CN202281901U - Device capable of reducing waste of photoresist during replacement - Google Patents
Device capable of reducing waste of photoresist during replacement Download PDFInfo
- Publication number
- CN202281901U CN202281901U CN2011203887413U CN201120388741U CN202281901U CN 202281901 U CN202281901 U CN 202281901U CN 2011203887413 U CN2011203887413 U CN 2011203887413U CN 201120388741 U CN201120388741 U CN 201120388741U CN 202281901 U CN202281901 U CN 202281901U
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- China
- Prior art keywords
- photoresist
- surge tank
- bottle
- pipeline
- utility
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Abstract
The utility model discloses a device capable of reducing the waste of photoresist during replacement. The photoresist is filled in a photoresist bottle; a nitrogen interface is formed at the bottle mouth of the photoresist bottle; the photoresist bottle is communicated with a buffering tank via a pipeline; and the buffering tank is a variable volume buffering tank. Since the variable volume buffering tank provided by the utility model replaces the conventional constant volume buffering tank, a liquid discharge valve is saved, the variable volume buffering tank is utilized to collect residual photoresist in the pipeline during the replacement of the photoresist, and further air in the pipeline is discharged, so as to avoid the waste of the photoresist.
Description
Technical field
The utility model relates to integrated circuit and makes the field, specifically belongs to a kind of device that photoresist is wasted when changing that reduces.
Background technology
When changing photoresist under the normal condition,, before replacing, can arrange the action of bubble, but remaining photoresist emits in also can be with pipeline in row's bubble, thereby cause the waste of photoresist in order to ensure there not being bubble in the pipeline.
Conventional device, as shown in Figure 1, comprise the photoresist bottle 1 that fills photoresist, the bottleneck of photoresist bottle 1 is equipped with nitrogen interface 4, and photoresist bottle 1 is communicated with the surge tank 2 of fixed volume through pipeline 5.Surge tank 2 is provided with the drain line 6 that connects factory's affair waste liquid pipeline, and this drain line 6 is provided with tapping valve 3.When using existing apparatus to arrange bubble; The nitrogen interface 4 of photoresist bottle 1 is connected with outside source nitrogen; Open the tapping valve 3 on the surge tank 2; Nitrogen pressure in residual photoresist in the pipeline 5 of connection photoresist bottle 1 and surge tank 2 and the bubble entering surge tank 2, enters through drain line 6 and tapping valve 3 in the waste liquid pipeline of factory's affair simultaneously.After the bubble emptying, close tapping valve and break off nitrogen.In the process of exhaust bubble, in order to make the bubble emptying in the pipeline, can the cull in the pipeline be abandoned, not only cause the photoresist waste, but also produce environmental issue.
The utility model content
The technical matters that the utility model will solve provides a kind of the reduce device that photoresist is wasted, the waste of the cull in the time of can avoiding changing photoresist in the pipeline and discharging when changing.
For solving the problems of the technologies described above; The device that the minimizing photoresist of the utility model is wasted when changing, said photoresist is loaded in the photoresist bottle, and the bottle mouth position of said photoresist bottle is provided with nitrogen interface; The photoresist bottle is communicated with surge tank through pipeline, and said surge tank is the variable displacement surge tank.
Further, said variable displacement surge tank comprises host buffer jar, inferior surge tank and is positioned at the piston of time surge tank that said host buffer jar communicates with time surge tank and isolates through piston.
The utility model uses the surge tank replacement existing fixed volume surge tank of variable volume; And saved draining valve; Utilize variable volume container to collect the cull of pipeline in the photoresist bottle exchange process earlier, the air in the discharge line again is to avoid the waste of photoresist.
Description of drawings
Below in conjunction with accompanying drawing and embodiment the utility model is done further detailed explanation:
Fig. 1 is a structural representation of changing photoresist exhaust bulb apparatus at present;
Fig. 2 is the structural representation of variable displacement surge tank in the utility model;
Fig. 3 is the synoptic diagram that utilizes the utility model exhaust bubble;
Fig. 4 utilizes the utility model to arrange the synoptic diagram of bubble;
Fig. 5 is the synoptic diagram of the photoresist bottle that more renews;
Fig. 6 makes pipeline be full of the synoptic diagram of photoresist behind the photoresist bottle that more renews.
Embodiment
The device that the minimizing photoresist of the utility model is wasted when changing; Said photoresist is loaded in the photoresist bottle 1; The bottle mouth position of said photoresist bottle 1 is provided with nitrogen interface 4, and photoresist bottle 1 is communicated with surge tank through pipeline 5, and said surge tank is a variable displacement surge tank 7.
As shown in Figure 2, said variable displacement surge tank 7 comprises host buffer jar 71, inferior surge tank 72 and is positioned at the piston 73 of time surge tank 72 that said host buffer jar 71 communicates with time surge tank 72.Host buffer jar 71 is made into one with time surge tank 72 when making, through piston 73 with two parts tank body spatial separation.
When changing photoresist, the nitrogen interface 4 of photoresist bottle 1 is connected with outside source nitrogen, and when nitrogen pressure, photoresist and the bubble of remnants in the pipeline 5 get into host buffer jar 71, and be as shown in Figure 3.When host buffer jar 71 is full of photoresist (or reaching certain pressure); Photoresist bottle 1 added nitrogen pressure is delivered to the pistons 73 of master, inferior surge tank 71,72 junctions; Promote piston 73 and outwards move, photoresist is got in time surge tank 72, thereby enlarged the volume of surge tank; As shown in Figure 4, the photoresist in photoresist bottle 1 gets into said variable volume surge tank fully.After the emptying of former photoresist bottle, stop pressurization, the disconnecting external source nitrogen.
As shown in Figure 5, change new photoresist bottle 1, at this moment, bubble concentrates on the top of host buffer jar 71.Piston 73 is inwardly moved, the bubble that is gathered in the surge tank top is pushed back photoresist bottle 1, make to no longer include bubble in the whole piece pipeline 5, be full of photoresist, as shown in Figure 6.In the process of whole replacing photoresist, the phenomenon of photoresist waste does not take place.
The utility model uses the surge tank of variable volume, replacement existing fixed volume surge tank, and saved draining valve; Collect the cull of pipeline in the photoresist bottle exchange process earlier, the air in the discharge line has been avoided the waste of photoresist again; Reduce the production cost of enterprise, and the protection environment.
More than through specific embodiment the utility model has been carried out detailed explanation, but these are not the restriction of formation to the utility model.Under the situation that does not break away from the utility model principle, those skilled in the art also can make many distortion and equivalent replacement to structure of variable displacement surge tank etc., and these also should be regarded as the protection domain of the utility model.
Claims (4)
1. one kind is reduced the device that photoresist is wasted when changing, and said photoresist is loaded in the photoresist bottle (1), and photoresist bottle (1) is communicated with surge tank through pipeline (5), and it is characterized in that: said surge tank is variable displacement surge tank (7).
2. the device that minimizing photoresist according to claim 1 is wasted when changing; It is characterized in that: said variable displacement surge tank (7) comprises host buffer jar (71), inferior surge tank (72) and is positioned at the piston (73) of time surge tank (72); Said host buffer jar (71) and time surge tank (72) communicate, and isolate through piston (73).
3. the device that minimizing photoresist according to claim 2 is wasted when changing is characterized in that: said host buffer jar (71) and time surge tank (72) are structure as a whole.
4. the device that is wasted when changing according to the minimizing photoresist shown in the claim 1, it is characterized in that: the bottle mouth position of said photoresist bottle (1) is provided with nitrogen interface (4).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203887413U CN202281901U (en) | 2011-10-13 | 2011-10-13 | Device capable of reducing waste of photoresist during replacement |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203887413U CN202281901U (en) | 2011-10-13 | 2011-10-13 | Device capable of reducing waste of photoresist during replacement |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202281901U true CN202281901U (en) | 2012-06-20 |
Family
ID=46228061
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011203887413U Expired - Fee Related CN202281901U (en) | 2011-10-13 | 2011-10-13 | Device capable of reducing waste of photoresist during replacement |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202281901U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103400785A (en) * | 2013-08-14 | 2013-11-20 | 上海华力微电子有限公司 | Conduit for photoresist bottle |
| CN105276344A (en) * | 2014-05-30 | 2016-01-27 | 盛美半导体设备（上海）有限公司 | Photoresist bottle holding device |
| CN113534610A (en) * | 2021-08-05 | 2021-10-22 | 宁波润华全芯微电子设备有限公司 | Photoresist air isolation system |
| CN114345644A (en) * | 2020-10-13 | 2022-04-15 | 中国科学院微电子研究所 | Photoresist conveying system |
| DE102014019561B4 (en) | 2014-03-13 | 2024-09-12 | Taiwan Semiconductor Manufacturing Co., Ltd. | SYSTEM AND METHOD FOR SUPPLYING AND DISPENSING BUBBLE-FREE PHOTOLITHOGRAPHIC CHEMICAL SOLUTIONS |
-
2011
- 2011-10-13 CN CN2011203887413U patent/CN202281901U/en not_active Expired - Fee Related
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103400785A (en) * | 2013-08-14 | 2013-11-20 | 上海华力微电子有限公司 | Conduit for photoresist bottle |
| CN103400785B (en) * | 2013-08-14 | 2015-10-21 | 上海华力微电子有限公司 | A kind of conduit for photoresist bottle |
| DE102014019561B4 (en) | 2014-03-13 | 2024-09-12 | Taiwan Semiconductor Manufacturing Co., Ltd. | SYSTEM AND METHOD FOR SUPPLYING AND DISPENSING BUBBLE-FREE PHOTOLITHOGRAPHIC CHEMICAL SOLUTIONS |
| CN105276344A (en) * | 2014-05-30 | 2016-01-27 | 盛美半导体设备（上海）有限公司 | Photoresist bottle holding device |
| CN105276344B (en) * | 2014-05-30 | 2019-02-01 | 盛美半导体设备（上海）有限公司 | Photoetching glue bottle holding unit |
| CN114345644A (en) * | 2020-10-13 | 2022-04-15 | 中国科学院微电子研究所 | Photoresist conveying system |
| CN114345644B (en) * | 2020-10-13 | 2023-10-20 | 中国科学院微电子研究所 | Photoresist conveying system |
| CN113534610A (en) * | 2021-08-05 | 2021-10-22 | 宁波润华全芯微电子设备有限公司 | Photoresist air isolation system |
| CN113534610B (en) * | 2021-08-05 | 2023-10-27 | 宁波润华全芯微电子设备有限公司 | Photoresist air isolation system |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: SHANGHAI HUAHONG GRACE SEMICONDUCTOR MANUFACTURING Free format text: FORMER OWNER: HUAHONG NEC ELECTRONICS CO LTD, SHANGHAI Effective date: 20131219 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 201206 PUDONG NEW AREA, SHANGHAI TO: 201203 PUDONG NEW AREA, SHANGHAI |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20131219 Address after: 201203 Shanghai city Zuchongzhi road Pudong New Area Zhangjiang hi tech Park No. 1399 Patentee after: Shanghai Huahong Grace Semiconductor Manufacturing Corporation Address before: 201206, Shanghai, Pudong New Area, Sichuan Road, No. 1188 Bridge Patentee before: Shanghai Huahong NEC Electronics Co., Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120620 Termination date: 20151013 |
|
| EXPY | Termination of patent right or utility model |