CN201940407U - Constant volume precise automatic liquid supply device - Google Patents
Constant volume precise automatic liquid supply device Download PDFInfo
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- CN201940407U CN201940407U CN2010206854559U CN201020685455U CN201940407U CN 201940407 U CN201940407 U CN 201940407U CN 2010206854559 U CN2010206854559 U CN 2010206854559U CN 201020685455 U CN201020685455 U CN 201020685455U CN 201940407 U CN201940407 U CN 201940407U
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- 239000007788 liquid Substances 0.000 title claims abstract description 87
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 24
- 239000010703 silicon Substances 0.000 claims abstract description 24
- 238000004513 sizing Methods 0.000 claims abstract description 20
- 238000001802 infusion Methods 0.000 claims description 4
- 239000012530 fluid Substances 0.000 claims 7
- 230000009469 supplementation Effects 0.000 claims 1
- 238000004140 cleaning Methods 0.000 abstract description 52
- 238000003860 storage Methods 0.000 abstract description 14
- 235000012431 wafers Nutrition 0.000 description 21
- 238000000034 method Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
一种定容式精准自动补液装置,包括储液罐、机械补液泵、定径罐、上液位传感器、下液位传感器、浮球、U形浮球杆、定容传感器、标尺、电磁换向阀、清洗槽和控制系统,在定径罐的内侧壁上设有上液位传感器和下液位传感器,通过定径罐的直径和浮球的下移距离可以获知一次补液的容积,浮球下降的距离由定容传感器控制,补液时电磁换向阀开通,当定容传感器下移预定距离后,定容传感器向控制系统发出信号,立即关闭电磁换向阀,这样清洗槽就能得到精确地补液,使清洗槽中的溶液浓度保持稳定,从根本上保证硅片清洗质量。
A constant-volume precise automatic rehydration device, including a liquid storage tank, a mechanical rehydration pump, a calibrating tank, an upper liquid level sensor, a lower liquid level sensor, a float, a U-shaped float rod, a constant volume sensor, a scale, and an electromagnetic changer. There are directional valves, cleaning tanks and control systems. An upper liquid level sensor and a lower liquid level sensor are installed on the inner wall of the sizing tank. Through the diameter of the sizing tank and the downward distance of the floating ball, the volume of the primary liquid replenishment can be known. The descending distance of the ball is controlled by the constant volume sensor, and the electromagnetic reversing valve is opened during liquid replenishment. When the constant volume sensor moves down a predetermined distance, the constant volume sensor sends a signal to the control system, and immediately closes the electromagnetic reversing valve, so that the cleaning tank can be cleaned. Precise replenishment of liquid keeps the concentration of the solution in the cleaning tank stable, fundamentally guaranteeing the quality of silicon wafer cleaning.
Description
技术领域:Technical field:
本实用新型涉及一种太阳能硅片清洗设备,尤其涉及全自动清洗设备中的补液装置。The utility model relates to a solar silicon chip cleaning device, in particular to a liquid replenishing device in a fully automatic cleaning device.
背景技术:Background technique:
在太阳能电池片的生产过程中,硅片的清洗工序是十分重要的工序,清洗质量直接影响到太阳能电池片的光电转换性能。硅片在清洗设备中,由于硅片与清洗液之间要发生化学反应,清洗液中的相关化学成份将被消耗,若不及时补充将直影响硅片的清洗效果。为了提高硅片清洗工艺的稳定性,在清洗一定次数后必须向清洗液中补充相应的化学药液。普通清洗机都采用人工添加方法进行补液,人工添加都存在补液量不准确的缺陷,补液精度人为因素影响很大。为了克服人工补液存在的缺陷,在先进的硅片清洗机中都设置了集中补液系统,所述集中补液系统由机械式补液泵定时向清洗槽中补充液体,在清洗设备运转过程中,根据单位时间内液清洗消耗的多少,确定相应流量的机械式补液泵,控制系统每隔预定时间间隔就向清洗槽中补一次液,这种补液系统虽然能实现对清洗槽的自动补液,但由于机械补液量的补液精度不高,且以每清洗十次确定为补液间隔,这样清洗液的化学浓度波动性很大,硅片的清洗质量波动也比较大,要想进一步提高硅片的清洗质量,必须及时补液,减小清洗液化学浓度波动值,因此,申请人设计了一种定压式自动补液装置,其补液原理是:在定压、流量相同条件下,通过控制补液时间来精确控制补液量,当清洗槽每清洗一批硅片后补液装置就适时向清洗槽中补液,这就是人们所述的微量精补装置,有了这种微量补液装置,清洗槽中清洗液的化学浓度的变化波动值就能得到有效控制,从而提高了硅片的清洗质量。In the production process of solar cells, the cleaning process of silicon wafers is a very important process, and the cleaning quality directly affects the photoelectric conversion performance of solar cells. In the silicon wafer cleaning equipment, due to the chemical reaction between the silicon wafer and the cleaning solution, the relevant chemical components in the cleaning solution will be consumed. If it is not replenished in time, the cleaning effect of the silicon wafer will be directly affected. In order to improve the stability of the silicon wafer cleaning process, corresponding chemical liquid must be added to the cleaning solution after cleaning for a certain number of times. Ordinary washing machines use manual addition method for rehydration, and manual addition has the defect of inaccurate rehydration volume, and human factors have a great influence on the accuracy of rehydration. In order to overcome the defects of artificial liquid replenishment, a centralized liquid replenishment system is installed in advanced silicon wafer cleaning machines. The centralized liquid replenishment system replenishes liquid to the cleaning tank regularly by a mechanical liquid replenishment pump. During the operation of the cleaning equipment, according to the unit The amount of liquid cleaning consumption within a certain period of time, determine the corresponding flow rate of the mechanical liquid replenishment pump, and the control system replenishes liquid to the cleaning tank every predetermined time interval. The accuracy of rehydration is not high, and the rehydration interval is determined every ten times of cleaning. In this way, the chemical concentration of the cleaning solution fluctuates greatly, and the cleaning quality of silicon wafers also fluctuates greatly. To further improve the cleaning quality of silicon wafers, It is necessary to replenish the liquid in time to reduce the fluctuation value of the chemical concentration of the cleaning liquid. Therefore, the applicant has designed a constant pressure automatic liquid replenishment device. When the cleaning tank washes a batch of silicon wafers, the liquid replenishing device will replenish liquid in the cleaning tank in a timely manner. This is what people call the micro-quantity replenishing device. Changing the fluctuation value can be effectively controlled, thereby improving the cleaning quality of the silicon wafer.
实用新型内容:Utility model content:
为了克服现有硅片清洗机中补液装置存在的不足,本实用新型提供了一种硅片清洗设备的定容式精准自动补液装置,它采用定容补液方式,在每清洗一次硅片后能对清洗槽及时进行定容精准补液,确保每批硅片清洗后清洗槽中的清洗液得到精准的补充,这样就能比较精确地控制清洗液的浓度,从而保证硅片的清洗质量。In order to overcome the deficiencies of the liquid replenishment device in the existing silicon wafer cleaning machine, the utility model provides a constant-volume precision automatic liquid replenishment device for silicon wafer cleaning equipment. The cleaning tank is replenished with constant volume and precise liquid in time to ensure that the cleaning liquid in the cleaning tank is accurately replenished after each batch of silicon wafers are cleaned, so that the concentration of the cleaning liquid can be controlled more accurately, thereby ensuring the cleaning quality of silicon wafers.
本实用新型所采用的技术方案是:The technical scheme adopted in the utility model is:
所述一种定容式精准自动补液装置,其特征是:它包括储液罐、机械补液泵、定径罐、上液位传感器、下液位传感器、浮球、U形浮球杆、定容传感器、标尺、电磁换向阀、清洗槽和控制系统,储液罐设置在全自动硅片清洗机旁,储液罐中存放待补充溶液,在储液罐顶部设有加液开口,供操作人员向其中加注溶液,机械补液泵设置在定径罐和储液罐之间,在定径罐的侧壁上设有上液位传感器和下液位传感器,在定径罐底部引出的补液管经电磁换向阀通入清洗槽,浮球放置在定径罐内,U形浮球杆的内杆穿过定径罐的上盖并旋固在浮球上,U形浮球杆的外杆沿定径罐的外壁向下延伸,在外杆上设有定容传感器,在对应于定容传感器的侧面设有标尺,上液位传感器、下液位传感器、定容传感器和电磁换向阀都与控制系统电连接。The fixed-capacity precise automatic liquid replenishing device is characterized in that it includes a liquid storage tank, a mechanical liquid replenishing pump, a calibration tank, an upper liquid level sensor, a lower liquid level sensor, a floating ball, a U-shaped floating ball rod, a fixed Capacity sensor, scale, electromagnetic reversing valve, cleaning tank and control system. The liquid storage tank is set next to the automatic silicon wafer cleaning machine. The liquid storage tank stores the solution to be replenished. There is a liquid filling opening on the top of the liquid storage tank. The operator adds solution to it, and the mechanical replenishment pump is set between the sizing tank and the liquid storage tank, and the upper liquid level sensor and the lower liquid level sensor are arranged on the side wall of the sizing tank, and the liquid level sensor drawn from the bottom of the sizing tank The liquid replenishment pipe leads to the cleaning tank through the electromagnetic reversing valve, the float ball is placed in the sizing tank, the inner rod of the U-shaped float rod passes through the upper cover of the sizing tank and is screwed on the float ball, the U-shaped float rod The outer rod extends downward along the outer wall of the sizing tank. A constant volume sensor is arranged on the outer rod, and a scale is arranged on the side corresponding to the constant volume sensor. The upper liquid level sensor, the lower liquid level sensor, the constant volume sensor and the electromagnetic switch The directional valves are all electrically connected to the control system.
由于将储液罐中的待加补溶液经机械补液泵先输入定径罐中,在定径罐的侧壁上依次设有上液位传感器和下液位传感器,机械补液泵的开关由上液位传感器和下液位传感器控制,确保定径罐内液位处于预定高度范围之内,通过定径罐的直径和浮球的下移距离可以获知浮球下降单位尺寸所放出的液体容积,再根据清洗槽每次定量清洗硅片所消耗的溶液量,经计算就得出每次补液浮球应该下降的距离,该距离由定容传感器控制,当清洗槽每次清洗一次后及时控制电磁换向阀开通补液,当定容传感器下移预定距离后,定容传感器向控制系统发出信号,立即关闭电磁换向阀,这样清洗槽就能得到精确地补液,使清洗槽中的溶液浓度保持稳定,从根本上保证硅片清洗质量。同时降低了机械泵开停频率,减少了对机械泵的损伤,大大提高了全自动清洗机的使用效率。Since the solution to be replenished in the liquid storage tank is first input into the calibrating tank through the mechanical replenishment pump, the upper liquid level sensor and the lower liquid level sensor are arranged on the side wall of the calibrated tank in turn, and the switch of the mechanical replenishment pump is controlled by the upper and lower liquid level sensors. The liquid level sensor and the lower liquid level sensor are controlled to ensure that the liquid level in the sizing tank is within the predetermined height range. Through the diameter of the sizing tank and the downward movement distance of the float, the volume of liquid released by the drop of the float per unit size can be known. Then, according to the amount of solution consumed by the cleaning tank to quantitatively clean the silicon wafers each time, the distance that the floating ball should drop for each rehydration can be obtained through calculation. This distance is controlled by the constant volume sensor. The reversing valve is turned on for liquid replenishment. When the constant volume sensor moves down a predetermined distance, the constant volume sensor sends a signal to the control system and immediately closes the electromagnetic reversing valve, so that the cleaning tank can be accurately replenished with liquid, so that the concentration of the solution in the cleaning tank remains constant. Stable, fundamentally guarantee the quality of silicon wafer cleaning. At the same time, the frequency of starting and stopping of the mechanical pump is reduced, the damage to the mechanical pump is reduced, and the use efficiency of the automatic cleaning machine is greatly improved.
附图说明:Description of drawings:
图1为本实用新型结构示意图;Fig. 1 is a structural representation of the utility model;
图中:1-储液罐;2-机械补液泵;3-定径罐;31-上盖;4-上液位传感器;5-下液位传感器;6-浮球;7-U形浮球杆;71-内杆;72-外杆;8-定容传感器;9-标尺;10-电磁换向阀;11-清洗槽;12-控制系统;13-输液管;14-补液管。In the figure: 1-liquid storage tank; 2-mechanical replenishment pump; 3-calibration tank; 31-upper cover; 4-upper liquid level sensor; 5-lower liquid level sensor; 6-float ball; 7-U-shaped float Ball bar; 71-inner rod; 72-outer rod; 8-constant volume sensor; 9-scale; 10-electromagnetic reversing valve; 11-cleaning tank; 12-control system; 13-infusion tube;
具体实施方式:Detailed ways:
根据附图详细说明本实用新型的具体实施方式:The specific embodiment of the utility model is described in detail according to the accompanying drawings:
所述一种定容式精准自动补液装置,如图1所示,它包括储液罐1、机械补液泵2、定径罐3、上液位传感器4、下液位传感器5、浮球6、U形浮球杆7、定容传感器8、标尺9、电磁换向阀10、清洗槽11和控制系统12,储液罐1设置在全自动硅片清洗机旁,储液罐1中存放待补充溶液,在储液罐1顶部设有加液开口,供操作人员向其中加注溶液,机械补液泵2设置在储液罐1和定径罐3之间,在定径罐3的侧壁上设有上液位传感器4和下液位传感器5,在定径罐3底部引出的补液管14经电磁换向阀10通入清洗槽11,浮球6放置在定径罐3内,U形浮球杆7的内杆71穿过定径罐3的上盖31并旋固在浮球6上,U形浮球杆7的外杆72沿定径罐3的外壁向下延伸,在外杆72上设有定容传感器8,在对应于定容传感器8的侧面设有标尺9,上液位传感器4、下液位传感器5、定容传感器8和电磁换向阀10都与控制系统12电连接。The fixed-volume precision automatic liquid replenishment device, as shown in Figure 1, includes a liquid storage tank 1, a mechanical liquid replenishment pump 2, a calibration tank 3, an upper liquid level sensor 4, a lower liquid level sensor 5, and a floating ball 6 , U-shaped floating ball rod 7, constant volume sensor 8, scale 9, electromagnetic reversing valve 10, cleaning tank 11 and
本实用新型的具体使用方法如下:Concrete use method of the present utility model is as follows:
由控制系统12启动机械补液泵2将储液罐1中的添补液经输液管13输入定径罐3中,当液体高度达到上液位传感器4时,便向控制系统12发出信号自动关闭机械补液泵2停止抽液,清洗机开始清洗硅片,当硅片清洗完后,由控制系统12使电磁换向阀10得电开通,此时定径罐3中的溶液经过补液管14通向清洗槽11中,当固定在U形浮球杆7的外杆72上的定容传感器8下移预定高度时,控制系统12收到定容传感器8发来的信号,立即关闭电磁换向阀10,此时清洗槽11溶液得到了精确补充,清洗机转入下一批硅片的清洗,如此往复。The
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Cited By (13)
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| CN102148285A (en) * | 2010-12-29 | 2011-08-10 | 常州亿晶光电科技有限公司 | Constant volume type accurate automatic liquid replenishing device |
| CN102527654A (en) * | 2011-12-30 | 2012-07-04 | 重庆平伟实业股份有限公司 | Automatic quantitative spray machine and method thereof |
| CN102784788A (en) * | 2012-08-28 | 2012-11-21 | 常州捷佳创精密机械有限公司 | Liquid level controlling and liquid supplementing device of silicon wafer cleaning tank |
| CN103028564A (en) * | 2011-09-30 | 2013-04-10 | 金宝电子(中国)有限公司 | Solution supply unit, cleaning system and cleaning method thereof |
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| CN105396837A (en) * | 2015-12-18 | 2016-03-16 | 南车戚墅堰机车车辆工艺研究所有限公司 | Circulation filtering device, spraying cleaning machine with circulation filtering device and cleaning method |
| CN107158464A (en) * | 2017-05-31 | 2017-09-15 | 陕西瑞盛生物科技有限公司 | A kind of automatic liquid supply formula takes off cell system |
| CN109047150A (en) * | 2018-07-30 | 2018-12-21 | 吴佳锋 | A kind of environment-friendly automatic auto parts cleaning case |
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