CN202238756U - Wet-process cleaning equipment - Google Patents
Wet-process cleaning equipment Download PDFInfo
- Publication number
- CN202238756U CN202238756U CN2011203300813U CN201120330081U CN202238756U CN 202238756 U CN202238756 U CN 202238756U CN 2011203300813 U CN2011203300813 U CN 2011203300813U CN 201120330081 U CN201120330081 U CN 201120330081U CN 202238756 U CN202238756 U CN 202238756U
- Authority
- CN
- China
- Prior art keywords
- output
- pump
- input
- filter
- inside groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Abstract
The utility model relates to wet-process cleaning equipment, which comprises an outer tank, an inner tank, a first pump, a heater, a filter and a particle detector. The inner tank is arranged in the outer tank, the first pump, the heater and the filter are connected in sequence, the inner tank is provided with a nozzle, the outer tank is provided with a draining outlet, the first pump is connected with the draining outlet of the outer tank, the filter is connected with the nozzle of the inner tank, an input end of the particle detector is connected with an output end of the filter through a sample input pipe, and an output end of the particle detector is connected with the nozzle of the inner tank through a sample output pipe. The wet-process cleaning equipment can detect content of particles in cleaning fluid in real time, and accordingly workload of particle detection is decreased.
Description
Technical field
The utility model relates to field of semiconductor manufacture, relates in particular to a kind of wet clean equipment.
Background technology
Wafer must clean on its surface carrying out PROCESS FOR TREATMENT (as deposition) before, in case crystal column surface tarnishes, must get rid of through cleaning.Said staining possibly be the pollutant from the environment, or in preceding technical process, remains in the dud of crystal column surface.At present, wet-cleaned is a kind of surperficial method of cleaning wafer comparatively commonly used.
Shown in Figure 1 is the wet clean equipment of prior art, and said wet clean equipment comprises inside groove 110, water jacket 120, pump 130, heater 140 and filter 150; Said inside groove 110 is arranged in the said water jacket 120, and said inside groove 110 is provided with nozzle 111, and said water jacket 120 is provided with leakage fluid dram 121; Cleaning fluid constantly injects in the said inside groove 110 through said nozzle 111, and fills with whole inside groove 110, owing to constantly there is cleaning fluid to inject in the said inside groove 110; Therefore; Constantly have cleaning fluid to overflow from said inside groove 110, the cleaning fluid that overflows from said inside groove 110 flows in the said water jacket 120, and discharges through said leakage fluid dram 121; Said pump 130 is the mobile driving force that provides of cleaning fluid; Taken and send into away heating in the said heater 140 from the cleaning fluid that said leakage fluid dram 121 is discharged by said pump 130, the cleaning fluid after the heating is transported to said filter 150 inner filtrations, sends back in the said inside groove 110 through said nozzle 111 again through the cleaning fluid that filters after handling.When using said wet clean equipment cleaning wafer surface; Wafer 210 to be cleaned is placed in the brilliant boat 220; The brilliant boat 220 that carries multi-disc wafer 210 to be cleaned places in the said inside groove 120; Said wet clean equipment washes away the surface of wafer 210 to be cleaned through circulating of cleaning fluid, reaches the purpose on cleaning wafer surface.
Particle (particle) is the key factor that influences the semiconductor devices workmanship, and in semiconductor manufacturing industry, all will carry out particle detection to board every day.With above-mentioned wet clean equipment is example, the particle detection method of brief account prior art: the particle detection method of prior art adopts off-line checking method, uses the special test wafer; Measure the quantity of the above particle of test wafer surface certain diameter earlier; Calculate the amounts of particles (being called preceding data) of unit are, then clean test wafer, after cleaning finishes with above-mentioned wet clean equipment; Measure the quantity of the above particle of test wafer surface certain diameter once more; Calculate the amounts of particles (being called the back data) of unit are, compare back data and preceding data, to obtain board particle detection result.
Can be known that by above description in the prior art, the particle detection of wet clean equipment adopts the offline inspection mode, the testing amount is bigger.
The utility model content
The purpose of the utility model is to provide a kind of wet clean equipment, can detect granule content in the cleaning fluid in real time, reduces the particle detection workload.
In order to reach above-mentioned purpose, the utility model provides a kind of wet clean equipment, comprises water jacket; Be arranged at the inside groove in the said water jacket, first pump, heater and the filter that connect successively, and grain testing apparatus; Said inside groove is provided with nozzle; Said water jacket is provided with leakage fluid dram, and said first pump is connected with the leakage fluid dram of said water jacket, and said filter is connected with the nozzle of said inside groove; The input of said grain testing apparatus is connected with the output of said filter through the sample input pipe, and the output of said grain testing apparatus is connected with the nozzle of said inside groove through the sample efferent duct.
Above-mentioned wet clean equipment; Wherein, Said grain testing apparatus comprises cooler and the sub-counter of liquid particle; The input of said cooler is connected with said sample input pipe, and the output of said cooler is connected with the input of the sub-counter of said liquid particle, and the output of the sub-counter of said liquid particle is connected with said sample efferent duct.
Above-mentioned wet clean equipment; Wherein, The sub-counter of said liquid particle comprises magnetic valve, spectroanalysis instrument and second pump, and the input of said magnetic valve is connected with the output of said cooler, and the input of said spectroanalysis instrument is connected with the output of said magnetic valve; The output of said spectroanalysis instrument is connected with the input of said second pump, and said second delivery side of pump is connected with said sample efferent duct.
The wet clean equipment of the utility model can carry out particle detection to cleaning fluid in real time, can in technical process, realize the particle detection of wet clean equipment, significantly reduces the particle detection workload;
The wet clean equipment of the utility model carries out real-time particle detection to cleaning fluid, can grasp granule content in the cleaning fluid in real time, when granule content in the cleaning fluid surpasses setting range, can in time find, can improve the product yield.
Description of drawings
The wet clean equipment of the utility model is provided by following embodiment and accompanying drawing.
Fig. 1 is the sketch map of the wet clean equipment of prior art.
Fig. 2 is the sketch map of the wet clean equipment of the utility model embodiment.
Fig. 3 is the sketch map of grain testing apparatus among the utility model embodiment.
The specific embodiment
Below will combine Fig. 2～Fig. 3 that the wet clean equipment of the utility model is done further to describe in detail.
Referring to Fig. 2, the wet clean equipment of the utility model embodiment comprises inside groove 310, water jacket 320, first pump 330, heater 340, filter 350 and grain testing apparatus 360;
Said inside groove 310 is arranged in the said water jacket 320, and said inside groove 310 is provided with nozzle 311, and said water jacket 320 is provided with leakage fluid dram 321;
The input of said first pump 330 is connected with the leakage fluid dram 321 of said water jacket 320, and the output of said first pump 330 is connected with the input of said heater 340;
The output of said heater 340 is connected with the input of said filter 350, and the output of said filter 350 is connected with the nozzle 311 of said inside groove 310;
Draw sample input pipe 370 from the output of said filter 350; Said sample input pipe 370 is connected with the input of said grain testing apparatus 360, and the output of said grain testing apparatus 360 is connected with the nozzle 311 of said inside groove 310 through sample efferent duct 380.
Wafer 410 to be cleaned is placed in the brilliant boat 420; The brilliant boat 420 that carries multi-disc wafer 410 to be cleaned places in the said inside groove 320; After being extracted by said first pump 330, the cleaning fluid of discharging from said leakage fluid dram 321 sends into said heater 340 and filter 350 successively; Cleaning fluid after said filter 350 filters is got back in the said inside groove 310 through said nozzle 311; Said sample input pipe 370 is sent into said grain testing apparatus 360 from the output extension cleaning fluid of said filter 350 as testing sample; Carry out particle detection by said grain testing apparatus 360, get back in the said inside groove 310 through said nozzle 311 again from the cleaning fluid of said grain testing apparatus 360 outputs.The wet clean equipment of present embodiment carries out real-time particle detection to cleaning fluid, in technical process, has realized the particle detection of wet clean equipment, need not off-line again and carries out particle detection, has significantly reduced the particle detection workload.
Preferable, in the present embodiment said grain testing apparatus 360 is arranged on the output of said filter 350, to reduce the bubbles volume in the cleaning fluid.
Referring to Fig. 3, preferably, said grain testing apparatus 360 comprises cooler 361 and the sub-counter 362 of liquid particle; The input of said cooler 361 is connected with said sample input pipe 370, and the output of said cooler 361 is connected with the input of the sub-counter 362 of said liquid particle, and the output of the sub-counter 362 of said liquid particle is connected with said sample efferent duct 380; Because from the cleaning fluid of said filter 350 outputs are the cleaning fluids through said heater 330 heating; Therefore, the temperature of cleaning fluid is than higher, before cleaning fluid gets into the sub-counter 362 of said liquid particle; Must lower the temperature to cleaning fluid earlier; So said sample input pipe 370 is sent the cleaning fluid of drawing into cooler 361 earlier and is cooled behind the output extension cleaning fluid of said filter 350; Send into the sub-counter 362 of said liquid particle again after the cleaning fluid cooling, measure granule content by the sub-counter 362 of said liquid particle.
Continuation is referring to Fig. 3, and preferably, the sub-counter 362 of said liquid particle comprises magnetic valve 3621, spectroanalysis instrument 3622 and second pump 3623; The input of said magnetic valve 3621 is connected with the output of said cooler 361; The input of said spectroanalysis instrument 3622 is connected with the output of said magnetic valve 3621; The output of said spectroanalysis instrument 3622 is connected with the input of said second pump 3623, and the output of said second pump 3623 is connected with said sample efferent duct 380;
Said magnetic valve 3621 is used to control the flow velocity that cleaning fluid gets into spectroanalysis instrument 3622; Said spectroanalysis instrument 3622 is used to measure particle size, count particles quantity etc.; Said second pump 3622 provides driving force for cleaning fluid flows.
When the quantity that measures the above particle of certain diameter in the cleaning fluid unit volume when the sub-counter 362 of said liquid particle exceeds setting range; The sub-counter 362 of said liquid particle gives the alarm; Remind the technological operation personnel; It is contaminated that the quantity (granule content) of the above particle of certain diameter exceeds setting range explanation cleaning fluid in the unit volume, can not re-use, otherwise can endanger the semiconductor devices workmanship.
The wet clean equipment of present embodiment can carry out particle detection to cleaning fluid in real time, can in technical process, realize the particle detection of wet clean equipment, significantly reduces the particle detection workload.
The wet clean equipment of present embodiment carries out real-time particle detection to cleaning fluid, can grasp granule content in the cleaning fluid in real time, when granule content in the cleaning fluid surpasses setting range, can in time find, can improve the product yield.
Claims (3)
1. a wet clean equipment comprises water jacket, first pump, heater and the filter that are arranged at the inside groove in the said water jacket and connect successively; Said inside groove is provided with nozzle; Said water jacket is provided with leakage fluid dram, and said first pump is connected with the leakage fluid dram of said water jacket, and said filter is connected with the nozzle of said inside groove; It is characterized in that; Said wet clean equipment also comprises grain testing apparatus, and the input of said grain testing apparatus is connected with the output of said filter through the sample input pipe, and the output of said grain testing apparatus is connected with the nozzle of said inside groove through the sample efferent duct.
2. wet clean equipment as claimed in claim 1; It is characterized in that; Said grain testing apparatus comprises cooler and the sub-counter of liquid particle; The input of said cooler is connected with said sample input pipe, and the output of said cooler is connected with the input of the sub-counter of said liquid particle, and the output of the sub-counter of said liquid particle is connected with said sample efferent duct.
3. wet clean equipment as claimed in claim 2; It is characterized in that; The sub-counter of said liquid particle comprises magnetic valve, spectroanalysis instrument and second pump, and the input of said magnetic valve is connected with the output of said cooler, and the input of said spectroanalysis instrument is connected with the output of said magnetic valve; The output of said spectroanalysis instrument is connected with the input of said second pump, and said second delivery side of pump is connected with said sample efferent duct.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203300813U CN202238756U (en) | 2011-09-05 | 2011-09-05 | Wet-process cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203300813U CN202238756U (en) | 2011-09-05 | 2011-09-05 | Wet-process cleaning equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202238756U true CN202238756U (en) | 2012-05-30 |
Family
ID=46100059
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011203300813U Expired - Fee Related CN202238756U (en) | 2011-09-05 | 2011-09-05 | Wet-process cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202238756U (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104588362A (en) * | 2015-01-08 | 2015-05-06 | 北京航天试验技术研究所 | Automatic detection and cleaning system of redundant substance of liquid rocket engine pipeline |
| CN104941936A (en) * | 2014-03-24 | 2015-09-30 | 内蒙古蒙牛乳业（集团）股份有限公司 | Cleaning unit for color machine mold and cleaning equipment thereof |
| CN106298580A (en) * | 2016-11-09 | 2017-01-04 | 上海华力微电子有限公司 | Wafer surface particle monitoring apparatus and method, the control method of wafer cleaning |
| CN108695190A (en) * | 2017-04-07 | 2018-10-23 | 矽品精密工业股份有限公司 | Cleaning equipment |
| CN110813888A (en) * | 2019-10-30 | 2020-02-21 | 苏州晶洲装备科技有限公司 | Mask plate cleaning device and mask plate cleaning method |
| CN112864050A (en) * | 2020-12-24 | 2021-05-28 | 长江存储科技有限责任公司 | Wafer cleaning device, control method, controller and system |
-
2011
- 2011-09-05 CN CN2011203300813U patent/CN202238756U/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104941936A (en) * | 2014-03-24 | 2015-09-30 | 内蒙古蒙牛乳业（集团）股份有限公司 | Cleaning unit for color machine mold and cleaning equipment thereof |
| CN104588362A (en) * | 2015-01-08 | 2015-05-06 | 北京航天试验技术研究所 | Automatic detection and cleaning system of redundant substance of liquid rocket engine pipeline |
| CN104588362B (en) * | 2015-01-08 | 2016-09-14 | 北京航天试验技术研究所 | A kind of liquid-propellant rocket engine pipeline fifth wheel detects and purging system automatically |
| CN106298580A (en) * | 2016-11-09 | 2017-01-04 | 上海华力微电子有限公司 | Wafer surface particle monitoring apparatus and method, the control method of wafer cleaning |
| CN108695190A (en) * | 2017-04-07 | 2018-10-23 | 矽品精密工业股份有限公司 | Cleaning equipment |
| CN110813888A (en) * | 2019-10-30 | 2020-02-21 | 苏州晶洲装备科技有限公司 | Mask plate cleaning device and mask plate cleaning method |
| CN112864050A (en) * | 2020-12-24 | 2021-05-28 | 长江存储科技有限责任公司 | Wafer cleaning device, control method, controller and system |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN202238756U (en) | Wet-process cleaning equipment | |
| CN104504970B (en) | Small-sized cavitation test device based on pressure control | |
| US20160056061A1 (en) | Real time liquid particle counter (lpc) end point detection system | |
| CN204556598U (en) | A kind of hydrate slurry sedimentary simulating experiment device | |
| CN109444028A (en) | A kind of particle analyzer and its liquid channel system, discharging of waste liquid method | |
| CN202330075U (en) | Liquid container bypass continuous sampling device | |
| CN203011709U (en) | Multi-pass method test bench for evaluating filter element performance of nuclear grade water filter | |
| CN105013772B (en) | Cleaning device and method for car air conditioning system | |
| CN206838686U (en) | Esr analyzer cleaning device and the Wei Shi esr analyzers comprising the cleaning device | |
| CN108398375B (en) | Multiphase flow erosion corrosion test device | |
| RU2382813C1 (en) | Reagent dosing method and equipment for implementation | |
| CN209280528U (en) | A kind of particle analyzer and its liquid channel system | |
| CN209451779U (en) | A kind of liquid medicine device for formulating | |
| KR20150033794A (en) | pipe flushing apparatus using microbubble | |
| CN207019984U (en) | Hydrolyzable Absorption of Fluoride device in sulfur hexafluoride gas | |
| CN203909029U (en) | Servo device of on-line automatic water quality safety monitoring system | |
| CN209675069U (en) | A kind of corrugated tank inside hot oil rinse-system | |
| CN203949404U (en) | The water-cooling tower of on-line cleaning | |
| CN104020268B (en) | Water quality safety online auto monitoring system servomechanism installation | |
| CN203196964U (en) | Movable pot cleaning machine for pharmaceutical factory | |
| CN205773454U (en) | A kind of COD stably reaching standard tapping equipment | |
| CN207268688U (en) | A kind of wet type sample gas pretreatment unit for being used to wish sieve reaction tower tail-gas on-line checking | |
| CN110899262A (en) | Device suitable for offshore platform chemical washing, oil washing and degreasing | |
| CN202377227U (en) | Washing device for cooling system of bearing liner of coal pulverizing machine | |
| CN101865185B (en) | Device for cleaning equipment using fluid |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Free format text: FORMER OWNER: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION Effective date: 20130423 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 201203 PUDONG NEW AREA, SHANGHAI TO: 100176 DAXING, BEIJING |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20130423 Address after: 100176 No. 18, Wenchang Avenue, Beijing economic and Technological Development Zone, Beijing Patentee after: Semiconductor Manufacturing International (Beijing) Corporation Address before: 201203, No. 18 Zhangjiang Road, Shanghai, Pudong New Area Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120530 Termination date: 20180905 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |