CN201488667U - Plasma jet igniter - Google Patents

Plasma jet igniter Download PDF

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Publication number
CN201488667U
CN201488667U CN2009200660970U CN200920066097U CN201488667U CN 201488667 U CN201488667 U CN 201488667U CN 2009200660970 U CN2009200660970 U CN 2009200660970U CN 200920066097 U CN200920066097 U CN 200920066097U CN 201488667 U CN201488667 U CN 201488667U
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CN
China
Prior art keywords
base
polysilicon
chip
pedestal
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN2009200660970U
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Chinese (zh)
Inventor
费凡
李爱夫
Original Assignee
HENGYANG TRANSISTOR CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HENGYANG TRANSISTOR CO Ltd filed Critical HENGYANG TRANSISTOR CO Ltd
Priority to CN2009200660970U priority Critical patent/CN201488667U/en
Application granted granted Critical
Publication of CN201488667U publication Critical patent/CN201488667U/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

A plasma jet igniter is characterized by consisting of a base, a polysilicon plasma ignition chip and an external shield, wherein the base has two concave pits that are formed by sinking the top surface into an upper concave pit and a lower concave pit; the chip is bonded in the lower concave pit of the base; the chip and an electrode conductor thereof are encapsulated in the base; the top surface on the external shield is provided with a crater that corresponds to the upper concave pit of the base and is clamped outside the base and covers the base; the extremely hot and high-speed jet polysilicon plasma particle ignition technology is used for replacing the traditional hot bridge wire ignition technology; under the excitation of electric pulse, the polysilicon mass block is fused from solid state to liquid state instantly and gasified from liquid state to gas state, thus forming the polysilicon plasma with high temperature, high pressure and acute impact by the constraining of the two concave pits; and the upper concave pit restrains the polysilicon plasma jetted in semi-spherical shape to directly enter a linear acceleration chamber to complete the jetting, therefore the detonator is detonated instantly by a fire flash vent; and the detonation energy is low, the detonation time is short, the electric detonator can be produced automatically in large scale, is applicable to different environments of high temperature and high pressure, and is safe and reliable.

Description

Plasma ejection igniter
Technical field
The utility model relates to a kind of igniter, particularly a kind of plasma ejection igniter.
Background technology
At present, in the igniter as civilian electric cap, ignition element is to adopt to wrap one deck chemical reagent on the heat bridge silk, by big electric current the bridge silk is heated in the bridge silk, thereby the chemical reagent that will wrap on the bridge silk adds thermal ignition.The chemical reagent layer is a manual application, be difficult to ensure the quality of products, and reaction speed is slow, and ignitor firing time is long, ignites poor stability in high temperature, hyperbaric environment easily.
Summary of the invention
The purpose of this utility model is in order to overcome above-mentioned weak point of the prior art, and provides a kind of volume little, and action time is short, safety, reliable, the plasma ejection igniter that adaptive capacity to environment is strong.
For achieving the above object, the technical solution adopted in the utility model is: plasma ejection igniter is by rewinding shape concave-concave pit foundation seat, polysilicon plasma igniting chip, outer shield is formed, be recessed into down successively in the middle of the end face on the pedestal, following concave-concave hole, polysilicon plasma igniting chip is followed successively by monocrystalline substrate from bottom to top, the dielectric bottom, the polysilicon mass that thin layer is arranged outward, insulating medium layer, the metal film electrode pad, in the following pit of die bonding in pedestal, its cathode lead is drawn by the inner chamber of pedestal bottom, chip, cathode lead is encapsulated in the pedestal, the pit of the corresponding pedestal of end face has bocca on the outer shield, and card covers on outside the pedestal.
The utility model with the traditional heat bridge silk firing technique of polysilicon plasma particle firing technique replacement of huge heat, high velocity jet, has been filled up the domestic technique blank owing to adopt above design.The polysilicon mass accurately is positioned in the following pit of pedestal, excitation following moment of electric pulse by solid-state molten for liquid, be gasificated into gaseous state by liquid state, and via concave-concave hole constraint formation high temperature, high pressure, the polysilicon plasma of severe impact, the polysilicon plasma confinement that last pit then will be hemispherical injection enters straight line and quickens thorax and finish accelerating jetting, ignition energy≤1.5mJ, action time≤3 μ s ignites, overcome the ignition energy height of heat bridge silk, long action time, reliability is low, shortcomings such as poor anti jamming capability, volume is little, can carry out automatic mass production, be adapted to high temperature, various environment such as high pressure use down, safety, reliably.
Description of drawings
Fig. 1 is the utility model structural representation;
Fig. 2 is the A-A generalized section of Fig. 1;
Fig. 3 is a polysilicon plasma igniting chip structure generalized section.
The specific embodiment
Now illustrated embodiment is made detailed description to the utility model in conjunction with the accompanying drawings.
As shown in the figure, plasma ejection igniter is by rewinding shape concave-concave hole injection moulding pedestal 1, polysilicon plasma igniting chip 2, outer shield 3 is formed, the recessed successively circular pit 4 of going up in the middle of the end face on the pedestal 1, square pit 5 down, polysilicon plasma igniting chip 2 is followed successively by monocrystalline substrate 6 from bottom to top, dielectric bottom 7, the polysilicon mass 8 that thin layer is arranged outward, insulating medium layer 9, metal film electrode pad 10, chip 2 is bonded in the following pit 5 in the pedestal 1, its flat bent cathode lead 11 is drawn by the inner chamber of pedestal 1 bottom, chip 2, cathode lead 11 is encapsulated in the pedestal 1, the pit of the corresponding pedestal 1 of end face has bocca 12 on the outer shield 3, and card covers on outside the pedestal 1.

Claims (1)

1. plasma ejection igniter, it is characterized in that it is by rewinding shape concave-concave pit foundation seat (1), polysilicon plasma igniting chip (2), outer shield (3) is formed, pedestal (1) is recessed into down in the middle of going up end face successively, following pit (4), (5), polysilicon plasma igniting chip (2) is followed successively by monocrystalline substrate (6) from bottom to top, dielectric bottom (7), the polysilicon mass (8) that thin layer is arranged outward, insulating medium layer (9), metal film electrode pad (10), chip (2) is bonded in the following pit (5) in the pedestal (1), its cathode lead (11) is drawn by the inner chamber of pedestal (1) bottom, chip (2), cathode lead (11) is encapsulated in the pedestal (1), the pit that outer shield (3) is gone up the corresponding pedestal of end face (1) has bocca (12), and card covers on outside the pedestal (1).
CN2009200660970U 2009-09-16 2009-09-16 Plasma jet igniter Expired - Lifetime CN201488667U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2009200660970U CN201488667U (en) 2009-09-16 2009-09-16 Plasma jet igniter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2009200660970U CN201488667U (en) 2009-09-16 2009-09-16 Plasma jet igniter

Publications (1)

Publication Number Publication Date
CN201488667U true CN201488667U (en) 2010-05-26

Family

ID=42427542

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2009200660970U Expired - Lifetime CN201488667U (en) 2009-09-16 2009-09-16 Plasma jet igniter

Country Status (1)

Country Link
CN (1) CN201488667U (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101672612A (en) * 2009-09-16 2010-03-17 衡阳晶体管有限公司 Plasma ejection igniter
CN103673792A (en) * 2012-09-06 2014-03-26 北京理工大学 High-voltage instant semiconductor bridge ignition module
CN110225642A (en) * 2018-03-01 2019-09-10 郑州大学 A kind of mixed type plasma jet of novel spark discharge

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101672612A (en) * 2009-09-16 2010-03-17 衡阳晶体管有限公司 Plasma ejection igniter
CN101672612B (en) * 2009-09-16 2013-06-05 李爱夫 Plasma ejection igniter
CN103673792A (en) * 2012-09-06 2014-03-26 北京理工大学 High-voltage instant semiconductor bridge ignition module
CN103673792B (en) * 2012-09-06 2016-03-02 北京理工大学 One sends out semiconductor bridge ignition module in high wink
CN110225642A (en) * 2018-03-01 2019-09-10 郑州大学 A kind of mixed type plasma jet of novel spark discharge

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Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
ASS Succession or assignment of patent right

Owner name: LI AIFU

Free format text: FORMER OWNER: HENGYANG TRANSISTOR CO., LTD.

Effective date: 20110909

C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20110909

Address after: 421007 Hunan province Hengyang City Baishazhou Yanfeng District No. 7 Jia Tang Yi

Patentee after: Li Aifu

Address before: 421007 Hunan province Hengyang City Baishazhou Yanfeng District No. 7 Jia Tang Yi

Patentee before: Hengyang Transistor Co., Ltd.

AV01 Patent right actively abandoned

Granted publication date: 20100526

Effective date of abandoning: 20090916

RGAV Abandon patent right to avoid regrant