CN201575796U - Manually-driven alignment objective table for measuring thickness of solar battery - Google Patents

Manually-driven alignment objective table for measuring thickness of solar battery Download PDF

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Publication number
CN201575796U
CN201575796U CN2009202827155U CN200920282715U CN201575796U CN 201575796 U CN201575796 U CN 201575796U CN 2009202827155 U CN2009202827155 U CN 2009202827155U CN 200920282715 U CN200920282715 U CN 200920282715U CN 201575796 U CN201575796 U CN 201575796U
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China
Prior art keywords
platform
silicon chip
slide mechanism
objective table
axis slide
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Expired - Fee Related
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CN2009202827155U
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Chinese (zh)
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杨文侃
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Changzhou Trina Solar Energy Co Ltd
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Changzhou Trina Solar Energy Co Ltd
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Abstract

The utility model relates to a manually-driven alignment objective table for measuring the thickness of a solar battery, especially for accommodating a solar battery silicon chip to measure the thickness of the thin film on the surface of the silicon chip. A second platform moves in the X-axis direction along a first platform through an X-axis slide mechanism, a fourth platform moves in the Y-axis direction along a third platform through a Y-axis slide mechanism, and the second platform and the third platform are relatively fixed; an X-axis plug-type fixing device for fixing the second platform in a plugged manner is arranged in the middle of the X-axis slide mechanism, and a Y-axis plug-type fixing device for fixing the fourth platform in a plugged manner is arranged in the middle of the Y-axis slide mechanism; and a silicon chip accommodating box for accommodating the silicon chip is fixed above the fourth platform. The utility model can perform precise position alignment to the solar battery silicon chip to be measured, and the measurement results can reflect the distribution state of the thickness of the silicon chip surface in an all-sided manner.

Description

A kind of solar cell thickness measures the manual alignment objective table
Technical field
The utility model relates to solar battery sheet film thickness measurement objective table, measures the manual alignment objective table in particular for the solar cell thickness of measuring solar battery sheet silicon nitride film thickness.
Background technology
At present, solar battery sheet silicon nitride film thickness measures the main elliptic polarization measured thin film technology that adopts, during measurement with silicon slice placed on the micrometering objective table of routine, by aiming at the measuring position manually, error in measurement is bigger, can't accurately calculate the uniformity coefficient of silicon wafer thickness, damage silicon chip simultaneously easily.
The utility model content
The technical problems to be solved in the utility model is: overcome the deficiencies in the prior art, provide a kind of solar cell thickness to measure the manual alignment objective table, can carry out accurate position alignment to the silicon chip of solar cell that need are measured, measurement can reflect the distribution situation of silicon chip surface thickness comprehensively.
The technical scheme that its technical matters that solves the utility model adopts is: a kind of solar cell thickness measures the manual alignment objective table, be used to place silicon chip of solar cell so that the silicon chip surface film thickness is measured, has the measurement objective table, described measurement objective table has first platform, second platform, the 3rd platform and Siping City's platform from bottom to up, second platform moves in X-direction along first platform by the X-axis slide mechanism, and its moving range is at least silicon chip 0.8 times in the X-direction size; Siping City's platform moves in Y direction along the 3rd platform by the Y-axis slide mechanism, and its moving range is at least silicon chip 0.8 times in the Y direction size; Second platform and the 3rd platform relative fixed.
The centre position of described X-axis slide mechanism is provided with one second platform is inserted fixing X-axis plug-in mounting device.
The centre position of described Y-axis slide mechanism is provided with one Siping City's platform is inserted fixing Y-axis plug-in mounting device.
Insert fixing with X-axis plug-in mounting device to second platform, second platform can not move in X-direction, whole objective table is only to move in Y direction, insert fixing with Y-axis plug-in mounting device to Siping City's platform, Siping City's platform can not move in Y direction, and whole objective table is only to move in X-direction.
Described Siping City platform upper fixed has a silicon chip holder that is used to place silicon chip, and the size of silicon chip holder length and width direction is all grown 2~10mm than the size of silicon chip length and width direction.Because of silicon chip holder size is slightly larger than die size, silicon chip is placed in the silicon chip holder and can arbitrarily move.
Further, described X-axis slide mechanism and Y-axis slide mechanism all adopt the ball spout slide mechanism.
If die size is 156*156mm, silicon chip holder size can be 161*161mm, and its second platform in X-direction and Siping City's platform in the moving range of Y direction is ± 68mm.
If die size is 125*125mm, silicon chip holder size can be that its second platform of 131*131mm is ± 52.5mm in the moving range of Y direction in X-direction and Siping City's platform.
Second platform all has certain moving range in X-direction and Siping City's platform in Y direction, can guarantee that the center of nine measurement points of silicon chip all can be measured to.
During measurement, the silicon chip of solar cell of required measurement is put into the silicon chip holder, can carry out accurate position alignment to silicon chip, silicon chip is carried out nine point measurements according to table 1.As shown in table 1, when second platform is adjusted to left-most position in X-direction, Siping City's platform is when Y direction is adjusted to right-most position, the measurement point of silicon chip point 1 on the corresponding silicon chip, according to elliptic polarization measured thin film technology, the measurement hot spot of ellipsometer is positioned at the measuring center of silicon chip point 1, can record silicon chip and put the film thickness at 1 place, when second platform is adjusted to the centre position in X-direction, Siping City's platform is when Y direction is adjusted to right-most position, the measurement point of silicon chip point 2 on the corresponding silicon chip, the measurement hot spot of ellipsometer is positioned at the measuring center of silicon chip point 2, can record the film thickness that silicon chip is put 2 places, and the like, the film thickness situation of nine measurement points of silicon chip surface can be accurately learnt, thereby the distribution situation of silicon chip surface film thickness can be effectively reflected.
Table 1
Figure G2009202827155D00031
The beneficial effects of the utility model are: in sum, the utility model can carry out accurate position alignment to the silicon chip of solar cell that need are measured, and measurement can reflect the distribution situation of silicon chip surface thickness comprehensively.
Description of drawings
Below in conjunction with accompanying drawing the utility model is further specified.
Fig. 1 is a structural representation of the present utility model;
Wherein: 1. first platform, 2. Siping City's platform, 3. silicon chip holder, 4.X axle plug-in mounting device, 5.Y axle plug-in mounting device, 6. silicon chip
Embodiment
A kind of solar cell thickness as shown in Figure 1 measures the manual alignment objective table, has the measurement objective table, measure objective table and have first platform 1, second platform, the 3rd platform and Siping City's platform 2 from bottom to up, platform 2 upper fixed in Siping City's have a silicon chip holder 3, place silicon chip 6 in the silicon chip holder 3.
Second platform moves in X-direction along first platform 1 by the X-axis slide mechanism, and Siping City's platform 2 moves in Y direction along the 3rd platform by the Y-axis slide mechanism, second platform and the 3rd platform relative fixed.X-axis slide mechanism and Y-axis slide mechanism all adopt the ball spout slide mechanism.
The centre position of X-axis slide mechanism is provided with one second platform is inserted fixing X-axis plug-in mounting device 4.
The centre position of Y-axis slide mechanism is provided with one Siping City's platform is inserted fixing Y-axis plug-in mounting device 5.
For example, the die size that needs to measure is 156*156mm, and silicon chip holder size is 161*161mm, and its second platform in X-direction and Siping City's platform in the moving range of Y direction is ± 68mm.
Insert fixing with 4 pairs second platforms of X-axis plug-in mounting device, second platform can not move in X-direction, whole objective table is only to move in Y direction, insert fixing with 5 pairs of Siping City's platforms 2 of Y-axis plug-in mounting device, Siping City's platform 2 can not move in Y direction, and whole objective table is only to move in X-direction.
During measurement, silicon chip 6 is put into the silicon chip holder 3 of Siping City's platform 2 tops, can carry out accurate position alignment to silicon chip 6, silicon chip 6 is carried out nine point measurements according to table 1.As shown in table 1, when second platform is adjusted to left-most position in X-direction, Siping City's platform 2 is when Y direction is adjusted to right-most position, the measurement point of silicon chip point 1 on the corresponding silicon chip 6, according to elliptic polarization measured thin film technology, the measurement hot spot of ellipsometer is positioned at the measuring center of silicon chip point 1, can record the film thickness that silicon chip is put 1 place; When second platform is adjusted to the centre position in X-direction, Siping City's platform is when Y direction is adjusted to the centre position, the measurement point of silicon chip point 5 on the corresponding silicon chip, it is the center of silicon chip, the measurement hot spot of ellipsometer is positioned at the center of silicon chip, and can record silicon chip and put the film thickness that 5 places are the silicon chip center, and the like, the film thickness situation of nine measurement points in silicon chip 6 surfaces can be accurately learnt, thereby the distribution situation of silicon chip 6 surface film thickness can be effectively reflected.

Claims (3)

1. a solar cell thickness measures the manual alignment objective table, be used to place silicon chip of solar cell so that the silicon chip surface film thickness is measured, has the measurement objective table, it is characterized in that: described measurement objective table has first platform, second platform, the 3rd platform and Siping City's platform from bottom to up, second platform moves in X-direction along first platform by the X-axis slide mechanism, and its moving range is at least silicon chip 0.8 times in the X-direction size; Siping City's platform moves in Y direction along the 3rd platform by the Y-axis slide mechanism, and its moving range is at least silicon chip 0.8 times in the Y direction size; Second platform and the 3rd platform relative fixed,
The centre position of described X-axis slide mechanism is provided with one second platform is inserted fixing X-axis plug-in mounting device;
The centre position of described Y-axis slide mechanism is provided with one Siping City's platform is inserted fixing Y-axis plug-in mounting device.
2. a kind of solar cell thickness according to claim 1 measures the manual alignment objective table, it is characterized in that: described Siping City platform upper fixed has a silicon chip holder that is used to place silicon chip, and the size of silicon chip holder length and width direction is all grown 2~10mm than the size of silicon chip length and width direction.
3. a kind of solar cell thickness according to claim 1 measures the manual alignment objective table, and it is characterized in that: described X-axis slide mechanism and Y-axis slide mechanism all adopt the ball spout slide mechanism.
CN2009202827155U 2009-12-28 2009-12-28 Manually-driven alignment objective table for measuring thickness of solar battery Expired - Fee Related CN201575796U (en)

Priority Applications (1)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102519365A (en) * 2011-12-06 2012-06-27 桂林电子科技大学 Detector of properties of gate line of solar cell piece
TWI481813B (en) * 2012-12-07 2015-04-21 Tsmc Solar Ltd Method and apparatus for measuring thickness of a solar cell film and method for measuring thickness at multiple locations on a solar cell module
CN107202542A (en) * 2017-08-02 2017-09-26 常州工学院 The measuring thickness device and thickness measuring method of a kind of solar battery sheet

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102519365A (en) * 2011-12-06 2012-06-27 桂林电子科技大学 Detector of properties of gate line of solar cell piece
TWI481813B (en) * 2012-12-07 2015-04-21 Tsmc Solar Ltd Method and apparatus for measuring thickness of a solar cell film and method for measuring thickness at multiple locations on a solar cell module
US9689912B2 (en) 2012-12-07 2017-06-27 Taiwan Semiconductor Manufacturing Co., Ltd. Rapid analysis of buffer layer thickness for thin film solar cells
CN107202542A (en) * 2017-08-02 2017-09-26 常州工学院 The measuring thickness device and thickness measuring method of a kind of solar battery sheet

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Granted publication date: 20100908

Termination date: 20131228