CN202246090U - Uniform heat extraction polycrystalline silicon reduction furnace base plate cooling structure - Google Patents

Uniform heat extraction polycrystalline silicon reduction furnace base plate cooling structure Download PDF

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Publication number
CN202246090U
CN202246090U CN2011202346186U CN201120234618U CN202246090U CN 202246090 U CN202246090 U CN 202246090U CN 2011202346186 U CN2011202346186 U CN 2011202346186U CN 201120234618 U CN201120234618 U CN 201120234618U CN 202246090 U CN202246090 U CN 202246090U
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China
Prior art keywords
chassis
reduction furnace
base plate
polycrystalline silicon
dividing plate
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Expired - Fee Related
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CN2011202346186U
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Chinese (zh)
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刘春江
黄哲庆
段连
袁希钢
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Tianjin University
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Tianjin University
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Abstract

The utility model discloses a uniform heat extraction polycrystalline silicon reduction furnace base plate cooling structure, which comprises a reduction furnace base plate upper bottom plate, a reduction furnace base plate lower bottom plate, a reduction furnace base plate middle clapboard, electrodes, a mixed air inlet, electrode sleeves, a plurality of honeycomb ducts, a plurality of base plate cooling water inlets, a base plate cooling water outlet, a base plate upper cavity, a base plate lower cavity and a base plate flange, wherein the reduction furnace base plate is partitioned into the base plate upper cavity and the base plate lower cavity by using the reduction furnace base plate middle clapboard; each electrode is provided with one electrode sleeve; and the electrode sleeves and the honeycomb ducts are directly welded on the reduction furnace base plate middle clapboard to communicate the base plate upper cavity with the base plate lower cavity. Due to the adoption of the uniform heat extraction polycrystalline silicon reduction furnace base plate cooling structure, the problems of high temperature of a central area and low temperature of an outer circumference in the conventional base plate structure are solved, the temperature distribution of the base plate is more uniform, the base plate structure is prevented from being deformed due to non-uniform temperature distribution, and safe production of a polycrystalline silicon reduction furnace is ensured.

Description

Even heat-obtaining formula polycrystalline silicon reducing furnace chassis cooling structure
Technical field
The utility model belongs to technical field of polysilicon production, and particularly Siemens Method is produced the polycrystalline silicon reducing furnace chassis of polysilicon; Relate to a kind of even heat-obtaining formula polycrystalline silicon reducing furnace chassis cooling structure.
Background introduction
The production of polysilicon corporate boss will adopt " improvement Siemens Method " both at home and abroad at present.The Production Flow Chart of this method is to utilize chlorine and hydrogen synthesising hydrogen (or outsourcing hydrogenchloride); Hydrogenchloride and silica flour be synthesizing trichlorosilane at a certain temperature; Then to the trichlorosilane rectification and purification; Behind the high-purity trichlorosilane and hydrogen proportional mixing after the purification, under certain temperature and pressure, feed in the polycrystalline silicon reducing furnace, generate polysilicon in the deposition reaction of the enterprising promoting the circulation of qi phase of energising high temperature silicon rod.Wherein trichlorosilane and hydrogen need react under 1080 ℃~1150 ℃ high temperature in the polycrystalline silicon reducing furnace, because internal reaction temperature is high, need cool off the chassis, to prevent the inefficacy of chassis temperature distortion and insulating material.In the prior art, the reduction furnace chassis all is a bilayer structure, and the centre is provided with simple helix or many spirals cooling channel.Like patent ZL200820154686.X a kind of structure of parallelly connected duplex flow-guiding channel is provided, patent 200920208194.9 provides a kind of structure of centrosymmetry duplex flow-guiding channel, and patent 200920208183.0 provides a kind of structure of centrosymmetry triple helical flow-guiding channel; These structures all are that entrance of cooling water is located at the chassis excircle; Cooling water outlet is arranged on center chassis, and water coolant flows to cooling water outlet along flow-guiding channel after getting into the chassis like this, and this heat-obtaining mode will cause the even property of the temperature distributing disproportionation on chassis very big; Make the center chassis regional temperature high; The excircle temperature is low, and this temperature difference is prone to cause the distortion of reduction furnace chassis structure, moreover along with the reduction furnace design develops to the maximization direction; This temperature difference will be more obvious, and visible this structure Design is very unreasonable.
Summary of the invention
The utility model provides a kind of even heat-obtaining formula polycrystalline silicon reducing furnace chassis cooling structure, has solved existing polycrystalline silicon reducing furnace chassis structure and has designed irrational problem.
The technical scheme of the utility model is following:
A kind of even heat-obtaining formula polycrystalline silicon reducing furnace chassis cooling structure comprises cavity under reduction furnace chassis upper plate, reduction furnace chassis lower shoe, reduction furnace chassis central dividing plate, electrode, inlet mouth, electrode sleeve, many thrust-augmenting nozzles, a plurality of chassis entrance of cooling water, chassis cooling water outlet, chassis flange, chassis upper plenum, the chassis; Its reduction furnace chassis upper plate, reduction furnace chassis central dividing plate, reduction furnace chassis lower shoe all are welded on the flange of chassis, and the chassis central dividing plate is positioned at flange middle, chassis.
An electrode sleeve is all arranged around each the root electrode on the reduction furnace chassis; Electrode sleeve is welded direct on the central dividing plate of reduction furnace chassis; 2mm~10mm annular space is arranged between electrode sleeve and the electrode, the slit of 2mm~10mm is arranged between electrode sleeve and reduction furnace chassis upper plate and the reduction furnace chassis lower shoe.
Reduction furnace chassis central dividing plate excircle is welded with 12~30 thrust-augmenting nozzles; The slit that 2mm~10mm is arranged between thrust-augmenting nozzle and reduction furnace chassis upper plate and the reduction furnace chassis lower shoe; The spacing of thrust-augmenting nozzle and chassis flange is 30mm~60mm, and is evenly distributed on the same circumference.6~12 chassis entrance of cooling water of reduction furnace chassis lower shoe uniform distribution, and be evenly distributed on the same circumference.1 chassis cooling water outlet of reduction furnace chassis central dividing plate centermost distribution.
Reduction furnace chassis upper plate and reduction furnace chassis central dividing plate have formed a chassis upper plenum, and the chassis upper plenum is connected with the chassis cooling water outlet; Reduction furnace chassis lower shoe and reduction furnace chassis central dividing plate have formed cavity under the chassis, and cavity is connected with the chassis entrance of cooling water under the chassis.
Compare with patent ZL200820154686.X, 200920208194.9,200920208183.0, the advantage that the utlity model has is:
At first the reduction furnace chassis is reduced the furnace hearth plate central dividing plate and separates; The chassis water coolant is earlier through cavity under the chassis; Get into the chassis upper plenum through annular space or thrust-augmenting nozzle again; This structure plays a kind of shock absorption to heat-eliminating medium mobile, in the time of can avoiding heat-eliminating medium just to get into the chassis cavity because the dead band of the local space that flow velocity causes enough soon, thus avoided the too high chassis structure distortion that causes of partial area temperature on chassis; Make the chassis temperature distribution more even, help the safety in production of reduction furnace;
Secondly this structure is that an electrode sleeve is installed around each root electrode; Because electrode is uniformly distributed on the chassis; Each position that can guarantee water coolant cavity of resorption from the chassis like this gets into the chassis epicoele, has avoided existing chassis structure central zone temperature high, the shortcoming that the excircle temperature is low; The temperature distribution that guarantees the chassis is more even, has avoided because of the even distortion that causes the reduction furnace chassis structure of reduction furnace chassis temperature distributing disproportionation.
Moreover, because electrode sleeve and chassis upper plate spacing are less, can guarantee water coolant so directly from the upper plate heat-obtaining on chassis, reduced the thermograde with chassis upper plate adjacent domain heat-eliminating medium, improved the heat-obtaining efficient of heat-eliminating medium.
Description of drawings
Fig. 1 is the distribution schematic diagram of the even heat-obtaining formula of the utility model patent polycrystalline silicon reducing furnace chassis cooling structure;
Fig. 2 is the distribution schematic diagram of the even heat-obtaining formula of the utility model patent polycrystalline silicon reducing furnace chassis cooling structure;
Fig. 3 is the front view of the even heat-obtaining formula of the utility model patent polycrystalline silicon reducing furnace chassis cooling structure;
Wherein: 1-polycrystalline silicon reducing furnace chassis; 2-reduction furnace chassis upper plate; 3-reduction furnace chassis central dividing plate; 4-reduction furnace chassis lower shoe; The 5-electrode; The 6-annular space; The 7-entrance of cooling water; The 8-mixed gas inlet; The 9-electrode sleeve; The 10-cooling water outlet; The 11-thrust-augmenting nozzle; 12-chassis flange; 13-chassis upper plenum; Cavity under the 14-chassis.
Embodiment
Below in conjunction with accompanying drawing and embodiment a kind of even heat-obtaining formula polycrystalline silicon reducing furnace chassis cooling structure that the utility model provides is done further explain.
Embodiment 1:
Even heat-obtaining formula polycrystalline silicon reducing furnace as shown in Figure 1 chassis cooling structure comprises: 1-polycrystalline silicon reducing furnace chassis; 2-reduction furnace chassis upper plate; 3-reduction furnace chassis central dividing plate; 4-reduction furnace chassis lower shoe; The 5-electrode; The 6-annular space; The 7-entrance of cooling water; The 8-mixed gas inlet; The 9-electrode sleeve; The 10-cooling water outlet; The 11-thrust-augmenting nozzle; 12-chassis flange; 13-chassis upper plenum; Cavity under the 14-chassis.Wherein reduction furnace chassis upper plate 2, reduction furnace chassis central dividing plate 3, reduction furnace chassis lower shoe 4 all are welded on the chassis flange 12; And reduction furnace chassis central dividing plate 3 is positioned at chassis flange 12 middles; Reduction furnace chassis upper plate 2 has formed a chassis upper plenum 13 with chassis central dividing plate 3, and reduction furnace chassis lower shoe and reduction furnace chassis central dividing plate have formed cavity 14 under the chassis; Around each root electrode 5 electrode sleeve 9 is arranged all, the annular space 6 of 10mm is arranged between electrode 5 and the electrode sleeve 9; Electrode sleeve 9 is welded direct on the central dividing plate of reduction furnace chassis; Reduction furnace chassis central dividing plate is welded with 30 thrust-augmenting nozzles, and the slit of 10mm is respectively arranged between thrust-augmenting nozzle and reduction furnace chassis upper plate and the reduction furnace chassis lower shoe, and 30 thrust-augmenting nozzles are evenly distributed on the same circumference, and with the spacing of chassis flange be 60mm; Entrance of cooling water 7 is welded direct on the reduction furnace chassis lower shoe 4, and with the chassis under cavity 14 be connected; Cooling water outlet 10 is welded direct on the reduction furnace chassis central dividing plate 3, and is connected with chassis upper plenum 13.
Embodiment 2:
Even heat-obtaining formula polycrystalline silicon reducing furnace as shown in Figure 2 chassis cooling structure comprises: 1-polycrystalline silicon reducing furnace chassis; 2-reduction furnace chassis upper plate; 3-reduction furnace chassis central dividing plate; 4-reduction furnace chassis lower shoe; The 5-electrode; The 6-annular space; The 7-entrance of cooling water; The 8-mixed gas inlet; The 9-electrode sleeve; The 10-cooling water outlet; The 11-thrust-augmenting nozzle; 12-chassis flange; 13-chassis upper plenum; Cavity under the 14-chassis.Wherein reduction furnace chassis upper plate 2, reduction furnace chassis central dividing plate 3, reduction furnace chassis lower shoe 4 all are welded on the chassis flange 12; And reduction furnace chassis central dividing plate 3 is positioned at chassis flange 12 middles; Reduction furnace chassis upper plate 2 has formed a chassis upper plenum 13 with chassis central dividing plate 3, and reduction furnace chassis lower shoe and reduction furnace chassis central dividing plate have formed cavity 14 under the chassis; Around each root electrode 5 electrode sleeve 9 is arranged all, the annular space 6 of 2mm is arranged between electrode 5 and the electrode sleeve 9; Electrode sleeve 9 is welded direct on the central dividing plate of reduction furnace chassis; Reduction furnace chassis central dividing plate is welded with 12 thrust-augmenting nozzles, and the slit of 2mm is respectively arranged between thrust-augmenting nozzle and reduction furnace chassis upper plate and the reduction furnace chassis lower shoe, and 12 thrust-augmenting nozzles are evenly distributed on the same circumference, and with the spacing of chassis flange be 30mm; Entrance of cooling water 7 is welded direct on the reduction furnace chassis lower shoe 4, and with the chassis under cavity 14 be connected; Cooling water outlet 10 is welded direct on the reduction furnace chassis central dividing plate 3, and is connected with chassis upper plenum 13.
Compare with patent ZL200820154686.X, 200920208194.9,200920208183.0; The advantage of embodiment 1,2 is: eliminated localized heat transfer and flow dead on the chassis; It is high to have solved existing chassis structure central zone temperature; The problem that the excircle temperature is low guarantees that the temperature distribution on chassis is more even, thereby guarantees the safety in production of polycrystalline silicon reducing furnace.
The above instance only is to prove absolutely the utility model and the preferred embodiment of being lifted, and the protection domain of the utility model is not limited thereto.Being equal to that the technician in present technique field is done on basis of the present invention substitutes or conversion, all within the protection domain of the utility model.The protection domain of the utility model is as the criterion with claims.

Claims (6)

1. even heat-obtaining formula polycrystalline silicon reducing furnace chassis cooling structure comprises cavity under reduction furnace chassis upper plate, reduction furnace chassis lower shoe, reduction furnace chassis central dividing plate, electrode, inlet mouth, electrode sleeve, many thrust-augmenting nozzles, a plurality of chassis entrance of cooling water, chassis cooling water outlet, chassis flange, chassis upper plenum, the chassis; It is characterized in that reduction furnace chassis upper plate, reduction furnace chassis central dividing plate, reduction furnace chassis lower shoe all are welded on the flange of chassis, and the chassis central dividing plate is positioned at flange middle, chassis.
2. even heat-obtaining formula polycrystalline silicon reducing furnace as claimed in claim 1 chassis cooling structure; It is characterized in that on the reduction furnace chassis each root electrode around an electrode sleeve all arranged; Electrode sleeve is welded direct on the central dividing plate of reduction furnace chassis; 2mm~10mm annular space is arranged between electrode sleeve and the electrode, the slit of 2mm~10mm is arranged between electrode sleeve and reduction furnace chassis upper plate and the reduction furnace chassis lower shoe.
3. even heat-obtaining formula polycrystalline silicon reducing furnace as claimed in claim 1 chassis cooling structure; It is characterized in that reduction furnace chassis central dividing plate excircle is welded with 12~30 thrust-augmenting nozzles; The slit that 2mm~10mm is arranged between thrust-augmenting nozzle and reduction furnace chassis upper plate and the reduction furnace chassis lower shoe; The spacing of thrust-augmenting nozzle and chassis flange is 30mm~60mm, and is evenly distributed on the same circumference.
4. even heat-obtaining formula polycrystalline silicon reducing furnace as claimed in claim 1 chassis cooling structure is characterized in that 6~12 chassis entrance of cooling water of reduction furnace chassis lower shoe uniform distribution, and is evenly distributed on the same circumference.
5. even heat-obtaining formula polycrystalline silicon reducing furnace as claimed in claim 1 chassis cooling structure is characterized in that 1 chassis cooling water outlet of reduction furnace chassis central dividing plate centermost distribution.
6. even heat-obtaining formula polycrystalline silicon reducing furnace as claimed in claim 1 chassis cooling structure is characterized in that reduction furnace chassis upper plate and reduction furnace chassis central dividing plate have formed a chassis upper plenum, and the chassis upper plenum is connected with the chassis cooling water outlet; Reduction furnace chassis lower shoe and reduction furnace chassis central dividing plate have formed cavity under the chassis, and cavity is connected with the chassis entrance of cooling water under the chassis.
CN2011202346186U 2011-07-05 2011-07-05 Uniform heat extraction polycrystalline silicon reduction furnace base plate cooling structure Expired - Fee Related CN202246090U (en)

Priority Applications (1)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102351193A (en) * 2011-07-05 2012-02-15 天津大学 Uniform heat-removing polysilicon reducing furnace chassis cooling structure
CN104724708A (en) * 2015-03-27 2015-06-24 中国恩菲工程技术有限公司 Chassis assembly for polycrystalline silicon reduction furnace
CN110937607A (en) * 2019-12-31 2020-03-31 亚洲硅业(青海)股份有限公司 Reduction furnace chassis and polycrystalline silicon reduction furnace

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102351193A (en) * 2011-07-05 2012-02-15 天津大学 Uniform heat-removing polysilicon reducing furnace chassis cooling structure
CN102351193B (en) * 2011-07-05 2013-01-02 天津大学 Uniform heat-removing polysilicon reducing furnace chassis cooling structure
CN104724708A (en) * 2015-03-27 2015-06-24 中国恩菲工程技术有限公司 Chassis assembly for polycrystalline silicon reduction furnace
CN110937607A (en) * 2019-12-31 2020-03-31 亚洲硅业(青海)股份有限公司 Reduction furnace chassis and polycrystalline silicon reduction furnace

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C17 Cessation of patent right
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Granted publication date: 20120530

Termination date: 20130705