CN108062008A - A kind of laser direct-writing exposure machine without stepping axis - Google Patents
A kind of laser direct-writing exposure machine without stepping axis Download PDFInfo
- Publication number
- CN108062008A CN108062008A CN201610973718.8A CN201610973718A CN108062008A CN 108062008 A CN108062008 A CN 108062008A CN 201610973718 A CN201610973718 A CN 201610973718A CN 108062008 A CN108062008 A CN 108062008A
- Authority
- CN
- China
- Prior art keywords
- light
- optical system
- laser direct
- exposure machine
- gantry structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
Abstract
The present invention relates to laser explosure technologies, and in particular to a kind of laser direct-writing exposure machine without stepping axis.In the prior art, laser direct-writing exposure machine is progressively scanned by a scan axis, while there are one stepping platform is matched, the work efficiency of this mode has to be hoisted.Multigroup optical system and light-source system are had multigroup fixation arranged side by side to be suspended on gantry structure by the present invention, and optical system covers the width of scanning platform, when these optical systems work at the same time on gantry structure, scanning platform need to only do once axial scanning motion under gantry structure, the exposure task of full page figure can be completed, the work efficiency of exposure is greatly improved, simplifies the structure of equipment.In addition, the present invention is also mounted with a beam splitting system under the DMD of optical system, individual digit micro-mirror device is exponentially improved（DMD）The area covered, under equal conditions, the input amount of DMD and optical lens halves, and significantly reduces equipment cost.
Description
Technical field
The present invention relates to laser explosure technologies, and in particular to a kind of laser direct-writing exposure machine without stepping axis.
Background technology
Digital micro-mirror device (Digital Micromirror Device, abbreviation DMD) is controlled with digital voltage signal
Micromirror performs mechanical movement to realize the device of optical function.These micro mirrors all left floating, and can tilt 10-12 ° to both sides
Left and right opens and closes two kinds of working conditions so as to may make up.In order to obtain different brightness, micro mirror unblank and the rate disconnected
It can also change, handy thousands of a micro mirror elements during work.
In the laser direct-write photoetching field that semiconductor and PCB are manufactured, using the scan exposure of the direct image technology of laser
Principle is as follows：Using the micromirror high-speed turnover ability of DMD, with reference to appropriate light source and projection optical system, when micromirror is
During ON, emergent light can project substrate, and when micromirror is OFF, emergent light will project light path, not have emergent light in substrate.It is logical
It crosses and continuously projects uniform light to DMD, while real-time, collective changes the on off state of micromirror array, reaches and is exposed on substrate
The purpose of different pattern.
At present, laser direct-writing exposure machine scan exposure process is：The scan axis of control platform at the uniform velocity moves, platform movement
The position signal fed back simultaneously to data processing module feedback position signal, data processing module according to platform, generates the position
Image be incident upon on DMD, DMD images the reflected beams to substrate complete the exposure work of the position；In this mode, once sweep
A strip scanning strip can be formed by retouching；After single time of each scan axis uniform speed scanning one, the stepping axis of platform acts a step, will
The region exposed on photosensitive material is removed under scan axis, by and then the part of exposure area moves on to and sweeps on photosensitive material
It retouches under axis, is ready for scan exposure next time, and so on, until photosensitive material completely exposure.
Actual needs the domain of scan exposure to be all much larger than the width of strip scanning strip, so needing Multiple-Scan.This
The mode of the single DMD of kind, stepping axis and scan axis cooperation Multiple-Scan, can cause production capacity low when large area is processed.In addition
During scan axis Multiple-Scan, high-precision joining between scanning strip is to the stability and equipment precision requirement of device systems
It is high.
The content of the invention
It is an object of the invention to provide a kind of laser direct-writing exposure machine without stepping axis, compared with the prior art,
This exposure machine only has scan axis, does not have stepping axis, and exposure efficiency can be substantially improved.
In order to reach above-mentioned technical purpose, the technical scheme is that：A kind of laser direct-writing without stepping axis exposes
Ray machine, including optical system, plateform system, light-source system, communication module, computer, data processing module and pedestal；Platform
System is mounted on pedestal, and plateform system is divided into gantry structure and scanning platform, the position of scanning platform be in gantry structure it
Under, and reciprocal axial scan action can be done under gantry structure；Computer and plateform system, communication module, data processing mould
Block is respectively connected with；Light-source system is made of light source control module and light source, and light source control module is connected with communication module；Light
System is connected with communication module；Optical system and light-source system are suspended on gantry structure；Optical system is by number
Micro-mirror device, level-one imaging system composition；The optical system and light-source system has multigroup fixation arranged side by side to be suspended on gantry
In structure, and optical system covers the width of scanning platform.
Preferably, a kind of optical system of above-mentioned laser direct-writing exposure machine without stepping axis further include beam splitting system with
And secondary imaging system, beam splitting system are mounted on the lower section of level-one imaging system, secondary imaging system is mounted under beam splitting system
Side.
Preferably, a kind of beam splitting system of above-mentioned laser direct-writing exposure machine without stepping axis is divided into left and right two, often
Branch is connected by a Y-axis light guiding prism with X axis light guiding prism to be formed；Also sequentially pacify the lower section of left and right two of beam splitting system
Equipped with dislocation fine tuning prism and optical path difference compensating prism.
Preferably, a kind of above-mentioned laser direct-writing exposure machine without stepping axis further includes an error correction module, institute
The error correction module stated is mounted on scanning platform and is connected with data processing module；
Preferably, a kind of data processing module of above-mentioned laser direct-writing exposure machine without stepping axis is by fpga chip and RAM
Storage unit and DLP processing units composition.
The technical effects of the invention are that：Due to having multigroup optical system and light-source system, fixation is suspended on gantry side by side
In structure, and optical system covers the width of scanning platform, when these optical systems work at the same time on gantry structure
When, scanning platform need to only do once axial scanning motion under gantry structure, you can complete whole scan exposure tasks.This
The design of sample is greatly improved the work efficiency of exposure, and compared with the prior art, the present invention does not set stepping platform, simplifies and sets
Standby structure.
Preferably, the present invention is mounted with a beam splitting system under DMD, by the reflected light on digital micro-mirror device
Divide to both sides, exponentially improve individual digit micro-mirror device（DMD）The area covered.Under equal conditions, needed for the present invention
The digital micro-mirror device wanted（DMD）Quantity there was only the half of the prior art.Due to significantly reducing digital micro-mirror device（DMD）
Usage amount, the complexity of system further reduced, also improved the stability of system operation；DMD input amounts halve,
Significantly reduce equipment cost.
Description of the drawings：
Fig. 1 is the structural diagram of the present invention；
Fig. 2 is the schematic block diagram of each component connection relation in preferred embodiment of the present invention；
Fig. 3 is the structure diagram of optical system in preferred embodiment of the present invention；
Fig. 4 is the dimensional structure diagram of beam splitting system in the present invention；
Fig. 5 is the schematic block diagram of each component connection relation in the present invention.
Specific embodiment：
The specific embodiment of the present invention is described in detail below in conjunction with attached drawing.1 and attached drawing 5 referring to the drawings, it is a kind of without
Have the laser direct-writing exposure machine of stepping axis, including optical system 100, plateform system 200, light-source system 300, communication module 400,
Computer 500, data processing module 600 and pedestal 800；Plateform system 200 is mounted on pedestal 800, and plateform system 200 divides
For gantry structure 210 and scanning platform 220, the position of scanning platform 220 is under gantry structure 210, and can be tied at gantry
Reciprocal axial scan action is done under structure 210；Computer 500 and plateform system 200, communication module 400, data processing module
600 are respectively connected with；Light-source system 300 is made of light source control module 310 and light source 320, light source control module 310 and communication
Module 400 is connected；Optical system 100 is connected with communication module 400；Optical system 100 and light-source system 300 are hung
On gantry structure 210；Optical system 100 is made of digital micro-mirror device 110, level-one imaging system 120；There is multigroup optical system
Fixation is suspended on gantry structure 210 side by side for system 100 and light-source system 300, and optical system 100 covers scanning platform
220 width.
A kind of laser direct-writing exposure machine without stepping axis provided by the present invention in actual use, light source first
320 send the light needed for exposure under the control of light source control module 310, and light is shipped at digital micro-mirror device 110, number
Image data is sent to digital micro-mirror device 110 by computer 500 and communication module 400 according to processing module 600, number is micro-
Lens device 110 forms exposure image in the control lower switch micro mirror array of data processing module 600, and by exposure image directive one
Grade imaging system 120；Exposure image is penetrated scanning platform 220 by level-one imaging system 120.Due to optical system 100 and light source
System 300 has multigroup fixation arranged side by side to be suspended on gantry structure 210, and optical system 100 covers the width of scanning platform 220
Direction is spent, when these optical systems 100 work at the same time on gantry structure 210, scanning platform 220 only need to be in gantry structure 210
Under do once axial scanning motion, you can complete whole scan exposure tasks.In exposure process, control computer 500
Control light-source system 300, plateform system 200, optical system（100）With data processing module 600, it is allowed to cooperate.So
Design, be greatly improved the work efficiency of exposing operation, compared with the prior art, the present invention does not set stepping platform, simplifies
The structure of equipment.
Since the width of scanning platform 220 is completely covered optical system 100, so need a fairly large number of light
System 100, in order to reduce the usage quantity of optical system 100, it is preferred that 2 and attached drawing 3 referring to the drawings, above-mentioned optical system
100 further include beam splitting system 130 and secondary imaging system 140, and beam splitting system 130 is mounted under level-one imaging system 120
Side, secondary imaging system 140 are mounted on 130 lower section of beam splitting system.Since beam splitting system 130 divides image two, stepping platform 210
On can be projected 2 exposure regions, compared with prior art, more exposure regions, the photographic department being carried on scanning platform 220
Part can be exposed by the two exposure regions.The opposite and prior art, at identical conditions, this preferred embodiment can be by optical system
100 usage quantity halves, and further simplifies the mechanism of equipment, while reduces equipment investment cost.
Preferably, beam splitting system 130 can realize that light two divides by prism arrangement, referring to the drawings 4, beam splitting system
130 points are left and right two, and every is made of a Y-axis light guiding prism 131 and the connection of X axis light guiding prism 132；Light splitting system
The lower section of left and right two of system 130 is also sequentially installed by have dislocation fine tuning prism 133 and optical path difference compensating prism 134.Beam splitting system 130
Light is carried out Y-axis deviation by Y-axis light guiding prism 131 on each, and the X axis in beam splitting system 130 each is guide-lighting
Light is carried out X axis deviation by prism 132, to achieve the purpose that divide light two.Dislocation fine tuning prism 133 finely tunes light in x
With the distance to misplace on y directions, optical path difference compensating prism 134 compensates two-part optical path difference.
Since the movement of plateform system 200 is there are error, actual exposure position and desired exposure position may result in not
It is unified, it is preferred that referring to the drawings 2, present invention additionally comprises an error correction module 700, error correction module 700 is mounted on and sweeps
It retouches on platform 220 and is connected with data processing module 600.Error correction module 700 scans for receiving on scanning platform 220
Accurate location information after site error is corrected, is then sent to data processing module 600 by the position signal of axis.
Preferably, data processing module 600 is by fpga chip 601 and ram memory cell 602 and DLP processing units 603
Composition；Fpga chip 601 is mainly used for data processing, and ram memory cell 602 is stored for data, and DLP processing units 603 drive
Dynamic digital micro-mirror device 110 performs image display.
It should be appreciated that the specific embodiments described herein are merely to illustrate and explain the present invention, it is not used to
The limitation present invention.All embodiments drawn based on the principle of the invention are within protection scope of the present invention.
Claims (5)
1. a kind of laser direct-writing exposure machine without stepping axis, including optical system（100）, plateform system（200）, light source system
System（300）, communication module（400）, computer（500）, data processing module（600）And pedestal（800）；Plateform system
（200）Mounted on pedestal（800）On, plateform system（200）It is divided into gantry structure（210）And scanning platform（220）, scanning platform
（220）Position be in gantry structure（210）Under, and can be in gantry structure（210）Under do reciprocal axial scan action；Institute
The computer stated（500）With plateform system（200）, communication module（400）, data processing module（600）It is respectively connected with；It is described
Light-source system（300）By light source control module（310）And light source（320）Composition, the light source control module（310）With leading to
Interrogate module（400）It is connected；The optical system（100）With communication module（400）It is connected；The optical system
（100）And light-source system（300）It is suspended on gantry structure（210）On；The optical system（100）It is filled by digital micro-mirror
It puts（110）, level-one imaging system（120）Composition；It is characterized in that：There is multigroup optical system（100）And light-source system（300）
Fixation is suspended on gantry structure side by side（210）On, and optical system（100）Cover scanning platform（220）Width.
2. a kind of laser direct-writing exposure machine without stepping axis according to claim 1, it is characterised in that：The light
System（100）Further include beam splitting system（130）And secondary imaging system（140）, beam splitting system（130）Mounted on level-one into
As system（120）Lower section, secondary imaging system（140）Mounted on beam splitting system（130）Lower section.
3. a kind of laser direct-writing exposure machine without stepping axis according to claim 2, it is characterised in that：Point
Photosystem（130）It is divided into left and right two, every by a Y-axis light guiding prism（131）With X axis light guiding prism（132）Even
Connect composition；The beam splitting system（130）Also sequentially installation has dislocation fine tuning prism the lower section of left and right two（133）And optical path difference
Compensating prism（134）.
4. a kind of laser direct-writing exposure machine without stepping axis according to claim 1 or claim 2, feature exist
In：Further include an error correction module（700）, the error correction module（700）Mounted on scanning platform（220）On simultaneously
With data processing module（600）It is connected.
5. a kind of laser direct-writing exposure machine without stepping axis according to claim 1 or claim 2, feature exist
In：The data processing module（600）By fpga chip（603）And ram memory cell（602）And DLP processing units
（601）Composition.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610973718.8A CN108062008A (en) | 2016-11-07 | 2016-11-07 | A kind of laser direct-writing exposure machine without stepping axis |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610973718.8A CN108062008A (en) | 2016-11-07 | 2016-11-07 | A kind of laser direct-writing exposure machine without stepping axis |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108062008A true CN108062008A (en) | 2018-05-22 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610973718.8A Pending CN108062008A (en) | 2016-11-07 | 2016-11-07 | A kind of laser direct-writing exposure machine without stepping axis |
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| Country | Link |
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| CN (1) | CN108062008A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111538215A (en) * | 2020-05-20 | 2020-08-14 | 领跃电子科技（珠海）有限公司 | Laser exposure processing device and implementation method thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004012899A (en) * | 2002-06-07 | 2004-01-15 | Fuji Photo Film Co Ltd | Aligner |
| TW200643401A (en) * | 2005-06-02 | 2006-12-16 | Favite Inc | Automatic optical test machine for determining the defect of color non-uniformity of panels |
| JP2007052214A (en) * | 2005-08-17 | 2007-03-01 | Nikon Corp | Scanning exposure apparatus and method for manufacturing microdevice |
| CN1932436A (en) * | 2006-09-30 | 2007-03-21 | 赵政康 | Moving gantry type optical coordinate measuring instrument |
| JP2012247711A (en) * | 2011-05-30 | 2012-12-13 | Orc Manufacturing Co Ltd | Exposure device |
| CN105954980A (en) * | 2016-07-20 | 2016-09-21 | 马颖鏖 | Ultraviolet exposure machine based on digital micromirror array and control method thereof |
-
2016
- 2016-11-07 CN CN201610973718.8A patent/CN108062008A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004012899A (en) * | 2002-06-07 | 2004-01-15 | Fuji Photo Film Co Ltd | Aligner |
| TW200643401A (en) * | 2005-06-02 | 2006-12-16 | Favite Inc | Automatic optical test machine for determining the defect of color non-uniformity of panels |
| JP2007052214A (en) * | 2005-08-17 | 2007-03-01 | Nikon Corp | Scanning exposure apparatus and method for manufacturing microdevice |
| CN1932436A (en) * | 2006-09-30 | 2007-03-21 | 赵政康 | Moving gantry type optical coordinate measuring instrument |
| JP2012247711A (en) * | 2011-05-30 | 2012-12-13 | Orc Manufacturing Co Ltd | Exposure device |
| CN105954980A (en) * | 2016-07-20 | 2016-09-21 | 马颖鏖 | Ultraviolet exposure machine based on digital micromirror array and control method thereof |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111538215A (en) * | 2020-05-20 | 2020-08-14 | 领跃电子科技（珠海）有限公司 | Laser exposure processing device and implementation method thereof |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20180522 |
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| WD01 | Invention patent application deemed withdrawn after publication |