CN201556023U - Wafer air-flow flusher - Google Patents
Wafer air-flow flusher Download PDFInfo
- Publication number
- CN201556023U CN201556023U CN 200920232183 CN200920232183U CN201556023U CN 201556023 U CN201556023 U CN 201556023U CN 200920232183 CN200920232183 CN 200920232183 CN 200920232183 U CN200920232183 U CN 200920232183U CN 201556023 U CN201556023 U CN 201556023U
- Authority
- CN
- China
- Prior art keywords
- air nozzle
- wafer
- enclosed cavity
- box
- spool box
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Abstract
The utility model relates to a wafer air-flow flusher which comprises an enclosed cavity, a film box and an air nozzle, wherein the film box and the air nozzle are arranged on the enclosed cavity, and the open end of the film box is arranged oppositely to the air nozzle which is connected with an air source, thus, wafers in the film box can be blown into the enclosed cavity by the sir floe through the air nozzle, on one hand, the static electricity between wafers is removed, on the other hand, the collecting of the dropping wafers are convenient.
Description
Technical field
The utility model relates to a kind of wafer gas flow flusher, belongs to the wafer process field.
Background technology
Because the wafer volume is little, thin thickness, therefore, very easily produce static between the wafer, when then wafer being poured out in spool box, because electrostatic interaction usually has wafer to stick in the spool box, in the prior art, the general hair-dryer that adopts blows out these wafers of being close to the spool box bottom, and still, this mode is inconvenient operation on the one hand, then be easily collecting not after wafer blows out on the other hand, fly around.
The utility model content
The utility model is at the demand of prior art, a kind of wafer gas flow flusher is provided, and it is removed with the static that will keep somewhere between the wafer in spool box by airflow scouring, it is dropped in the enclosed cavity, be convenient to the collection of wafer and the utilization again of spool box.
For realizing above technical purpose, the utility model will be taked following technical scheme.
A kind of wafer gas flow flusher comprises enclosed cavity and is installed in spool box and air nozzle on the enclosed cavity that the opening end of described spool box is placed towards air nozzle, and air nozzle is connected with source of the gas.
Offer the box body putting hole suitable with the spool box outside wall surface on the described enclosed cavity, then spool box places in this box body putting hole.
Enclosed cavity is the rectangular parallelepiped cavity, and described spool box and air nozzle are installed in respectively on two opposite faces of this rectangular parallelepiped cavity.
According to above technical scheme, can realize following beneficial effect:
The utility model is installed in spool box and air nozzle on the enclosed cavity, and the opening end of spool box is placed towards air nozzle, then can the wafer in the spool box be dashed and fall in the enclosed cavity by the air-flow of air nozzle ejection, remove the static between the wafer on the one hand, also conveniently fall the collection of wafer on the other hand.
Description of drawings
Fig. 1 is a structural representation of the present utility model.
Embodiment
Explain the technical solution of the utility model below with reference to accompanying drawing.
As shown in Figure 1, wafer gas flow flusher described in the utility model, comprise enclosed cavity 1 and be installed in spool box 2 and air nozzle 31 on the enclosed cavity 1, the opening end of spool box 2 is placed towards air nozzle 31, and air nozzle 31 is connected with source of the gas 32, offer on the described enclosed cavity 1 and the suitable box body putting hole of spool box 2 outside wall surface, then spool box 2 places in this box body putting hole, enclosed cavity 1 described in the utility model is the rectangular parallelepiped cavity, and described spool box 2 and air nozzle 31 are installed in respectively on two opposite faces of this rectangular parallelepiped enclosed cavity 1.
During use, there is the spool box 2 of wafer to be installed on the enclosed cavity 1 indwelling, then air nozzle 31 is connected source of the gas 32, then air nozzle 31 is aimed at spool box 2 and carry out airflow scouring, thereby will place the wafer in this spool box 2 to blow off in enclosed cavity 1, to remove the static between the wafer, carry out the recycling of wafer collection and spool box 2 then.
Claims (3)
1. a wafer gas flow flusher is characterized in that, comprises enclosed cavity and is installed in enclosed cavity fix the film box and air nozzle, and the opening end of described spool box is placed towards air nozzle, and air nozzle is connected with source of the gas.
2. wafer gas flow flusher according to claim 1 is characterized in that, offers the box body putting hole suitable with the spool box outside wall surface on the described enclosed cavity, and then spool box places in this box body putting hole.
3. wafer gas flow flusher according to claim 1 and 2 is characterized in that, enclosed cavity is the rectangular parallelepiped cavity, and described spool box and air nozzle are installed in respectively on two opposite faces of this rectangular parallelepiped cavity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200920232183 CN201556023U (en) | 2009-09-11 | 2009-09-11 | Wafer air-flow flusher |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200920232183 CN201556023U (en) | 2009-09-11 | 2009-09-11 | Wafer air-flow flusher |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201556023U true CN201556023U (en) | 2010-08-18 |
Family
ID=42615712
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200920232183 Expired - Fee Related CN201556023U (en) | 2009-09-11 | 2009-09-11 | Wafer air-flow flusher |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201556023U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101972758A (en) * | 2010-10-27 | 2011-02-16 | 镇江市港南电子有限公司 | Silicon wafer flushing mechanism |
| CN101972757A (en) * | 2010-10-27 | 2011-02-16 | 镇江市港南电子有限公司 | Connecting mechanism for silicon wafer washing device |
| CN102427047A (en) * | 2011-09-28 | 2012-04-25 | 上海华力微电子有限公司 | Wafer back cleaning device and wafer back cleaning method |
-
2009
- 2009-09-11 CN CN 200920232183 patent/CN201556023U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101972758A (en) * | 2010-10-27 | 2011-02-16 | 镇江市港南电子有限公司 | Silicon wafer flushing mechanism |
| CN101972757A (en) * | 2010-10-27 | 2011-02-16 | 镇江市港南电子有限公司 | Connecting mechanism for silicon wafer washing device |
| CN102427047A (en) * | 2011-09-28 | 2012-04-25 | 上海华力微电子有限公司 | Wafer back cleaning device and wafer back cleaning method |
| CN102427047B (en) * | 2011-09-28 | 2014-03-12 | 上海华力微电子有限公司 | Wafer back cleaning device and wafer back cleaning method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100818 Termination date: 20110911 |