CN202306138U - Maskless exposure device - Google Patents
Maskless exposure device Download PDFInfo
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- CN202306138U CN202306138U CN2011203678174U CN201120367817U CN202306138U CN 202306138 U CN202306138 U CN 202306138U CN 2011203678174 U CN2011203678174 U CN 2011203678174U CN 201120367817 U CN201120367817 U CN 201120367817U CN 202306138 U CN202306138 U CN 202306138U
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Abstract
The utility model relates to a maskless exposure device, which is provided with an exposure light source, an exposure optical system comprising a space optical modulator, an exposure working table and a measuring unit, wherein the exposure working table enables an exposure object to be opposite the exposure optical system and keeps the state, and relatively moves relative to the exposure optical system; and the measuring unit is used for measuring the amount of movement of a maintaining member, and the exposure optical system is used for exposing and describing the exposure object. The maskless exposure device is characterized by being provided with a comparing unit, a correcting unit and a setting unit.
Description
Technical field
The present invention relates to be used for the maskless exposure device that do not use mask pattern to be made public at exposure base.
Background technology
Knownly do not use pattern mask (pattern mask) and usage space photomodulator (Digital Mirror Device; DMD: below; Slightly be called DMD); Maskless (maskless) exposure device of at the exposure object thing of the photosensitive dry film of printed base plate, semiconductor, liquid crystal surfactant or aqueous resist etc. (below, be called exposure base) circuit pattern being described through ultraviolet ray (for example, with reference to patent documentation 1).
In this patent documentation 1, put down in writing following invention; It is a kind of maskless exposure device; Comprise: the exposure light source of output illumination for exposure light, 2 dimension space modulators, the 1st projecting lens, microlens array, the 2nd projecting lens and the worktable that keeps exposure base and move in direction with the light shaft positive cross of said the 2nd projecting lens; This maskless exposure device is characterised in that; Be provided with the 1st and the 2nd 2 the wedge glass and the mobile unit that at least one side of said wedge glass is moved that are the dip plane of angle θ as a face of plate thickness direction with respect to another face of plate thickness direction; Said another face of said the 1st wedge glass optical axis with respect to said the 2nd projecting lens is vertically disposed; The said face of said the 2nd wedge glass is made up with the mode that the distance with the corresponding face of said the 1st wedge glass becomes predetermined value; Be configured in the light incident side or the exiting side of said the 2nd projecting lens; Under the situation that the image space of the said optical axis direction of said the 2nd projecting lens departs from from the surface of said exposure base, through said mobile unit so that said distance for the arbitrary side of fixing mode with said wedge glass moves in said angle θ direction, is positioned at the imaging surface of said the 2nd projecting lens the surface of said exposure base thus.
In said patent documentation 1; Put down in writing departing to proofread and correct and position to the image space in when exposure; But in addition, in this maskless exposure device, under the situation of making public; To be fixed on as the exposure base of exposure object thing on the exposure worktable, control circuit switches the pattern of DMD and the worktable propelling makes public for same step.At this moment, control circuit generates the pattern switch pulse of the DMD that matees with exposure resolution ratio based on the scale pulse signal from the linear scale that is installed in exposure worktable (linear scale).Thereby the pattern switch pulse of DMD through to from linear scale directly input the scale pulse signal, be that so-called original scale pulse signal carries out the specified quantity counting and obtains.
DMD is built-in with the interim storage that is used for that is called as data-carrier store usually and describes memory of data; In addition; The control circuit of the control of carrying out self is installed; When receive in the exposure in current place next place describe the passing on of data the time, this is described data storage in the data-carrier store of self.And when receiving the pattern switch pulse,, carry out the On-Off of catoptron with the present pattern data of describing that pattern data replaces with data-carrier store of describing.These data pass on need be to a certain degree time.
When in the above described manner when original pulse signal generates the pattern switch pulse signal of DMD, the influence of carrying out the speed fluctuation of the drive system that worktable advances directly impacts said pattern switch pulse signal.On the other hand, though carry out drive system that worktable advances by servocontrol, its fltting speed changes with ± 10% degree., the fltting speed that advances when worktable accelerates, and passes on times prior and arrives next exposure area and produce the scale pulse in the above-mentioned data of describing, and when producing DMD pattern switch pulse according to it, DMD makes a mistake.Therefore, always have nargin, have to use than slow about 10% the fltting speed of average velocity for worktable is advanced.
The prior art document
Patent documentation
Patent documentation 1: TOHKEMY 2009-80324 communique.
The problem that invention will solve
, when the speed slow about 10% that worktable is advanced is made public, whole time shutter of exposure base slack-off make the worktable fltting speed postpone 10% amount, correspondingly production efficiency reduces.
Summary of the invention
Therefore, the problem that the present invention will solve is that the influence of the speed fluctuation of the drive system that the inhibition worktable advances makes public expeditiously, seeks the productive raising of the exposure process of exposure base.
Be used to solve the scheme of problem
In order to solve above-mentioned problem; The 1st scheme is a maskless exposure method; The exposure object thing is fixed on the exposure worktable; The pattern switching of the spatial light modulator of exposure optical system is made public with the worktable propelling synchronously; It is characterized in that, relatively follow moving of said exposure worktable and the recurrent interval of the scale pulse signal of recurrent interval of the scale pulse signal obtained and predefined standard, under the said scale pulse interval of the obtaining situation shorter than the recurrent interval of said standard; The output mode regularly that regularly becomes the scale recurrent interval of said standard with the output of this scale pulse that shortens is proofreaied and correct, so that the output gap of the pattern switch pulse of said spatial light modulator becomes and describes data and pass on more than the time.
Can reduce the mistake that change owing to the fltting speed of worktable propulsive mechanism 8 causes before data are passed on, producing the DMD that the scale pulse takes place thus.
The 2nd scheme is a kind of maskless exposure device, has: exposure light source, output illumination for exposure light; Exposure optical system comprises spatial light modulator; Exposure worktable also keeps exposure object thing and said exposure optical system in opposite directions, relatively moves with respect to said exposure optical system; And instrumentation unit; With the scale pulse signal amount of movement of said retaining member is carried out instrumentation; Said exposure object thing is made public and describe through said exposure optical system; This maskless exposure device is characterised in that to possess: comparing unit, relatively follow recurrent interval of scale pulse signal of recurrent interval and the predefined standard of the scale pulse signal that moving of said exposure worktable obtain through said instrumentation unit; Correcting unit; Comparative result according to said comparing unit; Under the said scale pulse interval of the obtaining situation shorter, regularly become the output mode regularly in the scale recurrent interval of said standard with the output of this scale pulse that shortens and proofread and correct than scale recurrent interval of said standard; And setup unit, with the correction through said correcting unit, the pattern switch pulse output gap of said spatial light modulator becomes to be described data and passes on above mode of time and set.
Have again, after in the embodiment stated, the exposure object thing is corresponding to exposure base 9; Exposure worktable is corresponding to the worktable propulsive mechanism 8 that comprises exposure worktable; Exposure optical system is corresponding to symbol 2, and spatial light modulator is corresponding to not shown DMD, follow moving of exposure worktable and the scale pulse interval obtained corresponding to scale pulse interval PIab, PIbc, PIcd, PIde, PIef, the PIfg of reality; The recurrent interval of the scale pulse signal of predefined standard is corresponding to symbol SPI; Both comparisons are corresponding to step S8, under the scale pulse interval of the obtaining situation shorter than the scale recurrent interval of standard, regularly become the output mode regularly in the scale recurrent interval of standard with the output of this scale pulse that shortens and proofread and correct corresponding to step S9; It is above corresponding to step S10 and step S11 the pattern switch pulse of spatial light modulator to be become describe data to pass on the time; Exposure light source is corresponding to symbol 1, and the instrumentation unit is corresponding to linear scale 5 and CNC7, and comparing unit is corresponding to step S8; Correcting unit is corresponding to step S9, and setup unit is corresponding to step S10 and step S11.
The effect of invention
According to the present invention; Because can reduce the mistake of the DMD that the change of the fltting speed of worktable propulsive mechanism 8 causes produces; Seek the raising of the fltting speed of worktable, therefore can make public expeditiously, seek the productive raising of the exposure process of exposure base.
Description of drawings
Fig. 1 is the figure of schematic configuration of the maskless exposure device of expression embodiment of the present invention.
Fig. 2 is the time diagram that the expression and the synchronous DMD pattern switch pulse of propelling of worktable propulsive mechanism are created on the timing under the desirable situation.
Fig. 3 is the time diagram of an output example regularly of the scale pulse after expression is proofreaied and correct the scale pulse that is produced by the exposure worktable of reality.
Fig. 4 is output another routine time diagram regularly of the scale pulse after expression is proofreaied and correct the scale pulse that is produced by the exposure worktable of reality.
Fig. 5 is a presentation graphs 3 and the process flow diagram of the trimming process of scale impulse correction shown in Figure 4.
Embodiment
The present invention is based on following discovery; Thereby reduced the generation of the mistake that said change causes; This discovery is the situation that does not almost have the generation of the scale pulse that the change of the fltting speed of worktable propulsive mechanism causes change to produce continuously, under most of situation be the scale pulse be the degree that alternately produces expansion and shrink at interval.
Below, to embodiment of the present invention, Yi Bian describe on one side with reference to accompanying drawing.
Fig. 1 is the figure of schematic configuration of the maskless exposure device of expression embodiment of the present invention.In with figure, maskless exposure device constitutes basically and comprises: exposure light source 1; The optical system 2 that comprises the DMD that will make public to exposure base 9 sides from the photoconduction of exposure light source 1 outgoing; Drive the DMD actuator unit 3 of DMD; The data of describing of control DMD actuator unit 3 are passed on PC (personal computer) 4; Main PC6 and CNC (computer numerical control device) 7 as the higher level PC of exposure control; The worktable propulsive mechanism 8 of the exposure worktable that comprises fixing exposure base 9 and move it; Be used for linear scale 5 to CNC7 output scale pulse signal; Read in the CCD camera 13 of the alignment mark that forms on the exposure base 9; Be transfused to the information that reads of CCD camera 13 and from the scale pulse signal of linear scale 5, to the image processing apparatus 12 of main PC6 output image process information.Have again, be equipped with at DMD actuator unit 3 and be used to the synchronous substrate 11 that drives the DMD actuator substrate 10 of DMD and be built-in with pulse-generating circuit.
In the maskless exposure device that constitutes like this, the light of the fixed wave length that will produce with exposure light source 1 is supplied with to optical system 2.Be provided with a plurality of optical systems according to apparatus structure, but be representative here with 1.In optical system 2, possess the element DMD (Digital Mirror Device) that is built-in with a plurality of small catoptrons, this small catoptron is to be controlled by On-Off from the electric signal of the DMD actuator substrate 10 in the DMD actuator unit 3 at high speed.The electric signal of DMD actuator substrate 10 is based on the electric signal that constitutes from describing data to pass on the DMD pattern switch pulse of describing data and generating according to the scale pulse signal of obtaining from linear scale 5 through the synchronous substrates in the DMD actuator unit 3 11 of passing on PC4 (after, only be called the DMD switch pulse).
Should obtain synchronously from the motion of the electric signal of DMD driver 10 instruction through main PC6, at the picture of exposure base 9 formation circuit etc. with the exposure directions of the worktable propulsive mechanism 8 of CNC7 control.Have again, the electric signal that here forms etc. be based on the alignment mark that reads in CCD camera 13 and image processing apparatus 12 positional information, cooperate the flexible of exposure base 9 and by the electric signal of conversion.
The data of said DMD being passed on the needed time here, is called afterwards and describes data and pass on time D T.In this embodiment, reduce this and describe data and pass on the mistake of the DMD that the change of fltting speed of time D T and worktable propulsive mechanism 8 causes and produce, seek the raising of the fltting speed of worktable.Have, DMD itself is known device, omits detailed explanation in this manual again.
Fig. 2 is expression receives main PC6 through built-in pulse generation circuit in the synchronous substrate 11 in DMD actuator unit 3 exposure instruction; The propelling that generates with worktable propulsive mechanism 8 is that synchronous DMD switch pulse is desirable situation, and promptly the fltting speed of exposure worktable is the time diagram of the situation of fixing.Here, whole time counts with the time clock of crystal oscillator of being equipped on synchronous substrate 11 etc.
Fltting speed at exposure worktable as shown in Figure 2 is under the fixing situation, produces equally spaced desirable scale pulse (a ~ g).The pulse generation circuit that is built in synchronous substrate 11 is counted this scale pulse, when reaching the regulation counting, generates the DMD switch pulse.When DMD receives the DMD switch pulse, describe data from built-in data-carrier store reception, making the DMD catoptron is ON, to exposure base exposure plotting pattern.During this exposure, data-carrier store passes on to receive with PC4 and describes passing on of data from describing data.This passes on the needed time is to describe data to pass on time D T, at this effluxion timing output DMD switch pulse, the DMD catoptron becomes ON.
Fig. 3 is the time diagram of the example of the scale pulse after expression is proofreaied and correct by the scale pulse of the exposure worktable generation of reality with through the bearing calibration of this embodiment.The scale pulse of reality is like this because the change of the fltting speed of exposure worktable, and the recurrent interval, PI changed.In Fig. 3, with each pulse a of the scale pulse 1 of reality, b, c, d, e, f, the rising edge time interval of g is PIab, PIbc, PIcd, PIde, PIef, PIfg.In this embodiment, this recurrent interval is carried out electricity proofread and correct.
Under the situation that the recurrent interval PI to reality proofreaies and correct, at first, the scale recurrent interval SPI of the standard of linear scale that in advance will be corresponding with the fltting speed command value of worktable is stored in the memory area that is equipped on the synchronous substrate 11.When receiving the exposure instruction from main PC6; Also receive the fltting speed command value of exposure worktable simultaneously; Read the scale recurrent interval SPI of the standard corresponding from storer, the interval PI of scale pulse is counted and relatively with the time clock of synchronous substrate 11 with this fltting speed command value.Do not proofread and correct the scale recurrent interval PI longer, and the short scale recurrent interval PI of contrast standard scale recurrent interval SPI carries out the electricity correction than this standard scale recurrent interval SPI.In the example of Fig. 3, to proofread and correct as the elongated mode of PIab, PIcd, PIfg of the scale recurrent interval PI shorter than standard scale recurrent interval SPI.Then, generate the DMD switch pulse according to the scale pulse after this correction.Thus, can pass on the DMD switch pulse of deficiency of time to the data of describing that DMD output can not become DMD.
That is, come word, so that proofread and correct than the interval of the interval PIfg of the interval PIcd of interval PIab, pulse c and the pulse d of short pulse a of standard scale recurrent interval SPI and pulse b and pulse f and the pulse g mode that equates with SPI that becomes with Fig. 3.Influence to the DMD switch pulse only is pulse g, but passes through the change of Monitor Scale pulse always, thus the change of compensated pulse g easily.Through proofreading and correct like this,, can suppress the generation of DMD mistake even, also can wait for the end of passing on of describing data reliably passing on the short time of time D T and export next switch pulse signal than describing data.
Fig. 4 is the time diagram that is illustrated in the situation that interval that other pattern acceptance of the bid chi pulse dashes changes.In this case, such shown in the scale pulse 2 of reality, shorten than pulse c with desirable scale pulsion phase, pulse e is elongated.With it likewise to proofread and correct with process in Fig. 3 explanation.So it is longer than desirable interval SPI that pulse e becomes, pulse f departs from corresponding amount because this departs from, pulse g become than describe data pass on the time (DT) slow., the DMD switch pulse that causes thus is not to describe data in deficiency to pass on and produce among the time D T, therefore can not produce mistake.With likewise always, the position deviation of this degree is in the scope of allowable error.
Fig. 5 is a presentation graphs 3 and the process flow diagram of the trimming process of scale impulse correction shown in Figure 4.
In this is proofreaied and correct; At first the DMD of optical system 2 from the fltting speed command value (step S1) that main PC6 receives exposure instruction and exposure worktable, reads in the standard scale recurrent interval SPI (step S2) corresponding with the fltting speed command value via DMD actuator unit 3.Then, describing data passes on PC4 and describes data (step S3) via the DMD actuator unit to what DMD passed on initial exposure area.
The pulse generation circuit of substrate 11 is counted this scale pulse synchronously, when reaching regulation counting (being pulse g) in Fig. 3 and Fig. 4, generates DMD switch pulse (step S4).When DMD receives the DMD switch pulse, further receive and describe data from built-in data-carrier store, making the DMD catoptron is ON, begins to describe the exposure (step S5) of pattern.
Describe data and pass on PC4 and begin pass on (the step S6) that the next one is described data, the recurrent interval PI of 11 pairs of linear scales of substrate counts (step S7) synchronously.Then; The recurrent interval PI and the standard scale recurrent interval SPI (step S8) that compare linear scale; The recurrent interval of linear scale PI than the short situation of standard scale recurrent interval SPI under; With the recurrent interval PI of linear scale become the mode paired pulses that equates with standard scale recurrent interval SPI at interval PI proofread and correct (step S9), (step S10) counted in pulse to scale.On the other hand, in the comparing to determine of step S8, if recurrent interval PI is more than the standard scale recurrent interval SPI, skips steps S9, step S10 to scale pulse count.
Then, relatively the count value N and the setting (step S11) of counting carry out from step S7 to the processing of handling step S11 till count value N reaches setting repeatedly.Then; When count value becomes setting (step S11: " being "); Check the exposure (step S12) of the Zone Full that whether is through with; If do not finish the exposure of Zone Full, carry out processing repeatedly, in the moment (step S12: " being ") end process of the exposure of the Zone Full that is through with from step S4 to step S12.
Like this, according to this embodiment, can obtain following effect.
1) because the change of the fltting speed that the servocontrol of worktable propulsive mechanism causes; Have to use slow about 10% the fltting speed of average velocity that advances than worktable; But the scale recurrent interval of reality PI become than short moment of standard scale recurrent interval SPI to proofread and correct with the standard scale recurrent interval SPI mode that equates that becomes, therefore can make the fltting speed of slow worktable accelerate about 10%.
2) fltting speed of exposure worktable can be only improved, the shorteningization of time shutter can be sought with simple control with the correction of scale pulse.
3) can suppress the influence of the speed fluctuation of the drive system that worktable advances, expeditiously exposure base made public.
Have, the present invention is not limited to this embodiment again, and various distortion can be arranged, and the technological item that comprises in the technological thought of in the scope of patent request, putting down in writing all is an object of the present invention.
Description of reference numerals
1 exposure light source;
2 exposure optical systems;
5 linear scales;
7?CNC；
8 worktable propulsive mechanisms;
9 exposure bases;
PIab, PIbc, PIcd, PIde, PIef, PIfg scale pulse interval;
The recurrent interval of the scale pulse signal of SPI standard.
Claims (1)
1. maskless exposure device has:
Exposure light source, output illumination for exposure light;
Exposure optical system comprises spatial light modulator;
Exposure worktable also keeps exposure object thing and said exposure optical system in opposite directions, relatively moves with respect to said exposure optical system; And
The instrumentation unit carries out instrumentation with the scale pulse signal to the amount of movement of said retaining member,
Said exposure object thing is made public and describe through said exposure optical system, this maskless exposure device is characterised in that to possess:
Comparing unit is relatively followed recurrent interval of scale pulse signal of recurrent interval and the predefined standard of the scale pulse signal that moving of said exposure worktable obtain through said instrumentation unit;
Correcting unit; Comparative result according to said comparing unit; Under the said scale pulse interval of the obtaining situation shorter, regularly become the output mode regularly in the scale recurrent interval of said standard with the output of this scale pulse that shortens and proofread and correct than scale recurrent interval of said standard; And
Setup unit, with the correction through said correcting unit, the pattern switch pulse of said spatial light modulator becomes at interval to be described data and passes on above mode of time and set.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010219279A JP2012073495A (en) | 2010-09-29 | 2010-09-29 | Maskless exposure method and device |
| JP2010-219279 | 2010-09-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202306138U true CN202306138U (en) | 2012-07-04 |
Family
ID=46169708
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011203678174U Expired - Lifetime CN202306138U (en) | 2010-09-29 | 2011-09-29 | Maskless exposure device |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2012073495A (en) |
| CN (1) | CN202306138U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104977814A (en) * | 2015-06-26 | 2015-10-14 | 吉林大学 | Exposure switching and exposure strength controlling device for laser processing, laser processing equipment, and laser processing control method |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109445253B (en) * | 2018-12-25 | 2021-03-05 | 合肥芯碁微电子装备股份有限公司 | Rapid scanning exposure method based on DMD leveling state |
-
2010
- 2010-09-29 JP JP2010219279A patent/JP2012073495A/en not_active Withdrawn
-
2011
- 2011-09-29 CN CN2011203678174U patent/CN202306138U/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104977814A (en) * | 2015-06-26 | 2015-10-14 | 吉林大学 | Exposure switching and exposure strength controlling device for laser processing, laser processing equipment, and laser processing control method |
| CN104977814B (en) * | 2015-06-26 | 2017-07-21 | 吉林大学 | For the exposure switch and the control device of exposure intensity of Laser Processing, laser process equipment, Laser Processing control method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012073495A (en) | 2012-04-12 |
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Owner name: VIA MECHANICS LTD. Free format text: FORMER NAME: HITACHI VIA MACHINERY CO., LTD. |
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| CP01 | Change in the name or title of a patent holder |
Address after: Kanagawa Patentee after: Via Mechanics Ltd. Address before: Kanagawa Patentee before: Hitachi VIA Machinery Co., Ltd. |
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| CP01 | Change in the name or title of a patent holder | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20180507 Address after: Tokyo, Japan, Japan Patentee after: Adrian Engineering Technology Co. Ltd. Address before: Kanagawa Patentee before: Via Mechanics Ltd. |
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