyestripping head | ?2 |
| Dyestripping X is to motion platform | ?3 |
| Dyestripping Y is to motion guide rail | ?4 |
| Useless film gathering-device | ?5 |
| The up-down stand | ?6 |
| The |
7 |
| Top dyestripping absorption chain- |
8 |
| The |
9 |
| |
10、11 |
| Dyestripping |
12 |
| Dyestripping |
13 |
| Mucous membrane |
14 |
| The |
15 |
| The |
16 |
The following specific embodiment will combine above-mentioned accompanying drawing to further specify the utility model.
The specific embodiment
Shown in Fig. 1 to 5, in a preferred embodiments of the utility model, the diaphragm on two surfaces up and down (figure does not show) that a kind of two-sided Coating-removing machine is used to tear and sticks to diaphragm 10.Said two-sided Coating-removing machine includes dyestripping lower platform 1, dyestripping X to motion platform 3, dyestripping mechanism, up-down stand 6, and lifting platform assembly 7.
Dyestripping lower platform 1 is used for film contraposition absorption, and its both sides are fixed with dyestripping Y to motion guide rail 4.Dyestripping X is slidingly mounted on the dyestripping lower platform 1 to motion guide rail 4 through dyestripping Y to motion platform 3, and to motion guide rail 4, dyestripping X can be along Y to moving to motion platform 3 through dyestripping Y.Dyestripping mechanism is installed in dyestripping X on motion platform 3, dyestripping X to motion platform 3 be used to drive dyestripping mechanism along X to moving.
Dyestripping mechanism includes mucous membrane wheel 15, dyestripping tong 16, dyestripping upset cylinder 12, dyestripping assembly lift cylinder 13, reaches mucous membrane head lift cylinder 14.Mucous membrane wheel 15 can be in order to cling the diaphragm on the diaphragm 10.Dyestripping tong 16 can be in order to clamp the diaphragm on the diaphragm 10.Dyestripping upset cylinder 12 can be taken turns 15 flip-flop movements in order to order about mucous membrane.Dyestripping assembly lift cylinder 13 can move up and down to motion platform 3 in order to order about the relative dyestripping X of dyestripping mechanism.Mucous membrane head lift cylinder 14 can move up and down in order to order about mucous membrane wheel 15.
Up-down stand 6 is fixed on the dyestripping lower platform 1.Lifting platform assembly 7 is installed on the up-down stand 6, and can be along up-down stand 6 vertical lifts.Lifting platform assembly 7 is provided with top dyestripping absorption chain-wales 8 and diaphragm vacuum cup 9.The top dyestripping adsorbs the angle of chain-wales 8 in order to absorption diaphragm 10, and, when dyestripping mechanism will descend diaphragm to tear off smoothly from below, can guarantee that diaphragm 10 can not break away from top dyestripping absorption chain-wales 8.Diaphragm vacuum cup 9 is used to adsorb four bights of diaphragm 10.
Please refer to Fig. 1 and Fig. 6; Tear when being adsorbed on the upper protective film of diaphragm 10 upper surfaces; Diaphragm 10 is positioned on the dyestripping lower platform 1, after completion contraposition and the absorption, 2 upsets of dyestripping head; Make mucous membrane wheel 15 down, move to diaphragm 10 lower left corners to motion platform 3 and dyestripping Y dyestripping head 2 under motion guide rail 4 drives with mucous membrane wheel 15 at dyestripping X.After accomplishing the location; 13 actions of dyestripping assembly lift cylinder; Make mucous membrane head lift cylinder 14, mucous membrane wheel 15, and dyestripping tong 16 integral body move downward, near being attracted to the diaphragm 10 on the dyestripping lower platform 1, mucous membrane head lift cylinder 14 actions then; Move downward until one jiao that is pressed in diaphragm 10 so that mucous membrane takes turns 15, and guarantee that mucous membrane wheel 15 clings upper protective film.Then; Dyestripping X drives the diagonal rectilinear motion a bit of distance of dyestripping head 2 along diaphragm 10 to motion platform 3 and dyestripping Y to motion guide rail 4 together; Make upper protective film glued appropriate length by mucous membrane wheel 15 outer revolution, this length can reliably be clamped by dyestripping tong 16 and is advisable can be guaranteed to protect upper protective film.At this moment, dyestripping tong 16 action, and upper protective film tightly clamped for one jiao, mucous membrane head lift cylinder 14 withdrawals then drive mucous membrane wheel 15 and rise, and make the last cuticula that adheres on the mucous membrane wheel 15 break away from mucous membrane simultaneously and take turns 15.Dyestripping assembly lift cylinder 13 withdrawal, drive mucous membrane head lift cylinder 14, mucous membrane wheel 15, and dyestripping tong 16 rise overally, make dyestripping X to motion platform 3 and dyestripping Y to motion guide rail 4 away from diaphragm 10.Thereby dyestripping X tears upper protective film to motion platform 3 and dyestripping Y off to motion guide rail 4 driving dyestripping heads 2 fast moving, and is taken away by useless film gathering-device 5, accomplishes upper protective film and removes.
Please refer to Fig. 7 to Fig. 9, tear when being adsorbed on the following diaphragm of diaphragm 10 lower surfaces, lifting platform assembly 7 moves downward from the top, stops after touching the diaphragm 10 that is adsorbed on dyestripping lower platform 1 reliably up to its diaphragm vacuum cup 9.The diaphragm vacuum cup 9 of lifting platform assembly 7 begins to adsorb diaphragm 10; After the reliable absorption; Lifting platform assembly 7 is promoted to the diaphragm height of tearing and (sees Fig. 7; Diaphragm is represented by dotted lines among the figure, and is labeled as 11), and guarantee that the position, dyestripping angle of diaphragm 11 is adsorbed on the top dyestripping absorption chain-wales 8 reliably.2 upsets of dyestripping head; Make mucous membrane wheel 15 up, dyestripping X moves to the lower left corner of diaphragm 11 to motion platform 3 and dyestripping Y, accomplishes the location under the driving of motion guide rail 4 after; 13 actions of dyestripping assembly lift cylinder; Make mucous membrane head lift cylinder 14, mucous membrane wheel 15, and dyestripping tong 16 integral body move upward, near the diaphragm 11 that is adsorbed, mucous membrane head lift cylinder 14 actions then; So that mucous membrane wheel 15 moves upward until the following diaphragm at the dyestripping angle that is pressed in diaphragm 11, cling down diaphragm to guarantee mucous membrane wheel 15.Dyestripping X drives dyestripping head 2 edges by a bit of distance of diagonal rectilinear motion of strip film to motion platform 3 and dyestripping Y to motion guide rail 4 together; Make down diaphragm glued appropriate length by mucous membrane wheel 15 outer revolution, this length can reliably be clamped by dyestripping tong 16 and is advisable can be guaranteed to protect down diaphragm.16 actions of dyestripping tong will descend diaphragm tightly to clamp for one jiao, and mucous membrane head lift cylinder 14 stretches out, and drive the mucous membrane wheel and swell for 15 times, and the following cuticula that adheres to simultaneously on the mucous membrane wheel 15 breaks away from mucous membrane wheel 15.Dyestripping assembly lift cylinder 13 stretches out, and drives mucous membrane head lift cylinder 14, mucous membrane wheel 15, and dyestripping tong 16 whole declines, make dyestripping X to motion platform 3 and dyestripping Y to motion guide rail 4 away from by strip film.Dyestripping X tears down diaphragm to motion platform 3 and dyestripping Y off to motion guide rail 4 driving dyestripping heads 2 fast moving, and is taken away by useless film gathering-device 5, accomplishes diaphragm removal down.
After the following diaphragm of diaphragm 11 was torn off, lifting platform assembly 7 descended, and diaphragm 11 is put back to once more waited on the dyestripping lower platform 1 and being taken away.
In one embodiment, lifting platform assembly 7 is preset with inhales film, the film of tearing, idle three anchor points, and diaphragm vacuum cup 9 positions can suitably be adjusted, to adapt to the diaphragm of multiple size.
Above-mentioned two-sided Coating-removing machine is because therefore two surface protective films of can tearing can make equipment cost be minimized, and cost of equipment maintenance also can reduce greatly, reduces floor space simultaneously, and is significant to the factory that the workshop is crowded.
In addition, above-mentioned two-sided Coating-removing machine also can be used for the dyestripping of TFT liquid crystal panel except that the dyestripping that is used for TFT module group backlight diaphragm.Because TFT liquid crystal panel to be assembled connected drive circuit, only need suitably to revise platform size, and the adsorbing mechanism that increases FPC, PCB circuit board just can satisfy the dyestripping of TFT liquid crystal panel.
Claims (10)
1. two-sided Coating-removing machine; Be used to tear and stick to up and down two lip-deep diaphragms of diaphragm; Include dyestripping lower platform, dyestripping X to motion platform, dyestripping mechanism, lifting platform and lifting platform assembly; The dyestripping lower platform is used for the contraposition absorption of diaphragm; Dyestripping X to motion platform be installed on the dyestripping lower platform, and can be at dyestripping lower platform upper edge Y to motion, dyestripping mechanism be installed in dyestripping X on motion platform, and can be at dyestripping X to motion platform upper edge X to motion, lifting platform is fixed on the dyestripping lower platform; The lifting platform assembly is installed on the lifting platform, also lifting platform moves up and down relatively; It is characterized in that: dyestripping mechanism comprises turnover dyestripping head, and when the diaphragm contraposition was adsorbed on the dyestripping lower platform, said dyestripping head can be adsorbed on the upper protective film of diaphragm; Dyestripping mechanism is torn the upper protective film of diaphragm to motion to the Y of motion platform on the dyestripping lower platform to motion and dyestripping X to the X on the motion platform at dyestripping X; When lifting platform assembly absorption diaphragm, upset dyestripping head is so that the dyestripping head can adsorb on the following diaphragm of diaphragm, and dyestripping mechanism is torn the following diaphragm of diaphragm to motion to the Y of motion platform on the dyestripping lower platform to motion and dyestripping X to the X on the motion platform at dyestripping X.
2. two-sided Coating-removing machine as claimed in claim 1 is characterized in that: the both sides of dyestripping lower platform are fixed with dyestripping Y to motion guide rail, and dyestripping X is installed on the dyestripping lower platform to motion guide rail through dyestripping Y to motion platform.
3. two-sided Coating-removing machine as claimed in claim 1 is characterized in that: dyestripping mechanism also includes the dyestripping tong, and the dyestripping tong can be in order to clamp the diaphragm on the diaphragm.
4. two-sided Coating-removing machine as claimed in claim 1 is characterized in that: dyestripping mechanism also includes dyestripping upset cylinder, and dyestripping upset cylinder can be in order to order about the upset of mucous membrane wheel.
5. two-sided Coating-removing machine as claimed in claim 1 is characterized in that: dyestripping mechanism also includes dyestripping assembly lift cylinder, and dyestripping assembly lift cylinder can move up and down to motion platform in order to order about the relative dyestripping X of dyestripping mechanism.
6. two-sided Coating-removing machine as claimed in claim 1 is characterized in that: dyestripping mechanism also includes mucous membrane head lift cylinder, and mucous membrane head lift cylinder can move up and down in order to order about the mucous membrane wheel.
7. two-sided Coating-removing machine as claimed in claim 1 is characterized in that: the lifting platform assembly is provided with the diaphragm vacuum cup, and the diaphragm vacuum cup can be used in four bights of absorption diaphragm.
8. two-sided Coating-removing machine as claimed in claim 7; It is characterized in that: the lifting platform assembly is provided with top dyestripping absorption chain-wales; In order to an angle of absorption diaphragm, and when dyestripping mechanism is torn the following diaphragm of diaphragm, can guarantee that diaphragm can not break away from top dyestripping absorption chain-wales.
9. two-sided Coating-removing machine as claimed in claim 8 is characterized in that: the lifting platform assembly is preset with inhales film, the film of tearing, idle three anchor points.
10. two-sided Coating-removing machine as claimed in claim 8 is characterized in that: the position of diaphragm vacuum cup can suitably be adjusted, to adapt to the diaphragm of multiple size.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012200052977U CN202388887U (en) | 2012-01-06 | 2012-01-06 | Double-sided film stripping machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012200052977U CN202388887U (en) | 2012-01-06 | 2012-01-06 | Double-sided film stripping machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202388887U true CN202388887U (en) | 2012-08-22 |
Family
ID=46663837
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012200052977U Withdrawn - After Issue CN202388887U (en) | 2012-01-06 | 2012-01-06 | Double-sided film stripping machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202388887U (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103192586A (en) * | 2012-01-06 | 2013-07-10 | 沈阳新松机器人自动化股份有限公司 | Two-sided film tearing machine |
| CN103640323A (en) * | 2013-11-29 | 2014-03-19 | 苏州晓炎自动化设备有限公司 | Non-standard automatic film tearing machine |
| CN104528083A (en) * | 2014-12-25 | 2015-04-22 | 苏州博众精工科技有限公司 | Film tearing mechanism |
| CN105190734A (en) * | 2013-05-17 | 2015-12-23 | 住友化学株式会社 | Detaching device and system for manufacturing optical display device |
| CN107187677A (en) * | 2017-05-31 | 2017-09-22 | 苏州博众精工科技有限公司 | A kind of automatic film tearing device |
| CN107264902A (en) * | 2017-05-31 | 2017-10-20 | 苏州博众精工科技有限公司 | A kind of automatic charging dyestripping mechanism |
| CN109625497A (en) * | 2018-12-24 | 2019-04-16 | 珠海研深科技有限公司 | A kind of dyestripping equipment and its working method based on shoveling film mechanism |
| CN110899300A (en) * | 2019-11-29 | 2020-03-24 | 嵊州市铭恩建设机械厂 | Old and useless plastic-aluminum board is broken to be retrieved and is used electrostatic separation equipment |
-
2012
- 2012-01-06 CN CN2012200052977U patent/CN202388887U/en not_active Withdrawn - After Issue
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103192586B (en) * | 2012-01-06 | 2015-02-25 | 沈阳新松机器人自动化股份有限公司 | Two-sided film tearing machine |
| CN103192586A (en) * | 2012-01-06 | 2013-07-10 | 沈阳新松机器人自动化股份有限公司 | Two-sided film tearing machine |
| CN105190734B (en) * | 2013-05-17 | 2017-09-19 | 住友化学株式会社 | The production system of stripping off device and optical display device |
| CN105190734A (en) * | 2013-05-17 | 2015-12-23 | 住友化学株式会社 | Detaching device and system for manufacturing optical display device |
| CN103640323A (en) * | 2013-11-29 | 2014-03-19 | 苏州晓炎自动化设备有限公司 | Non-standard automatic film tearing machine |
| CN104528083A (en) * | 2014-12-25 | 2015-04-22 | 苏州博众精工科技有限公司 | Film tearing mechanism |
| CN104528083B (en) * | 2014-12-25 | 2017-01-18 | 苏州博众精工科技有限公司 | Film tearing mechanism |
| CN107187677A (en) * | 2017-05-31 | 2017-09-22 | 苏州博众精工科技有限公司 | A kind of automatic film tearing device |
| CN107264902A (en) * | 2017-05-31 | 2017-10-20 | 苏州博众精工科技有限公司 | A kind of automatic charging dyestripping mechanism |
| CN107187677B (en) * | 2017-05-31 | 2019-05-03 | 博众精工科技股份有限公司 | A kind of automatic film tearing device |
| CN107264902B (en) * | 2017-05-31 | 2019-05-07 | 博众精工科技股份有限公司 | A kind of automatic charging dyestripping mechanism |
| CN109625497A (en) * | 2018-12-24 | 2019-04-16 | 珠海研深科技有限公司 | A kind of dyestripping equipment and its working method based on shoveling film mechanism |
| CN110899300A (en) * | 2019-11-29 | 2020-03-24 | 嵊州市铭恩建设机械厂 | Old and useless plastic-aluminum board is broken to be retrieved and is used electrostatic separation equipment |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20120822 Effective date of abandoning: 20150225 |
|
| RGAV | Abandon patent right to avoid regrant |