CN201940407U - Constant volume precise automatic liquid supply device - Google Patents
Constant volume precise automatic liquid supply device Download PDFInfo
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- CN201940407U CN201940407U CN2010206854559U CN201020685455U CN201940407U CN 201940407 U CN201940407 U CN 201940407U CN 2010206854559 U CN2010206854559 U CN 2010206854559U CN 201020685455 U CN201020685455 U CN 201020685455U CN 201940407 U CN201940407 U CN 201940407U
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- constant volume
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
A constant volume precise automatic liquid supply device comprises a liquid storage tank, a mechanical liquid supply pump, a constant diameter tank, an upper liquid level sensor, a lower liquid level sensor, a floating ball, a U-shaped floating ball rod, a constant volume sensor, a scale, an electro-magnetic switching valve, a cleaning tank and a controlling system. The upper liquid level sensor and the lower liquid level sensor are provided on the inner wall of the constant diameter tank. The volume of once liquid supply can be obtained via the diameter of the constant diameter tank and the downward traveling distance of the floating ball. The downward traveling distance of the floating ball can be controlled by the constant volume sensor. When the liquid is supplied, the electro-magnetic switching valve is turned on, the constant volume sensor sends out signals to the controlling system when the constant volume sensor travels downward for a certain distance, and the electro-magnetic switching valve is shut down immediately. Thus, the cleaning tank can be supplied with liquid precisely, so that the liquid concentration in the cleaning tank remains constant thus the cleaning effect of the wafer can be fully ensured.
Description
Technical field:
The utility model relates to a kind of solar silicon wafers cleaning equipment, relates in particular to the liquid supply device in the full automatic cleaning equipment.
Background technology:
In the production process of solar battery sheet, the matting of silicon chip is crucial operation, and cleaning quality directly has influence on the opto-electronic conversion performance of solar battery sheet.Silicon chip is in cleaning equipment, owing between silicon chip and the cleaning fluid chemical reaction will take place, the relevant chemical analysis in the cleaning fluid will be consumed, if untimelyly additionally will directly influence the cleaning performance of silicon chip.In order to improve the stability of silicon chip cleaning, after cleaning certain number of times, must in cleaning fluid, replenish corresponding chemical liquid.Common cleaning machine all adopts artificial adding method to carry out fluid infusion, and all there is the inaccurate defective of amount infused in artificial interpolation, and the influence of fluid infusion precision human factor is very big.In order to overcome the defective that artificial fluid infusion exists, in advanced person's silicon wafer cleaner, all be provided with concentrated fluid infusion system, described concentrated fluid infusion system is by mechanical type fluid infusion pump timing liquid make-up in rinse bath, in the cleaning equipment operation process, clean to consume according to liquid in the unit interval what, determine the mechanical type fluid infusion pump of corresponding discharge, control system is just mended a not good liquor every predetermined time interval in rinse bath, though this fluid infusion system can be realized the automatic liquid supply to rinse bath, but because the fluid infusion precision of mechanical amount infused is not high, and be defined as fluid infusion for ten times at interval with every cleaning, the chemical concentrations fluctuation of cleaning fluid is very big like this, the cleaning quality fluctuation of silicon chip is also bigger, want further to improve the cleaning quality of silicon chip, fluid infusion in time, reduce cleaning fluid chemical concentrations undulating value, therefore, the applicant has designed a kind of constant-pressure type automatic liquid supply device, its fluid infusion principle is: in level pressure, under flow the same terms, by accurate control of control fluid infusion time amount infused, just fluid infusion in rinse bath in good time of liquid supply device behind a collection of silicon chip of the every cleaning of rinse bath, Here it is, and the described trace essence of people is mended device, this micro-liquid supply device has been arranged, the variation undulating value of the chemical concentrations of cleaning fluid just can be effectively controlled in the rinse bath, thereby has improved the cleaning quality of silicon chip.
The utility model content:
In order to overcome the deficiency that liquid supply device exists in the existing silicon wafer cleaner, the utility model provides a kind of constant volume type of silicon chip cleaning equipment accurate automatic liquid supply device, it adopts constant volume fluid infusion mode, behind silicon chip of every cleaning, can in time carry out the accurate fluid infusion of constant volume to rinse bath, guarantee that the cleaning fluid that every batch of silicon chip cleans in the rinse bath of back obtains replenishing accurately, so just can control the concentration of cleaning fluid more accurately, thereby guarantee the cleaning quality of silicon chip.
The technical scheme that the utility model adopted is:
The accurate automatic liquid supply device of described a kind of constant volume type, it is characterized in that: it comprises fluid reservoir, machinery fluid infusion pump, the sizing jar, last liquid level sensor, following liquid level sensor, ball float, the U-shaped ball lever, the constant volume sensor, scale, solenoid directional control valve, rinse bath and control system, fluid reservoir is arranged on by the full-automatic silicon wafer cleaner, deposit in the fluid reservoir and treat make-up solution, be provided with the liquid feeding opening at the fluid reservoir top, supply operating personnel to the solution of wherein annotating, machinery fluid infusion pump is arranged between sizing jar and the fluid reservoir, be provided with liquid level sensor and following liquid level sensor on the sidewall of sizing jar, the liquid supplementation pipe of drawing at the sizing pot bottom feeds rinse bath through solenoid directional control valve, ball float is placed in the sizing jar, the interior bar of U-shaped ball lever passes the loam cake of sizing jar and is rotated with on ball float, the outer bar of U-shaped ball lever extends downwards along the outer wall of sizing jar, bar is provided with the constant volume sensor outside, be provided with scale in side, last liquid level sensor corresponding to the constant volume sensor, following liquid level sensor, constant volume sensor and solenoid directional control valve all are electrically connected with control system.
Because treating in the fluid reservoir added benefit solution to be imported in the sizing jar earlier through mechanical fluid infusion pump, be provided with liquid level sensor and following liquid level sensor on the sidewall of sizing jar successively, the switch of machinery fluid infusion pump is by last liquid level sensor and the control of following liquid level sensor, guarantee that liquid level is within the predetermined altitude range in the sizing jar, by the diameter of sizing jar and moving down of ball float apart from knowing the liquid capacity that ball float decline unit sizes is emitted, the solution amount that is consumed according to the each quantitatively cleaning silicon chip of rinse bath again, just draw the distance that each fluid infusion ball float should descend as calculated, this distance is controlled by the constant volume sensor, in time the control solenoid directional control valve is opened fluid infusion after the each cleaning once of rinse bath, after the constant volume sensor moves down preset distance, the constant volume sensor sends signal to control system, close solenoid directional control valve immediately, rinse bath just can obtain accurately fluid infusion like this, make the solution concentration in the rinse bath keep stable, fundamentally guarantee the silicon chip cleaning quality.Reduced mechanical pump start-stop frequency simultaneously, reduced damage, improved the service efficiency of automatic washing machine greatly mechanical pump.
Description of drawings:
Fig. 1 is the utility model structural representation;
Among the figure: the 1-fluid reservoir; 2-machinery fluid infusion pump; 3-sizing jar; The 31-loam cake; The last liquid level sensor of 4-; Liquid level sensor under the 5-; The 6-ball float; 7-U shape ball lever; Bar in the 71-; The outer bar of 72-; 8-constant volume sensor; The 9-scale; The 10-solenoid directional control valve; The 11-rinse bath; The 12-control system; The 13-woven hose; The 14-liquid supplementation pipe.
The specific embodiment:
Describe the specific embodiment of the present utility model with reference to the accompanying drawings in detail:
The accurate automatic liquid supply device of described a kind of constant volume type, as shown in Figure 1, it comprises fluid reservoir 1, machinery fluid infusion pump 2, sizing jar 3, last liquid level sensor 4, following liquid level sensor 5, ball float 6, U-shaped ball lever 7, constant volume sensor 8, scale 9, solenoid directional control valve 10, rinse bath 11 and control system 12, fluid reservoir 1 is arranged on by the full-automatic silicon wafer cleaner, deposit in the fluid reservoir 1 and treat make-up solution, be provided with the liquid feeding opening at fluid reservoir 1 top, supply operating personnel to the solution of wherein annotating, machinery fluid infusion pump 2 is arranged between fluid reservoir 1 and the sizing jar 3, be provided with liquid level sensor 4 and following liquid level sensor 5 on the sidewall of sizing jar 3, the liquid supplementation pipe 14 of drawing in sizing jar 3 bottoms feeds rinse bath 11 through solenoid directional control valve 10, ball float 6 is placed in the sizing jar 3, the interior bar 71 of U-shaped ball lever 7 passes the loam cake 31 of sizing jar 3 and is rotated with on ball float 6, the outer bar 72 of U-shaped ball lever 7 extends downwards along the outer wall of sizing jar 3, bar 72 is provided with constant volume sensor 8 outside, be provided with scale 9 in side, last liquid level sensor 4 corresponding to constant volume sensor 8, following liquid level sensor 5, constant volume sensor 8 and solenoid directional control valve 10 all are electrically connected with control system 12.
Concrete using method of the present utility model is as follows:
Starting mechanical fluid infusion pump 2 by control system 12 imports the liquid of replenishing in the fluid reservoir 1 in the sizing jars 3 through woven hose 13, when liquid height reaches liquid level sensor 4, just sending signal to control system 12 closes mechanical fluid infusion pump 2 automatically and stops drawing liquid, cleaning machine begins cleaning silicon chip, after silicon chip has cleaned, it is logical by control system 12 solenoid directional control valve 10 must to be established by cable, solution in the sizing jar 3 leads in the rinse bath 11 through liquid supplementation pipe 14 at this moment, when the constant volume sensor 8 on the outer bar 72 that is fixed on U-shaped ball lever 7 moves down predetermined altitude, control system 12 is received the signal that constant volume sensor 8 is sent, close solenoid directional control valve 10 immediately, this moment, rinse bath 11 solution obtained accurately replenishing, cleaning machine changes the cleaning of next group silicon chip over to, and so forth.
Claims (1)
1. accurate automatic liquid supply device of constant volume type, it is characterized in that: it comprises fluid reservoir (1), machinery fluid infusion pump (2), sizing jar (3), last liquid level sensor (4), following liquid level sensor (5), ball float (6), U-shaped ball lever (7), constant volume sensor (8), scale (9), solenoid directional control valve (10), rinse bath (11) and control system (12), fluid reservoir (1) is arranged on by the full-automatic silicon wafer cleaner, deposit in the fluid reservoir (1) and treat make-up solution, be provided with the liquid feeding opening at fluid reservoir (1) top, supply operating personnel to the solution of wherein annotating, machinery fluid infusion pump (2) is arranged between fluid reservoir (1) and the sizing jar (3), on the sidewall of sizing jar (3), be provided with liquid level sensor (4) and following liquid level sensor (5), the liquid supplementation pipe (14) of drawing in sizing jar (3) bottom feeds rinse bath (11) through solenoid directional control valve (10), ball float (6) is placed in the sizing jar (3), the interior bar (71) of U-shaped ball lever (7) passes the loam cake (31) of sizing jar (3) and is rotated with on ball float (6), the outer bar (72) of U-shaped ball lever (7) extends downwards along the outer wall of sizing jar (3), bar (72) is provided with constant volume sensor (8) outside, be provided with scale (9) in side, last liquid level sensor (4) corresponding to constant volume sensor (8), following liquid level sensor (5), constant volume sensor (8) and solenoid directional control valve (10) all are electrically connected with control system (12).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN2010206854559U CN201940407U (en) | 2010-12-29 | 2010-12-29 | Constant volume precise automatic liquid supply device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN2010206854559U CN201940407U (en) | 2010-12-29 | 2010-12-29 | Constant volume precise automatic liquid supply device |
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CN201940407U true CN201940407U (en) | 2011-08-24 |
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CN2010206854559U Expired - Fee Related CN201940407U (en) | 2010-12-29 | 2010-12-29 | Constant volume precise automatic liquid supply device |
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Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102148285A (en) * | 2010-12-29 | 2011-08-10 | 常州亿晶光电科技有限公司 | Constant volume type accurate automatic liquid replenishing device |
CN102527654A (en) * | 2011-12-30 | 2012-07-04 | 重庆平伟实业股份有限公司 | Automatic quantitative spray machine and method thereof |
CN102784788A (en) * | 2012-08-28 | 2012-11-21 | 常州捷佳创精密机械有限公司 | Liquid level controlling and liquid supplementing device of silicon wafer cleaning tank |
CN103028564A (en) * | 2011-09-30 | 2013-04-10 | 金宝电子(中国)有限公司 | Solution supply unit, cleaning system and cleaning method thereof |
CN104148323A (en) * | 2014-07-29 | 2014-11-19 | 黄瑞权 | Automatic cleaning machine for dies |
CN104291256A (en) * | 2014-09-29 | 2015-01-21 | 浙江长华汽车零部件有限公司 | Solution replenishing device |
CN105396823A (en) * | 2015-12-18 | 2016-03-16 | 南车戚墅堰机车车辆工艺研究所有限公司 | Rotary spraying mechanism, cleaning machine with rotary spraying mechanism and cleaning method |
CN105396837A (en) * | 2015-12-18 | 2016-03-16 | 南车戚墅堰机车车辆工艺研究所有限公司 | Circulation filtering device, spraying cleaning machine with circulation filtering device and cleaning method |
CN107158464A (en) * | 2017-05-31 | 2017-09-15 | 陕西瑞盛生物科技有限公司 | A kind of automatic liquid supply formula takes off cell system |
CN109047150A (en) * | 2018-07-30 | 2018-12-21 | 吴佳锋 | A kind of environment-friendly automatic auto parts cleaning case |
CN109534271A (en) * | 2018-11-19 | 2019-03-29 | 长江大学 | Flow conductivity test in can automatic liquid supply intermediate receptacle and its application method |
CN109530316A (en) * | 2019-02-09 | 2019-03-29 | 重庆市黔江中心医院 | Automatic Compounding cleaning device |
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2010
- 2010-12-29 CN CN2010206854559U patent/CN201940407U/en not_active Expired - Fee Related
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102148285A (en) * | 2010-12-29 | 2011-08-10 | 常州亿晶光电科技有限公司 | Constant volume type accurate automatic liquid replenishing device |
CN102148285B (en) * | 2010-12-29 | 2014-07-30 | 常州亿晶光电科技有限公司 | Constant volume type accurate automatic liquid replenishing device |
CN103028564A (en) * | 2011-09-30 | 2013-04-10 | 金宝电子(中国)有限公司 | Solution supply unit, cleaning system and cleaning method thereof |
CN102527654A (en) * | 2011-12-30 | 2012-07-04 | 重庆平伟实业股份有限公司 | Automatic quantitative spray machine and method thereof |
CN102784788A (en) * | 2012-08-28 | 2012-11-21 | 常州捷佳创精密机械有限公司 | Liquid level controlling and liquid supplementing device of silicon wafer cleaning tank |
CN104148323A (en) * | 2014-07-29 | 2014-11-19 | 黄瑞权 | Automatic cleaning machine for dies |
CN104291256A (en) * | 2014-09-29 | 2015-01-21 | 浙江长华汽车零部件有限公司 | Solution replenishing device |
CN105396837A (en) * | 2015-12-18 | 2016-03-16 | 南车戚墅堰机车车辆工艺研究所有限公司 | Circulation filtering device, spraying cleaning machine with circulation filtering device and cleaning method |
CN105396823A (en) * | 2015-12-18 | 2016-03-16 | 南车戚墅堰机车车辆工艺研究所有限公司 | Rotary spraying mechanism, cleaning machine with rotary spraying mechanism and cleaning method |
CN107158464A (en) * | 2017-05-31 | 2017-09-15 | 陕西瑞盛生物科技有限公司 | A kind of automatic liquid supply formula takes off cell system |
CN109047150A (en) * | 2018-07-30 | 2018-12-21 | 吴佳锋 | A kind of environment-friendly automatic auto parts cleaning case |
CN109047150B (en) * | 2018-07-30 | 2021-12-28 | 潘松琪 | Automatic environmental protection auto parts washs case |
CN109534271A (en) * | 2018-11-19 | 2019-03-29 | 长江大学 | Flow conductivity test in can automatic liquid supply intermediate receptacle and its application method |
CN109530316A (en) * | 2019-02-09 | 2019-03-29 | 重庆市黔江中心医院 | Automatic Compounding cleaning device |
CN109530316B (en) * | 2019-02-09 | 2021-05-14 | 重庆市黔江中心医院 | Automatic agent cleaning device |
CN111977822A (en) * | 2020-08-26 | 2020-11-24 | 张翠川 | Industrial sewage treatment system |
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Legal Events
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110824 Termination date: 20141229 |
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EXPY | Termination of patent right or utility model |