CN201545935U - 一种用于控制真空生长室内气体压力的压力自动控制装置 - Google Patents
一种用于控制真空生长室内气体压力的压力自动控制装置 Download PDFInfo
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- CN201545935U CN201545935U CN2009202223418U CN200920222341U CN201545935U CN 201545935 U CN201545935 U CN 201545935U CN 2009202223418 U CN2009202223418 U CN 2009202223418U CN 200920222341 U CN200920222341 U CN 200920222341U CN 201545935 U CN201545935 U CN 201545935U
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- 239000013078 crystal Substances 0.000 claims abstract description 25
- 239000007789 gas Substances 0.000 claims description 52
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 19
- 238000005516 engineering process Methods 0.000 description 7
- 239000000843 powder Substances 0.000 description 5
- 238000005086 pumping Methods 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
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- 241000209456 Plumbago Species 0.000 description 3
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- 238000002425 crystallisation Methods 0.000 description 2
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
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- 239000011261 inert gas Substances 0.000 description 2
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- 229910002804 graphite Inorganic materials 0.000 description 1
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CN2009202223418U CN201545935U (zh) | 2009-09-02 | 2009-09-02 | 一种用于控制真空生长室内气体压力的压力自动控制装置 |
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CN2009202223418U CN201545935U (zh) | 2009-09-02 | 2009-09-02 | 一种用于控制真空生长室内气体压力的压力自动控制装置 |
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CN201545935U true CN201545935U (zh) | 2010-08-11 |
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CN2009202223418U Expired - Fee Related CN201545935U (zh) | 2009-09-02 | 2009-09-02 | 一种用于控制真空生长室内气体压力的压力自动控制装置 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110083183A (zh) * | 2019-04-25 | 2019-08-02 | 中国科学院武汉病毒研究所 | 一种生物安全实验室化学淋浴间压力调节方法及系统 |
CN112176404A (zh) * | 2019-07-03 | 2021-01-05 | 硅晶体有限公司 | 用于高效制造多个高质量半导体单晶的系统和方法 |
CN112176405A (zh) * | 2019-07-03 | 2021-01-05 | 硅晶体有限公司 | 水平生长高质量半导体单晶的系统及该单晶的制造方法 |
CN113220045A (zh) * | 2021-05-10 | 2021-08-06 | 南京英锐创电子科技有限公司 | 气压控制装置和方法 |
-
2009
- 2009-09-02 CN CN2009202223418U patent/CN201545935U/zh not_active Expired - Fee Related
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110083183A (zh) * | 2019-04-25 | 2019-08-02 | 中国科学院武汉病毒研究所 | 一种生物安全实验室化学淋浴间压力调节方法及系统 |
CN110083183B (zh) * | 2019-04-25 | 2021-07-23 | 中国科学院武汉病毒研究所 | 一种生物安全实验室化学淋浴间压力调节方法及系统 |
CN112176404A (zh) * | 2019-07-03 | 2021-01-05 | 硅晶体有限公司 | 用于高效制造多个高质量半导体单晶的系统和方法 |
CN112176405A (zh) * | 2019-07-03 | 2021-01-05 | 硅晶体有限公司 | 水平生长高质量半导体单晶的系统及该单晶的制造方法 |
US11479875B2 (en) | 2019-07-03 | 2022-10-25 | Sicrystal Gmbh | System for horizontal growth of high-quality semiconductor single crystals by physical vapor transport |
US11560643B2 (en) | 2019-07-03 | 2023-01-24 | Sicrystal Gmbh | System for efficient manufacturing of a plurality of high-quality semiconductor single crystals by physical vapor transport |
CN113220045A (zh) * | 2021-05-10 | 2021-08-06 | 南京英锐创电子科技有限公司 | 气压控制装置和方法 |
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Owner name: BEIJING SHENGSHIXING TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: WU SHENG Effective date: 20141023 |
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Effective date of registration: 20141023 Address after: 100195, 102, building 10, building C, Yiyuan cultural industry creative base, 65 almond Road, Beijing, Haidian District Patentee after: Beijing Sheng Xing Xing Technology Co., Ltd. Address before: 100080, room 2, building 701, South Third Street, Zhongguancun, Beijing, Haidian District Patentee before: Wu Cheng |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
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Granted publication date: 20100811 Termination date: 20160902 |