CN113534610A - Photoresist air isolation system - Google Patents
Photoresist air isolation system Download PDFInfo
- Publication number
- CN113534610A CN113534610A CN202110894431.7A CN202110894431A CN113534610A CN 113534610 A CN113534610 A CN 113534610A CN 202110894431 A CN202110894431 A CN 202110894431A CN 113534610 A CN113534610 A CN 113534610A
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- Prior art keywords
- pressure
- photoresist
- valve
- air
- isolation system
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- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 113
- 238000002955 isolation Methods 0.000 title claims abstract description 27
- 239000003292 glue Substances 0.000 claims abstract description 66
- 230000001105 regulatory effect Effects 0.000 claims abstract description 38
- 238000007599 discharging Methods 0.000 claims abstract description 32
- 239000011230 binding agent Substances 0.000 claims description 3
- 238000012423 maintenance Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 39
- 230000000694 effects Effects 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 230000008859 change Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
- B05C11/1007—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to condition of liquid or other fluent material
- B05C11/1013—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to condition of liquid or other fluent material responsive to flow or pressure of liquid or other fluent material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
- B05C11/1026—Valves
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Coating Apparatus (AREA)
Abstract
The invention discloses a photoresist air isolation system, which comprises: a gas supply device; a plurality of pressure regulating devices, the plurality of pressure regulating devices comprising: a glue discharging and pressure regulating device and a pressure maintaining device; each of the pressure adjusting devices includes: the gas supply device is sequentially communicated with the pressure reducing valve and the throttle valve, and the working use pressures of the pressure reducing valves of the pressure regulating devices are different; the valve island is provided with a plurality of first air inlets which are communicated with the pressure regulating device; and the photoresist storage device is provided with a second air inlet and a photoresist outlet, and the second air inlet is communicated with the valve island. The invention effectively solves the problem that the glue solution contacts with air when the glue bottle is replaced or the glue solution is reloaded.
Description
Technical Field
The invention relates to the field of semiconductor wafers, in particular to a photoresist air isolation system.
Background
At present, when packaging the photoresist or using the photoresist in a photoresist bottle, nitrogen pressure is often adopted for supplying the photoresist, or a high-viscosity photoresist pump is adopted for conveying the photoresist. For example, the photoresist is pressurized by flushing nitrogen gas at a suitable pressure into the photoresist bottle, thereby extruding the photoresist out of the photoresist bottle. However, in the prior art, there is a device for filling nitrogen gas into a glue bottle separately, and there are problems that the photoresist in the device cannot be used up sufficiently, there is residue, and the risk of air contact is easily generated in the process of replacing the glue bottle or reloading the glue solution, resulting in the change of the photoresist property.
Disclosure of Invention
Therefore, the embodiment of the invention provides a photoresist air isolation system, which effectively solves the problem that glue solution contacts air when a glue bottle is replaced or glue solution is reloaded.
The embodiment of the invention provides a photoresist air isolation system, which comprises: a gas supply device; a plurality of pressure regulating devices, the plurality of pressure regulating devices comprising: a glue discharging and pressure regulating device and a pressure maintaining device; each of the pressure adjusting devices includes: the gas supply device is sequentially communicated with the pressure reducing valve and the throttle valve, and the working use pressures of the pressure reducing valves of the pressure regulating devices are different; the valve island is provided with a plurality of first air inlets which are communicated with the pressure regulating device; and the photoresist storage device is provided with a second air inlet and a photoresist outlet, and the second air inlet is communicated with the valve island.
The technical effect achieved after the technical scheme is adopted is as follows: the gas supply device is used for supplying gas and pressurizing the photoresist so as to discharge the photoresist; the pressure reducing valve is used for adjusting pressure, and the throttle valve is used for adjusting flow, so that the outflow process of the photoresist is more stable; the working service pressure of the pressure reducing valve of the pressure adjusting devices is different, so that different pressurizing effects can be realized through switching pipelines: for example, when the photoresist is discharged, the valve island can switch the pipeline to the photoresist discharge pressure regulating device, so that the photoresist is extruded by air pressure; when the photoresist is reloaded, the valve island can switch the pipeline to the pressure maintaining device, so that the pressure in the photoresist storage device is maintained, and the phenomenon that external air enters the photoresist storage device from the photoresist outlet to cause the change of the photoresist property is avoided.
In one embodiment of the invention, the valve island is provided with an air outlet communicated with the second air inlet; the air outlet is communicated with any one of the first air inlets and can be switched among the first air inlets.
The technical effect achieved after the technical scheme is adopted is as follows: the air outlet of the valve island is used for exhausting air, and the valve island can be used for switching and connecting the air outlet to different first air inlets, so that the pressure reducing valves with different working use pressures are communicated, and different pressurization effects are achieved.
In one embodiment of the invention, the valve island comprises: a plurality of two-position three-way valves, each of which is provided with the air outlet and a plurality of the first air inlets; wherein, a plurality of the first air inlets include the binder removal air inlet, the pressurize air inlet.
The technical effect achieved after the technical scheme is adopted is as follows: the two-position three-way valve can enable the rubber discharging air inlet to be communicated with the air outlet, or enable the pressure maintaining air inlet to be communicated with the air outlet; it is a plurality of two-position three-way valve can improve work efficiency to it is a plurality of two-position three-way valve moves separately, can realize that the same moment is different two-position three-way valve adopts different conduction mode, carries out pressurize function and binder removal function promptly simultaneously.
In an embodiment of the present invention, the glue discharging and pressure regulating device includes: a first pressure reducing valve; the pressurizer includes: a second pressure reducing valve; the working pressure of the first pressure reducing valve is greater than the working pressure of the second pressure reducing valve.
The technical effect achieved after the technical scheme is adopted is as follows: the first pressure reducing valve can control the air pressure to be in a higher state when the photoresist discharging and pressure regulating device is opened, so that enough pressure can be provided to push photoresist to be discharged out of the photoresist storage device; the second pressure reducing valve can maintain the air pressure in a lower state when the pressure maintaining device is opened, so that the phenomenon that the property of the photoresist is changed because the outside air enters the photoresist storage device is avoided.
In one embodiment of the invention, the first pressure reducing valve works at a pressure of 0.1Mpa to 0.2 Mpa; and/or the working pressure of the second reducing valve is 0.005MPa to 0.01 MPa.
The technical effect achieved after the technical scheme is adopted is as follows: the first pressure reducing valve controls the air pressure to be 0.1-0.2 Mpa, namely more than or equal to atmospheric pressure, and can effectively discharge the photoresist in the photoresist storage device; the second pressure reducing valve controls the air pressure to be 0.005Mpa to 0.01Mpa, and can effectively maintain the pressure of the photoresist storage device.
In an embodiment of the present invention, the glue discharging and pressure regulating device further includes: a first throttle valve; the first throttle valve is communicated between the first reducing valve and the rubber discharging air inlet.
The technical effect achieved after the technical scheme is adopted is as follows: the valve island switches the pipeline to the glue discharging air inlet to start the glue discharging function; the gas passes through the first pressure reducing valve and the first throttle valve to push the photoresist to be discharged at an appropriate pressure and flow rate.
In one embodiment of the present invention, the pressure holding device further comprises: a second throttle valve and an exhaust valve; and the second pressure reducing valve is communicated with the second throttling valve, the exhaust valve and the pressure maintaining air inlet in sequence.
The technical effect achieved after the technical scheme is adopted is as follows: the valve island switches the pipeline to the pressure maintaining air inlet and starts the pressure maintaining function; the gas passes through the second pressure reducing valve and the second throttling valve, so that the pressure and the flow can be lower, the air pressure of the photoresist storage device is maintained, and air is prevented from entering the photoresist storage device; the discharge valve can discharge gas in the pipe when the pipeline is switched to the pressure maintaining function through the glue discharging function, so that the current air pressure is more stable.
In an embodiment of the invention, the photoresist storage device includes a plurality of glue bottles, and the second air inlet and the glue outlet are disposed in the glue bottles.
The technical effect achieved after the technical scheme is adopted is as follows: the photoresist air isolation system can simultaneously perform pressure maintaining or glue discharging on a plurality of glue bottles; on the basis that each glue bottle corresponds a two-position three-way valve, different glue bottles can perform different functions.
In an embodiment of the present invention, the glue bottle further includes a one-way valve and/or a pressure relief valve, which is disposed at the second air inlet.
The technical effect achieved after the technical scheme is adopted is as follows: the one-way valve can prevent the gas in the glue bottle from escaping from the second gas inlet; the pressure release valve can discharge part of gas in the rubber bottle when the two-position three-way valve is switched from the rubber discharge air inlet to the pressure maintaining air inlet, so that the air pressure in the rubber bottle is reduced.
In one embodiment of the present invention, the photoresist air isolation system further comprises: and the control system is connected with the valve island.
The technical effect achieved after the technical scheme is adopted is as follows: the control system can control the on-off of each two-position three-way valve in the valve island.
In summary, the above embodiments of the present application may have one or more of the following advantages or benefits: i) the photoresist air isolation system is provided with a pressure reducing valve and a throttle valve, the air pressure is regulated through the pressure reducing valve, and the flow is regulated through the throttle valve, so that the photoresist in the photoresist bottle is pressurized more stably by gas; ii) the photoresist air isolation system is provided with two pressure reducing valves with different working use pressures, the lower working use pressure can realize a pressure maintaining function, so that the photoresist property change caused by the fact that air enters a photoresist bottle when photoresist is reloaded is avoided, the higher working pressure can realize a photoresist discharging function, the photoresist is pressed out of the photoresist bottle, and the replacement of the photoresist bottle is facilitated; ii) the two-position three-way valves realize the switching of the pressure maintaining function and the glue discharging function, each two-position three-way valve corresponds to one glue bottle, so that the working efficiency of the photoresist air isolation system is improved, and the glue bottles work independently and can realize different functions, namely, part of the glue bottles perform the pressure maintaining function and part of the glue bottles perform the glue discharging function; iv) the exhaust valve and the pressure release valve can exhaust when the two-dimensional three-way valve is switched from the glue discharging air inlet to the pressure maintaining air inlet, so that the air pressure is reduced, and the whole air path is more.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
Fig. 1 is a schematic structural diagram of a photoresist air isolation system according to an embodiment of the present invention.
FIG. 2 is a piping diagram of the photoresist air isolation system of FIG. 1.
FIG. 3 is a schematic view of the photoresist storage device shown in FIG. 2.
Fig. 4 is a schematic structural view of the glue bottle in fig. 3.
Description of the main element symbols:
100 is a photoresist air isolation system; 110 is a gas supply device; 111 is a gas source; 112 is a second manual valve; 120 is a pressure regulating device; 120a is a pressure reducing valve; 120b is a throttle valve; 121 is a rubber discharge pressure regulating device; 121a is a first pressure reducing valve; 121b is a first throttle valve; 122 is a pressure maintaining device; 122a is a second pressure reducing valve; 122b is a second throttle valve; 122c is an exhaust valve; 130 is a valve island; 131 is a glue discharging air inlet; 132 is a pressure maintaining air inlet; numeral 133 denotes an air outlet; 134 is a two-position three-way valve; 140 is a photoresist storage device; 141 is a rubber bottle; 142 is a one-way valve; 143 is a second gas inlet; 144 is a glue outlet; 145 is a pressure release valve; 150 is a control system.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-2, a photoresist air isolation system 100 is provided for embodiments of the present invention, comprising: a gas supply means 110, a plurality of pressure adjusting means 120, a valve island 130, and a photoresist storage means 140. Wherein, the gas supply device 110, the pressure regulating device 120, the valve island 130 and the photoresist storage device 140 are communicated in sequence. A gas supply device 110 for supplying gas to apply a gas pressure to the photoresist in the photoresist storage device 140; the pressure regulating device 120 is used for regulating the pressure value and/or flow of the gas; the valve island 130 is used for controlling the conduction of the gas circuit; the photoresist storage device 140 is used for storing photoresist and is provided with a photoresist outlet 144.
In the present embodiment, each pressure adjusting device 120 includes, for example: a pressure reducing valve 120a and a throttle valve 120b, and the gas supply means 110 communicates with the pressure reducing valve 120a and the throttle valve 120b in this order. The pressure reducing valve 120a is used to adjust the pressure of the gas, the throttle valve 120b is used to adjust the flow rate of the gas, and the throttle valve 120b is disposed behind the pressure reducing valve 120a to make the pressure of the gas more stable.
On this basis, the pressure used for the operation of the pressure reducing valves 120a of the plurality of pressure adjusting devices 120 is different, so that the gas pressure values of the gas passing through the pressure reducing valves 120a are different. For example, the higher air pressure can extrude the residual photoresist in the photoresist storage device 140 out of the photoresist outlet 144, which facilitates replacement of the photoresist storage device 140; the lower gas pressure can keep the gas pressure in the photoresist storage device 140 at a stable value, so as to prevent the change of the photoresist properties caused by the external gas entering the photoresist storage device 140, such as oxygen, when the photoresist is refilled.
In a specific embodiment, the plurality of voltage regulating devices 120 includes, for example: a rubber discharge pressure regulating device 121 and a pressure maintaining device 122. The photoresist discharge pressure regulating device 121 is used for discharging photoresist; the pressure maintaining device 122 is used for maintaining the pressure inside the photoresist storage device 140. Correspondingly, the glue discharging pressure regulating device 121 is provided with a first pressure reducing valve 121a, the pressure maintaining device 122 is provided with a second pressure reducing valve 122a, and the working pressure of the first pressure reducing valve 121a is greater than that of the second pressure reducing valve 122 a.
Preferably, the pressure of the first and second pressure reducing valves 121a and 122a ranges, for example, from 0.005Mpa to 0.2 Mpa. The working pressure of the first pressure reducing valve 121a is 0.1Mpa to 0.2Mpa, i.e., greater than or equal to atmospheric pressure, so that the photoresist in the photoresist storage device 140 can be completely extruded from the photoresist outlet 144 under the action of the pressure. Further, the working pressure of the second pressure reducing valve 122a is 0.005Mpa to 0.01Mpa, for example, 0.005Mpa, so that the pressure of the gas after passing through the first pressure reducing valve 121a is much lower than the atmospheric pressure, and after the valve island 130 switches the pipeline from the photoresist discharging pressure regulating device 121 to the pressure maintaining device 122, the pressure in the photoresist storage device 140 is gradually reduced and stabilized, and is balanced with the external atmosphere, so that the external air does not enter the photoresist storage device 140 when the photoresist is reloaded.
In a specific embodiment, the valve island 130 includes a plurality of first air inlets, for example, and the first air inlets communicate with the pressure regulating device 120, and the valve island 130 controls the opening and closing of the plurality of first air inlets to switch the pipelines. For example, on the basis that the pressure regulating device 120 includes the rubber discharge pressure regulating device 121 and the pressure holding device 122, the number of the first air inlets is two, and the first air inlets include a rubber discharge air inlet 131 corresponding to the rubber discharge pressure regulating device 121 and a pressure holding air inlet 132 corresponding to the pressure holding device 122.
On the other hand, the glue discharge pressure adjusting device 121 includes, for example, a first throttle valve 121b provided after the first pressure reducing valve 121 a. Wherein, the first throttle valve 121b may be directly communicated with the glue discharging inlet 131.
On the other hand, the pressurizer 122 includes, for example, a second throttle valve 122b, and is provided after the second pressure reducing valve 122 a. The pressure maintaining device 122 may further include an exhaust valve 122c for exhausting after the valve island 130 switches the pipeline from the photoresist discharging pressure regulating device 121 to the pressure maintaining device 122, so as to quickly reduce the air pressure in the pipeline and prevent the photoresist from continuously discharging out of the photoresist storage device 140. Of course, the pressure maintaining device 122 may further include an air pressure sensor and a flow sensor for measuring the current air pressure and flow, so as to control the opening and closing of the exhaust valve 122c, so as to stabilize the air pressure in the pipeline.
Preferably, the first throttle valve 121b and the second throttle valve 122b are, for example, one-way throttle valves 120b, so that after the valve island 130 switches the pipeline from the glue discharging pressure regulating device 121 to the pressure maintaining device 122, the gas does not flow backwards because the gas pressure at the outlet of the throttle valves 120b is greater than the gas pressure at the inlet.
Preferably, the valve island 130 is provided with an air outlet 133, for example, and the photoresist storage device 140 is provided with a second air inlet 143, for example, the second air inlet 143 is communicated with the air outlet 133 of the valve island 130. The air outlet 133 communicates with the gel exhaust air inlet 131 or the pressure maintaining air inlet 132 in the valve island 130, and can be switched with each other.
Further, the photoresist air isolation system 100, for example, further includes a control system 150, wherein the control system 150 is connected to the valve island 130 for switching the communication between the air outlet 133 and the photoresist discharge air inlet 131, and the communication between the air outlet 133 and the pressure maintaining air inlet 132.
In one particular embodiment, the valve island 130 includes, for example: a plurality of two-position three-way valves 134, each two-position three-way valve 134 is provided with a glue discharging air inlet 131, a pressure maintaining air inlet 132 and an air outlet 133. Preferably, the two-position three-way valve 134 is, for example, a two-position three-way solenoid valve, so that the conducting manner of the two-position three-way valve 134 is controlled by the control system 150.
Accordingly, referring to fig. 3-4, the photoresist storage device 140 includes, for example, a plurality of glue bottles 141, each glue bottle 141 is provided with a second inlet 143 and a glue outlet 144, and the number of glue bottles 141 corresponds to the number of two-position three-way valves 134. The plurality of glue bottles 141 can simultaneously perform the glue discharging or pressure maintaining, so that the working efficiency of the photoresist air isolation system 100 can be improved.
Preferably, the outlet of the first throttle valve 121b of the glue discharging pressure regulating device 121 is divided into a plurality of first pipelines, for example, each of the first pipelines is communicated to the glue discharging inlet 131 of any one of the two-position three-way valves 134, that is, the number of the first pipelines corresponds to the number of the two-position three-way valves 134. Likewise, the outlet of the exhaust valve 122c of the pressurizer 122 is divided into, for example, a plurality of second lines each of which is connected to the holding pressure inlet port 132 of any one of the two-position three-way valves 134, that is, the number of the second lines corresponds to the number of the two-position three-way valves 134.
At this time, the two-position three-way valve 134 can be separately controlled by the control system 150, so that the pressure maintaining of any number of glue bottles 141 is realized, and the glue discharging of the rest glue bottles 141 is realized. For example, 4 to 10, for example, 6, can be set for each of the two-position three-way valve 134 and the glue bottle 141, which is not limited herein, wherein the glue discharging inlet 131 of a part of the two-position three-way valve 134 is communicated with the air outlet 133, and the pressure maintaining inlet 132 of the other two-position three-way valve 134 is communicated with the air outlet 133.
Furthermore, an electromagnetic valve or a first manual valve may be disposed on the first pipeline and the second pipeline, so as to control the on/off of the first pipeline and the second pipeline, and to stop the operation of part of the glue bottles 141.
Preferably, the glue bottle 141 further includes a check valve 142 disposed at the second air inlet 143, so that the air flow can only enter the glue bottle 141 from the second air inlet 143 and cannot flow out from the second air inlet 143, thereby preventing unstable air pressure in the glue bottle 141.
Preferably, the glue bottle 141 further includes a pressure relief valve 145, for example, provided in the second air inlet 143, for switching the two-position three-way valve 134 from the conduction between the glue discharging air inlet 131 and the air outlet 133 to the conduction between the pressure maintaining air inlet 132 and the air outlet 133, so that the pressure relief valve 145 can quickly discharge the excess air pressure in the glue bottle 141 and quickly bring the glue bottle 141 into the pressure maintaining state.
With continued reference to fig. 1-2, the gas supply 110 includes, for example, a gas source 111 and a second manual valve 112, wherein the gas source 111 delivers a stable gas, such as nitrogen, and the second manual valve 112 controls the switching of the gas supply 110. Of course, the second manual valve 112 may be replaced by an electromagnetic valve, and the on/off is controlled by the control system 150.
Finally, it should be noted that: the above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
Claims (10)
1. A photoresist air isolation system, comprising:
a gas supply device;
a plurality of pressure regulating devices, the plurality of pressure regulating devices comprising: a glue discharging and pressure regulating device and a pressure maintaining device; each of the pressure adjusting devices includes: the gas supply device is sequentially communicated with the pressure reducing valve and the throttle valve, and the working use pressures of the pressure reducing valves of the pressure regulating devices are different;
the valve island is provided with a plurality of first air inlets which are communicated with the pressure regulating device;
and the photoresist storage device is provided with a second air inlet and a photoresist outlet, and the second air inlet is communicated with the valve island.
2. The photoresist air isolation system of claim 1, wherein the valve island is provided with an air outlet in communication with the second air inlet;
the air outlet is communicated with any one of the first air inlets and can be switched among the first air inlets.
3. The photoresist air isolation system of claim 2, wherein the valve island comprises:
a plurality of two-position three-way valves, each of which is provided with the air outlet and a plurality of the first air inlets;
wherein, a plurality of the first air inlets include the binder removal air inlet, the pressurize air inlet.
4. The photoresist air isolation system of claim 3, wherein the photoresist stripping pressure regulator comprises: a first pressure reducing valve;
the pressurizer includes: a second pressure reducing valve;
the working pressure of the first pressure reducing valve is greater than the working pressure of the second pressure reducing valve.
5. The photoresist air isolation system of claim 4,
the working pressure of the first reducing valve is 0.1 to 0.2 Mpa;
and/or the working pressure of the second reducing valve is 0.005MPa to 0.01 MPa.
6. The photoresist air isolation system of claim 4, wherein the photoresist stripping pressure regulator further comprises: a first throttle valve;
the first throttle valve is communicated between the first reducing valve and the rubber discharging air inlet.
7. The photoresist air isolation system of claim 4, wherein the pressure maintenance device further comprises: a second throttle valve and an exhaust valve;
and the second pressure reducing valve is communicated with the second throttling valve, the exhaust valve and the pressure maintaining air inlet in sequence.
8. The photoresist air isolation system of claim 1, wherein the photoresist storage device comprises a plurality of glue bottles, and the second air inlet and the glue outlet are disposed in the glue bottles.
9. The photoresist air isolation system of claim 8, wherein the glue bottle further comprises a one-way valve and/or a pressure relief valve disposed at the second air inlet.
10. The photoresist air isolation system of any one of claims 1-9, further comprising:
and the control system is connected with the valve island.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110894431.7A CN113534610B (en) | 2021-08-05 | 2021-08-05 | Photoresist air isolation system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110894431.7A CN113534610B (en) | 2021-08-05 | 2021-08-05 | Photoresist air isolation system |
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| Publication Number | Publication Date |
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| CN113534610A true CN113534610A (en) | 2021-10-22 |
| CN113534610B CN113534610B (en) | 2023-10-27 |
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| CN202110894431.7A Active CN113534610B (en) | 2021-08-05 | 2021-08-05 | Photoresist air isolation system |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114273158A (en) * | 2021-12-16 | 2022-04-05 | 沈阳芯源微电子设备股份有限公司 | Glue supplementing device capable of automatically switching double glue bottles and glue supplementing method thereof |
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Cited By (2)
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| CN114273158A (en) * | 2021-12-16 | 2022-04-05 | 沈阳芯源微电子设备股份有限公司 | Glue supplementing device capable of automatically switching double glue bottles and glue supplementing method thereof |
| CN114273158B (en) * | 2021-12-16 | 2023-01-24 | 沈阳芯源微电子设备股份有限公司 | Glue supplementing device capable of automatically switching double glue bottles and glue supplementing method thereof |
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| Publication number | Publication date |
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| CN113534610B (en) | 2023-10-27 |
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