CN201780955U - Electrostatic clamp - Google Patents
Electrostatic clamp Download PDFInfo
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- CN201780955U CN201780955U CN2010205328630U CN201020532863U CN201780955U CN 201780955 U CN201780955 U CN 201780955U CN 2010205328630 U CN2010205328630 U CN 2010205328630U CN 201020532863 U CN201020532863 U CN 201020532863U CN 201780955 U CN201780955 U CN 201780955U
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- electrostatic
- gas passage
- base material
- type crystalline
- crystalline ceramics
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Abstract
An electrostatic clamp comprises a clamping body, an electrode and a sintered crystallization ceramic tube, wherein the clamping body includes a substrate, an electrostatic absorption layer and a gas channel; the electrostatic absorption layer is superposed on the top surface of the substrate and used for the embedding of the electrode; the gas channel penetrates the substrate and the electrostatic absorption layer, and is provided with an upper part penetrating the electrostatic absorption layer and extending into the top of the substrate, as well as a lower part extending from the bottom end of the upper part to the bottom surface of the substrate. The sintered crystallization ceramic tube can be detachably plugged in the lower part, and the length ratio between the sintered crystallization ceramic tube and the lower part ranges from 0.25 to 1, so as to effectively suppress arc discharge at the lower part, facilitate the follow-up maintenance, and guarantee the overall good electrostatic absorption clamping effect.
Description
Technical field
The utility model relates to a kind of anchor clamps, particularly relates to a kind of electrostatic anchor clamps that utilize the Electrostatic Absorption mode to fix object.
Background technology
As shown in Figure 1; existing a kind of electrostatic chuck 1 comprises a base material 11; insulating barrier 12 on part that is stacked in this base material 11; the prime coat 13 that encloses this insulating barrier 12 is gone up and is encircled in other zones that are stacked in this base material 11; an adsorption layer 14 that is stacked on this prime coat 13 and this insulating barrier 12; an electrode 15 that is embedded in this adsorption layer 14; one runs through this base material 11; the gas passage 16 of this insulating barrier 12 and this adsorption layer 14; one is contained in this base material 11 and fit this insulating barrier 12 and ring enclose the ceramic block 17 of this gas passage 16, and one is contained in this base material 11 and ring encloses the protective layer 18 of this gas passage 16.On material, the material of this base material 11 is aluminum metal, and this insulating barrier 12 all is to starch the Al of meltallizing moulding with electricity with the material of this adsorption layer 14
2O
3, this prime coat 13 also is a metal material system, this protective layer 18 is to handle formed aluminum alloy films through anode surface; In addition according to dielectric strength, descendingly be arranged as in regular turn: ceramic block 17, insulating barrier 12/ adsorption layer 14, protective layer 18, base material 11/ prime coat 13.
In photoelectric process, can utilize this electrostatic chuck 1 that a glass substrate is accurately located, this glass substrate is placed on this adsorption layer 14, with this glass substrate as another electrode, between this glass substrate and this electrode 15, apply voltage, the two can produce this glass substrate and this adsorption layer 14 electrostatic attraction, make this glass substrate be able to Electrostatic Absorption and be fixed on this electrostatic chuck 1 because of capacity effect or strong Sen-Luo Beike effect (Johnsen-Fahbek Effect).After finishing processing procedure, remove the Electrostatic Absorption power of 1 of this glass substrate and this electrostatic chuck, cooperate gases at high pressure are injected this gas passage 16, make this glass substrate cooling and desorption be beneficial to get from.
Though; in the energising use of this electrostatic chuck 1; this protective layer 18 can produce protection to this gas passage 16; reduce this gas passage 16 to be punctured and produce the probability of arc discharge by electric current; in order to avoid have influence on the Electrostatic Absorption effect of 1 pair of glass substrate of this electrostatic chuck; yet; because protective layer 18 inside that present anode surface treatment technology is produced mostly are noncrystalline phase constitution greatly; the ability that block current flow punctures is not ideal enough; be heated to more than 1200 ℃ so must give again usually; making these protective layer 18 internal structures further change into crystalline phase organizes; but this high-temperature heating process probably can damage 11 body structures of this base material, real non-good plan.
In addition,, just must carry out anode surface to this base material 11 again and handle, form new protective layer 18 in these gas passage 16 surface regeneration, but whole regeneration maintenance process have following problem in case this protective layer 18 suffers that electric current punctures:
(1) time-consuming consumption worker; maintenance cost height: before carrying out Regeneration Treatment; must earlier the miscellaneous part dismounting be separated; could carry out anode treatment to this base material 1; generating new protective layer 18, and then miscellaneous part is organized backed again, owing to anode surface treatment technology itself is just quite consuming time, complicated in this gas passage 16 surfaces; repeated multiple times is carried out, and can cause maintenance cost quite high.
(2) will change gas flow after the regeneration: in regenerative process; must use corrosive liquid will suffer the residual thickness removal of the protective layer 18 of electric current puncture earlier; just can carry out anode treatment once more; generate new protective layer 18 on these gas passage 16 surfaces; but corrosive liquid also may corrode these gas passage 16 surfaces simultaneously; cause this gas passage 16 to widen, after repeatedly repeating regeneration, this gas passage 16 can impact gas flow because of constantly widening.
As shown in the above; handled the mode that this gas passage 16 is produced the protection effect by anode surface in the past; reduce the effect that arc discharge produces probability though can reach; but when carrying out upkeep operation in the future; but can produce the maintenance cost height; influence problems such as gas flow with causing this gas passage 16 to widen, should improve.
Summary of the invention
The purpose of this utility model is to provide a kind of effective inhibition arc discharge phenomenon and is convenient to safeguard, to guarantee to keep the electrostatic anchor clamps of good Electrostatic Absorption clamping effect.
Electrostatic anchor clamps of the present utility model, comprise a clamping body, an electrode, and slug type crystalline ceramics pipe, this clamping body comprises a base material, one is stacked in the end face of this base material and supplies the embedding Electrostatic Absorption layer wherein of this electrode, and gas passage that runs through this base material and this Electrostatic Absorption layer, this gas passage has an epimere portion of running through this Electrostatic Absorption layer and extending into the top of this base material, and bottom from this epimere portion extends to the hypomere portion of the bottom surface of this base material, this slug type crystalline ceramics pipe can plug removably in this hypomere portion, and the length ratio of itself and this hypomere portion is between 0.25 and 1.
Electrostatic anchor clamps described in the utility model, also comprise a slug type crystalline ceramics piece, this slug type crystalline ceramics piece is arranged on a bottom of enclosing this epimere portion in this base material with ring, and between the hypomere portion of a bottom surface of this Electrostatic Absorption layer and this gas passage.
Electrostatic anchor clamps described in the utility model, this Electrostatic Absorption layer has an adsorption layer portion, one and is positioned between an end face of a bottom surface of this adsorption layer portion and this slug type crystalline ceramics piece and ring encloses the insulating barrier portion of this epimere portion, and between the end face of bottom surface that is positioned at this adsorption layer portion and this base material and encircle the prime coat portion that encloses this insulating barrier portion.
Electrostatic anchor clamps described in the utility model, the cross-sectional area of the epimere portion of this gas passage is less than the cross-sectional area of this hypomere portion.
Electrostatic anchor clamps described in the utility model, the bottom surface consubstantiality of this slug type crystalline ceramics piece connects the end face of this slug type crystalline ceramics pipe.
Electrostatic anchor clamps described in the utility model, this epimere portion of this gas passage and the cross section of this hypomere portion are circular.
The beneficial effects of the utility model are: utilize this slug type crystalline ceramics pipe and this hypomere portion to form the structure of particular length ratio, effectively reduce the probability that this gas passage produces the arc discharge phenomenon, guarantee that integral body keeps good Electrostatic Absorption clamping effect; And, can plug structure in this hypomere portion removably by this slug type crystalline ceramics pipe, not only quite easy in the follow-up maintenance operation, operating cost is low, can not have influence on original dimensional structure of this gas passage simultaneously.
Description of drawings
Fig. 1 is a structural representation, and the structure of general electrostatic chuck is described;
Fig. 2 is a structural representation, and the structure of one first preferred embodiment of electrostatic anchor clamps of the present utility model is described;
Fig. 3 is a structural representation, and the partial structurtes of one second preferred embodiment of electrostatic anchor clamps of the present utility model are described.
Embodiment
Below in conjunction with drawings and Examples the utility model is elaborated.
Before the utility model is described in detail, be noted that in the following description content, similar elements is represented with identical numbering.
As shown in Figure 2, one first preferred embodiment of electrostatic anchor clamps 2 of the present utility model is used in the photoelectric process, a glass substrate 3 is accurately located, but its practical application area category is not as limit.
These electrostatic anchor clamps 2 comprise a clamping body 21, electrode 22, a slug type crystalline ceramics piece 23, and a slug type crystalline ceramics pipe 24.
This clamping body 21 comprises a base material 211, an Electrostatic Absorption layer 212 that is stacked in an end face of this base material 211, and a gas passage 213 that runs through this base material 211 and this Electrostatic Absorption layer 212.In the following description content, the face that this Electrostatic Absorption layer 212 is stacked on this base material 211 is the bottom surface of this Electrostatic Absorption layer 212; Corresponding, this base material 211 is the end face of this base material 211 near the face of this Electrostatic Absorption layer 212.In the present embodiment, this base material 211 is made by aluminum metal.
This gas passage 213 can inject for gases at high pressure, so that this glass substrate 3 is cooled off and desorption.This gas passage 213 has one and runs through the epimere portion 214 that this Electrostatic Absorption layer 212 an and one bottom extends into a top of this base material 211, and bottom from this epimere portion 214 extends to the hypomere portion 215 of the bottom surface of this base material 211, and the cross-sectional area of this epimere portion 214 is less than the cross-sectional area of this hypomere portion 215.In the present embodiment, this epimere portion 214 of this gas passage 213 and the cross section of this hypomere portion 215 are circular, and the diameter of this epimere portion 214 is less than the diameter of this hypomere portion 215.
This Electrostatic Absorption layer 212 has that a ring encloses the adsorption layer portion 216 of the epimere portion 214 of this gas passage 213, a consubstantiality is arranged on the bottom surface of this adsorption layer portion 216 and the insulating barrier portion 217 that ring encloses this epimere portion 214, and between the end face of bottom surface that is positioned at this adsorption layer portion 216 and this base material 211 and ring enclose the prime coat portion 218 of this insulating barrier portion 217.This electrode 22 is embedded in this adsorption layer portion 216.In the present embodiment, this insulating barrier portion 217 all is to starch the Al of meltallizing moulding with electricity with the material of this adsorption layer portion 216
2O
3, this prime coat portion 218 also is a metal material system.
The diameter of the external diameter of this slug type crystalline ceramics pipe 24 and the hypomere portion 215 of this gas passage 213 about equally, and can plug and cement in the top of this hypomere portion 215 removably, specifically, this slug type crystalline ceramics pipe 24 can be through the bottom end opening place of this hypomere portion 215, plug and be fixed in this hypomere portion 215, or separate this hypomere portion 215.Moreover the length ratio of this slug type crystalline ceramics pipe 24 and this hypomere portion 215 is between 0.25 and 1, and in the present embodiment, this slug type crystalline ceramics pipe 24 is 0.25 with the length ratio of this hypomere portion 215.In addition, crystalline ceramics pipe 24 does not exceed with the simple geometric shape with the epimere portion 214 of gas passage 213, the cross sectional shape of hypomere portion 215, as long as the outer peripheral face of crystalline ceramics pipe 24 and the inner peripheral surface of this hypomere portion 215 can closely cooperate.
These slug type crystalline ceramics piece 23 flat embeddings are arranged on the top of this base material 211, and between the hypomere portion 215 of the bottom surface of this insulating barrier portion 217 and this gas passage 213, and, the bottom that these slug type crystalline ceramics piece 23 rings enclose the epimere portion 214 of this gas passage 213.In the present embodiment, this slug type crystalline ceramics piece 23 is between the bottom surface and this slug type crystalline ceramics pipe 24 of this Electrostatic Absorption layer 212.
In the present embodiment, this slug type crystalline ceramics piece 23 and this slug type crystalline ceramics pipe 24 are independent moulding respectively, the material of the two is selected from aluminium oxide, aluminium carbide, aluminium nitride, silica, carborundum, silicon nitride, yittrium oxide, yttrium carbide, yttrium nitride, tantalum oxide, ramet, tantalum nitride, zirconia, zirconium carbide, zirconium nitride, or the combination of above-mentioned material.The dielectric strength of just encircling all parts that enclose this gas passage 213 is made comparisons in addition, and the dielectric strength value is arranged as from big to small in regular turn: slug type crystalline ceramics piece 23/ slug type crystalline ceramics pipe 24,217/ adsorption layer portion 216 of insulating barrier portion, base material 211/ prime coat portion 218.
Therefore, in the energising use of these electrostatic anchor clamps 2, utilize this slug type crystalline ceramics pipe 24 and this hypomere portion 215 to form the particular length ratio relation, effectively block current flow punctures this base material 211 from the hypomere portion 215 of this gas passage 213, effectively reduce the probability that these hypomere portion 215 places produce the arc discharge phenomenon simultaneously, can guarantee that so, just these electrostatic anchor clamps 2 integral body keep good Electrostatic Absorption clamping effect.
Moreover, when this slug type crystalline ceramics pipe 24 damages, the structure that can carry out dismounting by hypomere portion 215 bottoms of this gas passage 213 by this slug type crystalline ceramics pipe 24, just can be light, easily this slug type crystalline ceramics pipe 24 is changed, do not need extensive dismounting miscellaneous part fully, it is quite convenient to can be described as on safeguarding, operating cost is also very low, simultaneously, this kind upkeep operation mode can not have influence on original dimensional structure of this gas passage 213, guaranteed the stability of gas flow, improve in the past 1 pair of gas passage of electrostatic chuck as shown in Figure 1 16 carry out anode surface handle due to the maintenance cost height, and gas passage 16 is constantly widened and influenced problem such as gas flow.
As shown in Figure 3, one second preferred embodiment for electrostatic anchor clamps 2 of the present utility model, the places different with above-mentioned this first preferred embodiment are, this slug type crystalline ceramics piece 23 is formed in one with this slug type crystalline ceramics pipe 24 and makes, just the bottom surface consubstantiality of this slug type crystalline ceramics piece 23 connects the end face of this slug type crystalline ceramics pipe 24, and in the present embodiment, this slug type crystalline ceramics pipe 24 is 1 with the length ratio of the hypomere portion 215 of this gas passage 213.In addition, when carrying out follow-up maintenance, must disassemble miscellaneous part, make this slug type crystalline ceramics piece 23 be able to intercalation and go in this base material 211 with this slug type crystalline ceramics pipe 24, or detach this base material 211 together, it is just passable miscellaneous part to be reset back at last again.
Similarly, present embodiment also can reach effective inhibition arc discharge phenomenon certainly, be convenient to safeguard, and keeps effects such as good Electrostatic Absorption clamping effect.
Further, do actual checking with regard to effective inhibition arc discharge ability of the present utility model, with the length ratio of this slug type crystalline ceramics pipe 24 and the hypomere portion 215 of this gas passage 213 as the experiment factor, be 0.25 (to be exactly above-mentioned this first preferred embodiment with regard to length ratio respectively, to call experimental example 1 in the following text), 0.5 (to call experimental example 2 in the following text) and 1 (is exactly above-mentioned this second preferred embodiment, to call experimental example 3 in the following text) test, and with do not establish slug type crystalline ceramics pipe (to call comparative example 1 in the following text), length ratio less than 0.25 (to call comparative example 2 in the following text, wherein length ratio is 0.10) compare comparison, moreover, other associative operation conditions of above-mentioned test process are: setting voltage is 6000 volts, setting the up voltage gradient is 30 volts/second, and continuing 720 seconds, every group of testing time is 50 times.
By the test result shown in [table 1] as can be known, at experimental example 1 to experimental example 3, the arc discharge phenomenon can not take place in the hypomere portion 215 of this gas passage 213 fully, arc discharge generation probability is zero, relatively, in comparative example 1 and comparative example 2, this hypomere portion 215 produces the probability of arc discharge phenomenon but up to more than seventy percent, the result proves thus, when not establishing earthenware 24 or this earthenware 24 when too short, obviously can't block current flow puncture this hypomere portion 215, also can't suppress the arc discharge phenomenon takes place, and the utility model utilizes the particular length ratio design of this slug type crystalline ceramics pipe 24 and this hypomere portion 215, can effectively suppress really in these hypomere portion 215 places the arc discharge phenomenon takes place, and guarantees that integral body keeps good Electrostatic Absorption effect.
[table 1]
| Length ratio=earthenware length/hypomere minister degree | Arc discharge generation probability | |
| Experimental example 1 | ?0.25 | 0％ |
| Experimental example 2 | ?0.5 | 0％ |
| Experimental example 3 | ?1 | 0％ |
| Comparative example 1 | ?- | 80％ |
| Comparative example 2 | ?0.10 | 70％ |
Claims (6)
1. electrostatic anchor clamps, comprise a clamping body, and electrode, this clamping body comprises a base material, an end face and the embedding Electrostatic Absorption layer wherein of this electrode of confession that is stacked in this base material, and gas passage that runs through this base material and this Electrostatic Absorption layer, this gas passage has an epimere portion of running through this Electrostatic Absorption layer and extending into the top of this base material, and bottom from this epimere portion extends to the hypomere portion of the bottom surface of this base material; It is characterized in that: these electrostatic anchor clamps also comprise a slug type crystalline ceramics pipe that can plug removably in the hypomere portion of this gas passage, and the length ratio of this slug type crystalline ceramics pipe and this hypomere portion is between 0.25 and 1.
2. electrostatic anchor clamps according to claim 1, it is characterized in that: these electrostatic anchor clamps also comprise a slug type crystalline ceramics piece, this slug type crystalline ceramics piece is arranged on the bottom of enclosing the epimere portion of this gas passage in this base material with ring, and between the hypomere portion of the bottom surface of this Electrostatic Absorption layer and this gas passage.
3. electrostatic anchor clamps according to claim 2, it is characterized in that: this Electrostatic Absorption layer has an adsorption layer portion, one and is positioned between the end face of the bottom surface of this adsorption layer portion and this slug type crystalline ceramics piece and ring encloses the insulating barrier portion of the epimere portion of this gas passage, and between the end face of bottom surface that is positioned at this adsorption layer portion and this base material and encircle the prime coat portion that encloses this insulating barrier portion.
4. according to the described electrostatic anchor clamps of arbitrary claim in the claim 1 to 3, it is characterized in that: the cross-sectional area of the epimere portion of this gas passage is less than the cross-sectional area of this hypomere portion.
5. according to claim 2 or 3 described electrostatic anchor clamps, it is characterized in that: the bottom surface consubstantiality of this slug type crystalline ceramics piece connects the end face of this slug type crystalline ceramics pipe.
6. electrostatic anchor clamps according to claim 4 is characterized in that: this epimere portion of this gas passage and the cross section of this hypomere portion are for circular.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010205328630U CN201780955U (en) | 2010-09-17 | 2010-09-17 | Electrostatic clamp |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010205328630U CN201780955U (en) | 2010-09-17 | 2010-09-17 | Electrostatic clamp |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201780955U true CN201780955U (en) | 2011-03-30 |
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ID=43794160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010205328630U Expired - Lifetime CN201780955U (en) | 2010-09-17 | 2010-09-17 | Electrostatic clamp |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201780955U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107644831A (en) * | 2016-07-20 | 2018-01-30 | 三星显示有限公司 | Electrostatic chuck |
-
2010
- 2010-09-17 CN CN2010205328630U patent/CN201780955U/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107644831A (en) * | 2016-07-20 | 2018-01-30 | 三星显示有限公司 | Electrostatic chuck |
| CN107644831B (en) * | 2016-07-20 | 2023-03-17 | 三星显示有限公司 | Electrostatic clamp |
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| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20110330 |