CN107797394A - A kind of new mask-free photolithography system and the method for lifting its sweep speed - Google Patents
A kind of new mask-free photolithography system and the method for lifting its sweep speed Download PDFInfo
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- CN107797394A CN107797394A CN201711217541.XA CN201711217541A CN107797394A CN 107797394 A CN107797394 A CN 107797394A CN 201711217541 A CN201711217541 A CN 201711217541A CN 107797394 A CN107797394 A CN 107797394A
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- module
- light source
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- exposure
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
Abstract
The invention discloses a kind of new mask-free photolithography system and the method for lifting its sweep speed, it is combined based on proposition pattern generator speed exposure scheme and light source pulse synchronous control technique on the basis of new mask-free photolithography system, on the one hand the limit velocity of pattern generator scanning is significantly improved by exposure of slipping a line, on the other hand the light source pulse drive signal triggering light source HF switch synchronous with the upset of pattern generator provided by using aligning module, and the lighting time according to setting control light source in a figure returing cycle, realize the positional precision and extreme scan speed of pattern generator Refresh Data.
Description
Technical field：
The invention belongs to mask-free photolithography exposure system technical field, more particularly to a kind of new mask-free photolithography system and lifting
The method of its sweep speed.
Background technology：
Photoetching technique is the ring in current semiconductor main flow surface manufacturing process technology, and it is used to form spy on the surface of the substrate
Determine the pattern image of structure.Mask-free photolithography technology is a branch of photoetching technique, relative to traditional mask lithography technology, nothing
Photomask need to additionally be prepared to expose as mother matrix dub, mother matrix is replaced using pattern generator.Directly utilize pattern generator
The consistent pattern image of design documentation is resulted from, and passes through optical projection technology projection exposure to the substrate table for scribbling photosensitive material
Face.
The general pattern generator of mask-free photolithography Technical comparing is mainly the spatial light modulator of reflective devices at present,
The pattern generator of this scheme is independently addressable and control pel array, and the array that system uses is rectangle
Domain, it is M row X N rows（Wherein M and N is integer and M>N）.The pattern generator should be similar DMD（American TI Company product）
And GLV（SLM companies of the U.S. invent, after purchased by Japanese screen）Space light modulation reflection device.No matter DMD or GLV, because
, there is limit toggle frequency in the timeliness problem filled for addressing of address and data, for example, TI companies produce at present without mask
Field of lithography applies wide 0.95 inch, pel array 1920x1080, and single pixel size is 10.8umx10.8um
DMD, its limit toggle frequency about 30KHZ, by taking 2um data precisions as an example, if using whole audience DMD its extreme scan speed will
Below 60mm/s is limited in, this can not meet industrial production demand.
In order to break through extreme scan speed, currently used mode is the following two kinds in the industry：
1st, the valid pixel number of the actual use of pattern generator in a scanning direction is reduced, although improving sweep speed,
In the scene of some high photosensitive energy requirements, because the limit for the limit luminous power that pattern generator itself unit area can be born
System, then can not again provide and do to obtain sweep speed.By taking 0.95 inch of DMD of above-mentioned TI companies as an example, only using 336 rows relative to complete
By can only transmit 30% or so energy.This will significantly limit the production capacity of high energy demand photosensitive material, be unfavorable for advising greatly
Mould produces.
2nd, the data segmentation precision of different accuracy is used in scanning direction and non-scan direction, pattern generator is reduced and is sweeping
The data segmentation precision on direction is retouched to lift sweep speed, it is this to sacrifice the data segmentation precision on scanning direction as generation
Valency, will cause on substrate vertical and horizontal lines inconsistent and scanning direction Line-width precision reduces, and be unfavorable for high-accuracy exposure technology.
The content of the invention：
In view of the above-mentioned problems, the technical problem to be solved in the present invention is to provide a kind of new mask-free photolithography system and lift it and sweep
The method for retouching speed.
A kind of new mask-free photolithography system of the present invention, including
Item number system, it is polygon comprising contoured no overlap for the different CAD vectors design document forms of input to be converted to
The intermediate data format of shape figure；
Exposure system, for drive and respectively with RIP modules, aligning module, master control module, motion platform module and right
Position module realizes two-way communication；
RIP modules, for expanding, offseting and rotating intermediate data format in real time, and band figure is converted into, and by band
Figure carries out Y direction stretchings, and the band dot pattern of rasterizing is then formed after rasterizing；
Data handling system, blocking, pattern generator, X directions for realizing band dot pattern stretch and figure hair
Raw device frame；
Aligning module, it is two-way with exposure system, data handling system, motion platform module and light source module for realizing
Data communicate；
Light source module group, for realizing the two-way communication with aligning module, master control module and energy rectification module, and it is illumination
It is the high power light source that optics group provides controllable stabilization；
Illumination is optics group, and whole figure can be covered for realizing that the high power light source for providing light source module group is transformed into
The area source of device valid pixel array；
Pattern generator, for independently addressable and control pel array；
Master control module, for realizing and exposure system, light source module group, energy rectification module and the automatic two-way for focusing on module
Letter；
Energy rectification module, it is that optics group and timing monitor projection lens module to photosensitive material for real time and on line monitoring illumination
Expect the light energy fluctuation on surface, realize that driving light source module group changes light power size and closed-loop control；
Projection lens module, it is made up of at least 5 optical lenses；
It is automatic to focus on module, for realizing that dragging projection lens module moves up in the side vertical with focal plane；
Motion platform module, for realizing the specified coordinate place of the uniform speed scanning high-speed motion under the driving of exposure system；
Contraposition module, by least one CCD or CMOS cameras, the projection imaging camera lens matched with CCD or CMOS cameras, one
To guide rail, a shaft coupling, a screw mandrel and one carry the servo motor of encoder or determine mover and grating scale composition for a pair.
A kind of method of lifting mask-free photolithography system sweep speed of the present invention, it is characterised in that：Comprise the following steps：
（1）Aligning module is used as input signal source using grating scale signal first；
（2）Based on this signal source, platform compensation data array is obtained by specific demarcation means；
（3）After obtaining platform compensation data array, graphics driver signal, the light source pulse driving letter of output pattern generator are adjusted
Number and pattern generator effective coverage selection signal；
（4）Pattern generator is divided into different blocks on scanning direction of principal axis；
（5）Figure generation sweep speed is adjusted to N times of fast mode, exposure of slipping a line is realized by different blocks（N speeds jump N-1 rows）
Pattern；
（6）The light source pulse drive signal triggering light source synchronous with the upset of pattern generator provided using aligning module is high
Frequency switchs；
（7）Lighting time of the setting control light source in a figure returing cycle, realize the position of pattern generator Refresh Data
Put precision and extreme scan speed..
Preferably, the grating scale signal source is typical square-wave signal source.
Preferably, the light source HF switch controls frequency in more than 50K.
Beneficial effect of the present invention：The present invention can break the refreshing frequency limit of pattern generator, realize higher production capacity, but become
The data resolution of scanning direction of principal axis is mutually added, line width and position control accuracy is reduced, at this moment can be carried using the present invention
And light source pulse synchronous control technique realize the exposure of the higher production capacity of realization while precision is ensured, perfection solves speed
The defects of scanning strip comes.
Brief description of the drawings：
For ease of explanation, the present invention is described in detail by following specific implementations and accompanying drawing.
Fig. 1 is the building-block of logic of the present invention.
Fig. 2 is that aligning module by signal handles logical schematic.
Fig. 3 is pattern generator sweep speed speed logic.
Embodiment：
To make the object, technical solutions and advantages of the present invention of greater clarity, below by the specific implementation shown in accompanying drawing
Example describes the present invention.However, it should be understood that these descriptions are merely illustrative, and it is not intended to limit the scope of the present invention.This
Outside, in the following description, the description to known features and technology is eliminated, to avoid unnecessarily obscuring idea of the invention.
A kind of new mask-free photolithography system of the present invention, including
Item number system, it is polygon comprising contoured no overlap for the different CAD vectors design document forms of input to be converted to
The intermediate data format of shape figure；
Exposure system, for drive and respectively with RIP modules, aligning module, master control module, motion platform module and right
Position module realizes two-way communication；
RIP modules, for expanding, offseting and rotating intermediate data format in real time, and band figure is converted into, and by band
Figure carries out Y direction stretchings, and the band dot pattern of rasterizing is then formed after rasterizing；
Data handling system, blocking, pattern generator, X directions for realizing band dot pattern stretch and figure hair
Raw device frame；
Aligning module, it is two-way with exposure system, data handling system, motion platform module and light source module for realizing
Data communicate；
Light source module group, for realizing the two-way communication with aligning module, master control module and energy rectification module, and it is illumination
It is the high power light source that optics group provides controllable stabilization；
Illumination is optics group, and whole figure can be covered for realizing that the high power light source for providing light source module group is transformed into
The area source of device valid pixel array；
Pattern generator, for independently addressable and control pel array；
Master control module, for realizing and exposure system, light source module group, energy rectification module and the automatic two-way for focusing on module
Letter；
Energy rectification module, it is that optics group and timing monitor projection lens module to photosensitive material for real time and on line monitoring illumination
Expect the light energy fluctuation on surface, realize that driving light source module group changes light power size and closed-loop control；
Projection lens module, it is made up of at least 5 optical lenses；
It is automatic to focus on module, for realizing that dragging projection lens module moves up in the side vertical with focal plane；
Motion platform module, for realizing the specified coordinate place of the uniform speed scanning high-speed motion under the driving of exposure system；
Contraposition module, by least one CCD or CMOS cameras, the projection imaging camera lens matched with CCD or CMOS cameras, one
To guide rail, a shaft coupling, a screw mandrel and one carry the servo motor of encoder or determine mover and grating scale composition for a pair.
Specifically, mask-free photolithography equipment of the invention includes item number system, exposure system, RIP modules, data processing system
System, aligning module, light source module group, illumination are optics group, pattern generator, master control module, energy rectification module, projection lens
Head mould group, module, motion platform module and contraposition module composition are focused on automatically, the system is by one or more sets digital light projections
Lens group forms, and is included in each digital light projection lens group and only comprising a pattern generator, light source module group, one
Individual illumination is optics group, a data handling system, a projection lens module and an automatic focusing module.
A kind of method of lifting mask-free photolithography system sweep speed of the present invention, it is characterised in that：Comprise the following steps：
（1）Aligning module is used as input signal source using grating scale signal first；
（2）Based on this signal source, platform compensation data array is obtained by specific demarcation means；
（3）After obtaining platform compensation data array, graphics driver signal, the light source pulse driving letter of output pattern generator are adjusted
Number and pattern generator effective coverage selection signal；
（4）Pattern generator is divided into different blocks on scanning direction of principal axis；
（5）Figure generation sweep speed is adjusted to N times of fast mode, exposure of slipping a line is realized by different blocks（N speeds jump N-1 rows）
Pattern；
（6）The light source pulse drive signal triggering light source synchronous with the upset of pattern generator provided using aligning module is high
Frequency switchs；
（7）Lighting time of the setting control light source in a figure returing cycle, realize the position of pattern generator Refresh Data
Put precision and extreme scan speed..
Specifically, Fig. 2 discloses the signal processing logic of aligning module, the aligning module that the present invention is carried with
Grating scale（Encoder）Signal 151 is used as input signal source, is combined based on this signal source and is obtained by specific demarcation means
Platform compensation data array（Mapping data）Adjust output pattern generator graphics driver signal 152, light source pulse driving
Signal 153 and pattern generator effective coverage selection signal 154.
In practical application, 151 grating scale signal sources are generally typical square-wave signal source, and produce one with each precision
Individual pulse signal, as shown in Fig. 2 155, because the machine error in platform running, grating scale monitoring point are answered with actual exposure
The systematic error that the platform caused by the problems such as disunity moves will have follow-up demarcation means demarcation to obtain platform compensation number
According to array（Mapping data）, at that time, will realize that platform compensation data array is applied to by changing the number of metering 155
Drop point of the graphical pixel point on substrate.It is right between the rising pulses of each pattern generator energizing signal as shown in figure 152
The Encoder signal pulse quantity answered has certain change.
In recent years with the lifting of LD and LED light source technology and photosensitive material susceptibility, script maskless photoetching machine technology
Bottleneck switch to the toggle frequency lower limit film speed of pattern generator by energy of light source deficiency, and pattern generator is as half
Speed of the conductor device due to being limited to its data filling（Pattern generator area is increasing, but Pixel Dimensions are increasingly
Small, filling data volume is increasing）, it is difficult to there is the lifting of matter.In order to break through the speed limit of pattern generator its data filling
System, it can routinely use and use smaller pattern generator effective area, this can effectively shorten the time of data filling, but because
The energy limit problem that pattern generator surface unit area is born can greatly reduce energy utilization efficiency.It is also a kind of more to have
The scheme of effect is reduces the data precision of scanning direction, i.e., displacement accuracy reduces corresponding to pattern generator Refresh Data, but this
The Line-width precision of scanning direction will be influenceed, it is inadvisable so as to easily cause the difference of vertical and horizontal lines.
The present invention is directed to problem above, proposes pattern generator speed exposure scheme（As shown in Figure 3）And light source pulse is same
Step control technology is combined, and on the one hand passes through exposure of slipping a line（N speeds jump N-1 rows）Pattern can significantly improve pattern generator
The limit velocity of scanning, the light source pulse drive signal 153 on the other hand provided by using aligning module can be with figure
The upset of generator synchronously triggers light source HF switch（General switching control frequency is in more than 50K, and the state closed not is given
The driving power of light source is zero, but the low-power consumption output state more than device threshold is in as shown in 153）, and according to setting
Control lighting time of the light source in a figure returing cycle（Pattern Length in as shown in Figure 2 153）, so just
It compatible can realize the positional precision and extreme scan speed of pattern generator Refresh Data.Meanwhile because the pulse of light source should
With relative to continuous light application, more than 80% light power can be lifted.
Fig. 3 be figure occur sweep speed speed logic, as illustrated, by by pattern generator scanning direction of principal axis on
Different blocks is divided into, such as 184,185 and 186 blocks different as on same number generator, is realized and slipped a line using different masses
Exposure, so as to break the refreshing frequency limit of pattern generator itself, realizes that the speed of sweep speed is multiplied.As schemed
Show, in 1 times of fast mode, only use in pattern generator 184 pieces, then often expose a line and refresh a pattern generator projection
Data；In 2 times of fast modes, using 184 and 185 pieces in pattern generator, at that time, there will be 184 pieces to be responsible for exposure from bottom to top
1,3,5 rows, 185 pieces are responsible for 2,4,6 rows of exposure, therefore increasing is twice by the refreshing frequency interval of pattern generator, so as to real
Sweep speed adds one times under now same pattern generator refreshing frequency, improves production capacity；Equally in 3 times of fast modes
Under, using 184 in pattern generator, 185 and 186 pieces, at that time, will there are 184 pieces to be responsible for exposure 1,4 rows from bottom to top, 185
Block is responsible for exposure 2,5 rows, will have 186 to be responsible for 3,6 rows of exposure, therefore the refreshing frequency interval of pattern generator will increase 2 times, from
And realize that sweep speed adds 2 times under same pattern generator refreshing frequency.
Above scheme, the refreshing frequency limit of pattern generator can be broken, realize higher production capacity, but in a disguised form add scanning
The data resolution of direction of principal axis, line width and position control accuracy are reduced, the light source pulse that this patent at this moment can be used to refer to
Synchronous control technique realizes the exposure that higher production capacity is realized while precision is ensured, perfection solve speed scanning strip come it is scarce
Fall into.
The general principle and principal character and advantages of the present invention of the present invention has been shown and described above.The technology of the industry
Personnel are it should be appreciated that the present invention is not limited to the above embodiments, and the simply explanation described in above-described embodiment and specification is originally
The principle of invention, without departing from the spirit and scope of the present invention, various changes and modifications of the present invention are possible, these changes
Change and improvement all fall within the protetion scope of the claimed invention.The claimed scope of the invention by appended claims and its
Equivalent thereof.
Claims (4)
- A kind of 1. new mask-free photolithography system, it is characterised in that：IncludingItem number system, it is polygon comprising contoured no overlap for the different CAD vectors design document forms of input to be converted to The intermediate data format of shape figure；Exposure system, for drive and respectively with RIP modules, aligning module, master control module, motion platform module and right Position module realizes two-way communication；RIP modules, for expanding, offseting and rotating intermediate data format in real time, and band figure is converted into, and by band Figure carries out Y direction stretchings, and the band dot pattern of rasterizing is then formed after rasterizing；Data handling system, blocking, pattern generator, X directions for realizing band dot pattern stretch and figure hair Raw device frame；Aligning module, it is two-way with exposure system, data handling system, motion platform module and light source module for realizing Data communicate；Light source module group, for realizing the two-way communication with aligning module, master control module and energy rectification module, and it is illumination It is the high power light source that optics group provides controllable stabilization；Illumination is optics group, and whole figure can be covered for realizing that the high power light source for providing light source module group is transformed into The area source of device valid pixel array；Pattern generator, for independently addressable and control pel array；Master control module, for realizing and exposure system, light source module group, energy rectification module and the automatic two-way for focusing on module Letter；Energy rectification module, it is that optics group and timing monitor projection lens module to photosensitive material for real time and on line monitoring illumination Expect the light energy fluctuation on surface, realize that driving light source module group changes light power size and closed-loop control；Projection lens module, it is made up of at least 5 optical lenses；It is automatic to focus on module, for realizing that dragging projection lens module moves up in the side vertical with focal plane；Motion platform module, for realizing the specified coordinate place of the uniform speed scanning high-speed motion under the driving of exposure system；Contraposition module, the projection imaging camera lens matched by least one camera, one with camera, a pair of guide rails, a shaft coupling, One screw mandrel and a servo motor for carrying encoder determine mover and grating scale composition for a pair.
- A kind of 2. method for lifting mask-free photolithography system sweep speed, it is characterised in that：Comprise the following steps：（1）Aligning module is used as input signal source using grating scale signal first；（2）Based on this signal source, platform compensation data array is obtained by specific demarcation means；（3）After obtaining platform compensation data array, graphics driver signal, the light source pulse driving letter of output pattern generator are adjusted Number and pattern generator effective coverage selection signal；（4）Pattern generator is divided into different blocks on scanning direction of principal axis；（5）Figure generation sweep speed is adjusted to N times of fast mode, exposure of slipping a line is realized by different blocks（N speeds jump N-1 rows） Pattern；（6）The light source pulse drive signal triggering light source synchronous with the upset of pattern generator provided using aligning module is high Frequency switchs；（7）Lighting time of the setting control light source in a figure returing cycle, realize the position of pattern generator Refresh Data Put precision and extreme scan speed.
- A kind of 3. method for lifting mask-free photolithography system sweep speed according to claim 2, it is characterised in that：It is described Grating scale signal source is typical square-wave signal source.
- A kind of 4. method for lifting mask-free photolithography system sweep speed according to claim 2, it is characterised in that：It is described Light source HF switch controls frequency in more than 50K.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113960887A (en) * | 2021-01-05 | 2022-01-21 | 苏州源卓光电科技有限公司 | Scanning exposure method of direct-writing type photoetching machine |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107561876A (en) * | 2017-10-19 | 2018-01-09 | 苏州源卓光电科技有限公司 | A kind of new mask-free photolithography system and its technological process |
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| CN107561876A (en) * | 2017-10-19 | 2018-01-09 | 苏州源卓光电科技有限公司 | A kind of new mask-free photolithography system and its technological process |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113960887A (en) * | 2021-01-05 | 2022-01-21 | 苏州源卓光电科技有限公司 | Scanning exposure method of direct-writing type photoetching machine |
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| CB02 | Change of applicant information |
Address after: 215000 Room 102, building C5, Ting LAN lane, Suzhou Industrial Park, Jiangsu, China, 192 Applicant after: Suzhou source photoelectric technology Co., Ltd. Address before: 215166 Taihe business center, room 2013, Sun Wu Road, Wuzhong District, Suzhou, Jiangsu, A1103 Applicant before: Suzhou source photoelectric technology Co., Ltd. |
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