CN201128756Y - Substrate holder for vacuum coating vapour deposition process - Google Patents
Substrate holder for vacuum coating vapour deposition process Download PDFInfo
- Publication number
- CN201128756Y CN201128756Y CNU2007200423548U CN200720042354U CN201128756Y CN 201128756 Y CN201128756 Y CN 201128756Y CN U2007200423548 U CNU2007200423548 U CN U2007200423548U CN 200720042354 U CN200720042354 U CN 200720042354U CN 201128756 Y CN201128756 Y CN 201128756Y
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- flange
- magnetic current
- corrugated tube
- current sealing
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Abstract
The utility model discloses a substrate support for substrate clamping in the vapor deposition process in vacuum deposition coating. The vacuum chamber wall is provided with an opening; a vacuum chamber interface flange is installed on the edge of the opening outside the vacuum chamber; the top end of the corrugated pipe is connected to the external wall of the corrugated pipe contact flange; a magnetofluid sealed transmission outer shaft is sheathed inside the corrugated pipe contact flange; the end of the magnetofluid sealed transmission outer shaft is connected with a driving gear; a magnetofluid sealed transmission inner shaft is arranged inside the magnetofluid sealed transmission outer shaft; the end of the magnetofluid sealed transmission inner shaft is connected to a driven gear; the bottom end of the corrugated pipe contact flange is connected with a suspension; a heating/cooling mechanism is installed at the lower part of the suspension ; the lower part of the magnetofluid sealed transmission outer shaft is connected with a substrate rotation gear; a substrate support plate is installed at the lower part of the magnetofluid sealed transmission inner shaft; thereby the rotation of the substrate, the displacement relative to the disposition source, the heating/cooling of the substrate and the location and transportation of the process gas at the surface of the substrate are achieved at the same time.
Description
Technical field
The utility model relates to the substrate clamping device that a kind of vacuum plating vapor deposition apparatus uses.
Background technology
Under vacuum condition, utilizing gas phase deposition technology to be coated with film on substrate surface is the important channel that obtains good mechanical property, specific physical/chemical property thin-film material, is the research focus in fields such as current Materials science, physical science.The key problem of gas phase deposition technology is to utilize selected deposition method (as magnetron sputtering, pulsed laser deposition etc.), obtains the thin-film material of desired properties at substrate surface to be plated.
Vapor deposition processes need realize that the core component of this kind equipment is deposition source (as magnetron sputtering target, an ion source etc.) by vapor deposition apparatus, and the substrate clamping device belongs to slave unit.Yet because deposition source need be realized specific physical process, this has caused deposition source can only play the effect that produces particle beam in most cases.Therefore, in order to obtain needed film, the substrate clamping device need be born many important function.As: for guaranteeing the homogeneity of resultant film, substrate need be finished various rotations; For regulating the distance between deposition source and the substrate, substrate should be able to move along specific direction; For guaranteeing that film and substrate have bonding force preferably, substrate should be able to satisfy specific temperature requirement during deposition; For guaranteeing carrying out smoothly of some vapor deposition processes, process gas need be carried and put in place.
Because gas phase deposition technology relates to vacuum environment mostly, with respect to atmospheric environment, the difficulty relatively that becomes is carried in the location of the motion of vacuum condition subtegulum, heating/cooling, process gas, particularly when above-mentioned requirements occurs simultaneously.
Existing vapor deposition apparatus, as magnetron sputtering coater, electron beam evaporation deposition machine, pulsed laser deposition equipment etc., employed substrate frame can not realize above-mentioned requirements fully.
The utility model content
The purpose of the utility model patent provides a kind of substrate frame that is used for vacuum plating vapor deposition processes substrate clamping, utilize this device can realize the rotation of substrate (comprising that rotation, revolution or rotation add revolution), with respect to the position of deposition source move, the functions such as conveying of heating and cooling, process gas.
The technical scheme of the utility model patent is as follows:
The substrate frame that is used for vacuum plating vapor deposition processes substrate clamping, include vacuum-chamber wall, it is characterized in that: vacuum-chamber wall has perforate, the outer perforate of vacuum chamber along on the vacuum chamber flange is installed, the corrugated tube upper end is connected corrugated tube joint flange outer wall, the lower end is connected with the substrate frame flange, fixedly connected between vacuum chamber flange and the substrate frame flange, on the wave-wave line pipe coupling flange outer edge outer axis drive motor is installed, be set with magnetic current sealing transmission outer shaft in the corrugated tube joint flange, magnetic current sealing transmission outer shaft end is connected with driving toothed gear; Axle in the magnetic current sealing transmission is arranged in the magnetic current sealing transmission outer shaft, and shaft end is connected with follower gear in the magnetic current sealing transmission; Corrugated tube joint flange lower end is connected with suspension, and the suspension below is equipped with heating/cooling body, and magnetic current sealing transmission outer shaft below is connected with the substrate rotating gear, and the axle below is equipped with the substrate support plate in the magnetic current sealing transmission; Described suspension, substrate rotating gear, substrate support plate all are positioned at vacuum chamber; Described substrate frame flange side is connected with and promotes the support lower plate, promote and lifting-bolt is installed on the support lower plate and promotes the support guide pillar, lifting-bolt and promoting between the support lower plate to being rotationally connected, promote the support guide pillar and pass corrugated tube joint flange edge for being slidingly matched, between lifting-bolt and the corrugated tube joint flange edge for being threaded, described lifting-bolt upper end is equipped with turning handle, promotes the guide pillar upper end and is installed on the lifting support upper plate.
Characteristics of the present utility model:
One, on the Magneticfluid Seal Technique basis, utilize the substrate transmission in vacuum chamber of coaxial multiaxis magnetic current sealing transmission rig to rotate, by geartransmission, chain sprocket drive, synchronously with one or more modes in the transmission, in same vapor deposition apparatus, realize the mode of motion of rotation, revolution or the rotation+revolution of substrate flexibly.
Two, the magnetic current sealing body that will need to transmit rotation is installed on the flange that has corrugated tube, and this flange can move with respect to vacuum-chamber wall under the driving of drive unit, thereby realizes that substrate is with respect to fixing relatively moving of deposition source.
Three, will heat/refrigerating unit is installed in by fixed connection apparatus on the flange that has corrugated tube, and heating/refrigerating unit does not rotate with device for sealing magnetic fluid, but can realize moving with respect to the deposition source surface.Heating/the cooling surface of heating/refrigerating unit faces the deposition source surface.When substrate revolves round the sun between deposition source and the heating/refrigerating unit, can realize effective heating/cooling.
Four, the process gas input channel is installed in by fixed connection apparatus on the flange that has corrugated tube, and pipeline does not rotate with device for sealing magnetic fluid, but can realize moving with respect to the deposition source surface.The end of gas distribution pipeline adopts the distributing ring form that has aperture that process gas is transported to substrate surface in the vacuum chamber, thereby realizes that process gas is to the conveying of the location of substrate surface.
In order to improve the operability of this device, can adopt stepper-motor to drive the rotation of magnetic current sealing transmission rig and moving up and down of corrugated tube flange.
Innovation part of the present utility model:
One, integrated by to prior art can be realized mobile with respect to the deposition source surface of rotation that substrate is multi-form and substrate under vacuum condition.The substrate frame that has overcome legacy equipment can't realize the shortcoming of rotation, revolution and rotation+revolution motion form simultaneously.
Two,, provide guarantee smoothly for various vapor deposition processes by the location valve actuating mechanism is set.As: in magnetron sputtering, utilize valve actuating mechanism that reactant gases is transported to substrate surface, can reduce the generation of " target poisoning " phenomenon effectively, and more help guaranteeing the chemical dosage ratio of film.
Three, realize simultaneously the rotation of substrate, with respect to the location conveying of the moving of deposition source, heating of substrate/cooling and substrate surface process gas.
The utility model beneficial effect
1,, the function of vapor deposition apparatus is strengthened, especially for the vacuum vapor deposition equipment of research and development new membrane system by realizing above-mentioned functions simultaneously.
2,, can improve the uniform film thickness degree of institute's deposit film on the substrate by the reinforcement of substrate motion (comprising various rotations, moving) function with respect to deposition source.
3,, improved the quality of film by substrate heating/refrigerating unit.
4,, improved the stability of deposition process itself and compound chemistry dosage ratio by valve actuating mechanism.
Description of drawings
Fig. 1 is the utility model structural representation.
Embodiment
Number in the figure:
1, interior axle rotates follower gear, 2, axle in the magnetic current sealing transmission, 3, the lifting turning handle, 4, promote the support upper plate, 5, lifting screw, 6, promote the support guide pillar, 7, promote the support lower plate, 8, vacuum-chamber wall, 9, substrate heating/refrigerating unit, 10, the substrate rotating gear, 11, the substrate free-wheeling system, 12, substrate, 13, valve actuating mechanism, 14, deposition source, 15, the substrate support plate, 16, substrate rotation driving gear, 17, the vacuum chamber flange, 18, the substrate frame flange, 19, corrugated tube, 20, magnetic current sealing transmission outer shaft, 21, outer axis drive motor, 22, the corrugated tube joint flange, 23, outer axis drive motor driving toothed gear, 24, outer shaft rotates follower gear.
Referring to Fig. 1, described multi-functional, the multi-usage substrate frame of the utility model patent is connected on the 17 vacuum chamber flanges that 9 vacuum-chamber walls are welded by 18 substrate frame flanges.Parts such as 12 substrates, 9 substrate heating/refrigerating units, 11 substrate free-wheeling systems, 14, deposition source are positioned at vacuum chamber.Magnetic current sealing transmission mechanism body is connected on the 22 corrugated tube joint flanges by welding or other mode of connection, and is positioned at 19 corrugated tube inlet sides.The magnetic current sealing transmission rig can be by transmitting rotational motion in the outer axially vacuum chamber of axle and 20 magnetic current sealing transmissions in the 2 magnetic current sealing transmissions.The outside at vacuum chamber, for realizing the rotation of 20 magnetic current sealing outer shafts, outside 21, under the driving of axis drive motor, drive the 24 outer shafts rotation follower gear that is installed on the 20 magnetic current sealing transmission outer shafts by 23 outer axis drive motor driving toothed gears rotational motion is delivered to the vacuum chamber inboard.The similar fashion that moves through of axle is delivered in the vacuum chamber in the 2 magnetic current sealing transmissions, and axle rotates follower gear in 1 but only draw here, and drive-motor and driving toothed gear are positioned at rear side, do not draw.
Principle of work:
One, the realization of substrate rotational motion
Revolution: axis drive motor (not drawing among Fig. 1) in opening, driving toothed gear on the motor shaft (not drawing among Fig. 1) will drive axle rotation follower gear in 1, by axle in the 2 magnetic current sealing transmissions rotation is delivered to the vacuum chamber inboard, and drives the axis revolution that the 10 substrate rotating gears, 11 substrate free-wheeling systems and 12 substrates that are installed on the 15 substrate support plates center on axle in the 2 magnetic current sealing transmissions.
Rotation: start 21 outer axis drive motors, 23 outer axis drive motor driving toothed gears on the motor shaft will drive 24 outer shafts and rotate follower gear, by 20 magnetic current sealing transmission outer shafts rotation will be delivered to the vacuum chamber inboard, and drive the motion of 16 substrate rotation driving gears.The engagement of 16 substrate rotation driving gears and 10 substrate rotating gears, because 10 substrate rotating gears are installed in the bearing inner race in the 11 substrate free-wheeling systems, 12 substrates will be along the pivot axis of 10 substrate rotating gears, thereby produces spinning motion.
Rotation+revolution: axis drive motor (not drawing among Fig. 1) and 21 outer axis drive motors in starting, substrate will produce rotation and revolution motion simultaneously.
Two, substrate is with respect to the motion of deposition source
Turn 3 lifting turning handles, 5 lifting screws will rotate, owing to be processed with the internal thread with its engagement on 22 corrugated tube joint flanges, will produce rising/descending motion by meshing 22 corrugated tube joint flanges.22 corrugated tube joint flanges promote under the constraint of support guide pillar 6, can only rise/descend with the motion of 5 lifting screws.19 corrugated tubes that are welded on the 22 corrugated tube joint flanges will be stretched/compress.Like this, be fixed in all parts on the 22 corrugated tube joint flanges and 11 substrates and will produce motion, thereby realize regulating the effect of relative distance between 14 deposition sources and 12 substrates with respect to 14 deposition sources.
Three, heating of substrate/cooling
12 heating of substrate/process of cooling are finished by the 9 substrate heating/refrigerating units that are directly installed on the 22 corrugated tube joint flanges.When 12 substrates turn between 9 heating/cooling bodies and 14 deposition sources by revolution, can finish heating/process of cooling.
Four, carry the location of process gas
When 12 substrates need be finished vapor deposition processes by process gas, 12 substrates forwarded 14 deposition source positions to by revolution, open 13 valve actuating mechanisms, and process gas is transported to the location near 12 substrate surfaces.Because 13 valve actuating mechanisms are directly installed on the 22 corrugated tube joint flanges, the various motions of 12 substrates can not be subjected to the interference of 13 valve actuating mechanisms.
Claims (1)
1, the substrate frame that is used for vacuum plating vapor deposition processes substrate clamping, include vacuum-chamber wall, it is characterized in that: vacuum-chamber wall has perforate, the outer perforate of vacuum chamber along on the vacuum chamber flange is installed, the corrugated tube upper end is connected corrugated tube joint flange outer wall, the lower end is connected with the substrate frame flange, fixedly connected between vacuum chamber flange and the substrate frame flange, on the wave-wave line pipe coupling flange outer edge outer axis drive motor is installed, be set with magnetic current sealing transmission outer shaft in the corrugated tube joint flange, magnetic current sealing transmission outer shaft end is connected with driving toothed gear; Axle in the magnetic current sealing transmission is arranged in the magnetic current sealing transmission outer shaft, and shaft end is connected with follower gear in the magnetic current sealing transmission; Corrugated tube joint flange lower end is connected with suspension, and the suspension below is equipped with heating/cooling body, and magnetic current sealing transmission outer shaft below is connected with the substrate rotating gear, and the axle below is equipped with the substrate support plate in the magnetic current sealing transmission; Described suspension, substrate rotating gear, substrate support plate all are positioned at vacuum chamber; Described substrate frame flange side is connected with and promotes the support lower plate, promote and lifting-bolt is installed on the support lower plate and promotes the support guide pillar, lifting-bolt and promoting between the support lower plate to being rotationally connected, promote the support guide pillar and pass corrugated tube joint flange edge for being slidingly matched, between lifting-bolt and the corrugated tube joint flange edge for being threaded, described lifting-bolt upper end is equipped with turning handle, promotes the guide pillar upper end and is installed on the lifting support upper plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2007200423548U CN201128756Y (en) | 2007-11-21 | 2007-11-21 | Substrate holder for vacuum coating vapour deposition process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2007200423548U CN201128756Y (en) | 2007-11-21 | 2007-11-21 | Substrate holder for vacuum coating vapour deposition process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201128756Y true CN201128756Y (en) | 2008-10-08 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2007200423548U Expired - Fee Related CN201128756Y (en) | 2007-11-21 | 2007-11-21 | Substrate holder for vacuum coating vapour deposition process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201128756Y (en) |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102703875A (en) * | 2012-07-05 | 2012-10-03 | 哈尔滨工业大学 | Technological equipment for swept-angle magnetron sputtering deposition |
| CN103046014A (en) * | 2012-12-31 | 2013-04-17 | 上海子创镀膜技术有限公司 | Magnetically-controlled sputter coating vacuum transmission mechanism |
| CN103820772A (en) * | 2014-02-12 | 2014-05-28 | 清华大学 | System for removing electric charges from PECVD (Plasma Enhanced Chemical Vapor Deposition) device and control method of system |
| CN105112879A (en) * | 2015-09-11 | 2015-12-02 | 中国电子科技集团公司第四十八研究所 | Magnetron sputtering coating workpiece table |
| CN107012445A (en) * | 2017-05-05 | 2017-08-04 | 宁波工程学院 | A kind of chemical vapor deposition is coated with the sample bench of the equipment of diamond film |
| CN108774731A (en) * | 2018-07-31 | 2018-11-09 | 湖南玉丰真空科学技术有限公司 | A kind of vacuum coating equipment vacuum chamber substrate frame elevating mechanism |
| CN108866503A (en) * | 2018-08-30 | 2018-11-23 | 东莞市典雅五金制品有限公司 | A kind of heating rotation of substrate platform |
| CN108866501A (en) * | 2018-08-30 | 2018-11-23 | 东莞市典雅五金制品有限公司 | A kind of double ion beam sputtered coating apparatus of four targets |
| CN108858088A (en) * | 2018-06-14 | 2018-11-23 | 中国电子科技集团公司第四十八研究所 | A kind of work stage and its pass piece method |
| CN109252143A (en) * | 2017-07-13 | 2019-01-22 | 中国电子科技集团公司第四十八研究所 | A kind of chip bench |
| CN111850501A (en) * | 2020-07-20 | 2020-10-30 | 江苏集萃有机光电技术研究所有限公司 | Substrate frame structure and vacuum evaporation device |
| CN111940202A (en) * | 2020-07-02 | 2020-11-17 | 滁州优立光学眼镜有限公司 | Antifog water-proof membrane device is plated to spectacle lens |
| CN112964277A (en) * | 2021-03-05 | 2021-06-15 | 中国电子科技集团公司第四十八研究所 | Multi-station workpiece table of quartz harmonic oscillator flattening equipment |
-
2007
- 2007-11-21 CN CNU2007200423548U patent/CN201128756Y/en not_active Expired - Fee Related
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102703875A (en) * | 2012-07-05 | 2012-10-03 | 哈尔滨工业大学 | Technological equipment for swept-angle magnetron sputtering deposition |
| CN103046014A (en) * | 2012-12-31 | 2013-04-17 | 上海子创镀膜技术有限公司 | Magnetically-controlled sputter coating vacuum transmission mechanism |
| CN103046014B (en) * | 2012-12-31 | 2016-04-20 | 上海子创镀膜技术有限公司 | A kind of magnetron sputtering plating vacuum transmission mechanism |
| CN103820772A (en) * | 2014-02-12 | 2014-05-28 | 清华大学 | System for removing electric charges from PECVD (Plasma Enhanced Chemical Vapor Deposition) device and control method of system |
| CN105112879A (en) * | 2015-09-11 | 2015-12-02 | 中国电子科技集团公司第四十八研究所 | Magnetron sputtering coating workpiece table |
| CN107012445A (en) * | 2017-05-05 | 2017-08-04 | 宁波工程学院 | A kind of chemical vapor deposition is coated with the sample bench of the equipment of diamond film |
| CN109252143A (en) * | 2017-07-13 | 2019-01-22 | 中国电子科技集团公司第四十八研究所 | A kind of chip bench |
| CN109252143B (en) * | 2017-07-13 | 2020-12-11 | 中国电子科技集团公司第四十八研究所 | Substrate table |
| CN108858088A (en) * | 2018-06-14 | 2018-11-23 | 中国电子科技集团公司第四十八研究所 | A kind of work stage and its pass piece method |
| CN108774731A (en) * | 2018-07-31 | 2018-11-09 | 湖南玉丰真空科学技术有限公司 | A kind of vacuum coating equipment vacuum chamber substrate frame elevating mechanism |
| CN108866501A (en) * | 2018-08-30 | 2018-11-23 | 东莞市典雅五金制品有限公司 | A kind of double ion beam sputtered coating apparatus of four targets |
| CN108866503A (en) * | 2018-08-30 | 2018-11-23 | 东莞市典雅五金制品有限公司 | A kind of heating rotation of substrate platform |
| CN111940202A (en) * | 2020-07-02 | 2020-11-17 | 滁州优立光学眼镜有限公司 | Antifog water-proof membrane device is plated to spectacle lens |
| CN111940202B (en) * | 2020-07-02 | 2021-09-28 | 滁州优立光学眼镜有限公司 | Antifog water-proof membrane device is plated to spectacle lens |
| CN111850501A (en) * | 2020-07-20 | 2020-10-30 | 江苏集萃有机光电技术研究所有限公司 | Substrate frame structure and vacuum evaporation device |
| CN112964277A (en) * | 2021-03-05 | 2021-06-15 | 中国电子科技集团公司第四十八研究所 | Multi-station workpiece table of quartz harmonic oscillator flattening equipment |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: ANHUI WANYI SCIENCE AND TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: HEFEI WANYI TECHNOLOGY CO., LTD. Effective date: 20120208 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20120208 Address after: 230088 Anhui building, No. 71, Tianda Road, hi tech Zone, Anhui, Hefei Patentee after: Anhui Wanyi Science and Technology Co., Ltd. Address before: 230088 No. 71, Tianda Road, Hefei, Anhui Patentee before: Hefei Wanyi Technology Co., Ltd. |
|
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20081008 Termination date: 20131121 |