CN102591159B - Optical machining system and method - Google Patents

Optical machining system and method Download PDF

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Publication number
CN102591159B
CN102591159B CN 201210076397 CN201210076397A CN102591159B CN 102591159 B CN102591159 B CN 102591159B CN 201210076397 CN201210076397 CN 201210076397 CN 201210076397 A CN201210076397 A CN 201210076397A CN 102591159 B CN102591159 B CN 102591159B
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optics
processing
motion
motion shaft
control territory
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CN102591159A (en
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胡进
浦东林
陈林森
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Suzhou University
SVG Tech Group Co Ltd
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Svg Optronics Co ltd
Suzhou University
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Abstract

The invention discloses an optical machining system. The system comprises a machining platform, an optical projection lens, an optical template, a central control system, a position compensation system and a light source, wherein the position compensation system comprises a position detection system, a spatial light modulator, a position signal processing module and a deviation screening module. By the optical processing system, stepping movement of a first moving shaft and scanning movement of a second moving shaft are realized by the processing platform, scanning movement of a third moving shaft is realized by the optical template, an exposure position in the second moving shaft direction is dynamically compensated by the spatial light modulator, and two scanning shafts, namely the second moving shaft and the third moving shaft are accurately synchronized at a high speed, so that three-dimensional processing can be realized in a two-shaft scanning and one shaft stepping mode, and the processing efficiency and the processing precision of the optical processing system are greatly improved.

Description

Optics system of processing and method
Technical field
The present invention relates to a kind of optics system of processing and job operation, especially a kind of optics system of processing and job operation with position compensation function.
Background technology
Masterplate projection optics system of processing is a kind of by projecting light path, the optics masterplate is projected the system that exposes on certain zone of finished surface.
The optics masterplate refers to have the optical component of particular optical figure or particular optical structure.Can be transmission-type and reflective optic device the chromium plate mask of figure (as make), diffraction optical device (as binary optical devices such as transmission grating, phase boards), refractive element (as microlens array, Amici prism), can also be the spatial light modulator that shows arbitrary graphic, and their combination collocation.
Projecting light path is the optical system to optical processing such as the amplifying of the optical figuring structure of optics masterplate, miniature or spectral interferences.
Masterplate projection optics system of processing, simple and reliable for structure, low cost of manufacture, production efficiency height, be widely used in various fields, comprise semiconductor lithography, optical holography, 3-D display, anti-counterfeiting packing material, plate making, photocuring moulding, laser-induced thermal etching, LED patterned substrate and photon crystal structure making etc.In recent years, development along with the micro-optical device manufacturing technology, the application of novel optical masterplates such as high frequency phase grating and microlens array and projecting light path, make masterplate projection optics system of processing, have high graphics resolution, high-light-energy utilization factor and the long depth of focus, have excellent optics working ability.
Typically masterplate projection optics system of processing is X-Y two dimension system of processing, adopts the stepping processing mode.The profile of its optics masterplate is rectangle, and the exposure area that projects to finished surface through optical frames group micro also is rectangle.Workpiece is done the stepping of X-Y diaxon relative to the projection optics head and is moved, and the two dimension splicing by to the rectangle exposure area finally realizes large-area processing.Its typical case's representative is the step-by-step movement mask projection exposure machine (Step-and-Repeat Exposure System) for the optical semiconductor carving technology.
On the framework basis of above-mentioned two-dimentional system of processing, increase third dimension motion, be masterplate projection three-dimensional optics system of processing.The third dimension motion that increases can be the Z-direction lifting of the relative finished surface of optical projection lens, also can be the translation of the relative optical system of optics masterplate or rotation etc.Two-dimentional relatively system of processing, the dirigibility of three-dimensional system of processing and figure complicacy significantly strengthen.
Fig. 1 is the schematic diagram of typical masterplate projection three-dimensional optics system of processing.Wherein optics masterplate 101 is one-dimensional grating, and the figure 102 that its processing generates is called light variation image (Optical Variable Graph), has the interior grating angle of two-dimentional block distribution and the block information of totally three dimensions.Light variation image is the basis of optical holography and stereo display, is widely used in fields such as holographic false proof printing packaging.
On concrete movement control mode, in the development along with photoelectricity and control technology, for masterplate projection two-dimension optical system of processing more advanced processing mode one flight Exposure mode has appearred.Relative stepping Exposure mode, flight Exposure mode process velocity and positional precision significantly promote, and the figure homogeneity is also better.Simultaneously, the control system cost is higher, and technical difficulty is bigger.
Under the flight Exposure mode, light source carries out the ultrashort pulse exposure, platform stepping axle (X-axis) stepping line feed, and platform scanner axle (Y-axis) is lined by line scan.The motion of scan axis arrives the predetermined exposure position, triggers exposed pulse immediately.The scan axis continuous motion need not to pause in the process of delegation.
Because the exposure pulsewidth is generally extremely several milliseconds of tens nanoseconds, in the so short time, therefore the displacement of scan axis can not form ' smear ' much smaller than the optical resolution of system.Simultaneously, the flight exposure does not have mechanical position fixing process, and exposure position is triggered by electric-control system fully, so machining precision is high.
Adopt the flight Exposure mode must have following two key elements:
1, high-power short-pulse light source.Power must be enough big, could carry out the exposure of enough energy in the extremely short time shutter.Time shutter must be enough short, just can avoid ' smear '.
2, position signalling processing module.Exposed pulse is accurately triggered in position by scan axis.
Though flight exposure processing mode has above-mentioned plurality of advantages, but only be fit to be applied to peacekeeping two dimension system of processing usually, can implement but effect is little for three-dimensional and above system of processing, because in three dimension system, general maximum can only have a scan axis, and working (machining) efficiency is limited.Concrete reason is analyzed as follows.
The core content of flight Exposure mode is the automatically controlled triggering exposure of scan axis.Namely select certain kinematic axis as scan axis, scan axis is made uniform speed scanning line by line usually.On each row a plurality of predetermined exposure points (particular location depends on graphics processing) are arranged, when electric-control system detects scan axis and arrives these predetermined exposure point positions, trigger the series of pulses level, and then the trigger pulse light source exposes.
Obviously, substitute step motion with scanning motion and can significantly improve working (machining) efficiency and precision.Therefore, in a multidimensional system of processing, the number of stepping axle is more few more good, and the number of scan axis is The more the better.Actual conditions are that scan axis can only have one usually.Reason be two and above scan axis be difficult to realize the kinematic axis position synchronously.Analyzing examples is as follows:
Be example with diaxon X-Y, if need be to the exposing of four points (0,3), (1,5), (2,4) and (3,6), when X-axis scanning during through 0-1-2-3, be difficult to guarantee that Y-axis scanning also passes through 3-5-4-6 successively synchronously.And the scanning that can see Y-axis is not unidirectional, repeatedly turns back but exist, and obviously this has further strengthened the difficulty of motion control.Scan axis more than three, obviously more difficult synchronous.
According to above-mentioned analysis, in two-dimentional system of processing, implement the flight exposure, to select a kinematic axis usually and make scan axis, another kinematic axis is made step motion, forms the so-called processing mode of lining by line scan.
Implement the flight exposure in three-dimensional system of processing, also can only select a kinematic axis to make scan axis, all the other diaxons are as stepping.The processing mode of a scanning of this two steppings is compared three step-by-step systems, in working (machining) efficiency and precision bigger improvement is arranged.But itself working (machining) efficiency is still very low, and main cause is that the mode with two steppings covers certain working (finishing) area, and operational efficiency is very low.
Summary of the invention
In view of this, the present invention proposes a kind of optics system of processing and method.Utilize this optics system of processing and method, working (machining) efficiency and precision height.
To achieve these goals, the technical scheme that provides of the embodiment of the present application is as follows:
A kind of optics system of processing, comprise processing platform, optical projection lens, optics template, central control system and position compensation system, wherein, described processing platform is realized the scanning motion of step motion and the second motion shaft of first kinematic axis, the scanning motion of the firm and hard existing third motion shaft of described optical mode, described position compensation system comprises:
Position detecting system is for detection of the position of thing to be processed or optics template;
Spatial light modulator, it is for generation of a position control territory, this position control territory is projected to the optics template and behind the optical projection lens convergent-divergent, be positioned at the predetermined exposure district exposure on the thing to be processed surface on the processing platform, described spatial light modulator has the position compensation district, be positioned at described position control territory around, and active the resulting from this position compensation district in described position control territory;
The position signalling processing module, export first trigger pulse to spatial light modulator, be offset in described position compensation district to control described position control territory, when described position detecting system detects predetermined exposure district and position control territory produce a site error between the zone of thing to be processed surface projection, described position signalling processing module is controlled described spatial light modulator, and make described position control territory in the compensating basin, position, produce the skew of corresponding position, this position skew is satisfied described position control territory and is being projected to the optics template and behind the optical projection lens convergent-divergent, is reaching the predetermined exposure district;
Deviation screening module is judged whether described site error satisfies to impose a condition, and satisfies when imposing a condition in described site error, triggers exposed pulse and realizes exposure.
Preferably, in above-mentioned optics system of processing, described optics template is carried out rotary scanning.
Preferably, in above-mentioned optics system of processing, described deviation screening module is exported second trigger pulse, described second trigger pulse is identical with the sequential of first trigger pulse, the cycle of described second trigger pulse is M times of second trigger pulse width, and wherein, M is greater than 1.
Preferably, in above-mentioned optics system of processing, the rotation period of described optics template is the non-integral multiple of the first trigger pulse cycle.
Preferably, in above-mentioned optics system of processing, the rotation period of described optics template be the first trigger pulse cycle (N+1/M) doubly, wherein N is the integer more than or equal to 1.
Preferably, in above-mentioned optics system of processing, the motion of described position control territory in the compensating basin, position is equally spaced step motion.
The invention also discloses a kind of optics job operation, use above-mentioned optics system of processing, comprise step:
(1), processing platform scans along second motion shaft, the optics template is carried out scanning motion along third motion shaft;
(2), the predetermined exposure district arrives the precalculated position in the second motion shaft direction;
(3), position detecting system detects the predetermined exposure district and arrives the precalculated position in the second motion shaft direction, provide a position signalling to the position signalling processing module, offset movement is carried out in position control territory on the position signalling processing module control spatial light modulator in the compensating basin, position, the scanning motion of this offset movement and second motion shaft is synchronous, can be so that the position control territory is positioned at the predetermined exposure district all the time behind the optical projection lens convergent-divergent;
(4), the optics template is scanned up to the precalculated position, deviation screening module judges whether described site error satisfies and imposes a condition, and satisfies when imposing a condition in described site error, triggers exposed pulse and realizes exposure.
Preferably, in above-mentioned optics job operation, described impose a condition into: described site error smaller or equal to D, wherein, the sweep velocity * of D=second motion shaft (second trigger pulse the cycle/M).
The invention also discloses a kind of optics job operation, use above-mentioned optics system of processing, comprise step:
(1), processing platform scans along second motion shaft, the optics template is carried out scanning motion along third motion shaft;
(2), the predetermined exposure district arrives the precalculated position in the second motion shaft direction, and gradually out of position;
(3), the optics template moves to the precalculated position along third motion shaft;
(4), position detecting system detects predetermined exposure district and position control territory in the site error of zone on the second motion shaft direction of thing to be processed surface projection, and provides a position signalling to the position signalling processing module;
(5), the position signalling processing module is calculated this site error desired position side-play amount of compensation according to described position signalling, and the position control territory on the control spatial light modulator is offset in the compensating basin, make this position control territory behind the optical projection lens convergent-divergent, arrive the predetermined exposure district;
(6), after the position control territory skew, deviation screening module judges whether site error satisfies and imposes a condition that if site error satisfies when imposing a condition, the triggering exposed pulse exposes in the predetermined exposure district;
(7), if described site error does not satisfy when imposing a condition, return step (3).
Compared with prior art, beneficial effect of the present invention is: in the optics system of processing of the present invention, processing platform is realized the scanning motion of step motion and the second motion shaft of first kinematic axis, the scanning motion of the firm and hard existing third motion shaft of optical mode, by spatial light modulator the exposure position on the second motion shaft direction is carried out dynamic compensation, realized the accurate high-speed synchronous of these two scan axises of second motion shaft and third motion shaft, thereby can realize three-dimensional processing in the mode of " diaxon scanning, a stepping ", its working (machining) efficiency and machining precision significantly promote.Owing to be provided with deviation screening module, can further reduce error simultaneously, improve machining precision.
Description of drawings
In order to be illustrated more clearly in the embodiment of the invention or technical scheme of the prior art, to do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art below, apparently, accompanying drawing in describing below only is some embodiments of the present invention, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain other accompanying drawing according to these accompanying drawings.
Figure 1 shows that the principle schematic of template projection three-dimensional optics system of processing in the prior art;
Figure 2 shows that the structural representation of optics system of processing in the specific embodiment of the invention;
Figure 3 shows that the block diagram of position bucking-out system in the specific embodiment of the invention;
Fig. 4 A to 4B is depicted as the simple and easy synoptic diagram that map migration in the specific embodiment of the invention obtains position compensation;
Figure 5 shows that the process flow diagram of first kind of optics job operation in the specific embodiment of the invention;
Figure 6 shows that the process flow diagram of second kind of optics job operation in the specific embodiment of the invention;
Figure 7 shows that the synoptic diagram that utilizes first kind of optics job operation to realize position compensation in the specific embodiment of the invention;
Figure 8 shows that the synoptic diagram that utilizes second kind of optics job operation to realize position compensation in the specific embodiment of the invention.
Embodiment
The objective of the invention is to by in optical system, introducing spatial light modulator to the exposure position dynamic compensation of one of them scan axis, realized the accurate high-speed synchronous of two scan axises, thereby can realize three-dimensional processing in the mode of " diaxon scanning, a stepping ", significantly promote to realize process velocity and machining precision.
A further object of the present invention is to disclose a kind of optics system of processing and method, this method is by promoting the rotating speed of optics template, reduce its scan period, make each second motion shaft arrive the precalculated position to the time period of last exposure, the optics template is inswept predetermined exposure angle repeatedly, also be optics template acquisition multiexposure, multiple exposure opportunity, expose opportunity from the exposure that wherein filters out second motion shaft deviations minimum, can promote the exposure position precision of second motion shaft.
In order to make those skilled in the art person understand technical scheme among the application better, below in conjunction with the accompanying drawing in the embodiment of the present application, technical scheme in the embodiment of the present application is clearly and completely described, obviously, described embodiment only is the application's part embodiment, rather than whole embodiment.Based on the embodiment among the application, those of ordinary skills are not making the every other embodiment that obtains under the creative work prerequisite, all should belong to the scope of the application's protection.
In following examples, the optical projection lens fixed static, the scanning motion of the firm and hard present third motion shaft of optical mode, but in other embodiments, can be the scanning motion that optical projection lens carries out lift also, and the optics template be static.In other embodiments, the scanning motion of third motion shaft also can be by the realization that moves up and down of processing platform.
Join shown in Figure 2ly, optics system of processing 200 comprises processing platform 201, optical projection lens 202, optics template 203, central control system 204, position compensation system 205 and light source 206.Join shown in Figure 3ly, position compensation system 205 comprises position detecting system 2051, spatial light modulator 2052, position signalling processing module 2055 and deviation screening module 2056.
Processing platform 201 is X-Y diaxon processing platform, can realize the step motion of X-axis (first kinematic axis) and the scanning motion of Y-axis (second motion shaft).
Optical projection lens 202 can amplify the optical figuring structure of projection, optical processing such as miniature or spectral interference.
Optics template 203 is the optical components with particular optical figure or particular optical structure.Can be transmission-type and reflective optic device the chromium plate mask of figure (as make), diffraction optical device (as binary optical devices such as projection grating, phase boards) or refractive element (as microlens array, Amici prism).In the present embodiment, optics template 203 is provided with specific optical figuring, to determine the graphic structure in the exposure area.Simultaneously, 203 realizations of optics template are along the scanning motion of third motion shaft.Preferably, optics template 203 is carried out rotary scanning.In other embodiments, the scanning motion of optics template 203 can also be shuttle angle upset or along the translation motion of straight line.
Optics template 203 is in order to determine the graphic structure in the exposure area, and this graphic structure is for designing in advance on optics template 203.
Be easy to expect that in optics system of processing of the present invention, multiple a plurality of optics templates can be changed and be used alternatingly.
Central control system 204 in order to control processing platform 201 along the step motion of X-axis, processing platform 201 along Y-axis scanning motion and optics template 203 along the scanning motion of third motion shaft.
Position detecting system 2051 is for detection of the position of thing 207 to be processed or optics template 203.
In a kind of practical application, position detecting system 2051 comprises grating chi and grating reading head, the grating chi comprises the first kinematic axis grating chi, second motion shaft grating chi and third motion shaft grating chi, described grating reading head reads the position signalling of optical projection lens, thing to be processed or optics template, and sends a position signalling to position signalling processing module 2055.Particularly, the first kinematic axis grating chi is in order to detect the position coordinates of thing to be processed on first kinematic axis; Second motion shaft grating chi is in order to detect the position coordinates of thing to be processed on the second motion shaft direction; Angle or shift position that third motion shaft grating chi rotates in order to detection optical template or optical projection lens.
Optionally, the type of the position detecting system 2051 that the present invention was suitable for is not limited to the grating chi, also can be other types such as pulse code dish, laser interferometer, magnetic railings ruler.
Shown in ginseng Fig. 4 A-4B, spatial light modulator 2052, it is for generation of a position control territory 2053, this position control territory 2053 is projected to optics template 203 and behind optical projection lens 202 convergent-divergents, predetermined exposure district 2071 exposures that are being positioned at thing to be processed 207 surfaces on the processing platform 201, described spatial light modulator 2052 has position compensation district 2054, be positioned at described position control territory 2053 around, and described position control territory 2053 active resulting from this position compensation district 2054.
By changing shape and the position in the position control territory 2053 that shows on the spatial light modulator 2052, can control shape and the position of the exposure area that projects to the processing platform surface, for example profile size and the shape of exposure area.In actual applications, this position control territory 2053 is generally rectangle.
Spatial light modulator 2052 keeps independence with optics template 203, also is the not influence of graphic structure in 2052 pairs of exposure areas of spatial light modulator, and the not influence of the shape of 203 pairs of exposure areas of optics template and position.Spatial light modulator 2052 need not be fixed with particular location and the sequencing of optics template 203 in projecting light path, as long as satisfy above-mentioned independent condition.
Spatial light modulator 2052 can be preferably a kind of in digital micromirror elements, liquid crystal display device or silicon-based liquid crystal device.
Position signalling processing module 2055, export first trigger pulse to spatial light modulator 2052, be offset in described position compensation district 2054 to control described position control territory 2053, when position detecting system 2051 detects predetermined exposure district and position control territory 2053 produce a site error between the zone of thing to be processed surface projection, position signalling processing module 2055 control spatial light modulators 2052, and make position control territory 2053 in the compensating basin, position, produce the skew of corresponding position, position control territory after the skew is 2053 ' (ginseng Fig. 4 B), this position skew is satisfied position control territory 2053 and is being projected to optics template 203 and behind the optical projection lens convergent-divergent, is reaching predetermined exposure district 2071.Preferably, the motion of position control territory 2053 in compensating basin, position 2054 is equally spaced step motion.
Deviation screening module 2056, when it arrives the precalculated position in optics template 202, impose a condition in order to judge whether predetermined exposure district and position control territory 2053 site error between the zone of thing to be processed surface projection satisfies, satisfy when imposing a condition in site error, trigger exposed pulse and realize exposure.
Deviation screening module 2056 outputs second trigger pulse, second trigger pulse is identical with the sequential of first trigger pulse, and the cycle of second trigger pulse is M times of second trigger pulse width, and wherein, M is greater than 1.The rotation period of optics template 203 is the non-integral multiple of the first trigger pulse cycle.Further, the rotation period of optics template 203 be the first trigger pulse cycle (N+1/M) doubly, wherein N is the integer more than or equal to 1.
Position signalling processing module 2055 and deviation screening module 2056 preferably are integrated in the central control system 204.
Light source 206 is light-pulse generator, in order to realize the ultrashort pulse exposure.The power of light source 206 must be enough big, with in the extremely short time shutter, carries out the exposure of enough energy.Time shutter must be enough short, just can avoid ' smear '.In the optics system of processing of the present invention, when arriving the precalculated position, optics template 203 triggers exposure.
Utilize above-mentioned optics system of processing 200 to realize that the method for position compensation has two kinds: the compensation of (1) single step: namely when third motion shaft arrived the precalculated position, the site error of calculating second motion shaft also realized by the once skew of position control territory in the compensating basin; (2) " locking " compensation or multiple-step form compensation: namely when second motion shaft arrives the precalculated position, by position, position control territory and the second motion shaft simultaneous bias on the control spatial light modulator, make that in one sufficiently long period, the position control territory is through being locked in all the time in the predetermined exposure district behind the optical projection lens convergent-divergent.Thereby can wait for, trigger exposed pulse when third motion shaft arrives its precalculated position.
Join shown in Figure 5, first kind of job operation realization specific as follows:
(1), processing platform scans along second motion shaft, the optics template is carried out scanning motion along third motion shaft;
(2), the predetermined exposure district arrives the precalculated position in the second motion shaft direction, and gradually out of position;
(3), the optics template moves to the precalculated position along third motion shaft;
(4), position detecting system detects predetermined exposure district and position control territory in the site error of zone on the second motion shaft direction of thing to be processed surface projection, and provides a position signalling to the position signalling processing module;
(5), the position signalling processing module is calculated this site error desired position side-play amount of compensation according to described position signalling, and the position control territory on the control spatial light modulator is offset in the compensating basin, make this position control territory behind the optical projection lens convergent-divergent, arrive the predetermined exposure district;
(6), after the position control territory skew, deviation screening module judges whether site error satisfies and imposes a condition that if site error satisfies when imposing a condition, the triggering exposed pulse exposes in the predetermined exposure district;
(7), if described site error does not satisfy when imposing a condition, return step (3).
Join shown in Figure 6, second kind of job operation realization specific as follows:
(1), processing platform scans along second motion shaft, the optics template is carried out scanning motion along third motion shaft;
(2), the predetermined exposure district arrives the precalculated position in the second motion shaft direction;
(3), position detecting system detects the predetermined exposure district and arrives the precalculated position in the second motion shaft direction, provide a position signalling to the position signalling processing module, offset movement is carried out in position control territory on the position signalling processing module control spatial light modulator in the compensating basin, position, the scanning motion of this offset movement and second motion shaft is synchronous, can be so that the position control territory is positioned at the predetermined exposure district all the time behind the optical projection lens convergent-divergent;
(4), the optics template is scanned up to the precalculated position, deviation screening module judges whether described site error satisfies and imposes a condition, and satisfies when imposing a condition in described site error, triggers exposed pulse and realizes exposure.
In second kind of optics job operation, impose a condition into: site error smaller or equal to D, wherein, the sweep velocity * of D=second motion shaft (second trigger pulse the cycle/M).
In first kind of job operation, the required refreshing frequency of spatial light modulator 2052 is lower, but its steering logic is comparatively complicated.The skew step pitch of spatial light modulator 2052 is unfixing, obtains but need calculate according to site error.Its response time is therefore longer, is about several milliseconds.
In second kind of job operation, the required refreshing frequency of spatial light modulator 2052 is higher, but its skew step pitch fix, steering logic is simple, the response time is shorter, is about the hundreds of microsecond.
In two kinds of job operations, spatial light modulator modulator 2052 has a response time.Because corresponding given electric-control system, this response time is a fixed value, thereby is easy to compensation.So repeat no more in the technical scheme of the present invention.
In two kinds of job operations, the minimum value of the skew step pitch in position control territory 2053 is a pixel.
In order to further specify technical scheme of the present invention, below in conjunction with accompanying drawing the preferred embodiment of the invention is described, but should be appreciated that these describe just to further specifying the features and advantages of the present invention, rather than to the restriction of claim of the present invention.
Following implementation process is exemplary the giving an example of carrying out at above-mentioned first kind of job operation.
Join shown in Figure 7ly, X-axis is first kinematic axis, does step motion.Y-axis is second motion shaft, does scanning motion, the line scanning of corresponding processing platform 201.θ axle or template axles are third motion shaft, the rotation of corresponding optics masterplate.
Suppose that (X, Y θ) are (0,0,120) for the coordinate of exposure station.
In whole process, the rotation that remains a constant speed of θ axle is in the state of continuous high speed scanning.
At first, the X-axis step motion is to coordinate X=0.
Then, the scanning of Y-axis begin column, ginseng coordinate axis A, Y-axis arrives the precalculated position earlier, and along with the scanning forward of Y-axis, beginning is gradually out of position.The distance of 1 pixel of time interval among the figure between the neighbouring dotted line, this distance is the distance that is embodied on the spatial light modulator, that is, suppose that the Y-axis site error is 1 pixel, then the position control territory need corresponding on spatial light modulator 1 pixel of stepping can realize compensation.
Ginseng coordinate axis D, circles mark is represented exposure position, as can be seen from Figure, arrives the precalculated position to the time period of exposure in Y-axis, θ axle 3 times is through precalculated position (θ=120), and realizes exposure at the 3rd time.
Because the scan period of θ axle is not the integral multiple in the first trigger pulse cycle, so the Y-axis deviations of these 3 exposure correspondences on opportunity of θ axle and inequality.Wherein the Y-axis deviations minimum of the 3rd exposure correspondence on opportunity is the best opportunity.
Ginseng coordinate axis B and C, when the θ axle arrives the precalculated position at every turn, position detecting system detects predetermined exposure district and position control territory in the site error of zone on the second motion shaft direction of thing to be processed surface projection, and this position signalling passed to position signalling processing module 2055, position signalling processing module 2055 is calculated this site error desired position side-play amount of compensation according to position signalling, and the position control territory on the control spatial light modulator (SLM) 2052 is offset in the compensating basin, make this position control territory behind the optical projection lens convergent-divergent, arrive the predetermined exposure district, with the site error on the compensation Y direction, the site error ginseng coordinate axis C after the compensation.What coordinate axis B showed is the distance that the position control territory need be offset, and is unit with the pixel, and 1 pixel is least unit.
Coordinate axis E and F are respectively the sequential chart of first trigger pulse and second trigger pulse.
The screening that the θ axle exposes opportunity is finished automatically by electric-control system, can guarantee that the high speed of screening process is with accurate.Particularly, by circuit design, generate one tunnel synchronous " second trigger pulse " by " first trigger pulse ".Both sequential are identical, and unique difference is pulse width.The pulsewidth of " first trigger pulse " is very little, is generally for tens nanoseconds, is about hundreds of thousands/one of its recurrence interval, so only replaces with a line among the coordinate axis F.And the pulse width of " second trigger pulse " is bigger, is about M/one of second trigger pulse.
" θ axle trigger pulse " shown in the coordinate axis D and " deviation screening signal " carry out ' with ' computing, the most previous triggering exposure of gained effective impulse.Can be seen that by coordinate axis D and coordinate axis E opportunity is satisfied above-mentioned condition in the 3rd exposure of θ axle, the final triggering exposed.
The example of Fig. 7 is the exposure result of certain point, and more generally, the θ coordinate difference of exposure station, θ axle scan period difference, the Y-axis deviations minimum value that can filter out are also different.But, under the situation that first trigger pulse is fixed, if reasonably choose the θ axle scan period, then can be so that for any exposure station (the θ coordinate be any), a less Y-axis deviations that always can filter out.
Contrasted as can be known by coordinate axis C and figure coordinate axis E, the pulse width of " second trigger pulse " is more little, and the Y-axis deviations of the pulse correspondence that filters out is more little.But, if the pulse width of " second trigger pulse " is too little, then may filter out all trigger pulses of θ axle.When finally choosing, the pulse width of " second trigger pulse " should be recurrence interval/M.
Following implementation process is exemplary the giving an example of carrying out at above-mentioned second kind of job operation.
Join shown in Figure 8ly, X-axis is first kinematic axis, does step motion.Y-axis is second motion shaft, does scanning motion, the line scanning of corresponding processing platform 201.θ axle or template axles are third motion shaft, the rotation of corresponding optics masterplate.
Suppose that (X, Y θ) are (0,0,120) for the coordinate of exposure station.Can be seen by coordinate axis F and coordinate axis D, in Y-axis section locking time (time that the offset movement in position control territory and second motion shaft are synchronous), 3 inswept predetermined exposure angle 120 degree of θ axle are (though shown among the figure 4 times, but after the 3rd time is realized exposure, namely finish the locking time of Y-axis, the 4th does not exist in practice, and the technology of the present invention is understood at this place for convenience), also namely there is chance for exposure 3 times.Because the scan period of θ axle is not the integral multiple in the first trigger pulse cycle, so the Y-axis deviations of these 3 exposure correspondences on opportunity of θ axle and inequality.Wherein the Y-axis deviations minimum of the 3rd exposure correspondence on opportunity is the best opportunity.
" θ axle trigger pulse " shown in the coordinate axis D and " second trigger pulse " carry out ' with ' computing, the most previous triggering exposure of gained effective impulse.Can be seen that by coordinate axis D and coordinate axis E opportunity is satisfied above-mentioned condition in the 3rd exposure of θ axle, the final triggering exposed.
In sum, in the optics system of processing of the present invention, processing platform is realized the scanning motion of step motion and the second motion shaft of first kinematic axis, the scanning motion of the firm and hard existing third motion shaft of optical mode, by spatial light modulator the exposure position on the second motion shaft direction is carried out dynamic compensation, realized the accurate high-speed synchronous of these two scan axises of second motion shaft and third motion shaft, thereby can realize three-dimensional processing in the mode of " diaxon scanning, a stepping ", its working (machining) efficiency and machining precision significantly promote.Owing to be provided with deviation screening module, can further reduce error simultaneously, improve machining precision.
Above embodiment is only unrestricted in order to technical scheme of the present invention to be described, although with reference to preferred embodiment the present invention is had been described in detail, those of ordinary skill in the art is to be understood that, can make amendment or be equal to replacement technical scheme of the present invention, and not break away from the spirit and scope of technical solution of the present invention.

Claims (8)

1. optics system of processing, it is characterized in that: comprise processing platform, optical projection lens, optics template, central control system and position compensation system, wherein, described processing platform is realized the scanning motion of step motion and the second motion shaft of first kinematic axis, the scanning motion of the firm and hard existing third motion shaft of described optical mode, described optics template is carried out rotary scanning, and described position compensation system comprises:
Position detecting system is for detection of the position of thing to be processed or optics template;
Spatial light modulator, it is for generation of a position control territory, this position control territory is projected to the optics template and behind the optical projection lens convergent-divergent, be positioned at the predetermined exposure district exposure on the thing to be processed surface on the processing platform, described spatial light modulator has the position compensation district, be positioned at described position control territory around, and active the resulting from this position compensation district in described position control territory;
The position signalling processing module, export first trigger pulse to spatial light modulator, be offset in described position compensation district to control described position control territory, when described position detecting system detects predetermined exposure district and position control territory produce a site error between the zone of thing to be processed surface projection, described position signalling processing module is controlled described spatial light modulator, and make described position control territory in the compensating basin, position, produce the skew of corresponding position, this position skew is satisfied described position control territory and is being projected to the optics template and behind the optical projection lens convergent-divergent, is reaching the predetermined exposure district;
Deviation screening module is judged whether described site error satisfies to impose a condition, and satisfies when imposing a condition in described site error, triggers exposed pulse and realizes exposure.
2. optics system of processing according to claim 1, it is characterized in that: described deviation screening module is exported second trigger pulse, and described second trigger pulse is identical with the sequential of first trigger pulse, and the cycle of described second trigger pulse is M times of second trigger pulse width, wherein, M is greater than 1.
3. optics system of processing according to claim 2, it is characterized in that: the rotation period of described optics template is the non-integral multiple of the first trigger pulse cycle.
4. optics system of processing according to claim 3 is characterized in that: the rotation period of described optics template be the first trigger pulse cycle (N+1/M) doubly, wherein N is the integer more than or equal to 1.
5. optics system of processing according to claim 1, it is characterized in that: the motion of described position control territory in the compensating basin, position is equally spaced step motion.
6. optics job operation, right to use requires 2 to 4 any described optics systems of processing, it is characterized in that, comprises step:
(1), processing platform scans along second motion shaft, the optics template is carried out scanning motion along third motion shaft;
(2), the predetermined exposure district arrives the precalculated position in the second motion shaft direction;
(3), position detecting system detects the predetermined exposure district and arrives the precalculated position in the second motion shaft direction, provide a position signalling to the position signalling processing module, offset movement is carried out in position control territory on the position signalling processing module control spatial light modulator in the compensating basin, position, the scanning motion of this offset movement and second motion shaft is synchronous, can be so that the position control territory is positioned at the predetermined exposure district all the time behind the optical projection lens convergent-divergent;
(4), the optics template is scanned up to the precalculated position, deviation screening module judges whether described site error satisfies and imposes a condition, and satisfies when imposing a condition in described site error, triggers exposed pulse and realizes exposure.
7. optics job operation according to claim 6 is characterized in that: described impose a condition into: described site error smaller or equal to D, wherein, the sweep velocity * of D=second motion shaft (second trigger pulse the cycle/M).
8. optics job operation, right to use requires 1 described optics system of processing, it is characterized in that, comprises step:
(1), processing platform scans along second motion shaft, the optics template is carried out scanning motion along third motion shaft;
(2), the predetermined exposure district arrives the precalculated position in the second motion shaft direction, and gradually out of position;
(3), the optics template moves to the precalculated position along third motion shaft;
(4), position detecting system detects predetermined exposure district and position control territory in the site error of zone on the second motion shaft direction of thing to be processed surface projection, and provides a position signalling to the position signalling processing module;
(5), the position signalling processing module is calculated this site error desired position side-play amount of compensation according to described position signalling, and the position control territory on the control spatial light modulator is offset in the compensating basin, make this position control territory behind the optical projection lens convergent-divergent, arrive the predetermined exposure district;
(6), after the position control territory skew, deviation screening module judges whether site error satisfies and imposes a condition that if site error satisfies when imposing a condition, the triggering exposed pulse exposes in the predetermined exposure district;
(7), if described site error does not satisfy when imposing a condition, return step (3).
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CN102331687A (en) * 2011-10-21 2012-01-25 苏州大学 Step optical processing system and processing method

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