CN201374316Y - 一种用于晶圆清洗或腐蚀的旋转装置 - Google Patents
一种用于晶圆清洗或腐蚀的旋转装置 Download PDFInfo
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- CN201374316Y CN201374316Y CN200820233669U CN200820233669U CN201374316Y CN 201374316 Y CN201374316 Y CN 201374316Y CN 200820233669 U CN200820233669 U CN 200820233669U CN 200820233669 U CN200820233669 U CN 200820233669U CN 201374316 Y CN201374316 Y CN 201374316Y
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CN200820233669U CN201374316Y (zh) | 2008-12-25 | 2008-12-25 | 一种用于晶圆清洗或腐蚀的旋转装置 |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104299933A (zh) * | 2014-09-25 | 2015-01-21 | 安徽安芯电子科技有限公司 | 晶圆刻蚀装置 |
CN104826850A (zh) * | 2015-06-04 | 2015-08-12 | 天津市环欧半导体材料技术有限公司 | 一种硅片清洗筐 |
CN104992917A (zh) * | 2015-08-10 | 2015-10-21 | 乐山无线电股份有限公司 | 一种硅片载具 |
CN106409729A (zh) * | 2016-10-25 | 2017-02-15 | 中航(重庆)微电子有限公司 | 一种提高晶圆表面平整度的湿法刻蚀装置 |
CN106702496A (zh) * | 2015-07-20 | 2017-05-24 | 有研半导体材料有限公司 | 一种酸腐蚀去除硅晶圆表面损伤的装置及方法 |
CN107955972A (zh) * | 2017-10-17 | 2018-04-24 | 中锗科技有限公司 | 旋转锗片/硅片碱腐蚀工艺及其专用设备 |
-
2008
- 2008-12-25 CN CN200820233669U patent/CN201374316Y/zh not_active Expired - Lifetime
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104299933A (zh) * | 2014-09-25 | 2015-01-21 | 安徽安芯电子科技有限公司 | 晶圆刻蚀装置 |
CN104826850A (zh) * | 2015-06-04 | 2015-08-12 | 天津市环欧半导体材料技术有限公司 | 一种硅片清洗筐 |
CN106702496A (zh) * | 2015-07-20 | 2017-05-24 | 有研半导体材料有限公司 | 一种酸腐蚀去除硅晶圆表面损伤的装置及方法 |
CN106702496B (zh) * | 2015-07-20 | 2019-01-25 | 有研半导体材料有限公司 | 一种酸腐蚀去除硅晶圆表面损伤的装置及方法 |
CN104992917A (zh) * | 2015-08-10 | 2015-10-21 | 乐山无线电股份有限公司 | 一种硅片载具 |
CN104992917B (zh) * | 2015-08-10 | 2018-04-24 | 乐山无线电股份有限公司 | 一种硅片载具 |
CN106409729A (zh) * | 2016-10-25 | 2017-02-15 | 中航(重庆)微电子有限公司 | 一种提高晶圆表面平整度的湿法刻蚀装置 |
CN107955972A (zh) * | 2017-10-17 | 2018-04-24 | 中锗科技有限公司 | 旋转锗片/硅片碱腐蚀工艺及其专用设备 |
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Free format text: FORMER OWNER: GRINM SEMICONDUCTOR MATERIALS CO., LTD. Effective date: 20120216 Owner name: GRINM SEMICONDUCTOR MATERIALS CO., LTD. Free format text: FORMER OWNER: BEIJING GENERAL RESEARCH INSTITUTE FOR NONFERROUS METALS Effective date: 20120216 |
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Effective date of registration: 20120216 Address after: 100088, 2, Xinjie street, Beijing Patentee after: GRINM Semiconductor Materials Co., Ltd. Address before: 100088, 2, Xinjie street, Beijing Co-patentee before: GRINM Semiconductor Materials Co., Ltd. Patentee before: General Research Institute for Nonferrous Metals |
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Owner name: GRINM ADVANCED MATERIALS CO., LTD. Free format text: FORMER NAME: GRINM SEMICONDUCTOR MATERIALS CO., LTD. |
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Address after: 100088, 2, Xinjie street, Beijing Patentee after: YOUYAN NEW MATERIAL CO., LTD. Address before: 100088, 2, Xinjie street, Beijing Patentee before: GRINM Semiconductor Materials Co., Ltd. |
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Owner name: GRINM SEMICONDUCTOR MATERIALS CO., LTD. Free format text: FORMER OWNER: GRINM ADVANCED MATERIALS CO., LTD. Effective date: 20150610 |
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Effective date of registration: 20150610 Address after: 101300 Beijing city Shunyi District Shuanghe Linhe Industrial Development Zone on the south side of the road Patentee after: You Yan Semi Materials Co., Ltd. Address before: 100088, 2, Xinjie street, Beijing Patentee before: YOUYAN NEW MATERIAL CO., LTD. |
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Granted publication date: 20091230 |