CN202099373U

CN202099373U - Laser deposition device for surface film

Info

Publication number: CN202099373U
Application number: CN2011201445536U
Authority: CN
Inventors: 倪杨
Original assignee: SURFACE ENGINEERING RESEARCH CENTER OF NINGBO
Current assignee: SURFACE ENGINEERING RESEARCH CENTER OF NINGBO
Priority date: 2011-05-06
Filing date: 2011-05-06
Publication date: 2012-01-04
Anticipated expiration: 2021-05-06

Abstract

The utility model relates to a laser deposition device for a surface film; as a laser irradiator is adopted as a heating source, the problem that a heating source material is evaporated, so as to enter steam of an evaporate plating material and becomes impurities as the existing heating wire is taken as the heating source can be avoided; meanwhile, the steam of the evaporate plating material is necessarily irradiated by a laser beam, so that part of steam is ionized, namely, double functions of heating the evaporate plating material and ionizing the steam of the evaporate plating material can be exerted by the laser irradiator at the same time; the laser irradiator is controlled to rotate up and down by a controller, so that the irradiation scope is wider, and the evaporate plating material is more fully evaporated; and an acceleration power supply is arranged for accelerating the ionization of the steam so as to improve the deposition efficiency.

Description

A kind of surface film laser deposition device

Technical field

The utility model relates to a kind of surface processing device, especially a kind of surface film laser deposition device.

Background technology

Carry out the processing (the for example plated film of surface optical film) of surface coating, normally adopt as the device completion of Fig. 1: wherein 1 is deposition material, the 2nd, the crucible of deposition material is housed; The 3rd, be used to add the heater strip of thermogenesis electron beam; The 4th, the steam of deposition material, the 5th, make the Ionized ionize silk of vapor portion, the 6th, be used to stop heater strip and the excessive thermal baffle of ionize silk heat; The 7th, by vapor deposition surface, the 8th, vacuum vessel.

Yet there is following problems in said apparatus; Promptly because heater strip and ionize silk produce the part evaporation that high temperature tends to cause heater strip and ionize silk constituent material; And sneak in the steam of deposition material and become impurity, thereby finally cause the function film purity drop, influence quality of forming film.

Summary of the invention

The purpose of the utility model promptly is to provide the surface deposition device of sneaking into impurity in a kind of steam that can effectively prevent deposition material.

The technical scheme that the utility model adopted is following: a kind of surface film laser deposition device; It has vacuum vessel; Being built in being used in the vacuum vessel holds the crucible of deposition material; The laser irradiator that is used to produce irradiation and heats the laser beam of deposition material; Said laser irradiator links to each other through the unit laser generator outer with placing vacuum vessel, and said unit is controlled said laser irradiator and rotated up and down, at crucible and be deposited the power supply of the volts DS that is provided for applying speeding-up ion steam between the substrate.

The beneficial effect of the utility model is owing to adopted laser irradiator as heating source, to get into the problem that in deposition material steam become impurity with heater strip as the heating source material evaporation that heating source produces thereby avoided existing; Simultaneously and since laser beam will inevitably irradiation to the steam of deposition material, thereby make the part steam plasmaization, also be that laser irradiator has been brought into play the dual function that heats deposition material and ionize deposition material steam simultaneously; Unit control laser irradiator is rotated up and down, thereby makes irradiation range wider, and the deposition material evaporation is more abundant; Thereby be provided with accelerating power source and can improve sedimentation effect by speeding-up ion steam.

Description of drawings

Fig. 1 is the structural representation of existing surface coating device;

Fig. 2 is the structural representation of the utility model.

Embodiment

Below in conjunction with accompanying drawing 2; Describe the surface film laser deposition device of the utility model in detail; It has vacuum vessel 9; Being built in being used in the vacuum vessel 9 holds the crucible 11 of deposition material 10, is used to produce the laser irradiator 13 of the laser beam 12 of irradiation and heating deposition material 10, and said laser irradiator links to each other through unit 14 laser generator 15 outer with placing vacuum vessel; The said laser irradiator 13 of said unit 14 controls is rotated up and down, at crucible 11 and be deposited the power supply 17 of the volts DS that is provided for applying speeding-up ion steam between the substrate 16.

Claims

1. surface film laser deposition device; It has vacuum vessel; Being built in being used in the vacuum vessel holds the crucible of deposition material, is used to produce the laser irradiator of the laser beam of irradiation and heating deposition material, and said laser irradiator links to each other through the unit laser generator outer with placing vacuum vessel; Said unit is controlled said laser irradiator and is rotated up and down, at crucible and be deposited the power supply of the volts DS that is provided for applying speeding-up ion steam between the substrate.